WO2014034410A1 - Evaporation source - Google Patents
Evaporation source Download PDFInfo
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- WO2014034410A1 WO2014034410A1 PCT/JP2013/071621 JP2013071621W WO2014034410A1 WO 2014034410 A1 WO2014034410 A1 WO 2014034410A1 JP 2013071621 W JP2013071621 W JP 2013071621W WO 2014034410 A1 WO2014034410 A1 WO 2014034410A1
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- WIPO (PCT)
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- crucible
- vapor deposition
- evaporation source
- deposition material
- evaporation
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/243—Crucibles for source material
Definitions
- the present invention relates to an evaporation source.
- the temperature distribution of the crucible needs to be uniform. This is because the vapor deposition material in the crucible receives heat conduction and radiation from the crucible.
- a factor that deteriorates the temperature distribution of the crucible is that the crucible comes into contact with other members. For example, when the crucible is installed, if the bottom surface of the crucible comes into contact with the evaporation source holder or the insulator, the temperature of only the contact portion decreases. Furthermore, since the contact thermal resistance changes depending on the contact state with the evaporation source holder and insulator, the temperature changes variously.
- Patent Document 1 a technique disclosed in Patent Document 1 has been proposed.
- the technique disclosed in Patent Document 1 is provided with legs on the bottom surface of the crucible housed in the outer box to be heated, and by providing a gap between the bottom surface of the crucible and the floor surface of the outer box, It is intended to mitigate thermal fluctuation due to contact.
- the present invention has been made in view of the above situation, and supports the crucible on the outer surface of the crucible at a position higher than the filling surface of the vapor deposition material, so that the outer bottom surface of the crucible is the inner bottom surface of the container.
- the crucible can be housed in the container in a state of being separated from the container, and the contact portion of the crucible with the container can be located away from the vapor deposition material, so that the influence of thermal fluctuation due to contact is not easily transmitted to the vapor deposition material.
- An object of the present invention is to provide an evaporation source capable of making the temperature distribution of the vapor deposition material uniform and stabilizing the evaporation amount of the vapor deposition material.
- An evaporation source comprising a crucible 2 filled with a vapor deposition material 1, a heating unit 3 provided so as to surround the crucible 2, and a storage body 4 for storing and arranging the crucible 2 and the heating unit 3.
- a crucible support portion 6 is provided on the outer surface of the crucible 2 at a position higher than the filling surface 1 a of the vapor deposition material 1 and lower than the opening position of the crucible 2, and a crucible support portion 6 provided inside the storage body 4.
- the contact point between the crucible receiving part 5 and the crucible support part 6 is provided on the crucible 2 side with respect to the heating part 3 according to the evaporation source according to claim 1.
- the evaporation source according to any one of claims 1 and 2, wherein a plurality of openings 7 through which the vapor deposition material 1 passes are provided along the longitudinal direction.
- the crucible receiving part 5 and the crucible support part 6 are provided in plural, respectively, and the evaporation source according to any one of claims 1 and 2, characterized in that.
- the said crucible receiving part 5 and the said crucible support part 6 were comprised so that it might be heated by the said heating part 3, It concerns on the evaporation source of any one of Claims 1 and 2 characterized by the above-mentioned. It is.
- a projecting portion 8 is provided on the outer surface of the crucible 2 so as to project toward the inner surface of the housing body 4, and the crucible receiving portion 5 is provided on the projecting portion 8. It concerns on the evaporation source of any one of these.
- the crucible 2 is formed by bringing a plurality of divided bodies 2a and 2b into contact with each other, and a seal member 9 is provided at a contact portion between the divided bodies 2a and 2b. 2.
- the evaporation source according to any one of 2 above.
- the evaporation source according to any one of claims 1 and 2, further comprising a temperature adjusting mechanism for the crucible receiving part 5 and the crucible support part 6.
- the crucible support section 6 is the heating section 3, and relates to the evaporation source according to any one of claims 1 and 2.
- the evaporation source according to any one of claims 1 and 2, wherein a heat reflecting member is provided between the housing 4 and the heating unit 3.
- the present invention is configured as described above, the influence of thermal fluctuation due to contact is hardly transmitted to the vapor deposition material, the temperature distribution of the vapor deposition material can be made uniform, and the evaporation amount of the vapor deposition material can be stabilized. Become.
- FIG. 1 is a schematic explanatory cross-sectional view of Example 1.
- FIG. 1 is a schematic explanatory perspective view of a main part of Example 1.
- FIG. 3 is a schematic cross-sectional view of Example 2.
- FIG. 10 is a schematic explanatory perspective view of a main part of Example 2.
- FIG. 6 is a schematic explanatory cross-sectional view of another example of Embodiment 2.
- FIG. 10 is a schematic explanatory perspective view of a main part of another example of the second embodiment.
- the crucible 2 is heated by the heating unit 3 to evaporate the vapor deposition material 1, and vapor deposition is performed on an object to be deposited such as a substrate.
- the outer bottom surface of the crucible 2 and the inner bottom surface of the housing 4 that accommodates the crucible 2 are not in contact with each other, and the crucible receiving portion 5 is provided at a position higher than the filling surface 1 a of the vapor deposition material 1.
- the influence of the thermal fluctuation by the contact with the container 4 of the crucible 2 to the vapor deposition material 1 can be made as small as possible.
- the temperature distribution of the crucible 2 can be made uniform by the heating unit 3 and the temperature distribution of the vapor deposition material 1 filled in the crucible 2 can be made uniform, and the evaporation amount of the vapor deposition material can be stabilized. It will be.
- a so-called line source in which a plurality of openings 7 through which the vapor deposition material 1 passes is provided along the longitudinal direction, a so-called line source, the evaporation amount of the vapor deposition material 1 is uniform regardless of the position in the crucible 2. Therefore, it is possible to form a film with a uniform film thickness distribution.
- the crucible receiving part 5 and the crucible support part 6 are positioned lower than the opening, contamination by the vapor deposition material 1 can be avoided.
- the first embodiment includes a crucible 2 filled with a vapor deposition material 1, a heating unit 3 provided so as to surround the crucible 2, and a storage body 4 that stores and arranges the crucible 2 and the heating unit 3.
- a crucible receiving portion 5 is provided on the outer surface of the crucible 2 and higher than the filling surface 1 a of the vapor deposition material 1 and lower than the opening position of the crucible 2, and is provided inside the storage body 4.
