JP6526880B1 - Evaporation source and evaporation apparatus - Google Patents

Evaporation source and evaporation apparatus Download PDF

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JP6526880B1
JP6526880B1 JP2018124712A JP2018124712A JP6526880B1 JP 6526880 B1 JP6526880 B1 JP 6526880B1 JP 2018124712 A JP2018124712 A JP 2018124712A JP 2018124712 A JP2018124712 A JP 2018124712A JP 6526880 B1 JP6526880 B1 JP 6526880B1
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evaporation source
case
heating
source unit
crucible
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JP2020002443A (en
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博之 田村
博之 田村
良秋 風間
良秋 風間
将大 山崎
将大 山崎
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Canon Tokki Corp
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/243—Crucibles for source material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/26—Vacuum evaporation by resistance or inductive heating of the source

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

【課題】断熱効果の向上を図ることのできる蒸発源及び蒸着装置を提供する。【解決手段】坩堝３３０と、坩堝３３０を加熱する第１加熱体３３１と、第１加熱体３３１により坩堝３３０が加熱されることで蒸発又は昇華された材料を拡散する拡散室３４０と、拡散室３４０を加熱する第２加熱体３４１と、を有する蒸発源ユニット（第１蒸発源ユニット３００Ｘ，第２蒸発源ユニット３００Ｙ及び第３蒸発源ユニット３００Ｚ）を一体的に複数組備える蒸発源３００であって、複数の坩堝３３０をそれぞれ収容し、かつ断熱を行うための複数の第１ケース部３１０Ｘ，３１０Ｙ，３１０Ｚと、複数の拡散室３４０をそれぞれ収容し、かつ断熱を行うための複数の第２ケース部３２０Ｘ，３２０Ｙ，３２０Ｚと、を備えると共に、隣り合う第２ケース部３２０Ｘ，３２０Ｙ，３２０Ｚの間には、隙間Ｓ１，Ｓ２がそれぞれ形成されていることを特徴とする。【選択図】図４The present invention provides an evaporation source and a vapor deposition apparatus capable of improving the heat insulation effect. SOLUTION: A crucible 330, a first heating body 331 for heating the crucible 330, a diffusion chamber 340 for diffusing a material evaporated or sublimated by heating the crucible 330 by the first heating body 331, a diffusion chamber The evaporation source unit 300 includes a plurality of evaporation source units (a first evaporation source unit 300X, a second evaporation source unit 300Y, and a third evaporation source unit 300Z) integrally including a second heating body 341 for heating 340. A plurality of first case portions 310X, 310Y and 310Z for heat insulation and a plurality of second case parts for heat insulation, respectively. The case portions 320X, 320Y and 320Z are provided, and the gaps S1 and S2 are respectively provided between the adjacent second case portions 320X, 320Y and 320Z. Characterized in that it is formed. [Selected figure] Figure 4

Description

本発明は、真空蒸着に用いられる蒸発源及び蒸着装置に関する。   The present invention relates to an evaporation source and an evaporation apparatus used for vacuum evaporation.

従来、坩堝及びこの坩堝が加熱されることで蒸発又は昇華された材料を拡散する拡散室等を有する蒸発源ユニットを複数組備える蒸発源が知られている。図６を参照して、このような従来例に係る蒸発源について説明する。図６は従来例に係る蒸発源の模式的断面図である。図示の蒸発源５００は、第１蒸発源ユニット５００Ｘと、第２蒸発源ユニット５００Ｙと、第３蒸発源ユニット５００Ｚとを一体的に備えている。これら第１蒸発源ユニット５００Ｘ，第２蒸発源ユニット５００Ｙ及び第３蒸発源ユニット５００Ｚは、それぞれ、坩堝５２０及び拡散室５３０等を備えている。また、各坩堝５２０の周囲には、各坩堝５２０を加熱する加熱体（第１加熱体５２１）がそれぞれ設けられている。更に、各拡散室５３０の周囲には、各拡散室５３０内において、蒸発又は昇華された材料の温度が低下して析出してしまうことを抑制するために拡散室５３０を加熱する加熱体（第２加熱体５３１）がそれぞれ設けられている。   Conventionally, there is known an evaporation source provided with a plurality of evaporation source units including a crucible and a diffusion chamber or the like for diffusing a material evaporated or sublimated by heating the crucible. An evaporation source according to such a conventional example will be described with reference to FIG. FIG. 6 is a schematic cross-sectional view of an evaporation source according to a conventional example. The illustrated evaporation source 500 integrally includes a first evaporation source unit 500X, a second evaporation source unit 500Y, and a third evaporation source unit 500Z. The first evaporation source unit 500X, the second evaporation source unit 500Y, and the third evaporation source unit 500Z respectively include a crucible 520, a diffusion chamber 530, and the like. Moreover, the heating body (1st heating body 521) which heats each crucible 520 is provided in the circumference | surroundings of each crucible 520, respectively. Furthermore, a heating body for heating the diffusion chamber 530 in order to prevent the temperature of the evaporated or sublimated material from decreasing and depositing in each diffusion chamber 530 around each diffusion chamber 530 2 heaters 531) are provided respectively.

