JP6071068B2 - 露光方法及び露光装置、並びにデバイス製造方法及びフラットパネルディスプレイの製造方法 - Google Patents
露光方法及び露光装置、並びにデバイス製造方法及びフラットパネルディスプレイの製造方法 Download PDFInfo
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- JP6071068B2 JP6071068B2 JP2013531102A JP2013531102A JP6071068B2 JP 6071068 B2 JP6071068 B2 JP 6071068B2 JP 2013531102 A JP2013531102 A JP 2013531102A JP 2013531102 A JP2013531102 A JP 2013531102A JP 6071068 B2 JP6071068 B2 JP 6071068B2
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Images
Classifications
-
- G—PHYSICS
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- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70758—Drive means, e.g. actuators, motors for long- or short-stroke modules or fine or coarse driving
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
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- Liquid Crystal (AREA)
Applications Claiming Priority (7)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2011186949 | 2011-08-30 | ||
JP2011186922 | 2011-08-30 | ||
JP2011186922 | 2011-08-30 | ||
JP2011186871 | 2011-08-30 | ||
JP2011186949 | 2011-08-30 | ||
JP2011186871 | 2011-08-30 | ||
PCT/JP2012/005466 WO2013031223A1 (fr) | 2011-08-30 | 2012-08-30 | Dispositif de traitement de substrat et procédé de traitement de substrat, procédé d'exposition et dispositif d'exposition ainsi que procédé de fabrication d'un dispositif et procédé de fabrication d'un écran plat |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2017001562A Division JP6380564B2 (ja) | 2011-08-30 | 2017-01-10 | 露光装置、フラットパネルディスプレイの製造方法、デバイス製造方法、及び露光方法 |
Publications (2)
Publication Number | Publication Date |
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JPWO2013031223A1 JPWO2013031223A1 (ja) | 2015-03-23 |
JP6071068B2 true JP6071068B2 (ja) | 2017-02-01 |
Family
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Family Applications (4)
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JP2013531102A Active JP6071068B2 (ja) | 2011-08-30 | 2012-08-30 | 露光方法及び露光装置、並びにデバイス製造方法及びフラットパネルディスプレイの製造方法 |
JP2017001562A Active JP6380564B2 (ja) | 2011-08-30 | 2017-01-10 | 露光装置、フラットパネルディスプレイの製造方法、デバイス製造方法、及び露光方法 |
JP2018141981A Active JP6638774B2 (ja) | 2011-08-30 | 2018-07-30 | 露光方法及び露光装置、並びにデバイス製造方法及びフラットパネルディスプレイの製造方法 |
JP2019236526A Pending JP2020074009A (ja) | 2011-08-30 | 2019-12-26 | 基板処理装置及び基板処理方法、露光方法及び露光装置、並びにデバイス製造方法及びフラットパネルディスプレイの製造方法 |
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JP2017001562A Active JP6380564B2 (ja) | 2011-08-30 | 2017-01-10 | 露光装置、フラットパネルディスプレイの製造方法、デバイス製造方法、及び露光方法 |
JP2018141981A Active JP6638774B2 (ja) | 2011-08-30 | 2018-07-30 | 露光方法及び露光装置、並びにデバイス製造方法及びフラットパネルディスプレイの製造方法 |
JP2019236526A Pending JP2020074009A (ja) | 2011-08-30 | 2019-12-26 | 基板処理装置及び基板処理方法、露光方法及び露光装置、並びにデバイス製造方法及びフラットパネルディスプレイの製造方法 |
Country Status (6)
Country | Link |
---|---|
JP (4) | JP6071068B2 (fr) |
KR (2) | KR102105809B1 (fr) |
CN (4) | CN103782239B (fr) |
HK (1) | HK1245903A1 (fr) |
TW (2) | TW201921166A (fr) |
WO (1) | WO2013031223A1 (fr) |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI701514B (zh) * | 2014-03-28 | 2020-08-11 | 日商尼康股份有限公司 | 移動體裝置、曝光裝置、平板顯示器之製造方法、元件製造方法、及移動體驅動方法 |
