JP6061771B2 - 試料ホルダおよびそれを用いた荷電粒子線装置 - Google Patents

試料ホルダおよびそれを用いた荷電粒子線装置 Download PDF

Info

Publication number
JP6061771B2
JP6061771B2 JP2013092436A JP2013092436A JP6061771B2 JP 6061771 B2 JP6061771 B2 JP 6061771B2 JP 2013092436 A JP2013092436 A JP 2013092436A JP 2013092436 A JP2013092436 A JP 2013092436A JP 6061771 B2 JP6061771 B2 JP 6061771B2
Authority
JP
Japan
Prior art keywords
sample
magnetic field
magnetic
charged particle
particle beam
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2013092436A
Other languages
English (en)
Japanese (ja)
Other versions
JP2014216180A5 (enExample
JP2014216180A (ja
Inventor
菅原　昭
昭 菅原
智一 島倉
智一 島倉
高橋　由夫
由夫 高橋
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP2013092436A priority Critical patent/JP6061771B2/ja
Priority to EP14165693.4A priority patent/EP2797099B1/en
Priority to US14/260,452 priority patent/US9070532B2/en
Publication of JP2014216180A publication Critical patent/JP2014216180A/ja
Publication of JP2014216180A5 publication Critical patent/JP2014216180A5/ja
Application granted granted Critical
Publication of JP6061771B2 publication Critical patent/JP6061771B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/20—Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/09—Diaphragms; Shields associated with electron or ion-optical arrangements; Compensation of disturbing fields
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/266—Measurement of magnetic or electric fields in the object; Lorentzmicroscopy
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/02—Details
    • H01J2237/026—Shields
    • H01J2237/0264—Shields magnetic
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/20—Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
    • H01J2237/2008—Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated specially adapted for studying electrical or magnetical properties of objects

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
JP2013092436A 2013-04-25 2013-04-25 試料ホルダおよびそれを用いた荷電粒子線装置 Expired - Fee Related JP6061771B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2013092436A JP6061771B2 (ja) 2013-04-25 2013-04-25 試料ホルダおよびそれを用いた荷電粒子線装置
EP14165693.4A EP2797099B1 (en) 2013-04-25 2014-04-23 Magnetic field applying sample holder; and charged particle beam apparatus using same
US14/260,452 US9070532B2 (en) 2013-04-25 2014-04-24 Charged particle beam apparatus sample holder with magnetic field generating element and sample holding element

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2013092436A JP6061771B2 (ja) 2013-04-25 2013-04-25 試料ホルダおよびそれを用いた荷電粒子線装置

Publications (3)

Publication Number Publication Date
JP2014216180A JP2014216180A (ja) 2014-11-17
JP2014216180A5 JP2014216180A5 (enExample) 2016-03-10
JP6061771B2 true JP6061771B2 (ja) 2017-01-18

Family

ID=50513179

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2013092436A Expired - Fee Related JP6061771B2 (ja) 2013-04-25 2013-04-25 試料ホルダおよびそれを用いた荷電粒子線装置

Country Status (3)

Country Link
US (1) US9070532B2 (enExample)
EP (1) EP2797099B1 (enExample)
JP (1) JP6061771B2 (enExample)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6554066B2 (ja) * 2016-05-31 2019-07-31 株式会社日立製作所 磁場計測用電子顕微鏡、及び磁場計測法
JP6355703B2 (ja) * 2016-11-29 2018-07-11 株式会社メルビル 試料ホルダー
JP6786121B2 (ja) * 2017-01-24 2020-11-18 国立大学法人東北大学 電子線ホログラムの作成方法、磁場情報測定方法および磁場情報測定装置
CN112038039B (zh) * 2020-05-27 2021-08-24 中国科学院宁波材料技术与工程研究所 一种磁场发生装置及可施加磁场的透射电子显微镜样品杆
US20240258064A1 (en) * 2021-08-20 2024-08-01 Forschungszentrum Jülich GmbH Magnetization device for an electron microscope and method

