JP6045918B2 - 回路接続材料、回路接続部材の接続構造及び半導体装置 - Google Patents
回路接続材料、回路接続部材の接続構造及び半導体装置 Download PDFInfo
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Description
本発明の接着剤組成物は、熱可塑性樹脂、ラジカル重合性化合物、ラジカル重合開始剤、ニトロキシド化合物及び塩基性化合物を含有するものである。
次に、本発明の回路部材の接続構造の好適な実施形態について説明する。図1は、本発明の回路部材の接続構造の一実施形態を示す概略断面図である。図1に示すように、本実施形態の回路部材の接続構造1は、相互に対向する第1の回路部材20及び第2の回路部材30を備えており、第1の回路部材20と第2の回路部材30との間には、これらを電気的に接続する回路接続部材10が設けられている。第1の回路部材20は、第1の回路基板21と、回路基板21の主面21a上に形成される第1の回路電極22とを備えている。なお、回路基板21の主面21a上には、場合により絶縁層(図示せず)が形成されていてもよい。
次に、上述した回路部材の接続構造の製造方法について、その工程図である図2を参照にしつつ、説明する。
次に、本発明の半導体装置の実施形態について説明する。図3は、本発明の半導体装置の一実施形態を示す概略断面図である。図3に示すように、本実施形態の半導体装置2は、半導体素子50と、半導体の支持部材となる基板60とを備えており、半導体素子50及び基板60の間には、これらを電気的に接続する半導体素子接続部材80が設けられている。また、半導体素子接続部材80は基板60の主面60a上に積層され、半導体素子50は更にその半導体素子接続部材80上に積層されている。
次に、上述した半導体装置の製造方法について説明する。
フェノキシ樹脂(ユニオンカーバイド社製、商品名:PKHC、重量平均分子量45000)40質量部を、ガラス製の容器に収容したメチルエチルケトン(和光純薬工業社製、商品名:2−ブタノン、純度99%)60質量部に溶解して、固形分40質量%のフェノキシ樹脂溶液を調製した。
ポリブチレンアジペートジオール(Aldrich社製、重量平均分子量2000)450質量部、ポリオキシテトラメチレングリコール(Aldrich社製、重量平均分子量2000)450質量部及び1,4−ブチレングリコール(Aldrich社製)100質量部を、メチルエチルケトン(和光純薬工業(株)製、商品名:2−ブタノン、純度99%)4000質量部中に溶解した。そこにジフェニルメタンジイソシアネート(Aldrich社製)390質量部を加えて反応液を得た。次に、その反応液を70℃で60分間反応させて、ウレタン樹脂を得た。なお、このときの温度制御はオイルバス(アズワン(株)製、商品名:HOB−50D)を用いて行った。得られたウレタン樹脂の重量平均分子量をGPCによって測定したところ、35万であった。
イソシアヌル酸EO変性ジアクリレート(東亞合成(株)製、商品名:M−215)、ウレタンアクリレート(共栄社化学(株)製、商品名:AT−600)及び2−(メタ)アクリロイロキシエチルホスフェート(共栄社化学(株)製、商品名:P−2M)を準備した。
t−ヘキシルパーオキシ−2−エチルヘキサノエート(日本油脂(株)製、商品名:パーヘキシルO)を準備した。
4−ヒドロキシ−2,2,6,6−テトラメチルピペリジン−1−オキシル(TEMPOL、旭電化工業(株)製、商品名:LA7−RD)、4−アセトアミド−2,2,6,6−テトラメチルピペリジン−1−オキシル(TEMPOL−NHAc、東京化成工業(株)製)、2,2,6,6−テトラメチルピペリジン−1−オキシル(TEMPO、和光純薬工業(株)製)を準備した。
イミダゾール変性シランカップリング剤(日鉱マテリアル(株)製、商品名:IM−1000)、アミン化合物(旭電化(株)製、商品名:LA−87)及び1,2−ジメチルイミダゾールを準備した。
ポリスチレン粒子の表面上に、厚さ0.2μmになるようにニッケルからなる層を設け、更にこのニッケルからなる層の表面上に、厚さ0.02μmになるよう金からなる層を設けた。こうして平均粒径4μm及び比重2.5の導電性粒子を作製した。