- the crucible support part 6 supports the crucible receiving part 5 so that the crucible 2 can be accommodated in the accommodating body 4 with the outer bottom surface of the crucible 2 being separated from the inner bottom surface of the accommodating body 4. It is configured.
- Example 1 is an evaporation source having a cylindrical crucible 2, and faces a deposition object such as a substrate in a vacuum chamber equipped with an exhaust mechanism. It is provided in the state.
- the crucible 2 is made of titanium, and a circular opening 7 is provided on the upper end surface thereof. Not only titanium but also other materials such as tantalum, molybdenum or tungsten may be used.
- the crucible 2 of the first embodiment is configured by abutting and connecting divided bodies 2a and 2b divided in the vertical direction. Specifically, a male screw part and a female screw part are respectively provided in the divided bodies 2a and 2b, and these are screwed together. Therefore, when filling the crucible 2 with the vapor deposition material 1, the divided bodies 2 a and 2 b can be separated and the vapor deposition material 1 can be directly filled into the bottom of the crucible 2 without the opening 7.
- the vapor deposition material 1 is generally in the form of a powder or granule.
- the exposed surface (upper end surface) when the vapor deposition material 1 is filled in the crucible 2 is used as the filling surface 1a.
- the storage body 4 is a cylindrical body made of stainless steel and opened at the top, and a crucible support portion 6 projects from the inner surface.
- the material is not limited to stainless steel but may be aluminum.
- the crucible support portion 6 is in the shape of a square bar, supports the crucible receiving portion 5 provided on the outer surface of the crucible 2, and is formed of a material having low thermal conductivity such as ceramics.
- a concave portion is provided on the outer surface of the crucible 2 at a position higher than the filling surface 1 a of the vapor deposition material 1 and lower than the opening position of the crucible 2, and this is used as the crucible receiving portion 5.
- a plurality of recesses are provided at the same height position at the lower end of the upper divided body 2 b and are supported by the crucible support portion 6. Yes.
- the crucible 2 can be supported more stably by adopting a configuration in which it is supported at a plurality of positions. Even if only one pair of the crucible support portion 6 and the crucible support portion 5 is provided and the cantilever support structure is provided at one place of the crucible support portion 6, the function of supporting the crucible 2 can be achieved at a minimum.
- the position where the crucible receiving portion 5 is provided is a substantially intermediate position between the upper end of the filling surface 1a and the lower end of the opening 7 of the crucible 2, and influences the evaporation amount of the vapor deposition material 1 as much as possible. While making it small, the crucible receiving part 5 and the crucible support part 6 are separated from the opening 7 of the crucible 2 to make it difficult to be contaminated.
- the heating unit 3 As the heating unit 3, a general sheath heater is adopted.
- the heating unit 3 is provided between the crucible 2 and the storage body 4.
- the crucible support part 6 is provided so as to surround the side surface and the bottom surface of the crucible 2 except for a part through which the crucible support part 6 passes, so that the crucible receiving part 5 and the crucible support part 6 are heated by the heating part 3. It is composed. Therefore, the crucible receiving part 5 and the crucible support part 6 are also heated by the heating part 3, so that the heat fluctuation in the vicinity of the crucible receiving part 5 due to contact with the crucible support part 6, that is, the temperature drop in the vicinity of the crucible receiving part 5. Is suppressed.
- the contact point between the crucible receiving part 5 and the crucible support part 6 is provided on the crucible 2 side from the inner surface of the heating part 3. Therefore, the crucible 2 receives external heat fluctuations through the contact of the crucible support 6 and is hardly affected by external heat fluctuations. That is, for example, when there is a contact point between the crucible receiving part 5 and the crucible support part 6 outside the heating part 3 (when a part of the crucible 2 exists outside the heating part 3), a part of the crucible 2 is Under the influence of the outside of the heating unit 3, the heat fluctuation is transmitted to the crucible 2 by the heat conduction of the crucible 2, so that the heat fluctuation is easily affected.
- the crucible support part 6 may be constituted by the heating part 3, and in this case, the thermal fluctuation in the vicinity of the crucible receiving part 5 is further suppressed.
- the crucible 2 may be provided with a protruding portion 8, and in this case as well, thermal fluctuations in the vicinity of the crucible receiving portion 5 are further suppressed.
- a heat reflecting member may be provided between the housing 4 and the heating unit 3 so as to surround the heating unit 3.
- the crucible 2 is heated by the heating unit 3 more satisfactorily. It becomes possible to do.
- the heating unit 3 it is possible to make the temperature distribution of the crucible 2 uniform by the heating unit 3 to make the temperature distribution of the vapor deposition material 1 filled in the crucible 2 uniform, and stabilize the evaporation amount of the vapor deposition material. Can be achieved.
- the second embodiment is a linear evaporation source including a plurality of openings 7 along the longitudinal direction on the upper end surface and having crucibles 2 that are long in the parallel direction of the openings 7. is there.
- Example 2 a protruding portion 8 that protrudes toward the inner surface of the housing 4 is provided on the outer surface of the crucible 2, and the crucible receiving portion 5 is provided on the protruding portion 8. Specifically, a plurality of protrusions 8 are provided at predetermined intervals.
- the crucible 2 is configured by connecting the upper and lower divided bodies 2a and 2b using bolts 10 and nuts 11 in a state where the opposed surfaces thereof are in contact with each other. Specifically, the divided bodies 2a and 2b are connected by inserting the bolt 10 through an insertion hole provided in the protruding portion 8 and screwing the nut 11 therethrough.
- a concave portion as the crucible receiving portion 5 is provided at the protruding end portion of the protruding portion 8. Further, the width of the concave portion (the gap with the crucible support portion 6) is appropriately set for each part so as to allow the elongation in consideration of the elongation of the crucible 2 due to heat.
- Example 2 by providing the protrusion 8, the crucible receiving part 5 can be provided at a position further away from the vapor deposition material 1 of the crucible 2, and the temperature due to heat conduction from the protrusion 8 to the crucible support part 6. It is possible to effectively mitigate the influence of the decrease.
- the heating unit 3 is provided so as to surround the upper and lower surfaces of the protruding portion 8 and the protruding end surface (except for a part through which the crucible support portion 6 passes). Accordingly, the surface area of the crucible receiving portion 5 to be heated is increased as compared with the case where the protruding portion 8 is not provided. Also from this point, the effect of the temperature drop due to the heat conduction from the protruding portion 8 to the crucible support portion 6 is effective. It becomes possible to relax.
