KR102049629B1

KR102049629B1 - Evaporation source

Info

Publication number: KR102049629B1
Application number: KR1020157007556A
Authority: KR
Inventors: 요시나리 곤도; 나오토 야마다; 요시마사 고바야시; 사토시 사토; 에이이치 마츠모토
Original assignee: 캐논 톡키 가부시키가이샤
Priority date: 2012-08-29
Filing date: 2013-08-09
Publication date: 2019-11-28
Also published as: TWI589716B; KR20150044961A; TW201425613A; CN104603321A; WO2014034410A1; JP2014047365A; JP6049355B2; CN104603321B

Abstract

Since the influence of thermal fluctuation due to contact is hardly transmitted to the deposition material, the temperature distribution of the deposition material can be made uniform, and an evaporation source capable of stabilizing the evaporation amount of the deposition material is provided. A crucible 2 filled with the evaporation material 1, a heating part 3 provided to surround the crucible 2, and a housing 4 accommodating and arranging the crucible 2 and the heating part 3. As an evaporation source comprising a crucible receiving portion 5 at a position higher than the filling surface 1a of the deposition material 1 on the outer surface of the crucible 2 and lower than the opening position of the crucible 2, The crucible receiving portion 5 is supported by a crucible support portion 6 provided inside the housing 4, so that the outer bottom surface of the crucible 2 is lower than the inner bottom surface of the housing 4. The crucible 2 is configured to be housed in the housing 4 in a spaced apart state.

Description

Evaporation Source {EVAPORATION SOURCE}

The present invention relates to an evaporation source.

In a vapor deposition apparatus, it is necessary to make uniform the temperature distribution of the vapor deposition material in a crucible at the time of vapor deposition. This is because there is a correlation between the evaporation amount of the vapor deposition material and the temperature.

Here, in order to make the temperature distribution of the vapor deposition material in a crucible uniform, the temperature distribution of a crucible needs to be uniform. This is because the vapor deposition material in the crucible is subjected to heat conduction or radiation from the crucible.

In other words, in order to make the evaporation amount of the evaporation material uniform, it is necessary to make the temperature distribution of the crucible uniform, and in particular, the temperature distribution in the vicinity of the evaporation material of the crucible is important.

Moreover, as a factor which worsens the temperature distribution of a crucible, the crucible contacts with another member is mentioned. For example, when installing the crucible, if the crucible bottom surface comes into contact with the evaporation source holder or insulator, only the contact portion decreases in temperature. In addition, since the contact thermal resistance changes depending on the contact state to the evaporation source holder or insulator, the temperature varies in various ways.

Then, in order to solve the above problems, the technique disclosed by patent document 1 is proposed, for example. The technique disclosed in this patent document 1 provides a leg portion on the bottom surface of the crucible to be stored in the outer box to be heated, and provides a gap between the bottom surface of the crucible and the bottom surface of the outer box, thereby reducing thermal fluctuation due to contact. I want to relax.

Patent Document 1: Japanese Patent No. 4676710

However, in the said patent document 1, since the leg part is provided directly under a vapor deposition material, the vicinity of the leg part of a crucible is locally heated by the heat conduction through a leg part, and the evaporation amount of the vapor deposition material of the leg part is different. It seems to increase compared to place.

Therefore, even if the position where the leg portion is provided is the crucible end portion, if the evaporation amount locally increases, the ejection amount of the evaporation material from the opening near the end portion increases, resulting in nonuniformity in the film thickness distribution.

The present invention has been made in view of the above-described phenomenon, and by supporting the crucible at a position higher than the filling surface of the vapor deposition material on the outer surface of the crucible, the outer bottom surface of the crucible is spaced apart from the inner bottom surface of the housing. The crucible can be housed and disposed in the housing, and the contact portion with the housing of the crucible can be placed at a position away from the vapor deposition material, and the influence of thermal fluctuation due to the contact is less likely to be transmitted to the vapor deposition material, and the vapor deposition material It is an object of the present invention to provide an evaporation source capable of uniformizing the temperature distribution of and to stabilize the evaporation amount of the evaporation material.

The gist of the present invention will be described with reference to the accompanying drawings.

A crucible 2 filled with the evaporation material 1, a heating part 3 provided to surround the crucible 2, and a housing 4 accommodating and arranging the crucible 2 and the heating part 3. As an evaporation source comprising a crucible receiving portion 5 at a position higher than the filling surface 1a of the deposition material 1 on the outer surface of the crucible 2 and lower than the opening position of the crucible 2, The crucible receiving portion 5 is supported by a crucible support 6 provided inside the housing 4 so that an outer bottom surface of the crucible 2 is spaced apart from an inner bottom surface of the housing 4. It relates to an evaporation source, characterized in that the crucible (2) is configured to be housed in the housing (4).