そして、従来例に係る蒸発源５００においては、直方体形状のケース５１０の内部に複数の隔壁５１１が設けられることで、第１蒸発源ユニット５００Ｘと、第２蒸発源ユニット５００Ｙと、第３蒸発源ユニット５００Ｚに分けられている。ここで、ケース５１０及び隔壁５１１は断熱機能を備えている。これにより、ケース５１０の外部に熱が伝わってしまうことを抑制している。   Further, in the evaporation source 500 according to the conventional example, the plurality of partition walls 511 are provided inside the case 510 having a rectangular parallelepiped shape, whereby the first evaporation source unit 500X, the second evaporation source unit 500Y, and the third evaporation source It is divided into units 500Z. Here, the case 510 and the partition 511 have a heat insulating function. This suppresses heat transfer to the outside of the case 510.

しかしながら、上記の従来例に係る蒸発源５００においては、蒸着対象である基板側に配置される拡散室５３０付近の温度が上昇し易い。すなわち、隣り合う拡散室５３０を隔てる隔壁５１１の両側に第２加熱体５３１が設けられているため、隔壁５１１の温度が上昇してしまい易い。そのため、断熱効果が十分発揮されず、拡散室５３０付近の温度が上昇して、基板への温度影響を抑制するのが難しくなってしまう。なお、坩堝等がそれぞれ独立して設けられる蒸発源も知られているが（特許文献１，２参照）、そのような蒸発源の場合、坩堝や加熱体等が剥き出しになっているため、放熱を抑制することは難しい。   However, in the evaporation source 500 according to the conventional example described above, the temperature in the vicinity of the diffusion chamber 530 disposed on the side of the substrate to be vapor-deposited tends to rise. That is, since the second heating members 531 are provided on both sides of the partition 511 separating the adjacent diffusion chambers 530, the temperature of the partition 511 is likely to rise. Therefore, the heat insulation effect is not sufficiently exhibited, and the temperature in the vicinity of the diffusion chamber 530 rises, which makes it difficult to suppress the temperature influence on the substrate. In addition, although the evaporation source which a crucible etc. are each independently provided is also known (refer patent document 1, 2), in the case of such an evaporation source, since a crucible, a heating body, etc. are exposed, it is heat release. It is difficult to suppress

特開２００６−１５２３２６号公報JP, 2006-152326, A 特開２０１６−７９４２０号公報JP, 2016-79420, A

本発明の目的は、断熱効果の向上を図ることのできる蒸発源及び蒸着装置を提供することにある。   An object of the present invention is to provide an evaporation source and a vapor deposition apparatus capable of improving the heat insulation effect.

本発明は、上記課題を解決するために以下の手段を採用した。   The present invention adopts the following means in order to solve the above problems.

本発明の蒸発源は、
基板に蒸着させる物質の材料を収容する坩堝と、該坩堝を加熱する第１加熱体と、第１加熱体により坩堝が加熱されることで蒸発又は昇華された材料を拡散する拡散室と、該拡散室を加熱する第２加熱体と、を有する蒸発源ユニットを一体的に複数組備える蒸発源で
あって、
複数の前記坩堝をそれぞれ収容し、かつ断熱を行うための複数の第１ケース部と、
複数の前記拡散室をそれぞれ収容し、かつ断熱を行うための複数の第２ケース部と、
を備えると共に、
隣り合う第２ケース部の間には、隙間がそれぞれ形成されていることを特徴とする。 The evaporation source of the present invention is
A crucible for containing a material of a substance to be deposited on a substrate, a first heating body for heating the crucible, a diffusion chamber for diffusing a material evaporated or sublimated by heating the crucible by the first heating body, An evaporation source unit integrally including a plurality of evaporation source units each having a second heating body for heating the diffusion chamber,
A plurality of first case portions for respectively accommodating a plurality of the crucibles and performing heat insulation;
A plurality of second case portions respectively accommodating a plurality of the diffusion chambers and performing heat insulation;
Together with
A gap is formed between the adjacent second case portions.

また、本発明の蒸着装置は、
上記の蒸発源と、
前記蒸発源が内部に配置されるチャンバと、
を備えることを特徴とする。 In the vapor deposition apparatus of the present invention,
With the above evaporation sources,
A chamber in which the evaporation source is disposed;
And the like.

本発明によれば、断熱効果の向上を図ることができる。   According to the present invention, the heat insulation effect can be improved.

図１は本発明の実施例に係る蒸着装置の概略構成図である。FIG. 1 is a schematic configuration view of a vapor deposition apparatus according to an embodiment of the present invention. 図２は本発明の実施例１に係る蒸発源の平面図である。FIG. 2 is a plan view of the evaporation source according to the first embodiment of the present invention. 図３は本発明の実施例１に係る蒸発源の模式的断面図である。FIG. 3 is a schematic cross-sectional view of the evaporation source according to the first embodiment of the present invention. 図４は本発明の実施例１に係る蒸発源の模式的断面図である。FIG. 4 is a schematic cross-sectional view of the evaporation source according to the first embodiment of the present invention. 図５は本発明の実施例２に係る蒸発源の模式的断面図である。FIG. 5 is a schematic cross-sectional view of an evaporation source according to a second embodiment of the present invention. 図６は従来例に係る蒸発源の模式的断面図である。FIG. 6 is a schematic cross-sectional view of an evaporation source according to a conventional example.