- the temperature distribution of the crucible 2 can be made uniform by the heating unit 3, and the temperature distribution of the vapor deposition material 1 filled in the crucible 2 can be made uniform. Since it becomes uniform regardless of the position in the crucible 2, it is possible to form a film with a uniform film thickness distribution.
- Example 2 has comprised the protrusion part 8 as mentioned above, you may comprise like another example illustrated in FIG. In other words, the protruding portion 8 may be provided in a bowl shape around the outer surface of the crucible 2.
- reference numerals 12 and 13 are storage recesses for storing the head and tail of the bolt 10 connecting the divided bodies 2 a and 2 b and the nut 11.
- the seal member 9 is provided between the opposing surfaces which are the contact portions between the divided bodies 2a and 2b, and the leakage of the vapor deposition material 1 can be further prevented.
Abstract
Provided is an evaporation source with which the effect of thermal fluctuation due to contact is not easily transmitted to a vapor deposition material, and with which the temperature distribution of the vapor deposition material can be made uniform, and the amount of evaporation of the vapor deposition material can be stabilized. This evaporation source comprises a crucible (2) filled with an evaporation material (1), a heating part (3) provided so as to surround this crucible (2), and a container (4) arranged so as to house the crucible (2) and the heating unit (3). The construction is such that crucible-receiving parts (5) are provided on the outside surface of the crucible at positions higher than the fill surface (1a) of the evaporation material (1) and lower than the position of the opening of the crucible (2), the crucible-receiving parts (5) are supported by crucible support parts (6) provided on the inside of the container (4), and the crucible (2) is housed in the container (4) with the outside base surface of the crucible (2) separated from the inside base surface of the container (4).
Description
本発明は、蒸発源に関するものである。
The present invention relates to an evaporation source.
蒸着装置においては、蒸着の際にルツボ内の蒸着材料の温度分布を均一にする必要がある。それは、蒸着材料の蒸発量と温度に相関関係があるためである。
In the vapor deposition apparatus, it is necessary to make the temperature distribution of the vapor deposition material in the crucible uniform during vapor deposition. This is because there is a correlation between the evaporation amount of the vapor deposition material and the temperature.
ここで、ルツボ内の蒸着材料の温度分布を均一にするには、ルツボの温度分布が均一である必要がある。ルツボ内の蒸着材料は、ルツボからの熱伝導や輻射を受けるためである。
Here, in order to make the temperature distribution of the vapor deposition material in the crucible uniform, the temperature distribution of the crucible needs to be uniform. This is because the vapor deposition material in the crucible receives heat conduction and radiation from the crucible.
つまり、蒸着材料の蒸発量を均一にするためには、ルツボの温度分布を均一にする必要があり、特に、ルツボの蒸着材料近傍部分の温度分布の均一化が重要である。
That is, in order to make the evaporation amount of the vapor deposition material uniform, it is necessary to make the temperature distribution of the crucible uniform, and in particular, it is important to make the temperature distribution in the vicinity of the vapor deposition material of the crucible uniform.
また、ルツボの温度分布を悪くする要因としては、ルツボが他の部材と接触することが挙げられる。例えば、ルツボを設置する際に、ルツボ底面が蒸発源ホルダやガイシに接触すると、接触部のみ温度が下がる。更に、蒸発源ホルダやガイシへの接触具合によって接触熱抵抗が変わるため、温度が様々に変化する。
Also, a factor that deteriorates the temperature distribution of the crucible is that the crucible comes into contact with other members. For example, when the crucible is installed, if the bottom surface of the crucible comes into contact with the evaporation source holder or the insulator, the temperature of only the contact portion decreases. Furthermore, since the contact thermal resistance changes depending on the contact state with the evaporation source holder and insulator, the temperature changes variously.
そこで、上記のような問題点を解決するため、例えば特許文献１に開示される技術が提案されている。この特許文献１に開示される技術は、加熱される外箱内に収納されるルツボの底面に脚部を設けて、ルツボの底面と外箱の床面との間に間隔を設けることで、接触による熱変動を緩和させようとするものである。
Therefore, in order to solve the above problems, for example, a technique disclosed in Patent Document 1 has been proposed. The technique disclosed in Patent Document 1 is provided with legs on the bottom surface of the crucible housed in the outer box to be heated, and by providing a gap between the bottom surface of the crucible and the floor surface of the outer box, It is intended to mitigate thermal fluctuation due to contact.
しかしながら、上記特許文献１においては、脚部が蒸着材料の直下に設けられているため、ルツボの脚部近傍が脚部を介しての熱伝導により局所的に加熱され、脚部近傍の蒸着材料の蒸発量が他の場所に比し増加すると考えられる。
However, in Patent Document 1, since the leg portion is provided directly under the vapor deposition material, the vicinity of the leg portion of the crucible is locally heated by heat conduction through the leg portion, and the vapor deposition material in the vicinity of the leg portion. It is considered that the amount of evaporation increases compared to other places.
そのため、脚部を設ける位置がルツボ端部であったとしても、蒸発量が局所的に増加すれば、端部近傍の開口からの蒸着材料の噴出量が増加し、膜厚分布にバラつきが生じることになる。
Therefore, even if the position where the leg is provided is at the end of the crucible, if the evaporation amount increases locally, the amount of vapor deposition material ejected from the opening in the vicinity of the end increases and the film thickness distribution varies. It will be.
本発明は、上述のような現状に鑑みなされたもので、ルツボを、ルツボの外側面にして蒸着材料の充填面よりも高い位置で支持することで、ルツボの外底面が収納体の内底面から離間した状態でルツボを収納体内に収納配設でき、且つ、ルツボの収納体との接触部を蒸着材料から離れた位置とすることができ、接触による熱変動の影響が蒸着材料に伝わり難く、蒸着材料の温度分布を均一化でき、蒸着材料の蒸発量の安定化を図ることができる蒸発源を提供することを目的としている。
The present invention has been made in view of the above situation, and supports the crucible on the outer surface of the crucible at a position higher than the filling surface of the vapor deposition material, so that the outer bottom surface of the crucible is the inner bottom surface of the container. The crucible can be housed in the container in a state of being separated from the container, and the contact portion of the crucible with the container can be located away from the vapor deposition material, so that the influence of thermal fluctuation due to contact is not easily transmitted to the vapor deposition material. An object of the present invention is to provide an evaporation source capable of making the temperature distribution of the vapor deposition material uniform and stabilizing the evaporation amount of the vapor deposition material.
