KR100809930B1 - 증착원 - Google Patents
증착원 Download PDFInfo
- Publication number
- KR100809930B1 KR100809930B1 KR1020060120867A KR20060120867A KR100809930B1 KR 100809930 B1 KR100809930 B1 KR 100809930B1 KR 1020060120867 A KR1020060120867 A KR 1020060120867A KR 20060120867 A KR20060120867 A KR 20060120867A KR 100809930 B1 KR100809930 B1 KR 100809930B1
- Authority
- KR
- South Korea
- Prior art keywords
- deposition
- cell
- wall member
- wall
- deposition material
- Prior art date
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Classifications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/12—Organic material
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
- H01L21/67207—Apparatus for manufacturing or treating in a plurality of work-stations comprising a chamber adapted to a particular process
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Metallurgy (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Chemistry (AREA)
- Mechanical Engineering (AREA)
- Materials Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Power Engineering (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Physical Vapour Deposition (AREA)
- Electroluminescent Light Sources (AREA)
Abstract
Description
Claims (5)
- 상단에는 셀 캡이 장착되어 있는 증착 셀; 및증착 셀의 외부에 설치된 가열 수단을 포함하되,상기 증착 셀은, 내부 공간을 형성하는 바닥 부재와 외벽 부재 및 상기 외벽 부재로부터 연장되어 내부 공간을 복수의 단위 공간들로 구분하는 내벽 부재를 포함하는 것을 특징으로 하는 증착원.
- 제 1 항에 있어서, 상기 내벽 부재들은 그 종단이 서로 연결되어 상기 단위 공간들은 독립적인 공간으로 이루어지는 것을 특징으로 하는 증착원.
- 제 2 항에 있어서, 상기 내벽 부재들은 방사형으로 연장되어 상기 단위 공간들이 방사형으로 배치되어 있는 것을 특징으로 하는 증착원.
- 제 1 항에 있어서, 상기 내벽 부재들은 그 종단이 이격되어 상기 단위 공간들이 서로 연결되어 있는 것을 특징으로 하는 증착원.
- 제 1 항 내지 제 4 항 중 어느 한 항에 있어서, 상기 내벽 부재는 그 높이가 외벽의 높이보다 낮은 것을 특징으로 하는 증착원.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020060120867A KR100809930B1 (ko) | 2006-12-01 | 2006-12-01 | 증착원 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020060120867A KR100809930B1 (ko) | 2006-12-01 | 2006-12-01 | 증착원 |
Publications (1)
Publication Number | Publication Date |
---|---|
KR100809930B1 true KR100809930B1 (ko) | 2008-03-06 |
Family
ID=39397618
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020060120867A KR100809930B1 (ko) | 2006-12-01 | 2006-12-01 | 증착원 |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR100809930B1 (ko) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN105603364A (zh) * | 2016-03-16 | 2016-05-25 | 深圳市华星光电技术有限公司 | 导热装置与蒸镀坩埚 |
CN105648404A (zh) * | 2016-03-21 | 2016-06-08 | 深圳市华星光电技术有限公司 | 蒸镀坩埚 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001011633A (ja) | 1999-06-28 | 2001-01-16 | Nippon Sanso Corp | 気化器 |
KR20010031111A (ko) * | 1997-10-14 | 2001-04-16 | 노르만 엘. 터너 | 기판 가열 및 냉각을 개선한 진공 프로세싱 시스템 |
KR20040034537A (ko) * | 2002-10-21 | 2004-04-28 | 도호꾸 파이오니어 가부시끼가이샤 | 진공 증착 장치 |
KR20050057359A (ko) * | 2002-09-20 | 2005-06-16 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 제조 시스템 및 발광장치 제작방법 |
-
2006
- 2006-12-01 KR KR1020060120867A patent/KR100809930B1/ko active IP Right Grant
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20010031111A (ko) * | 1997-10-14 | 2001-04-16 | 노르만 엘. 터너 | 기판 가열 및 냉각을 개선한 진공 프로세싱 시스템 |
JP2001011633A (ja) | 1999-06-28 | 2001-01-16 | Nippon Sanso Corp | 気化器 |
KR20050057359A (ko) * | 2002-09-20 | 2005-06-16 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 제조 시스템 및 발광장치 제작방법 |
KR20040034537A (ko) * | 2002-10-21 | 2004-04-28 | 도호꾸 파이오니어 가부시끼가이샤 | 진공 증착 장치 |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN105603364A (zh) * | 2016-03-16 | 2016-05-25 | 深圳市华星光电技术有限公司 | 导热装置与蒸镀坩埚 |
CN105648404A (zh) * | 2016-03-21 | 2016-06-08 | 深圳市华星光电技术有限公司 | 蒸镀坩埚 |
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