以下に図面を参照して、この発明を実施するための形態を、実施例に基づいて例示的に詳しく説明する。ただし、この実施例に記載されている構成部品の寸法、材質、形状、その相対配置などは、特に特定的な記載がない限りは、この発明の範囲をそれらのみに限定する趣旨のものではない。   Hereinafter, with reference to the drawings, modes for carrying out the present invention will be exemplarily described in detail based on examples. However, the dimensions, materials, shapes, relative positions, etc. of the components described in this embodiment are not intended to limit the scope of the present invention to them unless otherwise specified. .

（実施例１）
図１〜図４を参照して、本発明の実施例１に係る蒸発源と、この蒸発源を備える蒸着装置について説明する。 Example 1
An evaporation source according to a first embodiment of the present invention and a vapor deposition apparatus including the evaporation source will be described with reference to FIGS. 1 to 4.

＜蒸着装置＞
図１を参照して、本実施例に係る蒸着装置１０について説明する。図１は本発明の実施例に係る蒸着装置１０の概略構成図である。蒸着装置１０は、真空ポンプ２００によって、内部が真空（減圧雰囲気）となるように構成されるチャンバ１００と、チャンバ１００の内部に配置される蒸発源３００とを備えている。蒸発源３００は、基板２０に蒸着させる物質の材料を加熱することで、当該材料を蒸発又は昇華させる役割を担っている。この蒸発源３００によって蒸発または昇華された物質が、チャンバ１００の内部に設置された基板２０に付着することで、基板２０に薄膜が形成される。 <Evaporation device>
With reference to FIG. 1, the vapor deposition apparatus 10 which concerns on a present Example is demonstrated. FIG. 1 is a schematic block diagram of a vapor deposition apparatus 10 according to an embodiment of the present invention. The vapor deposition apparatus 10 includes a chamber 100 configured to have a vacuum (a reduced pressure atmosphere) inside by a vacuum pump 200, and an evaporation source 300 disposed inside the chamber 100. The evaporation source 300 serves to evaporate or sublime the material by heating the material of the substance to be deposited on the substrate 20. A substance evaporated or sublimated by the evaporation source 300 adheres to the substrate 20 placed inside the chamber 100, whereby a thin film is formed on the substrate 20.

＜蒸発源＞
図２〜図４を参照して、本実施例に係る蒸発源３００について説明する。図２は本発明の実施例１に係る蒸発源の平面図である。図３は本発明の実施例１に係る蒸発源の模式的断面図であり、図２中のＡＡ断面図である。図４は本発明の実施例１に係る蒸発源の模式的断面図であり、図２中のＢＢ断面図である。 <Evaporation source>
The evaporation source 300 according to the present embodiment will be described with reference to FIGS. 2 to 4. FIG. 2 is a plan view of the evaporation source according to the first embodiment of the present invention. FIG. 3 is a schematic cross-sectional view of the evaporation source according to the first embodiment of the present invention, and is a cross-sectional view taken along the line AA in FIG. FIG. 4 is a schematic cross-sectional view of the evaporation source according to the first embodiment of the present invention, and is a BB cross-sectional view in FIG.

本実施例に係る蒸発源３００は、複数組（図示の例では３組）の蒸発源ユニットを一体的に備えている。以下、説明の便宜上、これら３組の蒸発源ユニットを、それぞれ第１蒸発源ユニット３００Ｘ，第２蒸発源ユニット３００Ｙ及び第３蒸発源ユニット３００Ｚと
称する。なお、これらの各ユニットの構成は基本的に同一であるので、これらのユニットを構成する各部材については、原則、同一の符号を付している。 The evaporation source 300 according to the present embodiment integrally includes a plurality of (three in the illustrated example) evaporation source units. Hereinafter, for convenience of description, these three sets of evaporation source units are respectively referred to as a first evaporation source unit 300X, a second evaporation source unit 300Y, and a third evaporation source unit 300Z. In addition, since the structure of each of these units is fundamentally the same, about the member which comprises these units, in principle, the same code | symbol is attached | subjected.

蒸発源３００は、第１ケース３１０と、３つの第２ケース部３２０Ｘ，３２０Ｙ，３２０Ｚとを備えている。第２ケース部３２０Ｘ，３２０Ｙ，３２０Ｚは、第１ケース３１０に固定されている。また、第１ケース３１０の内部は２つの隔壁３１２，３１３により隔てられており、３つの第１ケース部３１０Ｘ，３１０Ｙ，３１０Ｚが形成されている。第１ケース部３１０Ｘと第２ケース部３２０Ｘは、第１蒸発源ユニット３００Ｘの構成要素である。また、第１ケース部３１０Ｙと第２ケース部３２０Ｙは、第２蒸発源ユニット３００Ｙの構成要素である。更に、第１ケース部３１０Ｚと第２ケース部３２０Ｚは、第３蒸発源ユニット３００Ｚの構成要素である。   The evaporation source 300 includes a first case 310 and three second case parts 320X, 320Y, and 320Z. The second case parts 320X, 320Y, 320Z are fixed to the first case 310. Further, the inside of the first case 310 is separated by two partition walls 312 and 313, and three first case parts 310X, 310Y and 310Z are formed. The first case portion 310X and the second case portion 320X are components of the first evaporation source unit 300X. The first case portion 310Y and the second case portion 320Y are components of the second evaporation source unit 300Y. Furthermore, the first case portion 310Z and the second case portion 320Z are components of the third evaporation source unit 300Z.