添付図面を参照して本発明の要旨を説明する。
The gist of the present invention will be described with reference to the accompanying drawings.
蒸着材料１が充填されるルツボ２と、このルツボ２を囲うように設けられた加熱部３と、前記ルツボ２及び前記加熱部３を収納配設する収納体４とから成る蒸発源であって、前記ルツボ２の外側面にして前記蒸着材料１の充填面１ａよりも高くルツボ２の開口位置よりも低い位置にルツボ受け部５を設け、前記収納体４の内側に設けたルツボ支持部６により前記ルツボ受け部５を支持して、前記ルツボ２の外底面が前記収納体４の内底面から離間した状態で前記ルツボ２を前記収納体４に収納配設し得るように構成したことを特徴とする蒸発源に係るものである。
An evaporation source comprising a crucible 2 filled with a vapor deposition material 1, a heating unit 3 provided so as to surround the crucible 2, and a storage body 4 for storing and arranging the crucible 2 and the heating unit 3. A crucible support portion 6 is provided on the outer surface of the crucible 2 at a position higher than the filling surface 1 a of the vapor deposition material 1 and lower than the opening position of the crucible 2, and a crucible support portion 6 provided inside the storage body 4. By supporting the crucible receiving part 5, the crucible 2 can be accommodated in the storage body 4 with the outer bottom surface of the crucible 2 being separated from the inner bottom surface of the storage body 4. It relates to a characteristic evaporation source.
また、前記ルツボ受け部５と前記ルツボ支持部６との接触点は、前記加熱部３よりルツボ２側に設けたことを特徴とする請求項１記載の蒸発源に係るものである。
Further, the contact point between the crucible receiving part 5 and the crucible support part 6 is provided on the crucible 2 side with respect to the heating part 3 according to the evaporation source according to claim 1.
また、蒸着材料１が通過する開口部７を長手方向に沿って複数設けたことを特徴とする請求項１，２のいずれか１項に記載の蒸発源に係るものである。
Further, the evaporation source according to any one of claims 1 and 2, wherein a plurality of openings 7 through which the vapor deposition material 1 passes are provided along the longitudinal direction.
また、前記ルツボ受け部５及び前記ルツボ支持部６を夫々複数設けたことを特徴とする請求項１，２のいずれか１項に記載の蒸発源に係るものである。
Further, the crucible receiving part 5 and the crucible support part 6 are provided in plural, respectively, and the evaporation source according to any one of claims 1 and 2, characterized in that.
また、前記ルツボ受け部５及び前記ルツボ支持部６は、前記加熱部３により加熱されるように構成したことを特徴とする請求項１，２のいずれか１項に記載の蒸発源に係るものである。
The said crucible receiving part 5 and the said crucible support part 6 were comprised so that it might be heated by the said heating part 3, It concerns on the evaporation source of any one of Claims 1 and 2 characterized by the above-mentioned. It is.
また、前記ルツボ２の外側面に前記収納体４の内側面に向かって突出する突出部８を設け、この突出部８に前記ルツボ受け部５を設けたことを特徴とする請求項１，２のいずれか１項に記載の蒸発源に係るものである。
Further, a projecting portion 8 is provided on the outer surface of the crucible 2 so as to project toward the inner surface of the housing body 4, and the crucible receiving portion 5 is provided on the projecting portion 8. It concerns on the evaporation source of any one of these.
また、前記ルツボ２は複数の分割体２ａ・２ｂ同士を互いに当接させて形成し、この分割体２ａ・２ｂ同士の当接部にシール部材９を設けたことを特徴とする請求項１，２のいずれか１項に記載の蒸発源に係るものである。
The crucible 2 is formed by bringing a plurality of divided bodies 2a and 2b into contact with each other, and a seal member 9 is provided at a contact portion between the divided bodies 2a and 2b. 2. The evaporation source according to any one of 2 above.
また、前記ルツボ受け部５及び前記ルツボ支持部６の温度調節機構を備えたことを特徴とする請求項１，２のいずれか１項に記載の蒸発源に係るものである。
The evaporation source according to any one of claims 1 and 2, further comprising a temperature adjusting mechanism for the crucible receiving part 5 and the crucible support part 6.
また、前記ルツボ支持部６は前記加熱部３であることを特徴とする請求項１，２のいずれか１項に記載の蒸発源に係るものである。
Further, the crucible support section 6 is the heating section 3, and relates to the evaporation source according to any one of claims 1 and 2.
また、前記収納体４と前記加熱部３との間に熱反射部材を設けたことを特徴とする請求項１，２のいずれか１項に記載の蒸発源に係るものである。
Further, the evaporation source according to any one of claims 1 and 2, wherein a heat reflecting member is provided between the housing 4 and the heating unit 3.
本発明は上述のように構成したから、接触による熱変動の影響が蒸着材料に伝わり難く、蒸着材料の温度分布を均一化でき、蒸着材料の蒸発量の安定化を図ることができる蒸発源となる。
Since the present invention is configured as described above, the influence of thermal fluctuation due to contact is hardly transmitted to the vapor deposition material, the temperature distribution of the vapor deposition material can be made uniform, and the evaporation amount of the vapor deposition material can be stabilized. Become.
好適と考える本発明の実施形態を、図面に基づいて本発明の作用を示して簡単に説明する。
Embodiments of the present invention that are considered suitable will be briefly described with reference to the drawings, illustrating the operation of the present invention.
加熱部３によりルツボ２を加熱して蒸着材料１を蒸発させ、基板等の被蒸着物に対して蒸着を行う。
The crucible 2 is heated by the heating unit 3 to evaporate the vapor deposition material 1, and vapor deposition is performed on an object to be deposited such as a substrate.
この際、ルツボ２の外底面とルツボ２を収容する収納体４の内底面とは接触せず、且つ、ルツボ受け部５は蒸着材料１の充填面１ａよりも高い位置に設けているから、蒸着材料１へのルツボ２の収納体４との接触による熱変動の影響を可及的に小さくできる。
At this time, the outer bottom surface of the crucible 2 and the inner bottom surface of the housing 4 that accommodates the crucible 2 are not in contact with each other, and the crucible receiving portion 5 is provided at a position higher than the filling surface 1 a of the vapor deposition material 1. The influence of the thermal fluctuation by the contact with the container 4 of the crucible 2 to the vapor deposition material 1 can be made as small as possible.