Moreover, the contact point of the said crucible receiving part 5 and the said crucible support part 6 is provided in the crucible 2 side rather than the said heating part 3, It is related with the evaporation source of Claim 1 characterized by the above-mentioned.

The present invention also relates to an evaporation source according to any one of claims 1 and 2, wherein a plurality of openings 7 through which the evaporation material 1 passes are provided in the longitudinal direction.

Moreover, it is related with the evaporation source in any one of Claims 1 and 2 characterized by providing the said crucible receiving part 5 and the said crucible support part 6, respectively.

Further, the crucible receiving portion 5 and the crucible support portion 6 relate to the evaporation source according to any one of claims 1 and 2, wherein the crucible receiving portion 6 is configured to be heated by the heating portion 3.

In addition, the outer surface of the crucible 2 is provided with a projection 8 protruding toward the inner surface of the housing 4, and the crucible receiving portion 5 is provided on the projection 8. It relates to the evaporation source in any one of Claims 1 and 2.

The crucible 2 is formed by bringing a plurality of partitions 2a and 2b into contact with each other, and the sealing member 9 is provided at the contact portions of the partitions 2a and 2b. It relates to the evaporation source of any one of Claims.

Furthermore, it is related with the evaporation source in any one of Claims 1 and 2 provided with the temperature control mechanism of the said crucible receiving part 5 and the said crucible support part 6.

Further, the crucible support 6 is the heating part 3, and relates to the evaporation source according to any one of claims 1 and 2.

Moreover, the heat reflection member was provided between the said accommodating body 4 and the said heating part 3, It is related with the evaporation source in any one of Claims 1 and 2 characterized by the above-mentioned.

Since the present invention is constituted as described above, an evaporation source capable of making the influence of thermal fluctuation due to contact hardly transmitted to the deposition material, making it possible to uniformize the temperature distribution of the deposition material, and stabilizing the evaporation amount of the deposition material. Becomes

1 is a schematic cross-sectional view of Embodiment 1. FIG.
2 is a schematic explanatory perspective view of main parts of the first embodiment;
3 is a schematic cross-sectional view of Embodiment 2;
4 is a schematic explanatory perspective view of main parts of a second embodiment.
5 is a schematic cross-sectional view of another example of the second embodiment.
6 is a schematic explanatory perspective view of a main part of another example of the second embodiment.

EMBODIMENT OF THE INVENTION Embodiment of this invention which thinks it is suitable is demonstrated based on drawing of the action of this invention based on drawing.

The crucible 2 is heated by the heating section 3 to evaporate the vapor deposition material 1, and vapor deposition is performed on the deposits such as the substrate.

At this time, the outer bottom surface of the crucible 2 and the inner bottom surface of the housing 4 accommodating the crucible 2 are not in contact with each other, and the crucible receiving portion 5 is filled with the filling surface of the evaporation material 1 ( Since it is provided in the position higher than 1a), the influence of the thermal fluctuation by contact with the housing | casing 4 of the crucible 2 with respect to the vapor deposition material 1 can be made as small as possible.

That is, although local thermal fluctuations occur at the contact portion between the crucible 2 and the housing 4 due to heat conduction, the crucible 2 at a position away from the deposition material 1 higher than the filling height of the deposition material 1. Since the thermal fluctuation is supported, the influence of the heat fluctuation on the evaporation amount of the vapor deposition material 1 can be minimized.

Therefore, according to the present invention, the heating portion 3 makes the temperature distribution of the crucible 2 uniform, thereby making it possible to make the temperature distribution of the vapor deposition material 1 filled in the crucible 2 uniform. The evaporation amount can be stabilized.

Further, for example, in the case of a linear evaporation source or a so-called line source provided with a plurality of openings 7 through which the evaporation material 1 passes along the length direction, the evaporation amount of the evaporation material 1 is irrespective of the position in the crucible 2. Since it becomes uniform, it becomes possible to form into a film with uniform film thickness distribution.

In addition, since the crucible receiving portion 5 and the crucible support portion 6 are positioned at a lower position than the opening, contamination by the vapor deposition material 1 can be avoided.

Example 1

EMBODIMENT OF THE INVENTION The specific Example 1 of this invention is demonstrated based on FIG.

In Example 1, the crucible 2 filled with the vapor deposition material 1, the heating part 3 provided so as to surround this crucible 2, the said crucible 2 and the said heating part 3 are arrange | positioned, A crucible receiving portion 5 at a position higher than the filling surface 1a of the evaporation material 1 on the outer surface of the crucible 2 and lower than the opening position of the crucible 2 as an evaporation source composed of the housing 4. ) And the crucible receiving portion 5 is supported by a crucible support 6 provided inside the housing 4, so that an outer bottom surface of the crucible 2 is formed of the housing 4. The crucible 2 is configured to be housed in the housing 4 while being spaced apart from the inner bottom surface.