第１ケース部３１０Ｘ，３１０Ｙ，３１０Ｚと第２ケース部３２０Ｘ，３２０Ｙ，３２０Ｚは、断熱機能を備えている。例えば、これらのケース部の内部に通路（流路）を形成しておき、この通路に冷却水などの冷却液を流すことで、断熱効果を発揮させることができる。なお、これらのケース部は、「冷却ケース（部）」と呼ばれることもある。次に、蒸発源ユニットの構成について説明する。上記の通り、各蒸発源ユニットの構成は基本的に同一であるので、ここでは、代表して、第１蒸発源ユニット３００Ｘを例にして説明する。   The first case parts 310X, 310Y, 310Z and the second case parts 320X, 320Y, 320Z have a heat insulating function. For example, a passage (flow passage) is formed in the inside of these case parts, and a heat insulating effect can be exhibited by flowing cooling fluid such as cooling water through this passage. In addition, these case parts may be called "cooling case (part)." Next, the configuration of the evaporation source unit will be described. As described above, since the configurations of the respective evaporation source units are basically the same, here, as a representative, the first evaporation source unit 300X will be described as an example.

第１蒸発源ユニット３００Ｘは、基板２０に蒸着させる物質の材料を収容する坩堝３３０と、坩堝３３０を加熱する第１加熱体３３１とを有している。坩堝３３０は第１ケース部３１０Ｘに収容されている。また、第１加熱体３３１は、坩堝３３０の外壁面を取り囲むように設けられている。第１加熱体３３１としては、シースヒータなど、通電により発熱する部材を好適に適用できる。この第１加熱体３３１と第１ケース部３１０Ｘの内壁面との間には、第１加熱体３３１からの熱を反射させる第１リフレクタ３３２が設けられている。坩堝３３０の側面側においては、２重のリフレクタ構造が採用されており、第１リフレクタ３３２と第１ケース部３１０Ｘの内壁面との間に、更に、第１補助リフレクタ３３３が設けられている。   The first evaporation source unit 300 </ b> X includes a crucible 330 containing a material of a substance to be deposited on the substrate 20 and a first heating body 331 which heats the crucible 330. The crucible 330 is accommodated in the first case portion 310X. Further, the first heating body 331 is provided to surround the outer wall surface of the crucible 330. As the 1st heating body 331, a member which generates heat by energization, such as a sheath heater, can be applied suitably. A first reflector 332 for reflecting the heat from the first heating body 331 is provided between the first heating body 331 and the inner wall surface of the first case portion 310X. A double reflector structure is adopted on the side surface side of the weir 330, and a first auxiliary reflector 333 is further provided between the first reflector 332 and the inner wall surface of the first case portion 310X.

また、第１蒸発源ユニット３００Ｘは、第１加熱体３３１により坩堝３３０が加熱されることで蒸発又は昇華された材料を拡散する拡散室３４０と、拡散室３４０を加熱する第２加熱体３４１とを有している。第２加熱体３４１によって、拡散室３４０を加熱することによって、拡散室３４０の内部において、蒸発又は昇華した材料の温度が低下して析出してしまうことを抑制している。拡散室３４０は第２ケース部３２０Ｘに収容されている。また、第２加熱体３４１としては、シースヒータなど、通電により発熱する部材を好適に適用できる。第２加熱体３４１は、拡散室３４０の外壁面を取り囲むように設けられている。この第２加熱体３４１と第２ケース部３２０Ｘの内壁面との間には、第２加熱体３４１からの熱を反射させる第２リフレクタ３４２が設けられている。拡散室３４０の側面側においては、２重のリフレクタ構造が採用されており、第２リフレクタ３４２と第２ケース部３２０Ｘの内壁面との間に、更に、第２補助リフレクタ３４３が設けられている。また、拡散室３４０には、拡散された材料を噴射するための複数のノズル３５０が設けられている。このノズル３５０は、第２ケース部３２０Ｘに設けられた貫通孔３２１から第２ケース部３２０Ｘの外部に飛び出すように設けられている。   The first evaporation source unit 300X also includes a diffusion chamber 340 for diffusing the material evaporated or sublimated by heating the crucible 330 by the first heating body 331, and a second heating body 341 for heating the diffusion chamber 340. have. By heating the diffusion chamber 340 by the second heating body 341, it is suppressed that the temperature of the evaporated or sublimed material is reduced and deposited inside the diffusion chamber 340. The diffusion chamber 340 is accommodated in the second case portion 320X. Moreover, as the 2nd heating body 341, the member which generate | occur | produces heat by electricity supply, such as a sheath heater, can be applied suitably. The second heater 341 is provided to surround the outer wall surface of the diffusion chamber 340. A second reflector 342 that reflects the heat from the second heating member 341 is provided between the second heating member 341 and the inner wall surface of the second case portion 320X. A double reflector structure is employed on the side surface side of the diffusion chamber 340, and a second auxiliary reflector 343 is further provided between the second reflector 342 and the inner wall surface of the second case portion 320X. . Further, the diffusion chamber 340 is provided with a plurality of nozzles 350 for injecting the diffused material. The nozzle 350 is provided to protrude from the through hole 321 provided in the second case portion 320X to the outside of the second case portion 320X.