即ち、ルツボ２と収納体４との接触部では熱伝導によって局部的な熱変動が生じるが、蒸着材料１の充填高さより高く蒸着材料１から離れた位置でルツボ２を支持するため、当該熱変動が蒸着材料１の蒸発量に及ぼす影響を最小限とすることができる。
That is, local heat fluctuations occur due to heat conduction at the contact portion between the crucible 2 and the container 4, but the crucible 2 is supported at a position higher than the deposition height of the vapor deposition material 1 and away from the vapor deposition material 1. The influence of the fluctuation on the evaporation amount of the vapor deposition material 1 can be minimized.
従って、本発明は、加熱部３によりルツボ２の温度分布を均一にしてルツボ２に充填される蒸着材料１の温度分布を均一にすることが可能となり、蒸着材料の蒸発量の安定化を図れることになる。
Therefore, according to the present invention, the temperature distribution of the crucible 2 can be made uniform by the heating unit 3 and the temperature distribution of the vapor deposition material 1 filled in the crucible 2 can be made uniform, and the evaporation amount of the vapor deposition material can be stabilized. It will be.
また、例えば、蒸着材料１が通過する開口部７を長手方向に沿って複数設けた線形蒸発源、所謂ラインソースの場合には、蒸着材料１の蒸発量がルツボ２内の位置によらず均一になるため、均一な膜厚分布で成膜することが可能となる。
Further, for example, in the case of a so-called line source in which a plurality of openings 7 through which the vapor deposition material 1 passes is provided along the longitudinal direction, a so-called line source, the evaporation amount of the vapor deposition material 1 is uniform regardless of the position in the crucible 2. Therefore, it is possible to form a film with a uniform film thickness distribution.
また、ルツボ受け部５及びルツボ支持部６は開口より低い位置となるため、蒸着材料１による汚染を避けることができる。
Moreover, since the crucible receiving part 5 and the crucible support part 6 are positioned lower than the opening, contamination by the vapor deposition material 1 can be avoided.
本発明の具体的な実施例１について図１，２に基づいて説明する。
Specific Example 1 of the present invention will be described with reference to FIGS.
実施例１は、蒸着材料１が充填されるルツボ２と、このルツボ２を囲うように設けられた加熱部３と、前記ルツボ２及び前記加熱部３を収納配設する収納体４とから成る蒸発源であって、前記ルツボ２の外側面にして前記蒸着材料１の充填面１ａよりも高くルツボ２の開口位置よりも低い位置にルツボ受け部５を設け、前記収納体４の内側に設けたルツボ支持部６により前記ルツボ受け部５を支持して、前記ルツボ２の外底面が前記収納体４の内底面から離間した状態で前記ルツボ２を前記収納体４に収納配設し得るように構成したものである。
The first embodiment includes a crucible 2 filled with a vapor deposition material 1, a heating unit 3 provided so as to surround the crucible 2, and a storage body 4 that stores and arranges the crucible 2 and the heating unit 3. A crucible receiving portion 5 is provided on the outer surface of the crucible 2 and higher than the filling surface 1 a of the vapor deposition material 1 and lower than the opening position of the crucible 2, and is provided inside the storage body 4. The crucible support part 6 supports the crucible receiving part 5 so that the crucible 2 can be accommodated in the accommodating body 4 with the outer bottom surface of the crucible 2 being separated from the inner bottom surface of the accommodating body 4. It is configured.
具体的には、実施例１は、図１，２に図示したように、筒状のルツボ２を有する蒸発源であり、排気機構を備えた真空槽内に、基板等の被蒸着物と対向状態に設けられるものである。
Specifically, as shown in FIGS. 1 and 2, Example 1 is an evaporation source having a cylindrical crucible 2, and faces a deposition object such as a substrate in a vacuum chamber equipped with an exhaust mechanism. It is provided in the state.
各部を具体的に説明する。
Each part will be explained in detail.
ルツボ２はチタン製であり、その上端面には円形の開口部７が設けられている。なお、チタンに限らず、タンタル，モリブデン若しくはタングステン等、他の素材を用いても良い。
The crucible 2 is made of titanium, and a circular opening 7 is provided on the upper end surface thereof. Not only titanium but also other materials such as tantalum, molybdenum or tungsten may be used.
また、実施例１のルツボ２は、上下に分割した分割体２ａ・２ｂを当接連結して構成している。具体的には、分割体２ａ・２ｂに雄螺子部及び雌螺子部を夫々設け、これらを螺合連結している。従って、蒸着材料１をルツボ２に充填する際、分割体２ａ・２ｂを分離して、開口部７を介さずに、ルツボ２の底部に直接蒸着材料１を充填することができる。
Also, the crucible 2 of the first embodiment is configured by abutting and connecting divided bodies 2a and 2b divided in the vertical direction. Specifically, a male screw part and a female screw part are respectively provided in the divided bodies 2a and 2b, and these are screwed together. Therefore, when filling the crucible 2 with the vapor deposition material 1, the divided bodies 2 a and 2 b can be separated and the vapor deposition material 1 can be directly filled into the bottom of the crucible 2 without the opening 7.
なお、蒸着材料１は一般的には紛状体若しくは粒状体であり、実施例１においては、この蒸着材料１をルツボ２に充填した際の露出面（上端面）を充填面１ａとしている。
The vapor deposition material 1 is generally in the form of a powder or granule. In Example 1, the exposed surface (upper end surface) when the vapor deposition material 1 is filled in the crucible 2 is used as the filling surface 1a.
収納体４はステンレス製で上部が開口した筒状体であり、内側面にルツボ支持部６が突設されている。なお、ステンレス製に限らず、アルミニウム製としても良い。
The storage body 4 is a cylindrical body made of stainless steel and opened at the top, and a crucible support portion 6 projects from the inner surface. The material is not limited to stainless steel but may be aluminum.