Specifically, Example 1 is an evaporation source having a cylindrical crucible 2, as shown in Figs. 1 and 2, and is provided in a vacuum chamber provided with an exhaust mechanism in a state opposed to a deposit such as a substrate. will be.

Each part is explained concretely.

The crucible 2 is made of titanium, and a circular opening 7 is provided on the upper end face thereof. In addition, other materials such as tantalum, molybdenum or tungsten may be used, without being limited to titanium.

Moreover, the crucible 2 of Example 1 is comprised by contact-connecting the divided bodies 2a * 2b divided up and down. Specifically, the male screw portion and the female screw portion are provided in the divided bodies 2a and 2b, respectively, and screwed together to connect them. Therefore, when filling the crucible 2 with the deposition material 1, the partitions 2a and 2b are separated to directly deposit the deposition material 1 at the bottom of the crucible 2 without passing through the opening 7. ) Can be charged.

In addition, the vapor deposition material 1 is generally a powder or a granular body, and in Example 1, the exposed surface (upper surface) when this vapor deposition material 1 was filled in the crucible 2 was filled with the charging surface ( 1a).

The housing | casing 4 is a cylindrical body which the upper part opened from stainless steel, and the crucible support part 6 protrudes from the inner side surface. Moreover, it is not limited to stainless steel, You may make aluminum.

The crucible support part 6 is a rectangular bar shape, and supports the crucible receiving part 5 provided on the outer side surface of the crucible 2, and is formed of the material with low thermal conductivity, such as ceramics. In Example 1, the recessed part is provided in the position higher than the filling surface 1a of the vapor deposition material 1 of the outer surface of the crucible 2, and lower than the opening position of the crucible 2, and this is the crucible receiving part 5 I am doing it. Specifically, a plurality of recesses (two in Figs. 1 and 2) at the same height position are provided at the lower end of the upper partition 2b at the same height, and each of them is supported by the crucible support 6. I make it a constitution. By setting it as the structure which supports at multiple positions, the crucible 2 can be supported more stably. Moreover, even if only one pair of crucible support part 6 and crucible receiving part 5 are provided, and a cantilever support structure in one point of the crucible support part 6, the function of supporting the crucible 2 is at least achieved. can do.

In Example 1, the position at which the crucible receiving portion 5 is provided is approximately an intermediate position between the upper end of the filling surface 1a and the lower end of the opening 7 of the crucible 2, and the evaporation amount of the evaporation material 1 The crucible receiving portion 5 and the crucible support portion 6 are separated from the opening portion 7 of the crucible 2, making it less likely to be contaminated.

As the heating unit 3, a general sheath heater is employed. This heating part 3 is provided between the crucible 2 and the housing | casing 4. Specifically, except for a portion through which the crucible support 6 passes, the crucible receiving part 5 and the crucible support part 6 are provided so as to surround the side surface and the bottom surface of the crucible 2. It is configured to be heated by). Therefore, the crucible receiving part 5 and the crucible support part 6 are also heated by the heating part 3, so that the thermal fluctuation near the crucible receiving part 5 by contacting with the crucible support part 6, that is, the crucible receiving The temperature fall of the vicinity of the part 5 is suppressed.

Moreover, the contact point of the crucible receiving part 5 and the crucible support part 6 is provided in the crucible 2 side rather than the inner surface of the heating part 3. Therefore, the crucible 2 is subject to external heat fluctuation through the contact of the crucible support 6, making it difficult to be influenced by external heat fluctuations. That is, for example, when there is a contact point of the crucible receiving part 5 and the crucible support part 6 outside the heating part 3 (when a part of the crucible 2 exists outside the heating part 3), A part of the crucible 2 is influenced by the outside of the heating part 3, and since the heat fluctuation is transmitted to the crucible 2 by the heat conduction of the crucible 2, it becomes easy to be affected by the heat fluctuation.

In addition, you may make it the structure provided with the temperature regulating mechanism of the crucible receiving part 5 and the crucible support part 6, In this case, the heat fluctuation of the vicinity of the crucible receiving part 5 is further suppressed.

Moreover, the crucible support part 6 may be comprised by the said heating part 3, and also in this case, the heat fluctuation of the vicinity of the crucible receiving part 5 is further suppressed.

In addition, it is good also as a structure which provides the protrusion part 8 in the crucible 2 like Example 2 mentioned later, and also in this case, the heat fluctuation of the vicinity of the crucible receiving part 5 is further suppressed.

In addition, the heat reflection member (reflector) may be provided between the housing | casing 4 and the heating part 3 so that the heating part 3 may be enclosed, In this case, a heating part ( 3) the crucible 2 can be heated.