上記フェノキシ樹脂溶液62.5質量部(フェノキシ樹脂を25質量部含有)に、上記ウレタン樹脂を固形分で25質量部、ラジカル重合性化合物として、M−215を25質量部、AT−600を25質量部及びP−2Mを5質量部、ラジカル重合開始剤としてパーヘキシルOを3質量部、ニトロキシド化合物としてTEMPOLを0.2質量部及び塩基性化合物としてIM−1000を1質量部配合した。得られた溶液に上述の導電性粒子を配合分散させて、接着剤組成物を得た。導電性粒子の配合割合は、接着剤組成物の全量に対して1.5体積%であった。
塩基性化合物として、IM−1000を1質量部配合することに代えてLA−87を1質量部配合した以外は実施例1と同様にして、フィルム状回路接続材を得た。
塩基性化合物として、IM−1000を1質量部配合することに代えて1,2−ジメチルイミダゾールを1質量部配合した以外は実施例1と同様にして、フィルム状回路接続材を得た。
ラジカル重合性化合物として、P−2Mを配合しない以外は実施例1と同様にして、フィルム状回路接続材を得た。
ニトロキシド化合物として、TEMPOL0.2質量部に代えてTEMPO0.5質量部を配合した以外は実施例1と同様にして、フィルム状回路接続材を得た。
ニトロキシド化合物として、TEMPOL0.2質量部に代えてTEMPOL−NHAc0.2質量部を配合した以外は実施例1と同様にして、フィルム状回路接続材を得た。
塩基性化合物として、IM−1000を1質量部配合することに代えて0.05質量部配合した以外は実施例1と同様にして、フィルム状回路接続材を得た。
塩基性化合物として、IM−1000を1質量部配合することに代えて2質量部配合した以外は実施例1と同様にして、フィルム状回路接続材を得た。
塩基性化合物であるIM−1000を配合しない以外は実施例1と同様にして、フィルム状回路接続材を得た。
ニトロキシド化合物であるTEMPOL及び塩基性化合物であるIM−1000を配合しない以外は実施例1と同様にして、フィルム状回路接続材を得た。
まず、ライン幅25μm、ピッチ50μm及び厚み18μmの銅回路配線を500本有するフレキシブル回路板(FPC基板)と、0.2μmの酸化インジウム(ITO)の薄層を全面に形成したガラス基板(ITO基板、厚み1.1mm、表面抵抗20Ω/□)とを準備した。次に、それらFPC基板とITO基板との間に、上述のようにして得られたフィルム状回路接続材を配置した。そして、熱圧着装置(加熱方式:コンスタントヒート型、東レエンジニアリング株式会社製)を用いて、所定の温度、3MPaの条件下、それらの積層方向に10秒間の加熱加圧を行った。こうして、幅2mmにわたりFPC基板とITO基板とを回路接続材料の硬化物により電気的に接続した回路部材の接続構造を作製した。なお、上記所定温度は、160℃、180℃及び200℃の3パターンを採用した。
また、得られたフィルム状回路接続材を真空包装材に収容し、40℃で5日間放置した後、上記と同様にして回路部材の接続構造を作製した。
得られた回路部材の接続構造における回路間の接続抵抗を、(1)接着直後、並びに、(2)接着後80℃、95%RHの高温高湿槽中で120時間耐湿試験を行った後、マルチメータ(アドバンテスト社製、商品名:TR6848)で測定した。なお、抵抗値は、隣接する回路間の抵抗150点の平均(x+3σ)で示した。結果を表3に示す。
得られた回路部材の接続構造における回路間の接着強度をJIS−Z0237に準じて90度剥離法で測定し評価した。ここで、接着強度の測定装置はテンシロンUTM−4(剥離速度50mm/min、25℃、東洋ボールドウィン社製)を使用した。結果を表4に示す。
得られたフィルム状回路接続材3.0±0.2mgを電子天秤((株)エー・アンド・デイ製、商品名:HR202)を用い秤量し測定試料とした。示差走査熱量測定(DSC)装置「DSC7」(PERKIN ELMER社製、商品名)を使用し、窒素気流下、測定温度範囲30℃〜250℃、昇温速度10℃/分で測定を行った。また、実施例1〜8及び比較例1、2のフィルム状回路接続材を真空包装材に収容し、40℃で3日及び5日間放置した後、同様の条件でDSC測定を行った。結果を表5に示す。
Claims (5)
- 対向する回路電極同士を電気的に接続するための回路接続材料であって、
熱可塑性樹脂、ラジカル重合性化合物、ラジカル重合開始剤、ニトロキシド化合物、酸性化合物及び塩基性化合物を含有し、前記熱可塑性樹脂100質量部に対して、前記ラジカル重合性化合物50〜250質量部、前記ラジカル重合開始剤0.05〜30質量部、前記ニトロキシド化合物0.01〜10質量部及び前記塩基性化合物0.5〜10質量部を含有し、
前記ラジカル重合性化合物が、(メタ)アクリロイル基を有し、
前記ニトロキシド化合物が、下記一般式(A)及び下記式(13)〜(16)で表される化合物から選ばれる1種又は2種以上の化合物であり、