ルツボ支持部６は角棒状で、ルツボ２の外側面に設けたルツボ受け部５を支持するものであり、セラミックス等の熱伝導率が低い材料で形成している。実施例１においては、ルツボ２の外側面にして蒸着材料１の充填面１ａよりも高くルツボ２の開口位置よりも低い位置に凹部を設け、これをルツボ受け部５としている。具体的には、上側の分割体２ｂの下端部に、ルツボ受け部５としての凹部を同一高さ位置に複数（図１，２では２つ）設け、夫々ルツボ支持部６で支持する構成としている。複数位置で支持する構成とすることで、より安定的にルツボ２を支持することができる。なお、ルツボ支持部６とルツボ受け部５とを一対だけ設け、ルツボ支持部６一箇所での片持ち支持構造としても、ルツボ２を支持する機能は最低限達成できる。
The crucible support portion 6 is in the shape of a square bar, supports the crucible receiving portion 5 provided on the outer surface of the crucible 2, and is formed of a material having low thermal conductivity such as ceramics. In Example 1, a concave portion is provided on the outer surface of the crucible 2 at a position higher than the filling surface 1 a of the vapor deposition material 1 and lower than the opening position of the crucible 2, and this is used as the crucible receiving portion 5. Specifically, a plurality of recesses (two in FIG. 1 and FIG. 2) are provided at the same height position at the lower end of the upper divided body 2 b and are supported by the crucible support portion 6. Yes. The crucible 2 can be supported more stably by adopting a configuration in which it is supported at a plurality of positions. Even if only one pair of the crucible support portion 6 and the crucible support portion 5 is provided and the cantilever support structure is provided at one place of the crucible support portion 6, the function of supporting the crucible 2 can be achieved at a minimum.
実施例１においては、ルツボ受け部５を設ける位置は、充填面１ａの上端とルツボ２の開口部７の下端との略中間位置として、蒸着材料１の蒸発量に及ぼす影響を可及的に小さくしつつ、ルツボ２の開口部７からルツボ受け部５及びルツボ支持部６を離して汚染され難くしている。
In the first embodiment, the position where the crucible receiving portion 5 is provided is a substantially intermediate position between the upper end of the filling surface 1a and the lower end of the opening 7 of the crucible 2, and influences the evaporation amount of the vapor deposition material 1 as much as possible. While making it small, the crucible receiving part 5 and the crucible support part 6 are separated from the opening 7 of the crucible 2 to make it difficult to be contaminated.
加熱部３としては、一般的なシースヒータを採用している。この加熱部３は、ルツボ２と収納体４との間に設けている。具体的には、ルツボ支持部６が通過する一部を除き、ルツボ２の側面及び底面を囲うように設けて、ルツボ受け部５及びルツボ支持部６が、加熱部３により加熱されるように構成している。従って、ルツボ受け部５及びルツボ支持部６も加熱部３により加熱されることで、ルツボ支持部６と接触することによるルツボ受け部５近傍の熱変動、即ち、ルツボ受け部５近傍の温度低下が抑制される。
As the heating unit 3, a general sheath heater is adopted. The heating unit 3 is provided between the crucible 2 and the storage body 4. Specifically, the crucible support part 6 is provided so as to surround the side surface and the bottom surface of the crucible 2 except for a part through which the crucible support part 6 passes, so that the crucible receiving part 5 and the crucible support part 6 are heated by the heating part 3. It is composed. Therefore, the crucible receiving part 5 and the crucible support part 6 are also heated by the heating part 3, so that the heat fluctuation in the vicinity of the crucible receiving part 5 due to contact with the crucible support part 6, that is, the temperature drop in the vicinity of the crucible receiving part 5. Is suppressed.
また、ルツボ受け部５とルツボ支持部６との接触点は、加熱部３の内面よりルツボ２側に設けられることになる。従って、ルツボ２は外部の熱変動をルツボ支持部６の接触を介して受けることになり、外部の熱変動の影響を受け難くなる。即ち、例えば、加熱部３より外側にルツボ受け部５とルツボ支持部６との接触点がある場合（ルツボ２の一部が加熱部３の外側に存在する場合）、ルツボ２の一部が加熱部３の外部の影響を受け、その熱変動はルツボ２の熱伝導でルツボ２内に伝わるため、熱変動の影響を受け易くなる。
Also, the contact point between the crucible receiving part 5 and the crucible support part 6 is provided on the crucible 2 side from the inner surface of the heating part 3. Therefore, the crucible 2 receives external heat fluctuations through the contact of the crucible support 6 and is hardly affected by external heat fluctuations. That is, for example, when there is a contact point between the crucible receiving part 5 and the crucible support part 6 outside the heating part 3 (when a part of the crucible 2 exists outside the heating part 3), a part of the crucible 2 is Under the influence of the outside of the heating unit 3, the heat fluctuation is transmitted to the crucible 2 by the heat conduction of the crucible 2, so that the heat fluctuation is easily affected.
なお、ルツボ受け部５及びルツボ支持部６の温度調節機構を備えた構成としても良く、この場合には、ルツボ受け部５近傍の熱変動が一層抑制される。
In addition, it is good also as a structure provided with the temperature control mechanism of the crucible receiving part 5 and the crucible support part 6, and the thermal fluctuation of the crucible receiving part 5 vicinity is further suppressed in this case.
また、ルツボ支持部６を前記加熱部３で構成しても良く、この場合も、ルツボ受け部５近傍の熱変動が一層抑制される。
Further, the crucible support part 6 may be constituted by the heating part 3, and in this case, the thermal fluctuation in the vicinity of the crucible receiving part 5 is further suppressed.
また、後述する実施例２のように、ルツボ２に突出部８を設ける構成としても良く、この場合も、ルツボ受け部５近傍の熱変動が一層抑制される。
Also, as in Example 2 described later, the crucible 2 may be provided with a protruding portion 8, and in this case as well, thermal fluctuations in the vicinity of the crucible receiving portion 5 are further suppressed.
また、収納体４と加熱部３との間に、加熱部３を囲むように熱反射部材（リフレクタ）を設ける構成としても良く、この場合には、一層良好に加熱部３によりルツボ２を加熱することが可能となる。
In addition, a heat reflecting member (reflector) may be provided between the housing 4 and the heating unit 3 so as to surround the heating unit 3. In this case, the crucible 2 is heated by the heating unit 3 more satisfactorily. It becomes possible to do.
従って、実施例１によれば、加熱部３によりルツボ２の温度分布を均一にしてルツボ２に充填される蒸着材料１の温度分布を均一にすることが可能となり、蒸着材料の蒸発量の安定化を図れることになる。
Therefore, according to the first embodiment, it is possible to make the temperature distribution of the crucible 2 uniform by the heating unit 3 to make the temperature distribution of the vapor deposition material 1 filled in the crucible 2 uniform, and stabilize the evaporation amount of the vapor deposition material. Can be achieved.
本発明の具体的な実施例２について図３～６に基づいて説明する。
Specific Example 2 of the present invention will be described with reference to FIGS.