US20230290667A1 (en) * | 2014-06-17 | 2023-09-14 | Kateeva, Inc. | Printing system assemblies and methods |
CN115946453A (zh) * | 2014-06-17 | 2023-04-11 | 科迪华公司 | 打印系统组件和方法 |
KR101715785B1 (ko) * | 2014-12-05 | 2017-03-13 | 프로미스 주식회사 | Fpd용 노광장치 |
WO2016159176A1 (fr) * | 2015-03-31 | 2016-10-06 | 株式会社ニコン | Dispositif d'exposition, procédé de fabrication d'écran plat, procédé de fabrication de dispositif, et procédé d'exposition |
CN104820346B (zh) * | 2015-04-24 | 2017-04-12 | 深圳市大川光电设备有限公司 | 平板工件的对位方法 |
US20190377271A1 (en) * | 2016-09-30 | 2019-12-12 | Nikon Corporation | Exposure apparatus, manufacturing method of flat-panel display, device manufacturing method, and exposure method |
JPWO2018181912A1 (ja) * | 2017-03-31 | 2020-02-13 | 株式会社ニコン | 移動体装置、露光装置、フラットパネルディスプレイの製造方法、デバイス製造方法、及び移動体の駆動方法 |
KR102653016B1 (ko) | 2018-09-18 | 2024-03-29 | 삼성전자주식회사 | 척 구동 장치 및 기판 처리 장치 |
CN109870881B (zh) * | 2019-03-20 | 2021-06-15 | 哈尔滨工业大学 | 宏微组合式长行程精密运动平台 |
KR102125677B1 (ko) * | 2019-06-27 | 2020-06-24 | 세메스 주식회사 | 기판 처리 방법 |
CN111082596B (zh) * | 2019-12-23 | 2022-04-15 | 安徽机电职业技术学院 | 一种包括二自由度执行机构的自由度多方位微动台 |
Family Cites Families (25)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE69735016T2 (de) * | 1996-12-24 | 2006-08-17 | Asml Netherlands B.V. | Lithographisches Gerät mit zwei Objekthaltern |
JP2000040662A (ja) * | 1999-08-05 | 2000-02-08 | Nikon Corp | 露光装置 |
JP2001313246A (ja) * | 2000-04-28 | 2001-11-09 | Nikon Corp | 露光方法及び露光装置並びにデバイスの製造方法及びデバイス |
KR20010034990A (ko) * | 2000-06-29 | 2001-05-07 | 박용석 | 반도체 및 평판디스플레이용 멀티기능을 갖춘 집적제조장치 |
JP2002251017A (ja) * | 2001-02-23 | 2002-09-06 | Adtec Engineeng Co Ltd | 露光装置 |
TWI226303B (en) * | 2002-04-18 | 2005-01-11 | Olympus Corp | Substrate carrying device |
ATE429031T1 (de) * | 2003-08-07 | 2009-05-15 | Nikon Corp | Belichtungsverfahren |
JP2005317916A (ja) * | 2004-03-30 | 2005-11-10 | Canon Inc | 露光装置及びデバイス製造方法 |
JP2006049384A (ja) * | 2004-07-30 | 2006-02-16 | Laserfront Technologies Inc | ガントリー型xyステージ |
KR101116630B1 (ko) * | 2005-03-28 | 2012-03-07 | 엘지디스플레이 주식회사 | 평판표시장치용 노광장비 및 이를 이용한 기판의포토리소그라피 방법 |
JP2008182002A (ja) * | 2007-01-24 | 2008-08-07 | Dainippon Printing Co Ltd | 基板加工装置、基板加工方法、表示装置構成部材の製造方法 |
JP4652351B2 (ja) * | 2007-02-02 | 2011-03-16 | 大日本印刷株式会社 | 基板支持装置、基板支持方法 |
WO2008129762A1 (fr) | 2007-03-05 | 2008-10-30 | Nikon Corporation | Appareil à corps mobile, appareil de formation de motif, procédé de fabrication de motif, procédé de fabrication de dispositif, procédé de fabrication d'appareil à corps mobile, et procédé d'entraînement de corps mobile |
US8896809B2 (en) * | 2007-08-15 | 2014-11-25 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
JP2009088297A (ja) * | 2007-09-29 | 2009-04-23 | Dainippon Printing Co Ltd | 載置装置、載置方法、基板加工装置、基板加工方法、表示装置構成部材の製造方法 |
JP2009147240A (ja) * | 2007-12-18 | 2009-07-02 | Dainippon Printing Co Ltd | 基板支持装置、基板支持方法、基板加工装置、基板加工方法、表示装置構成部材の製造方法 |
JP2009200122A (ja) * | 2008-02-19 | 2009-09-03 | Canon Inc | 露光装置およびデバイス製造方法 |