そして、第１ケース部３１０Ｘには、第１ケース部３１０Ｘの内部と第２ケース部３２０Ｘの内部とを連通する連通孔３１１が設けられている。この連通孔３１１が設けられることによって、坩堝３３０の内部と拡散室３４０の内部とが繋がることを可能としている。   The first case portion 310X is provided with a communication hole 311 for communicating the inside of the first case portion 310X with the inside of the second case portion 320X. By providing the communication hole 311, it is possible to connect the inside of the weir 330 and the inside of the diffusion chamber 340.

以上のように構成される第１蒸発源ユニット３００Ｘによれば、第１加熱体３３１により坩堝３３０が加熱されると、坩堝３３０内の材料が蒸発又は昇華されて、拡散室３４０内で拡散され、複数のノズル３５０から噴射される。また、第１リフレクタ３３２及び第１補助リフレクタ３３３によって、坩堝３３０は効率的に加熱されると共に、第１ケース部３１０Ｘに熱が伝わることが抑制される。また、断熱機能を有する第１ケース部３１０Ｘによって、第１ケース部３１０Ｘの外部に熱が逃げることが抑制される。同様に、第２リフレクタ３４２及び第２補助リフレクタ３４３によって、拡散室３４０は効率的に加熱されると共に、第２ケース部３２０Ｘに熱が伝わることが抑制される。また、断熱機能を有する第２ケース部３２０Ｘによって、第２ケース部３２０Ｘの外部に熱が逃げることが抑制される。   According to the first evaporation source unit 300X configured as described above, when the crucible 330 is heated by the first heating body 331, the material in the crucible 330 is evaporated or sublimated and diffused in the diffusion chamber 340. , From the plurality of nozzles 350. Moreover, while the crucible 330 is efficiently heated by the 1st reflector 332 and the 1st auxiliary | assistant reflector 333 that a heat | fever is transmitted to the 1st case part 310X is suppressed. In addition, the first case portion 310X having the heat insulating function suppresses the escape of heat to the outside of the first case portion 310X. Similarly, the diffusion chamber 340 is efficiently heated by the second reflector 342 and the second auxiliary reflector 343, and heat transfer to the second case portion 320X is suppressed. In addition, the second case portion 320X having the heat insulating function suppresses the escape of heat to the outside of the second case portion 320X.

なお、上記の通り、第２蒸発源ユニット３００Ｙ及び第３蒸発源ユニット３００Ｚについても、第１蒸発源ユニット３００Ｘと基本的な構成は同一であり、同様の機能が発揮される。本実施例に係る蒸発源３００においては、複数組の蒸発源ユニットを備えているため、各蒸発源ユニットによって、それぞれ異なる材料を噴射させることができる。例えば、第１蒸発源ユニット３００Ｘと第３蒸発源ユニット３００Ｚについてはドーパント材料を噴射させるために用い、第２蒸発源ユニット３００Ｙについてはホスト材料を噴射させるために用いることができる。   As described above, the basic configuration of the second evaporation source unit 300Y and the third evaporation source unit 300Z is the same as that of the first evaporation source unit 300X, and the same function is exhibited. In the evaporation source 300 according to the present embodiment, since the plurality of evaporation source units are provided, different evaporation source units can jet different materials. For example, the first evaporation source unit 300X and the third evaporation source unit 300Z can be used to eject the dopant material, and the second evaporation source unit 300Y can be used to eject the host material.