実施例２は、図３，４に図示したように、上端面に開口部７を長手方向に沿って複数設けた、この開口部７の並設方向に長いルツボ２を備えた線形蒸発源である。
As shown in FIGS. 3 and 4, the second embodiment is a linear evaporation source including a plurality of openings 7 along the longitudinal direction on the upper end surface and having crucibles 2 that are long in the parallel direction of the openings 7. is there.
実施例２は、ルツボ２の外側面に収納体４の内側面に向かって突出する突出部８を設け、この突出部８にルツボ受け部５を設けている。具体的には、突出部８を所定間隔で複数設けている。
In Example 2, a protruding portion 8 that protrudes toward the inner surface of the housing 4 is provided on the outer surface of the crucible 2, and the crucible receiving portion 5 is provided on the protruding portion 8. Specifically, a plurality of protrusions 8 are provided at predetermined intervals.
また、実施例２においては、ルツボ２は、上下の分割体２ａ・２ｂを、その対向面を当接させた状態でボルト10及びナット11を用いて連結して構成している。具体的には、ボルト10を、突出部８に設けた挿通孔に挿通してナット11を螺合させることで分割体２ａ・２ｂを連結している。
Further, in the second embodiment, the crucible 2 is configured by connecting the upper and lower divided bodies 2a and 2b using bolts 10 and nuts 11 in a state where the opposed surfaces thereof are in contact with each other. Specifically, the divided bodies 2a and 2b are connected by inserting the bolt 10 through an insertion hole provided in the protruding portion 8 and screwing the nut 11 therethrough.
また、突出部８の突出端部にルツボ受け部５としての凹部を設けている。また、この凹部の幅（ルツボ支持部６との隙間）は、ルツボ２の熱による伸びを考慮してこの伸びを許容するように部位毎に適宜設定する。
Further, a concave portion as the crucible receiving portion 5 is provided at the protruding end portion of the protruding portion 8. Further, the width of the concave portion (the gap with the crucible support portion 6) is appropriately set for each part so as to allow the elongation in consideration of the elongation of the crucible 2 due to heat.
実施例２は、突出部８を設けることで、ルツボ２の蒸着材料１からより離れた位置にルツボ受け部５を設けることが可能となり、突出部８からルツボ支持部６への熱伝導による温度低下の影響を効果的に緩和することが可能となる。
In Example 2, by providing the protrusion 8, the crucible receiving part 5 can be provided at a position further away from the vapor deposition material 1 of the crucible 2, and the temperature due to heat conduction from the protrusion 8 to the crucible support part 6. It is possible to effectively mitigate the influence of the decrease.
また、加熱部３は、突出部８の上下面及び（ルツボ支持部６が通過する一部を除き）突出端面をも囲うように設けている。従って、突出部８を設けない場合に比し、ルツボ受け部５の加熱される表面積が広がり、この点からも、突出部８からルツボ支持部６への熱伝導による温度低下の影響を効果的に緩和することが可能となる。
Further, the heating unit 3 is provided so as to surround the upper and lower surfaces of the protruding portion 8 and the protruding end surface (except for a part through which the crucible support portion 6 passes). Accordingly, the surface area of the crucible receiving portion 5 to be heated is increased as compared with the case where the protruding portion 8 is not provided. Also from this point, the effect of the temperature drop due to the heat conduction from the protruding portion 8 to the crucible support portion 6 is effective. It becomes possible to relax.
従って、実施例２によれば、加熱部３によりルツボ２の温度分布を均一にしてルツボ２に充填される蒸着材料１の温度分布を均一にすることが可能となり、蒸着材料１の蒸発量がルツボ２内の位置によらず均一になるため、均一な膜厚分布で成膜することが可能となる。
Therefore, according to the second embodiment, the temperature distribution of the crucible 2 can be made uniform by the heating unit 3, and the temperature distribution of the vapor deposition material 1 filled in the crucible 2 can be made uniform. Since it becomes uniform regardless of the position in the crucible 2, it is possible to form a film with a uniform film thickness distribution.
なお、実施例２は上述のように突出部８を構成しているが、図５，６に図示した別例のように構成しても良い。即ち、突出部８をルツボ２の外側面に鍔状に周設する構成としても良い。図５，６中、符号12・13は、分割体２ａ・２ｂを連結したボルト10の頭部及び尾部並びにナット11を収納する収納凹部である。
In addition, although Example 2 has comprised the protrusion part 8 as mentioned above, you may comprise like another example illustrated in FIG. In other words, the protruding portion 8 may be provided in a bowl shape around the outer surface of the crucible 2. In FIGS. 5 and 6, reference numerals 12 and 13 are storage recesses for storing the head and tail of the bolt 10 connecting the divided bodies 2 a and 2 b and the nut 11.
また、この別例では、分割体２ａ・２ｂ同士の当接部である対向面間にシール部材９を設けて、蒸着材料１の漏れを一層良好に阻止できる構成としている。
Further, in this other example, the seal member 9 is provided between the opposing surfaces which are the contact portions between the divided bodies 2a and 2b, and the leakage of the vapor deposition material 1 can be further prevented.
その余は実施例１と同様である。
The rest is the same as in Example 1.
なお、本発明は、実施例１，２に限られるものではなく、各構成要件の具体的構成は適宜設計し得るものである。
Note that the present invention is not limited to the first and second embodiments, and the specific configuration of each component can be designed as appropriate.
Claims (10)
- 蒸着材料が充填されるルツボと、このルツボを囲うように設けられた加熱部と、前記ルツボ及び前記加熱部を収納配設する収納体とから成る蒸発源であって、前記ルツボの外側面にして前記蒸着材料の充填面よりも高くルツボの開口位置よりも低い位置にルツボ受け部を設け、前記収納体の内側に設けたルツボ支持部により前記ルツボ受け部を支持して、前記ルツボの外底面が前記収納体の内底面から離間した状態で前記ルツボを前記収納体に収納配設し得るように構成したことを特徴とする蒸発源。 An evaporation source comprising a crucible filled with a vapor deposition material, a heating unit provided so as to surround the crucible, and a storage body that stores and arranges the crucible and the heating unit, and is provided on an outer surface of the crucible. Providing a crucible receiving part at a position higher than the filling surface of the vapor deposition material and lower than the opening position of the crucible, and supporting the crucible receiving part by a crucible support part provided inside the housing, An evaporation source characterized in that the crucible can be housed and disposed in the housing body in a state where the bottom surface is separated from the inner bottom surface of the housing body.
