JP6049355B2 - Evaporation source - Google Patents

Description

  The present invention relates to an evaporation source.

  In the vapor deposition apparatus, it is necessary to make the temperature distribution of the vapor deposition material in the crucible uniform during vapor deposition. This is because there is a correlation between the evaporation amount of the vapor deposition material and the temperature.

  Here, in order to make the temperature distribution of the vapor deposition material in the crucible uniform, the temperature distribution of the crucible needs to be uniform. This is because the vapor deposition material in the crucible receives heat conduction and radiation from the crucible.

  That is, in order to make the evaporation amount of the vapor deposition material uniform, it is necessary to make the temperature distribution of the crucible uniform, and in particular, it is important to make the temperature distribution in the vicinity of the vapor deposition material of the crucible.

  Moreover, as a factor which makes the temperature distribution of a crucible worse, it is mentioned that a crucible contacts with another member. For example, when the crucible is installed, if the bottom surface of the crucible comes into contact with the evaporation source holder or the insulator, the temperature of only the contact portion decreases. Furthermore, since the contact thermal resistance changes depending on the contact state with the evaporation source holder and insulator, the temperature changes variously.

  In order to solve the above problems, for example, a technique disclosed in Patent Document 1 has been proposed. The technique disclosed in Patent Document 1 is provided with legs on the bottom surface of the crucible housed in the outer box to be heated, and by providing a gap between the bottom surface of the crucible and the floor surface of the outer box, It is intended to mitigate thermal fluctuation due to contact.

Japanese Patent No. 4696710

  However, in Patent Document 1, since the leg portion is provided directly under the vapor deposition material, the vicinity of the leg portion of the crucible is locally heated by heat conduction through the leg portion, and the vapor deposition material in the vicinity of the leg portion. It is considered that the amount of evaporation increases compared to other places.

  Therefore, even if the position where the leg is provided is at the end of the crucible, if the evaporation amount increases locally, the amount of vapor deposition material ejected from the opening in the vicinity of the end increases and the film thickness distribution varies. It will be.

  The present invention has been made in view of the above situation, and supports the crucible on the outer surface of the crucible at a position higher than the filling surface of the vapor deposition material, so that the outer bottom surface of the crucible is the inner bottom surface of the container. The crucible can be housed in the container in a state of being separated from the container, and the contact portion of the crucible with the container can be located away from the vapor deposition material, so that the influence of thermal fluctuation due to contact is not easily transmitted to the vapor deposition material. An object of the present invention is to provide an evaporation source capable of making the temperature distribution of the vapor deposition material uniform and stabilizing the evaporation amount of the vapor deposition material.

  The gist of the present invention will be described with reference to the accompanying drawings.

  An evaporation source comprising a crucible 2 filled with a vapor deposition material 1, a heating unit 3 provided so as to surround the crucible 2, and a storage body 4 for storing and arranging the crucible 2 and the heating unit 3. A crucible support portion 6 is provided on the outer surface of the crucible 2 at a position higher than the filling surface 1 a of the vapor deposition material 1 and lower than the opening position of the crucible 2, and a crucible support portion 6 provided inside the storage body 4. By supporting the crucible receiving part 5 so that the crucible 2 can be housed in the housing body 4 with the outer bottom surface of the crucible 2 being separated from the inner bottom surface of the housing body 4, The contact point between the crucible receiving part 5 and the crucible support part 6 relates to an evaporation source, which is provided closer to the crucible 2 than the heating part 3.

  2. The evaporation source according to claim 1, wherein a plurality of openings 7 through which the vapor deposition material 1 passes are provided along the longitudinal direction.

  Moreover, the said crucible receiving part 5 and the said crucible support part 6 were provided with two or more, respectively, It concerns on the evaporation source of any one of Claim 1, 2 characterized by the above-mentioned.

  4. The evaporation source according to claim 1, wherein the crucible receiving part 5 and the crucible support part 6 are configured to be heated by the heating part 3. 5. It is.

  5. A projecting portion 8 projecting toward the inner surface of the housing body 4 is provided on the outer surface of the crucible 2, and the crucible receiving portion 5 is provided on the projecting portion 8. It concerns on the evaporation source of any one of these.

  The crucible 2 is formed by bringing a plurality of divided bodies 2a and 2b into contact with each other, and a seal member 9 is provided at a contact portion between the divided bodies 2a and 2b. 5. The evaporation source according to any one of 5 above.

