JP6049355B2 - 蒸発源 - Google Patents

蒸発源 Download PDF

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Publication number
JP6049355B2
JP6049355B2 JP2012188691A JP2012188691A JP6049355B2 JP 6049355 B2 JP6049355 B2 JP 6049355B2 JP 2012188691 A JP2012188691 A JP 2012188691A JP 2012188691 A JP2012188691 A JP 2012188691A JP 6049355 B2 JP6049355 B2 JP 6049355B2
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JP
Japan
Prior art keywords
crucible
vapor deposition
deposition material
evaporation source
evaporation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2012188691A
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English (en)
Japanese (ja)
Other versions
JP2014047365A (ja
JP2014047365A5 (zh
Inventor
喜成 近藤
喜成 近藤
尚人 山田
尚人 山田
義仁 小林
義仁 小林
佐藤　聡
聡 佐藤
松本　栄一
栄一 松本
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Tokki Corp
Original Assignee
Canon Tokki Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Tokki Corp filed Critical Canon Tokki Corp
Priority to JP2012188691A priority Critical patent/JP6049355B2/ja
Priority to TW102127956A priority patent/TWI589716B/zh
Priority to PCT/JP2013/071621 priority patent/WO2014034410A1/ja
Priority to CN201380044630.2A priority patent/CN104603321B/zh
Priority to KR1020157007556A priority patent/KR102049629B1/ko
Publication of JP2014047365A publication Critical patent/JP2014047365A/ja
Publication of JP2014047365A5 publication Critical patent/JP2014047365A5/ja
Application granted granted Critical
Publication of JP6049355B2 publication Critical patent/JP6049355B2/ja
Active legal-status Critical Current
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Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/243—Crucibles for source material

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
JP2012188691A 2012-08-29 2012-08-29 蒸発源 Active JP6049355B2 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2012188691A JP6049355B2 (ja) 2012-08-29 2012-08-29 蒸発源
TW102127956A TWI589716B (zh) 2012-08-29 2013-08-05 Evaporation source
PCT/JP2013/071621 WO2014034410A1 (ja) 2012-08-29 2013-08-09 蒸発源
CN201380044630.2A CN104603321B (zh) 2012-08-29 2013-08-09 蒸发源
KR1020157007556A KR102049629B1 (ko) 2012-08-29 2013-08-09 증발원

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2012188691A JP6049355B2 (ja) 2012-08-29 2012-08-29 蒸発源

Publications (3)

Publication Number Publication Date
JP2014047365A JP2014047365A (ja) 2014-03-17
JP2014047365A5 JP2014047365A5 (zh) 2015-10-08
JP6049355B2 true JP6049355B2 (ja) 2016-12-21

Family

ID=50183226

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2012188691A Active JP6049355B2 (ja) 2012-08-29 2012-08-29 蒸発源

Country Status (5)

Country Link
JP (1) JP6049355B2 (zh)
KR (1) KR102049629B1 (zh)
CN (1) CN104603321B (zh)
TW (1) TWI589716B (zh)
WO (1) WO2014034410A1 (zh)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6291696B2 (ja) * 2014-07-28 2018-03-14 株式会社Ｊｏｌｅｄ 蒸着装置および蒸発源
KR101528709B1 (ko) * 2014-09-30 2015-06-16 에스엔유 프리시젼 주식회사 증착 균일도를 향상시키는 증착 용기
KR101615913B1 (ko) * 2014-11-12 2016-05-13 에스엔유 프리시젼 주식회사 박막증착장치
CN106893981B (zh) * 2017-03-30 2019-01-25 南京大学 一种用于提高蒸发束流稳定性的坩埚和具有该坩埚的源炉
US20200199737A1 (en) * 2017-09-14 2020-06-25 Alpha Plus Co., Ltd. Vacuum evaporation source
CN107604318B (zh) * 2017-09-27 2019-10-15 京东方科技集团股份有限公司 坩埚加热装置
CN107805782B (zh) * 2017-11-27 2019-09-20 深圳市华星光电半导体显示技术有限公司 一种蒸镀装置
CN107916401B (zh) * 2017-12-15 2023-09-22 合肥鑫晟光电科技有限公司 蒸镀坩埚和蒸镀装置
JP6526880B1 (ja) * 2018-06-29 2019-06-05 キヤノントッキ株式会社 蒸発源及び蒸着装置
CN113574202B (zh) * 2019-05-13 2022-12-02 株式会社爱发科 蒸镀单元及具有该蒸镀单元的真空蒸镀装置
JP7088891B2 (ja) * 2019-09-26 2022-06-21 キヤノントッキ株式会社 蒸発源装置及び蒸着装置
WO2021065081A1 (ja) * 2019-10-04 2021-04-08 株式会社アルバック 真空蒸着装置用の蒸着源

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06108236A (ja) * 1992-09-25 1994-04-19 Mitsubishi Electric Corp 薄膜形成装置
JPH07300666A (ja) * 1994-04-27 1995-11-14 Nissin Electric Co Ltd シリコン蒸発用分子線源およびこれに用いるるつぼの製造方法
JPH09209126A (ja) * 1996-02-08 1997-08-12 Idemitsu Kosan Co Ltd 真空蒸着装置
KR100434438B1 (ko) * 2002-11-18 2004-06-04 주식회사 야스 증착 공정용 원추형 노즐 증발원
JP2005154903A (ja) * 2003-11-26 2005-06-16 Samsung Sdi Co Ltd 蒸着膜形成方法及び蒸着膜形成装置
JP2006104513A (ja) 2004-10-04 2006-04-20 Toyota Industries Corp 蒸発源におけるるつぼの冷却方法及び蒸発源
JP4696710B2 (ja) 2005-06-15 2011-06-08 ソニー株式会社 蒸着成膜装置および蒸着源
KR100712217B1 (ko) * 2005-09-30 2007-04-27 삼성에스디아이 주식회사 증발원 및 이를 이용한 진공증착기
KR100784953B1 (ko) * 2006-05-23 2007-12-11 세메스 주식회사 다수의 도가니를 이용한 유기발광소자 박막 제작을 위한선형증발원
JP5520871B2 (ja) * 2011-03-31 2014-06-11 株式会社日立ハイテクノロジーズ 蒸着装置

Also Published As

Publication number Publication date
CN104603321A (zh) 2015-05-06
TW201425613A (zh) 2014-07-01
CN104603321B (zh) 2016-10-26
JP2014047365A (ja) 2014-03-17
KR20150044961A (ko) 2015-04-27
KR102049629B1 (ko) 2019-11-28
TWI589716B (zh) 2017-07-01
WO2014034410A1 (ja) 2014-03-06

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