JP2010067867A (ja) * | 2008-09-11 | 2010-03-25 | Nikon Corp | 露光方法及び装置、並びにデバイス製造方法 |
US8599359B2 (en) | 2008-12-19 | 2013-12-03 | Nikon Corporation | Exposure apparatus, exposure method, device manufacturing method, and carrier method |
CN201364460Y (zh) * | 2009-01-20 | 2009-12-16 | 清华大学 | 一种光刻机硅片台双台交换装置 |
KR102211255B1 (ko) * | 2009-05-15 | 2021-02-02 | 가부시키가이샤 니콘 | 이동체 장치, 용력 전달 장치, 및 노광 장치, 그리고 디바이스 제조 방법 |
US20110042874A1 (en) * | 2009-08-20 | 2011-02-24 | Nikon Corporation | Object processing apparatus, exposure apparatus and exposure method, and device manufacturing method |
US8699001B2 (en) * | 2009-08-20 | 2014-04-15 | Nikon Corporation | Object moving apparatus, object processing apparatus, exposure apparatus, object inspecting apparatus and device manufacturing method |
JP5573849B2 (ja) * | 2009-08-20 | 2014-08-20 | 株式会社ニコン | 物体処理装置、露光装置及び露光方法、並びにデバイス製造方法 |
US8598538B2 (en) * | 2010-09-07 | 2013-12-03 | Nikon Corporation | Movable body apparatus, object processing device, exposure apparatus, flat-panel display manufacturing method, and device manufacturing method |
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2012
- 2012-08-30 CN CN201280042608.XA patent/CN103782239B/zh active Active
- 2012-08-30 TW TW107147782A patent/TW201921166A/zh unknown
- 2012-08-30 TW TW101131504A patent/TWI650612B/zh active
- 2012-08-30 KR KR1020147008312A patent/KR102105809B1/ko active IP Right Grant
- 2012-08-30 WO PCT/JP2012/005466 patent/WO2013031223A1/fr active Application Filing
- 2012-08-30 CN CN201710696016.4A patent/CN107479332B/zh active Active
- 2012-08-30 CN CN201710695999.XA patent/CN107357137A/zh active Pending
- 2012-08-30 KR KR1020207011723A patent/KR102226989B1/ko active IP Right Grant
- 2012-08-30 JP JP2013531102A patent/JP6071068B2/ja active Active
- 2012-08-30 CN CN201811339478.1A patent/CN109324485A/zh active Pending
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2017
- 2017-01-10 JP JP2017001562A patent/JP6380564B2/ja active Active
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2018
- 2018-04-24 HK HK18105325.5A patent/HK1245903A1/zh unknown
- 2018-07-30 JP JP2018141981A patent/JP6638774B2/ja active Active
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2019
- 2019-12-26 JP JP2019236526A patent/JP2020074009A/ja active Pending
Also Published As
Publication number | Publication date |
---|---|
JP2019049694A (ja) | 2019-03-28 |
WO2013031223A1 (fr) | 2013-03-07 |
KR102105809B1 (ko) | 2020-05-28 |
CN103782239A (zh) | 2014-05-07 |
CN103782239B (zh) | 2017-09-05 |
JP2017102468A (ja) | 2017-06-08 |
HK1245903A1 (zh) | 2018-08-31 |
KR20140084007A (ko) | 2014-07-04 |
JP6638774B2 (ja) | 2020-01-29 |
JPWO2013031223A1 (ja) | 2015-03-23 |
TW201319758A (zh) | 2013-05-16 |
CN107479332B (zh) | 2020-04-03 |
JP2020074009A (ja) | 2020-05-14 |
KR20200046127A (ko) | 2020-05-06 |
TWI650612B (zh) | 2019-02-11 |
KR102226989B1 (ko) | 2021-03-11 |
TW201921166A (zh) | 2019-06-01 |
CN107479332A (zh) | 2017-12-15 |
CN107357137A (zh) | 2017-11-17 |
CN109324485A (zh) | 2019-02-12 |
JP6380564B2 (ja) | 2018-08-29 |
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