＜第２ケース部＞
第２ケース部３２０Ｘ，３２０Ｙ，３２０Ｚについて、より詳細に説明する。本実施例においては、隣り合う第２ケース部の間には、隙間がそれぞれ形成されている。つまり、第２ケース部３２０Ｘと第２ケース部３２０Ｙとの間に、隙間Ｓ１が形成され、かつ、第２ケース部３２０Ｙと第２ケース部３２０Ｚとの間に、隙間Ｓ２が形成されている。本実施例においては、これらの隙間Ｓ１，Ｓ２は、蒸発源３００の外側の空間と繋がっている。つまり、隙間Ｓ１，Ｓ２は開放された空間となっている。また、第２ケース部３２０Ｘ，３２０Ｙ，３２０Ｚにおける長手方向の両側面３２２、及び第２ケース部３２０Ｘ，３２０Ｙ，３２０Ｚにおける短手方向の両側面３２３は、いずれも蒸発源３００の外側の空間に曝されている。そして、本実施例においては、第２ケース部３２０Ｘ，３２０Ｙ，３２０Ｚのケース内壁面における長手方向の両側面間の幅Ｗ２１は、第１ケース部３１０Ｘ，３１０Ｙ，３１０Ｚのケース内壁面における長手方向の両側面間の幅Ｗ１１よりも狭くなるように構成されている（図３参照）。また、第２ケース部３２０Ｘ，３２０Ｙ，３２０Ｚのケース内壁面における短手方向の両側面間の幅Ｗ２２は、第１ケース部３１０Ｘ，３１０Ｙ，３１０Ｚのケース内壁面における短手方向の両側面間の幅Ｗ１２よりも狭くなるように構成されている（図４参照）。従って、第２ケース部３２０Ｘ，３２０Ｙ，３２０Ｚのケース内壁面の表面積は、第１ケース部３１０Ｘ，３１０Ｙ，３１０Ｚのケース内壁面の表面積よりも狭い。 <Second case section>
The second case parts 320X, 320Y and 320Z will be described in more detail. In the present embodiment, gaps are respectively formed between adjacent second case parts. That is, the gap S1 is formed between the second case portion 320X and the second case portion 320Y, and the gap S2 is formed between the second case portion 320Y and the second case portion 320Z. In the present embodiment, these gaps S1 and S2 are connected to the space outside the evaporation source 300. That is, the gaps S1 and S2 are open spaces. Further, both the side surfaces 322 in the longitudinal direction in the second case parts 320X, 320Y, 320Z and the side surfaces 323 in the lateral direction in the second case parts 320X, 320Y, 320Z are exposed to the space outside the evaporation source 300. It is done. In the present embodiment, the width W21 between both side surfaces in the longitudinal direction in the case inner wall surface of the second case portions 320X, 320Y, 320Z is the longitudinal direction in the case inner wall surface of the first case portions 310X, 310Y, 310Z. It is configured to be narrower than the width W11 between the two side surfaces (see FIG. 3). Further, the width W22 between both side surfaces in the short direction in the case inner wall surface of the second case portions 320X, 320Y and 320Z is between the both side surfaces in the short direction in the case inner wall surface of the first case portions 310X, 310Y and 310Z. It is configured to be narrower than the width W12 (see FIG. 4). Therefore, the surface area of the case inner wall surface of the second case parts 320X, 320Y, 320Z is smaller than the surface area of the case inner wall surface of the first case parts 310X, 310Y, 310Z.

＜本実施例に係る蒸発源及び蒸着装置の優れた点＞
本実施例に係る蒸着装置１０に備えられる蒸発源３００は、複数組の蒸発源ユニットを一体的に備えている。これにより、複数の蒸発源ユニットがそれぞれ独立して設けられる場合に比べて、次のような利点がある。（１）一枚のベース板を位置基準とすることができるため、各蒸発源ユニットの位置決めが容易である。なお、本実施例の場合には、例えば、第１ケース３１０の底板をベース板とすることができる。これに対して、複数の蒸発源ユニットがそれぞれ独立して設けられる場合には、各蒸発源ユニット同士の位置合わせが必要になってしまう。（２）蒸着装置１０に蒸発源３００を搭載する際の作業も容易である。つまり、複数の蒸発源ユニットがそれぞれ独立して設けられる場合には、搭載作業の回数が多くなるだけでなく、各蒸発源ユニット同士の位置合わせ作業が必要となるのに対して、本実施例に係る蒸発源３００の場合には、そのような手間を省くことができる。（３）本実施例の場合には、坩堝３３０の短手方向の幅を広くすることもできる。すなわ
ち、本実施例の蒸発源３００の場合には、隣り合う坩堝３３０の間に、１枚の隔壁３１２，３１３が設けられるのに対して、複数の蒸発源ユニットがそれぞれ独立して設けられる場合には、隣り合う坩堝の間に２枚の壁（ケース部の壁）が設けられる。また、各蒸発源ユニットの間に間隔が設けられる場合には、当該間隔分のスペースも必要となる。従って、限られたスペースに対して、本実施例に係る蒸発源３００を採用した場合には、複数の蒸発源ユニットがそれぞれ独立して設けられる場合に比べて、坩堝３３０の短手方向の幅を広くすることができ、より多くの材料を収容することが可能となる。（４）ケース部の内部に冷却液を流すための通路が設けられる場合、冷却液の系統数を削減することができる。つまり、本実施例に係る蒸発源３００の場合には、冷却液の供給口と排出口をそれぞれ一つ設けることで、全てのケース部に冷却液を流すことができる。これに対して、複数の蒸発源ユニットがそれぞれ独立して設けられる場合には、それぞれの蒸発源ユニットに、冷却液の供給口と排出口を設けなければならない。 <Superior points of the evaporation source and the evaporation apparatus according to the present embodiment>
The evaporation source 300 provided in the vapor deposition apparatus 10 according to the present embodiment integrally includes a plurality of evaporation source units. This offers the following advantages as compared to the case where a plurality of evaporation source units are provided independently of one another. (1) Since one base plate can be used as a position reference, positioning of each evaporation source unit is easy. In the case of the present embodiment, for example, the bottom plate of the first case 310 can be used as a base plate. On the other hand, when a plurality of evaporation source units are provided independently, alignment between the evaporation source units is required. (2) The operation at the time of mounting the evaporation source 300 on the vapor deposition apparatus 10 is also easy. That is, in the case where a plurality of evaporation source units are provided independently, not only the number of mounting operations increases, but also the alignment operation of the respective evaporation source units becomes necessary, compared to the present embodiment. In the case of the evaporation source 300 according to the above, such labor can be omitted. (3) In the case of the present embodiment, the width of the weir 330 in the short direction can also be increased. That is, in the case of the evaporation source 300 of this embodiment, one partition wall 312, 313 is provided between the adjacent weirs 330, while a plurality of evaporation source units are provided independently. In the case, two walls (walls of the case part) are provided between adjacent ridges. Moreover, when a space is provided between each evaporation source unit, a space for the space is also required. Therefore, when the evaporation source 300 according to the present embodiment is employed for a limited space, the width of the weir 330 in the lateral direction is smaller than when the plurality of evaporation source units are provided independently. Can be made wider and more material can be accommodated. (4) When a passage for flowing the coolant is provided in the inside of the case portion, the number of coolant systems can be reduced. That is, in the case of the evaporation source 300 according to the present embodiment, the cooling liquid can flow in all the case parts by providing one supply port and one discharge port for the cooling liquid. On the other hand, in the case where a plurality of evaporation source units are provided independently of one another, each of the evaporation source units must be provided with a cooling liquid supply port and a discharge port.

