JP6090144B2 - 切替弁、液処理装置 - Google Patents

切替弁、液処理装置 Download PDF

Info

Publication number
JP6090144B2
JP6090144B2 JP2013258684A JP2013258684A JP6090144B2 JP 6090144 B2 JP6090144 B2 JP 6090144B2 JP 2013258684 A JP2013258684 A JP 2013258684A JP 2013258684 A JP2013258684 A JP 2013258684A JP 6090144 B2 JP6090144 B2 JP 6090144B2
Authority
JP
Japan
Prior art keywords
liquid
valve
flow path
port
chemical
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2013258684A
Other languages
English (en)
Japanese (ja)
Other versions
JP2015115555A (ja
Inventor
幹雄 中島
幹雄 中島
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Electron Ltd
Original Assignee
Tokyo Electron Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Priority to JP2013258684A priority Critical patent/JP6090144B2/ja
Priority to KR1020140174014A priority patent/KR102269161B1/ko
Publication of JP2015115555A publication Critical patent/JP2015115555A/ja
Application granted granted Critical
Publication of JP6090144B2 publication Critical patent/JP6090144B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02002Preparing wafers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02002Preparing wafers
    • H01L21/02005Preparing bulk and homogeneous wafers

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
JP2013258684A 2013-12-13 2013-12-13 切替弁、液処理装置 Active JP6090144B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2013258684A JP6090144B2 (ja) 2013-12-13 2013-12-13 切替弁、液処理装置
KR1020140174014A KR102269161B1 (ko) 2013-12-13 2014-12-05 전환 밸브, 액 처리 장치

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2013258684A JP6090144B2 (ja) 2013-12-13 2013-12-13 切替弁、液処理装置

Publications (2)

Publication Number Publication Date
JP2015115555A JP2015115555A (ja) 2015-06-22
JP6090144B2 true JP6090144B2 (ja) 2017-03-08

Family

ID=53516627

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2013258684A Active JP6090144B2 (ja) 2013-12-13 2013-12-13 切替弁、液処理装置

Country Status (2)

Country Link
JP (1) JP6090144B2 (ko)
KR (1) KR102269161B1 (ko)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN117571897B (zh) * 2023-11-15 2024-04-30 青岛惠安康生物工程有限公司 一种液相色谱-质谱联用仪及切换装置

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3117811B2 (ja) * 1992-09-10 2000-12-18 シンエイテック株式会社 二方切替弁
JP4066004B2 (ja) * 1997-10-13 2008-03-26 忠弘 大見 上段部材取付けの基準となる孔を有する複数の下段部材の固定方法および固定用治具
JP3841945B2 (ja) * 1997-10-29 2006-11-08 大日本スクリーン製造株式会社 基板処理装置
JP4172769B2 (ja) * 2003-03-10 2008-10-29 大日本スクリーン製造株式会社 基板処理装置および基板処理方法
JP5202101B2 (ja) * 2008-05-21 2013-06-05 旭有機材工業株式会社 ミキシングバルブ及びそれを用いたミキシング装置
JP5148465B2 (ja) * 2008-12-08 2013-02-20 東京エレクトロン株式会社 液処理方法、液処理装置および記憶媒体
JP2010232521A (ja) * 2009-03-27 2010-10-14 Dainippon Screen Mfg Co Ltd 処理液供給装置および処理液供給方法
JP5474666B2 (ja) 2009-07-31 2014-04-16 東京エレクトロン株式会社 液処理装置、液処理方法、プログラムおよびプログラム記録媒体
JP5220707B2 (ja) 2009-07-31 2013-06-26 東京エレクトロン株式会社 液処理装置、液処理方法、プログラムおよびプログラム記録媒体
KR101478859B1 (ko) * 2009-12-09 2015-01-02 도쿄엘렉트론가부시키가이샤 기판 처리 장치, 기판 처리 방법, 및 이 기판 처리 방법을 실행시키기 위한 프로그램을 기록한 기록 매체

Also Published As

Publication number Publication date
JP2015115555A (ja) 2015-06-22
KR102269161B1 (ko) 2021-06-23
KR20150069524A (ko) 2015-06-23

Similar Documents

Publication Publication Date Title
JP5736687B2 (ja) 基板処理装置
KR101584843B1 (ko) 액 처리 장치, 액 처리 방법 및 기억 매체
US10168618B2 (en) Liquid processing method and storage medium
TWI666700B (zh) 基板處理裝置及基板處理方法
KR101371107B1 (ko) 액처리 장치, 액처리 방법 및 기록 매체
KR101761429B1 (ko) 액처리 장치, 액처리 장치의 제어 방법, 및 컴퓨터 판독 가능한 기억 매체
JP6454629B2 (ja) 基板液処理装置
US20200070196A1 (en) Substrate processing apparatus, substrate processing method, and storage medium
US20120199164A1 (en) Methods for Using Proximity Head With Configurable Delivery
US20210111043A1 (en) Liquid supply device and liquid supply method
JP6224359B2 (ja) 基板処理装置のためのスケジュール作成方法およびスケジュール作成プログラム
JP4815274B2 (ja) 基板処理装置、基板処理方法、および記録媒体
US11798819B2 (en) Liquid processing apparatus and liquid processing method
JP6090144B2 (ja) 切替弁、液処理装置
JP2014099528A (ja) 液処理装置
US10832902B2 (en) Substrate processing apparatus and substrate processing method
WO2017043495A1 (ja) 基板液処理装置及び流路洗浄方法
KR20170027295A (ko) 기판 처리 장치
JP7292120B2 (ja) 基板処理方法および基板処理装置
KR102613750B1 (ko) 액 처리 장치
JP6101228B2 (ja) 基板処理装置及び基板処理方法
JP7122140B2 (ja) 基板処理装置、基板処理方法、及び記憶媒体
JP5913492B2 (ja) 液処理装置
JP6675955B2 (ja) 基板処理装置
CN116805595A (zh) 衬底处理装置及衬底处理方法

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20151109

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20160802

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20160928

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20170110

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20170123

R150 Certificate of patent or registration of utility model

Ref document number: 6090144

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250