- 前記ルツボ受け部と前記ルツボ支持部との接触点は、前記加熱部よりルツボ側に設けたことを特徴とする請求項１記載の蒸発源。 2. The evaporation source according to claim 1, wherein a contact point between the crucible receiving part and the crucible support part is provided closer to the crucible than the heating part.
- 蒸着材料が通過する開口部を長手方向に沿って複数設けたことを特徴とする請求項１，２のいずれか１項に記載の蒸発源。 The evaporation source according to claim 1, wherein a plurality of openings through which the vapor deposition material passes are provided along the longitudinal direction.
- 前記ルツボ受け部及び前記ルツボ支持部を夫々複数設けたことを特徴とする請求項１，２のいずれか１項に記載の蒸発源。 The evaporation source according to any one of claims 1 and 2, wherein a plurality of the crucible receiving portions and the crucible support portions are provided.
- 前記ルツボ受け部及び前記ルツボ支持部は、前記加熱部により加熱されるように構成したことを特徴とする請求項１，２のいずれか１項に記載の蒸発源。 The evaporation source according to any one of claims 1 and 2, wherein the crucible receiving part and the crucible support part are configured to be heated by the heating part.
- 前記ルツボの外側面に前記収納体の内側面に向かって突出する突出部を設け、この突出部に前記ルツボ受け部を設けたことを特徴とする請求項１，２のいずれか１項に記載の蒸発源。 The protrusion part which protrudes toward the inner surface of the said storage body was provided in the outer surface of the said crucible, and the said crucible receiving part was provided in this protrusion part, Either of Claim 1, 2 characterized by the above-mentioned. The source of evaporation.
- 前記ルツボは複数の分割体同士を互いに当接させて形成し、この分割体同士の当接部にシール部材を設けたことを特徴とする請求項１，２のいずれか１項に記載の蒸発源。 The evaporation according to claim 1, wherein the crucible is formed by bringing a plurality of divided bodies into contact with each other, and a seal member is provided at a contact portion between the divided bodies. source.
- 前記ルツボ受け部及び前記ルツボ支持部の温度調節機構を備えたことを特徴とする請求項１，２のいずれか１項に記載の蒸発源。 The evaporation source according to any one of claims 1 and 2, further comprising a temperature adjusting mechanism for the crucible receiving portion and the crucible support portion.
- 前記ルツボ支持部は前記加熱部であることを特徴とする請求項１，２のいずれか１項に記載の蒸発源。 The evaporation source according to any one of claims 1 and 2, wherein the crucible support part is the heating part.
- 前記収納体と前記加熱部との間に熱反射部材を設けたことを特徴とする請求項１，２のいずれか１項に記載の蒸発源。 The evaporation source according to any one of claims 1 and 2, wherein a heat reflecting member is provided between the storage body and the heating unit.
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201380044630.2A CN104603321B (en) | 2012-08-29 | 2013-08-09 | Evaporation source |
| KR1020157007556A KR102049629B1 (en) | 2012-08-29 | 2013-08-09 | Evaporation source |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2012188691A JP6049355B2 (en) | 2012-08-29 | 2012-08-29 | Evaporation source |
| JP2012-188691 | 2012-08-29 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| WO2014034410A1 true WO2014034410A1 (en) | 2014-03-06 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PCT/JP2013/071621 WO2014034410A1 (en) | 2012-08-29 | 2013-08-09 | Evaporation source |
Country Status (5)
| Country | Link |
|---|---|
| JP (1) | JP6049355B2 (en) |
| KR (1) | KR102049629B1 (en) |
| CN (1) | CN104603321B (en) |
| TW (1) | TWI589716B (en) |
| WO (1) | WO2014034410A1 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2016030839A (en) * | 2014-07-28 | 2016-03-07 | 株式会社Ｊｏｌｅｄ | Vapor deposition apparatus and vapor deposition source |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101528709B1 (en) * | 2014-09-30 | 2015-06-16 | 에스엔유 프리시젼 주식회사 | depositon crucible for improving evaporation uniformity |
| KR101615913B1 (en) * | 2014-11-12 | 2016-05-13 | 에스엔유 프리시젼 주식회사 | Depositing device for thin film |
| CN106893981B (en) * | 2017-03-30 | 2019-01-25 | 南京大学 | A kind of crucible for improving evaporation line stability and the source furnace with the crucible |
| US20200199737A1 (en) * | 2017-09-14 | 2020-06-25 | Alpha Plus Co., Ltd. | Vacuum evaporation source |
| CN107604318B (en) * | 2017-09-27 | 2019-10-15 | 京东方科技集团股份有限公司 | Crucible heating device |
| CN107805782B (en) * | 2017-11-27 | 2019-09-20 | 深圳市华星光电半导体显示技术有限公司 | A kind of evaporation coating device |
| CN107916401B (en) * | 2017-12-15 | 2023-09-22 | 合肥鑫晟光电科技有限公司 | Evaporation crucible and evaporation device |
| JP6526880B1 (en) * | 2018-06-29 | 2019-06-05 | キヤノントッキ株式会社 | Evaporation source and evaporation apparatus |
| WO2020230359A1 (en) * | 2019-05-13 | 2020-11-19 | 株式会社アルバック | Deposition unit, and vacuum deposition device provided with said deposition unit |
| JP7088891B2 (en) * | 2019-09-26 | 2022-06-21 | キヤノントッキ株式会社 | Evaporation source equipment and vapor deposition equipment |
| WO2021065081A1 (en) * | 2019-10-04 | 2021-04-08 | 株式会社アルバック | Evaporation source for vacuum evaporation systems |
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- 2013-08-09 CN CN201380044630.2A patent/CN104603321B/en active Active
- 2013-08-09 KR KR1020157007556A patent/KR102049629B1/en active IP Right Grant
- 2013-08-09 WO PCT/JP2013/071621 patent/WO2014034410A1/en active Application Filing
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| JPH07300666A (en) * | 1994-04-27 | 1995-11-14 | Nissin Electric Co Ltd | Production of molecular beam source for silicon evaporation and crucible used for the same |
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Also Published As
| Publication number | Publication date |
|---|---|
| CN104603321B (en) | 2016-10-26 |
| KR20150044961A (en) | 2015-04-27 |
| CN104603321A (en) | 2015-05-06 |
| TW201425613A (en) | 2014-07-01 |
| JP2014047365A (en) | 2014-03-17 |
| TWI589716B (en) | 2017-07-01 |
| KR102049629B1 (en) | 2019-11-28 |
| JP6049355B2 (en) | 2016-12-21 |
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