[式(A)中、R 1 は、水素原子、水酸基、アミノ基、カルボキシル基、シアノ基、チオイソシアネート基、炭素数1〜10のアルキル基、アリール基、炭素数1〜20のアルコキシ基、エステル基、=O又はアミド基を示し、X 1 、X 2 、X 3 及びX 4 は、それぞれ独立に炭素数1〜5のアルキル基を示す。]
前記酸性化合物が、リン酸エステル誘導体を含み、前記リン酸エステル誘導体が、下記一般式(F)で表される化合物を含み、
[式(F)中、R 18 は水素原子又はメチル基を示し、nは1〜10の整数を示し、mは1又は2の整数を示す。]
前記塩基性化合物が、アミノ基、ピリジル基及びイミダゾイル基からなる群より選ばれる1種以上の官能基を有し、前記塩基性化合物の共役酸のpKaが5.0〜11.0である、接着剤組成物を含有する、回路接続材料。 - 前記塩基性化合物が、下記一般式(B)、(C)及び(D)で表される化合物から選ばれる1種又は2種以上の化合物である、請求項1に記載の回路接続材料。
[式(B)中、R2、R3及びR4は、それぞれ独立に、水素原子、炭素数1〜20のアルキル基、又は炭素数1〜8のシクロアルキル基を示す。]
[式(C)中、R5〜R9は、それぞれ独立に、水素原子、水酸基、アミノ基、シアノ基、アリール基、エステル基、アミド基、炭素数1〜20のアルキル基、炭素数1〜8のシクロアルキル基、又は炭素数1〜20のアルコキシ基を示す。]
[式(D)中、R10〜R12は、それぞれ独立に、水素原子、水酸基、アミノ基、シアノ基、アリール基、エステル基、アミド基、炭素数1〜20のアルキル基または、炭素数1〜8のシクロアルキル基、又は炭素数1〜20のアルコキシ基を示し、R13は、水素原子、アリール基、又は炭素数1〜20のアルキル基を示す。] - 前記接着剤組成物が導電性粒子を更に含有する、請求項1〜3のいずれか一項に記載の回路接続材料。
- 第1の回路基板の主面上に第1の回路電極が形成された第1の回路部材と、
第2の回路基板の主面上に第2の回路電極が形成された第2の回路部材と、
前記第1の回路基板の主面と前記第2の回路基板の主面との間に設けられ、前記第1の回路電極と前記第2の回路電極とを対向配置させた状態で電気的に接続する回路接続部材と、を備え、
前記回路接続部材は、請求項1〜4のいずれか一項に記載の回路接続材料の硬化物である回路部材の接続構造。
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US20080292801A1 (en) * | 2007-05-23 | 2008-11-27 | National Starch And Chemical Investment Holding Corporation | Corrosion-Preventive Adhesive Compositions |
EP2188622A2 (en) * | 2007-09-13 | 2010-05-26 | 3M Innovative Properties Company | Low temperature bonding electronic adhesives |
JP5816456B2 (ja) * | 2011-05-12 | 2015-11-18 | デクセリアルズ株式会社 | 異方性導電接続材料、フィルム積層体、接続方法及び接続構造体 |
WO2013035206A1 (ja) * | 2011-09-09 | 2013-03-14 | ヘンケル・アクチェンゲゼルシャフト・ウント・コムパニー・コマンディットゲゼルシャフト・アウフ・アクチェン | 電子装置用シール剤組成物 |
JP6374192B2 (ja) * | 2014-03-25 | 2018-08-15 | デクセリアルズ株式会社 | 異方性導電フィルム、接続方法、及び接合体 |
EP4092059A1 (en) * | 2021-05-21 | 2022-11-23 | 3M Innovative Properties Company | Curable precursor of an adhesive composition |
JP2024042257A (ja) * | 2022-09-15 | 2024-03-28 | 株式会社レゾナック | 接着剤組成物、接着剤フィルム、接続構造体及びその製造方法 |
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JPH0491109A (ja) * | 1990-08-07 | 1992-03-24 | Teijin Ltd | ビニルエステル系硬化樹脂の製造法及びそれに用いる硬化性組成物 |