そして、本実施例に係る蒸着装置１０に備えられる蒸発源３００においては、隣り合う第２ケース部３２０Ｘ，３２０Ｙ，３２０Ｚの間には、隙間Ｓ１，Ｓ２がそれぞれ形成されている。従って、第２ケース部３２０Ｘ，３２０Ｙ，３２０Ｚは、両面側から第２加熱体３４１によって加熱されるようなことはないため、第２ケース部３２０Ｘ，３２０Ｙ，３２０Ｚによる断熱機能は十分発揮される。従って、十分な断熱効果を得ることができる。従って、基板２０への温度の影響を抑制することができる。   In the evaporation source 300 provided in the vapor deposition apparatus 10 according to the present embodiment, gaps S1 and S2 are respectively formed between the adjacent second case parts 320X, 320Y and 320Z. Therefore, since the second case parts 320X, 320Y, 320Z are not heated by the second heating body 341 from both sides, the heat insulating function by the second case parts 320X, 320Y, 320Z is sufficiently exhibited. Therefore, a sufficient heat insulation effect can be obtained. Therefore, the influence of the temperature on the substrate 20 can be suppressed.

また、本実施例においては、第２ケース部３２０Ｘ，３２０Ｙ，３２０Ｚのケース内壁面の表面積は、第１ケース部３１０Ｘ，３１０Ｙ，３１０Ｚのケース内壁面の表面積よりも狭くなるように構成されている。従って、基板２０に、より近い距離に位置する第２ケース部３２０Ｘ，３２０Ｙ，３２０Ｚのケース内壁面の表面積が狭いことにより、基板２０の温度上昇を抑制することができる。   Further, in the present embodiment, the surface area of the case inner wall surface of the second case parts 320X, 320Y, 320Z is configured to be narrower than the surface area of the case inner wall surface of the first case parts 310X, 310Y, 310Z. . Therefore, since the surface area of the case inner wall surface of the second case parts 320X, 320Y, 320Z located closer to the substrate 20 is narrow, the temperature rise of the substrate 20 can be suppressed.

（実施例２）
図５には、本発明の実施例２が示されている。本実施例においては、隣り合う第２ケース部の間の隙間の一部を配線の設置スペースとして利用した場合の構成を示す。その他の構成および作用については実施例１と同一なので、同一の構成部分については同一の符号を付して、その説明は省略する。 (Example 2)
A second embodiment of the present invention is shown in FIG. In this embodiment, a configuration is shown in which a part of the gap between adjacent second case portions is used as a wiring installation space. The other configurations and operations are the same as those of the first embodiment, and therefore the same components are denoted by the same reference numerals and the description thereof will be omitted.

図５は本発明の実施例２に係る蒸発源の模式的断面図である。なお、この図５は、上述した実施例１における図２中のＢＢ断面図に相当する。本実施例に係る蒸発源３００においても、上記実施例１の場合と同様に、３組の蒸発源ユニット（第１蒸発源ユニット３００Ｘ，第２蒸発源ユニット３００Ｙ及び第３蒸発源ユニット３００Ｚ）を一体的に備えている。第１蒸発源ユニット３００Ｘ，第２蒸発源ユニット３００Ｙ及び第３蒸発源ユニット３００Ｚの構成及び作用効果については、上記実施例１で説明した通りであるので、その説明は省略する。   FIG. 5 is a schematic cross-sectional view of an evaporation source according to a second embodiment of the present invention. 5 corresponds to a cross-sectional view taken along the line BB in FIG. 2 in the first embodiment described above. Also in the evaporation source 300 according to the present embodiment, three evaporation source units (a first evaporation source unit 300X, a second evaporation source unit 300Y, and a third evaporation source unit 300Z) are provided in the same manner as the first embodiment. It is equipped integrally. The configurations and effects of the first evaporation source unit 300X, the second evaporation source unit 300Y, and the third evaporation source unit 300Z are the same as described in the first embodiment, and thus the description thereof is omitted.

本実施例においては、隙間Ｓ１及び隙間Ｓ２の一部に、それぞれ複数の第１配線３７１及び第２配線３７２が配置されている。複数の第１配線３７１は、第１加熱体３３１及び第２加熱体３４１に電気的に接続され、これら第１加熱体３３１及び第２加熱体３４１に電気を送るための配線である。また、複数の第２配線３７２は、ユニット内に設けられた熱電対３６０に電気的に接続された配線である。なお、複数の第１配線３７１及び第２配線３７２はカバー３８０によって保護されている。   In the present embodiment, a plurality of first wires 371 and second wires 372 are disposed in portions of the gap S1 and the gap S2, respectively. The plurality of first wires 371 are wires that are electrically connected to the first heating body 331 and the second heating body 341 and send electricity to the first heating body 331 and the second heating body 341. The plurality of second wires 372 are wires electrically connected to the thermocouples 360 provided in the unit. The plurality of first wires 371 and the second wires 372 are protected by the cover 380.