Further, it relates to the evaporation source according to any one of claims 1-6, characterized in that a heat reflecting member between the heating part 3 and the container 4.

  Since the present invention is configured as described above, the influence of thermal fluctuation due to contact is hardly transmitted to the vapor deposition material, the temperature distribution of the vapor deposition material can be made uniform, and the evaporation amount of the vapor deposition material can be stabilized. Become.

1 is a schematic explanatory cross-sectional view of Example 1. FIG. 1 is a schematic explanatory perspective view of a main part of Example 1. FIG. 3 is a schematic cross-sectional view of Example 2. FIG. 10 is a schematic explanatory perspective view of a main part of Example 2. FIG. 6 is a schematic explanatory cross-sectional view of another example of Embodiment 2. FIG. FIG. 10 is a schematic explanatory perspective view of a main part of another example of the second embodiment.

  An embodiment of the present invention which is considered to be suitable will be briefly described with reference to the drawings showing the operation of the present invention.

  The crucible 2 is heated by the heating unit 3 to evaporate the vapor deposition material 1, and vapor deposition is performed on an object to be deposited such as a substrate.

  At this time, the outer bottom surface of the crucible 2 and the inner bottom surface of the housing 4 that accommodates the crucible 2 are not in contact with each other, and the crucible receiving portion 5 is provided at a position higher than the filling surface 1 a of the vapor deposition material 1. The influence of the thermal fluctuation by the contact with the container 4 of the crucible 2 to the vapor deposition material 1 can be made as small as possible.

  That is, local heat fluctuations occur due to heat conduction at the contact portion between the crucible 2 and the container 4, but the crucible 2 is supported at a position higher than the deposition height of the vapor deposition material 1 and away from the vapor deposition material 1. The influence of the fluctuation on the evaporation amount of the vapor deposition material 1 can be minimized.

  Therefore, according to the present invention, the temperature distribution of the crucible 2 can be made uniform by the heating unit 3 and the temperature distribution of the vapor deposition material 1 filled in the crucible 2 can be made uniform, and the evaporation amount of the vapor deposition material can be stabilized. It will be.

  Further, for example, in the case of a so-called line source in which a plurality of openings 7 through which the vapor deposition material 1 passes is provided along the longitudinal direction, a so-called line source, the evaporation amount of the vapor deposition material 1 is uniform regardless of the position in the crucible 2. Therefore, it is possible to form a film with a uniform film thickness distribution.

  Moreover, since the crucible receiving part 5 and the crucible support part 6 are positioned lower than the opening, contamination by the vapor deposition material 1 can be avoided.

  A specific embodiment 1 of the present invention will be described with reference to FIGS.

  The first embodiment includes a crucible 2 filled with a vapor deposition material 1, a heating unit 3 provided so as to surround the crucible 2, and a storage body 4 that stores and arranges the crucible 2 and the heating unit 3. A crucible receiving portion 5 is provided on the outer surface of the crucible 2 and higher than the filling surface 1 a of the vapor deposition material 1 and lower than the opening position of the crucible 2, and is provided inside the storage body 4. The crucible support part 6 supports the crucible receiving part 5 so that the crucible 2 can be accommodated in the accommodating body 4 with the outer bottom surface of the crucible 2 being separated from the inner bottom surface of the accommodating body 4. It is configured.

  Specifically, as shown in FIGS. 1 and 2, Example 1 is an evaporation source having a cylindrical crucible 2, and faces a deposition object such as a substrate in a vacuum chamber equipped with an exhaust mechanism. It is provided in the state.

  Each part will be specifically described.

  The crucible 2 is made of titanium, and a circular opening 7 is provided on the upper end surface thereof. Not only titanium but also other materials such as tantalum, molybdenum or tungsten may be used.

  In addition, the crucible 2 of the first embodiment is configured by abutting and connecting divided bodies 2a and 2b divided in the vertical direction. Specifically, a male screw part and a female screw part are respectively provided in the divided bodies 2a and 2b, and these are screwed together. Therefore, when filling the crucible 2 with the vapor deposition material 1, the divided bodies 2 a and 2 b can be separated and the vapor deposition material 1 can be directly filled into the bottom of the crucible 2 without the opening 7.

  The vapor deposition material 1 is generally in the form of a powder or granule. In Example 1, the exposed surface (upper end surface) when the vapor deposition material 1 is filled in the crucible 2 is used as the filling surface 1a.