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58169762A (ja) * 1982-03-30 1983-10-06 Internatl Precision Inc 電子線装置
JPH08264146A (ja) 1995-03-24 1996-10-11 Hitachi Ltd 透過電子顕微鏡
US6476913B1 (en) * 1998-11-30 2002-11-05 Hitachi, Ltd. Inspection method, apparatus and system for circuit pattern
DE19945344A1 (de) * 1999-09-22 2001-03-29 Leo Elektronenmikroskopie Gmbh Teilchenoptisches Beleuchtungs- und Abbildungssystem mit einer Kondensor-Objektiv-Einfeldlinse
JP3469213B2 (ja) * 2001-03-29 2003-11-25 株式会社日立製作所 磁場印加試料観察システム
JP2005294181A (ja) * 2004-04-05 2005-10-20 Jeol Ltd バルク試料ホルダ
JP4759733B2 (ja) 2005-09-15 2011-08-31 国立大学法人東北大学 電子顕微鏡
JP2011003533A (ja) * 2009-05-20 2011-01-06 Jeol Ltd 磁区観察装置
JP5645386B2 (ja) 2009-09-30 2014-12-24 株式会社日立製作所 電磁場印加装置
JP2012129137A (ja) * 2010-12-17 2012-07-05 Hitachi Ltd 磁場印加試料保持装置およびそれを用いた荷電粒子線装置

Also Published As

Publication number Publication date
EP2797099A3 (en) 2016-01-06
EP2797099A2 (en) 2014-10-29
US20140319371A1 (en) 2014-10-30
JP2014216180A (ja) 2014-11-17
EP2797099B1 (en) 2017-09-27
US9070532B2 (en) 2015-06-30

Similar Documents

Publication Publication Date Title
JP6389671B2 (ja) 荷電粒子ビームを集束させる磁気レンズ
JP6061771B2 (ja) 試料ホルダおよびそれを用いた荷電粒子線装置
JP4795847B2 (ja) 電子レンズ及びそれを用いた荷電粒子線装置
CN102820196B (zh) 可加磁场的透射电子显微镜样品杆
US20230089136A1 (en) Magnetic field generation device, and transmission electron microscope sample holder capable of applying magnetic field
US7064325B2 (en) Apparatus with permanent magnetic lenses
EP3396696A1 (en) Compact deflecting magnet
EP2525384A2 (en) Method and structure for controlling magnetic field distributions in an ExB wien filter
JP5140103B2 (ja) リニアモータ対、移動ステージ、及び電子顕微鏡
JP5088536B2 (ja) 可動コイル型リニアモータの組立方法
WO2013015311A1 (ja) 電磁レンズおよび荷電粒子装置
Iseki et al. Two-dimensionally deflecting mirror using electromagnetic actuation
JP2002175971A (ja) 磁気レンズ、磁気シールド体の製造方法、荷電粒子線露光装置及び半導体デバイスの製造方法
JP5645386B2 (ja) 電磁場印加装置
JP2012129137A (ja) 磁場印加試料保持装置およびそれを用いた荷電粒子線装置
JP2020061523A (ja) 電磁石、磁場印加システム
US20130328431A1 (en) Cylindrical electromagnetic actuator
JP2008047491A (ja) 偏向電磁石およびそれを備えるイオン注入装置
JP5512797B2 (ja) 電子線干渉装置
CN103311083A (zh) 离子注入装置
Bai et al. An in-situ magnetising holder achieving 1.5 T in-plane field in 200 kV transmission electron microscope
JP2022099282A (ja) 荷電粒子顕微鏡用の無磁場サンプル面
Hahn et al. Evaluation of a linear hybrid microstep motor by means of magnetic flux measurements
HK40000572A (en) Compact deflecting magnet

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20160125

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20160125

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20161012

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20161115

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20161213

R150 Certificate of patent or registration of utility model

Ref document number: 6061771

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

LAPS Cancellation because of no payment of annual fees