以上のように構成される本実施例に係る蒸発源３００においても、上記実施例１の場合と同様の効果を得ることができる。また、本実施例においては、複数の第１配線３７１及び第２配線３７２が、第１ケース部３１０Ｘ，３１０Ｙ，３１０Ｚや第２ケース部３２０
Ｘ，３２０Ｙ，３２０Ｚの内部ではなく、これらの外部に設けられているため、第１配線３７１及び第２配線３７２の昇温が抑制される。従って、これら第１配線３７１及び第２配線３７２が断線してしまうことを抑制することができる。 Also in the evaporation source 300 according to the present embodiment configured as described above, the same effect as that of the first embodiment can be obtained. Further, in the present embodiment, the plurality of first wires 371 and the second wires 372 correspond to the first case portions 310X, 310Y, 310Z, and the second case portion 320.
The temperature rise of the first wiring 371 and the second wiring 372 is suppressed because they are provided not in the interior of the X, 320Y, and 320Z but in the outside thereof. Therefore, disconnection of the first wiring 371 and the second wiring 372 can be suppressed.

１０…蒸着装置，２０…基板，３００…蒸発源，３００Ｘ…第１蒸発源ユニット，３００Ｙ…第２蒸発源ユニット，３００Ｚ…第３蒸発源ユニット，３１０Ｘ，３１０Ｙ，３１０Ｚ…第１ケース部，３２０Ｘ，３２０Ｙ，３２０Ｚ…第２ケース部，３３０…坩堝，３３１…第１加熱体，３４０…拡散室，３４１…第２加熱体，Ｓ１，Ｓ２…隙間   DESCRIPTION OF SYMBOLS 10 vapor deposition apparatus 20 board | substrate 300 evaporation source 300X 1st evaporation source unit 300Y 2nd evaporation source unit 300Z 3rd evaporation source unit 310X, 310Y, 310Z 1st case part, 320X , 320 Y, 320 Z: second case portion, 330: 坩 堝, 331: first heating body, 340: diffusion chamber, 341: second heating body, S1, S2: gap

Claims (4)

基板に蒸着させる物質の材料を収容する坩堝と、該坩堝を加熱する第１加熱体と、第１加熱体により坩堝が加熱されることで蒸発又は昇華された材料を拡散する拡散室と、該拡散室を加熱する第２加熱体と、を有する蒸発源ユニットを一体的に複数組備える蒸発源であって、
複数の前記坩堝をそれぞれ収容し、かつ断熱を行うための複数の第１ケース部と、
複数の前記拡散室をそれぞれ収容し、かつ断熱を行うための複数の第２ケース部と、
を備えると共に、
隣り合う第２ケース部の間には、隙間がそれぞれ形成されていることを特徴とする蒸発源。 A crucible for containing a material of a substance to be deposited on a substrate, a first heating body for heating the crucible, a diffusion chamber for diffusing a material evaporated or sublimated by heating the crucible by the first heating body, An evaporation source unit integrally including a plurality of evaporation source units each having a second heating body for heating the diffusion chamber,
A plurality of first case portions for respectively accommodating a plurality of the crucibles and performing heat insulation;
A plurality of second case portions respectively accommodating a plurality of the diffusion chambers and performing heat insulation;
Together with
An evaporation source characterized in that a gap is formed between adjacent second case portions. 第２ケース部のケース内壁面における長手方向の両側面間の幅は、第１ケース部のケース内壁面における長手方向の両側面間の幅よりも狭く、第２ケース部のケース内壁面における短手方向の両側面間の幅は、第１ケース部のケース内壁面における短手方向の両側面間の幅よりも狭いことを特徴とする請求項１に記載の蒸発源。   The width between both side surfaces in the longitudinal direction in the case inner wall surface of the second case portion is narrower than the width between both side surfaces in the longitudinal direction in the case inner wall surface of the first case portion, and the short in the case inner wall surface of the second case portion The evaporation source according to claim 1, wherein a width between both side surfaces in the hand direction is narrower than a width between both side surfaces in the lateral direction of the case inner wall surface of the first case portion. 隣り合う第２ケース部の間の隙間の一部に、第１ケース部内及び第２ケース部内のうちの少なくともいずれか一方に備えられる部材に電気的に接続される配線が配置されていることを特徴とする請求項１または２に記載の蒸発源。   A wire electrically connected to a member provided in at least one of the first case portion and the second case portion is disposed in a part of the gap between the adjacent second case portions. The evaporation source according to claim 1 or 2 characterized by the above-mentioned. 請求項１，２または３に記載の蒸発源と、
前記蒸発源が内部に配置されるチャンバと、
を備えることを特徴とする蒸着装置。 An evaporation source according to claim 1, 2 or 3.
A chamber in which the evaporation source is disposed;
An evaporation apparatus comprising:
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