  The storage body 4 is a cylindrical body made of stainless steel and opened at the top, and a crucible support portion 6 projects from the inner surface. The material is not limited to stainless steel but may be aluminum.

  The crucible support portion 6 is in the shape of a square bar, supports the crucible receiving portion 5 provided on the outer surface of the crucible 2, and is formed of a material having low thermal conductivity such as ceramics. In Example 1, a concave portion is provided on the outer surface of the crucible 2 at a position higher than the filling surface 1 a of the vapor deposition material 1 and lower than the opening position of the crucible 2, and this is used as the crucible receiving portion 5. Specifically, a plurality of recesses (two in FIG. 1 and FIG. 2) are provided at the same height position at the lower end of the upper divided body 2 b and are supported by the crucible support portion 6. Yes. The crucible 2 can be supported more stably by adopting a configuration in which it is supported at a plurality of positions. Even if only one pair of the crucible support portion 6 and the crucible support portion 5 is provided and the cantilever support structure is provided at one place of the crucible support portion 6, the function of supporting the crucible 2 can be achieved at a minimum.

  In the first embodiment, the position where the crucible receiving portion 5 is provided is a substantially intermediate position between the upper end of the filling surface 1a and the lower end of the opening 7 of the crucible 2, and influences the evaporation amount of the vapor deposition material 1 as much as possible. While making it small, the crucible receiving part 5 and the crucible support part 6 are separated from the opening 7 of the crucible 2 to make it difficult to be contaminated.

  A general sheath heater is employed as the heating unit 3. The heating unit 3 is provided between the crucible 2 and the storage body 4. Specifically, the crucible support part 6 is provided so as to surround the side surface and the bottom surface of the crucible 2 except for a part through which the crucible support part 6 passes, so that the crucible receiving part 5 and the crucible support part 6 are heated by the heating part 3. It is composed. Therefore, the crucible receiving part 5 and the crucible support part 6 are also heated by the heating part 3, so that the heat fluctuation in the vicinity of the crucible receiving part 5 due to contact with the crucible support part 6, that is, the temperature drop in the vicinity of the crucible receiving part 5. Is suppressed.

  Further, the contact point between the crucible receiving portion 5 and the crucible support portion 6 is provided on the crucible 2 side from the inner surface of the heating portion 3. Therefore, the crucible 2 receives external heat fluctuations through the contact of the crucible support 6 and is hardly affected by external heat fluctuations. That is, for example, when there is a contact point between the crucible receiving part 5 and the crucible support part 6 outside the heating part 3 (when a part of the crucible 2 exists outside the heating part 3), a part of the crucible 2 is Under the influence of the outside of the heating unit 3, the heat fluctuation is transmitted to the crucible 2 by the heat conduction of the crucible 2, so that it is easily affected by the heat fluctuation.

  In addition, it is good also as a structure provided with the temperature control mechanism of the crucible receiving part 5 and the crucible support part 6, and in this case, the thermal fluctuation of the crucible receiving part 5 vicinity is suppressed further.

  Moreover, the crucible support part 6 may be comprised by the said heating part 3, and the thermal fluctuation of the crucible receiving part 5 vicinity is further suppressed also in this case.

  Moreover, it is good also as a structure which provides the protrusion part 8 in the crucible 2 like Example 2 mentioned later, and the thermal fluctuation of the crucible receptacle part 5 vicinity is further suppressed also in this case.

  In addition, a heat reflecting member (reflector) may be provided between the housing 4 and the heating unit 3 so as to surround the heating unit 3. In this case, the crucible 2 is heated by the heating unit 3 more satisfactorily. It becomes possible to do.

  Therefore, according to the first embodiment, it is possible to make the temperature distribution of the crucible 2 uniform by the heating unit 3 to make the temperature distribution of the vapor deposition material 1 filled in the crucible 2 uniform, and stabilize the evaporation amount of the vapor deposition material. Can be achieved.

  A specific embodiment 2 of the present invention will be described with reference to FIGS.

  As shown in FIGS. 3 and 4, the second embodiment is a linear evaporation source including a plurality of openings 7 along the longitudinal direction on the upper end surface and having crucibles 2 that are long in the parallel direction of the openings 7. is there.