Therefore, according to Example 1, it becomes possible to make uniform the temperature distribution of the crucible 2 by the heating part 3, and to make the temperature distribution of the vapor deposition material 1 filled in the crucible 2 uniform, It is possible to stabilize the amount of evaporation of the material.

Example 2

The specific Example 2 of this invention is demonstrated based on FIGS.

3 and 4 are linear evaporation sources provided with crucibles 2 elongated in the parallel direction of the openings 7 in which a plurality of openings 7 are provided along the longitudinal direction on the top surface thereof. .

In Example 2, the outer side of the crucible 2 is provided with the protrusion 8 which protrudes toward the inner side of the accommodating body 4, and the crucible receiving part 5 is provided in this protrusion 8. Specifically, a plurality of protrusions 8 are provided at predetermined intervals.

In addition, in Example 2, the crucible 2 is comprised by connecting the upper and lower divisions 2a * 2b using the bolt 10 and the nut 11 in the state which contacted the opposing surface. . Specifically, the partitions 2a and 2b are connected by inserting the bolt 10 through the insertion hole provided in the projection 8 and screwing the nut 11.

Moreover, the recessed part as the crucible receiving part 5 is provided in the protruding edge part of the protrusion part 8. In addition, the width | variety (gap with the crucible support part 6) of this recessed part is set suitably for every site | part in order to allow this elongation in consideration of elongation by the heat of the crucible 2.

In Example 2, by providing the projection 8, it becomes possible to provide the crucible receiving part 5 at a position further away from the vapor deposition material 1 of the crucible 2, and from the projection 8 to the crucible support 6 It is possible to effectively alleviate the influence of the temperature drop due to thermal conduction to the heat sink.

In addition, the heating part 3 is provided so that the upper and lower surfaces of the protrusion part 8 and the protrusion end surface (except the part which the crucible support part 6 passes) surround also. Therefore, the surface area where the crucible receiving portion 5 is heated is enlarged as compared with the case where the protrusion 8 is not provided, and from this point of view, the temperature decreases due to heat conduction from the protrusion 8 to the crucible support 6. It is possible to effectively mitigate the effects of

Therefore, according to Example 2, it becomes possible to make the temperature distribution of the crucible 2 uniform by the heating part 3, and to make the temperature distribution of the vapor deposition material 1 filled in the crucible 2 uniform, Since the amount of evaporation of the material 1 becomes uniform regardless of the position in the crucible 2, the film can be formed with a uniform film thickness distribution.

In addition, although Example 2 comprises the protrusion part 8 as mentioned above, you may comprise like the separate example shown in FIGS. That is, the protrusion part 8 may be provided in the circumference | surroundings on the outer surface of the crucible 2 in a flange shape. 5 and 6, reference numerals 12 and 13 denote storage recesses for accommodating the head and tail portions of the bolts 10 connecting the divided bodies 2a and 2b and the nuts 11.

In addition, in this separate example, the sealing member 9 is provided between the opposing surfaces which are the contact portions of the divided bodies 2a and 2b, so that the leakage of the vapor deposition material 1 can be further prevented. have.

The rest is the same as in Example 1.

In addition, this invention is not limited to Example 1, 2, The specific structure of each structural requirement can be designed suitably.

Claims

An evaporation source comprising a crucible filled with a vapor deposition material, a heating part provided to surround the crucible, and a crucible and a housing for accommodating the heating part, the opening position of the crucible being higher than the filling surface of the vapor deposition material on the outer surface of the crucible The crucible receiving part is provided at a lower position, and the crucible receiving part is supported by a crucible support part provided to pass through the heating part inside the housing, so that the outer bottom surface of the crucible is spaced apart from the inner bottom surface of the housing. The crucible is configured to be housed in the housing in a state where the crucible receiving portion and the crucible support portion are in contact with the crucible rather than the heating portion.

The method of claim 1,
An evaporation source comprising a plurality of openings through which evaporation material passes, along a longitudinal direction.

The method of claim 1,
An evaporation source comprising a plurality of crucible receiving parts and a crucible support part, respectively.

The method of claim 1,
The crucible receiving portion and the crucible support portion are configured to be heated by the heating portion.

The method of claim 1,
An evaporation source comprising: a protruding portion protruding toward an inner surface of the housing on an outer surface of the crucible, and the crucible receiving portion provided on the protruding portion.

The method of claim 1,
The crucible is formed by bringing a plurality of partitions into contact with each other, and a sealing member is provided at the contact portion of the partitions.

The method of claim 1,
And a temperature adjusting mechanism of the crucible receiving portion and the crucible support portion.

The method of claim 1,
The crucible support is the evaporation source, characterized in that the heating.

The method of claim 1,
An evaporation source, wherein a heat reflecting member is provided between the housing and the heating unit.

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