KR102049629B1 - 증발원 - Google Patents

증발원 Download PDF

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Publication number
KR102049629B1
KR102049629B1 KR1020157007556A KR20157007556A KR102049629B1 KR 102049629 B1 KR102049629 B1 KR 102049629B1 KR 1020157007556 A KR1020157007556 A KR 1020157007556A KR 20157007556 A KR20157007556 A KR 20157007556A KR 102049629 B1 KR102049629 B1 KR 102049629B1
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KR
South Korea
Prior art keywords
crucible
housing
evaporation source
deposition material
evaporation
Prior art date
Application number
KR1020157007556A
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English (en)
Korean (ko)
Other versions
KR20150044961A (ko
Inventor
요시나리 곤도
나오토 야마다
요시마사 고바야시
사토시 사토
에이이치 마츠모토
Original Assignee
캐논 톡키 가부시키가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by 캐논 톡키 가부시키가이샤 filed Critical 캐논 톡키 가부시키가이샤
Publication of KR20150044961A publication Critical patent/KR20150044961A/ko
Application granted granted Critical
Publication of KR102049629B1 publication Critical patent/KR102049629B1/ko

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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/243—Crucibles for source material

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
KR1020157007556A 2012-08-29 2013-08-09 증발원 KR102049629B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JPJP-P-2012-188691 2012-08-29
JP2012188691A JP6049355B2 (ja) 2012-08-29 2012-08-29 蒸発源
PCT/JP2013/071621 WO2014034410A1 (ja) 2012-08-29 2013-08-09 蒸発源

Publications (2)

Publication Number Publication Date
KR20150044961A KR20150044961A (ko) 2015-04-27
KR102049629B1 true KR102049629B1 (ko) 2019-11-28

Family

ID=50183226

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020157007556A KR102049629B1 (ko) 2012-08-29 2013-08-09 증발원

Country Status (5)

Country Link
JP (1) JP6049355B2 (zh)
KR (1) KR102049629B1 (zh)
CN (1) CN104603321B (zh)
TW (1) TWI589716B (zh)
WO (1) WO2014034410A1 (zh)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6291696B2 (ja) * 2014-07-28 2018-03-14 株式会社Ｊｏｌｅｄ 蒸着装置および蒸発源
KR101528709B1 (ko) * 2014-09-30 2015-06-16 에스엔유 프리시젼 주식회사 증착 균일도를 향상시키는 증착 용기
KR101615913B1 (ko) * 2014-11-12 2016-05-13 에스엔유 프리시젼 주식회사 박막증착장치
CN106893981B (zh) * 2017-03-30 2019-01-25 南京大学 一种用于提高蒸发束流稳定性的坩埚和具有该坩埚的源炉
US20200199737A1 (en) * 2017-09-14 2020-06-25 Alpha Plus Co., Ltd. Vacuum evaporation source
CN107604318B (zh) * 2017-09-27 2019-10-15 京东方科技集团股份有限公司 坩埚加热装置
CN107805782B (zh) * 2017-11-27 2019-09-20 深圳市华星光电半导体显示技术有限公司 一种蒸镀装置
CN107916401B (zh) * 2017-12-15 2023-09-22 合肥鑫晟光电科技有限公司 蒸镀坩埚和蒸镀装置
JP6526880B1 (ja) * 2018-06-29 2019-06-05 キヤノントッキ株式会社 蒸発源及び蒸着装置
WO2020230359A1 (ja) * 2019-05-13 2020-11-19 株式会社アルバック 蒸着ユニット及びこの蒸着ユニットを備える真空蒸着装置
JP7088891B2 (ja) * 2019-09-26 2022-06-21 キヤノントッキ株式会社 蒸発源装置及び蒸着装置
CN112912534B (zh) * 2019-10-04 2022-06-17 株式会社爱发科 真空蒸镀装置用蒸镀源

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006104513A (ja) 2004-10-04 2006-04-20 Toyota Industries Corp 蒸発源におけるるつぼの冷却方法及び蒸発源
KR100784953B1 (ko) * 2006-05-23 2007-12-11 세메스 주식회사 다수의 도가니를 이용한 유기발광소자 박막 제작을 위한선형증발원

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06108236A (ja) * 1992-09-25 1994-04-19 Mitsubishi Electric Corp 薄膜形成装置
JPH07300666A (ja) * 1994-04-27 1995-11-14 Nissin Electric Co Ltd シリコン蒸発用分子線源およびこれに用いるるつぼの製造方法
JPH09209126A (ja) * 1996-02-08 1997-08-12 Idemitsu Kosan Co Ltd 真空蒸着装置
KR100434438B1 (ko) * 2002-11-18 2004-06-04 주식회사 야스 증착 공정용 원추형 노즐 증발원
JP2005154903A (ja) * 2003-11-26 2005-06-16 Samsung Sdi Co Ltd 蒸着膜形成方法及び蒸着膜形成装置
JP4696710B2 (ja) 2005-06-15 2011-06-08 ソニー株式会社 蒸着成膜装置および蒸着源
KR100712217B1 (ko) * 2005-09-30 2007-04-27 삼성에스디아이 주식회사 증발원 및 이를 이용한 진공증착기
JP5520871B2 (ja) * 2011-03-31 2014-06-11 株式会社日立ハイテクノロジーズ 蒸着装置

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006104513A (ja) 2004-10-04 2006-04-20 Toyota Industries Corp 蒸発源におけるるつぼの冷却方法及び蒸発源
KR100784953B1 (ko) * 2006-05-23 2007-12-11 세메스 주식회사 다수의 도가니를 이용한 유기발광소자 박막 제작을 위한선형증발원

Also Published As

Publication number Publication date
TWI589716B (zh) 2017-07-01
WO2014034410A1 (ja) 2014-03-06
KR20150044961A (ko) 2015-04-27
CN104603321A (zh) 2015-05-06
JP6049355B2 (ja) 2016-12-21
TW201425613A (zh) 2014-07-01
CN104603321B (zh) 2016-10-26
JP2014047365A (ja) 2014-03-17

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