  In the second embodiment, a protruding portion 8 that protrudes toward the inner surface of the storage body 4 is provided on the outer surface of the crucible 2, and the crucible receiving portion 5 is provided on the protruding portion 8. Specifically, a plurality of protrusions 8 are provided at predetermined intervals.

  Further, in the second embodiment, the crucible 2 is configured by connecting the upper and lower divided bodies 2a and 2b using bolts 10 and nuts 11 with their opposing surfaces in contact with each other. Specifically, the divided bodies 2a and 2b are connected by inserting the bolt 10 through an insertion hole provided in the protruding portion 8 and screwing the nut 11 therethrough.

  Further, a concave portion as the crucible receiving portion 5 is provided at the protruding end portion of the protruding portion 8. Further, the width of the concave portion (the gap with the crucible support portion 6) is appropriately set for each part so as to allow the elongation in consideration of the elongation of the crucible 2 due to heat.

  In Example 2, by providing the protrusion 8, the crucible receiving part 5 can be provided at a position further away from the vapor deposition material 1 of the crucible 2, and the temperature due to heat conduction from the protrusion 8 to the crucible support part 6. It is possible to effectively mitigate the influence of the decrease.

  The heating unit 3 is also provided so as to surround the upper and lower surfaces of the protruding portion 8 and the protruding end surface (except for a part through which the crucible support portion 6 passes). Accordingly, the surface area of the crucible receiving portion 5 to be heated is increased as compared with the case where the protruding portion 8 is not provided, and also from this point, the influence of the temperature drop due to the heat conduction from the protruding portion 8 to the crucible support portion 6 is effective. It becomes possible to relax.

  Therefore, according to the second embodiment, the temperature distribution of the crucible 2 can be made uniform by the heating unit 3, and the temperature distribution of the vapor deposition material 1 filled in the crucible 2 can be made uniform. Since it becomes uniform regardless of the position in the crucible 2, it is possible to form a film with a uniform film thickness distribution.

  In addition, although Example 2 comprises the protrusion part 8 as mentioned above, you may comprise like another example illustrated in FIG. In other words, the protruding portion 8 may be provided in a bowl shape around the outer surface of the crucible 2. In FIGS. 5 and 6, reference numerals 12 and 13 are storage recesses for storing the head and tail of the bolt 10 connecting the divided bodies 2 a and 2 b and the nut 11.

  Moreover, in this another example, the sealing member 9 is provided between the opposing surfaces that are the contact portions between the divided bodies 2a and 2b, so that the vapor deposition material 1 can be more effectively prevented from leaking.

  The rest is the same as in Example 1.

  The present invention is not limited to the first and second embodiments, and the specific configuration of each component can be designed as appropriate.

DESCRIPTION OF SYMBOLS 1 Deposition material 1a Filling surface 2 Crucible 2a, 2b Divided body 3 Heating part 4 Storage body 5 Crucible receiving part 6 Crucible support part 7 Opening part 8 Protruding part 9 Seal member

Claims (7)

  An evaporation source comprising a crucible filled with a vapor deposition material, a heating unit provided so as to surround the crucible, and a storage body that stores and arranges the crucible and the heating unit, and is provided on an outer surface of the crucible. Providing a crucible receiving part at a position higher than the filling surface of the vapor deposition material and lower than the opening position of the crucible, and supporting the crucible receiving part by a crucible support part provided inside the housing, The crucible can be housed and disposed in the housing body in a state where the bottom surface is separated from the inner bottom surface of the housing body, and the contact point between the crucible receiving portion and the crucible support portion is greater than the crucible from the heating portion. An evaporation source characterized by being provided on the side.   The evaporation source according to claim 1, wherein a plurality of openings through which the vapor deposition material passes are provided along the longitudinal direction.   The evaporation source according to claim 1, wherein a plurality of the crucible receiving portions and the crucible support portions are provided.   The evaporation source according to claim 1, wherein the crucible receiving part and the crucible support part are configured to be heated by the heating part.   The protrusion part which protrudes toward the inner surface of the said storage body is provided in the outer surface of the said crucible, The said crucible receiving part was provided in this protrusion part, The any one of Claims 1-4 characterized by the above-mentioned. The source of evaporation.   The evaporation according to any one of claims 1 to 5, wherein the crucible is formed by bringing a plurality of divided bodies into contact with each other, and a sealing member is provided at a contact portion between the divided bodies. source. Evaporation source according to any one of claims 1 to 6, characterized in that a heat reflecting member between the housing body and the heating unit.

Images