JPH1135647A (ja) * | 1997-07-25 | 1999-02-09 | Hitachi Chem Co Ltd | 電子部品封止用成形材料、その成形方法、電子部品装置及びその製造方法 |
JP3375872B2 (ja) * | 1997-12-16 | 2003-02-10 | 株式会社日本触媒 | 硬化性樹脂組成物の製造方法 |
US6300533B1 (en) * | 1999-08-16 | 2001-10-09 | Uniroyal Chemical Company, Inc. | Inhibition of polymerization of ethylenically unsaturated monomers |
JP2001294557A (ja) * | 2000-02-10 | 2001-10-23 | Nippon Shokubai Co Ltd | α,β−不飽和カルボン酸エステル類の製法及び該製法に用いる触媒 |
JP4752107B2 (ja) * | 2000-11-29 | 2011-08-17 | 日立化成工業株式会社 | 回路接続用フィルム状接着剤、回路端子の接続構造および回路端子の接続方法 |
JP4788036B2 (ja) * | 2000-11-29 | 2011-10-05 | 日立化成工業株式会社 | 回路接続用フィルム状接着剤、回路端子の接続構造および回路端子の接続方法 |
JP4852785B2 (ja) * | 2000-11-29 | 2012-01-11 | 日立化成工業株式会社 | 回路接続用フィルム状接着剤、回路端子の接続構造および回路端子の接続方法 |
JP4736280B2 (ja) * | 2001-08-30 | 2011-07-27 | 日立化成工業株式会社 | 回路接続用接着剤及びそれを用いた回路接続構造体 |
JP3937299B2 (ja) * | 2001-11-28 | 2007-06-27 | 日立化成工業株式会社 | 支持体つき接着剤及びそれを用いた回路接続構造体 |
JP2003257247A (ja) * | 2002-02-28 | 2003-09-12 | Hitachi Chem Co Ltd | 回路接続用異方導電性接着剤組成物、それを用いた回路端子の接続方法及び回路端子の接続構造 |
KR100780136B1 (ko) * | 2002-11-29 | 2007-11-28 | 히다치 가세고교 가부시끼가이샤 | 접착제조성물 |
JP2004217781A (ja) * | 2003-01-15 | 2004-08-05 | Hitachi Chem Co Ltd | 回路接続用異方導電性接着剤組成物、それを用いた回路端子の接続方法及び回路端子の接続構造体 |
JP4720073B2 (ja) * | 2003-08-07 | 2011-07-13 | 日立化成工業株式会社 | 接着剤組成物、回路接続用接着剤組成物、接続体及び半導体装置 |
JP2005194393A (ja) * | 2004-01-07 | 2005-07-21 | Hitachi Chem Co Ltd | 回路接続用接着フィルム及び回路接続構造体 |
JP4380328B2 (ja) * | 2004-01-07 | 2009-12-09 | 日立化成工業株式会社 | 回路接続材料、これを用いたフィルム状回路接続材料、回路部材の接続構造及びその製造方法 |
JP4655488B2 (ja) * | 2004-02-16 | 2011-03-23 | 日立化成工業株式会社 | 回路接続材料及びそれを用いたフィルム状回路接続材料、並びに回路部材の接続構造及びその製造方法 |
KR101013260B1 (ko) * | 2004-06-09 | 2011-02-09 | 히다치 가세고교 가부시끼가이샤 | 회로접속재료 및 회로부재의 접속 구조 |
JP4760070B2 (ja) * | 2005-03-16 | 2011-08-31 | 日立化成工業株式会社 | 接着剤、回路接続用接着剤、接続体及び半導体装置 |
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- 2006-08-24 WO PCT/JP2006/316588 patent/WO2007046189A1/ja active Application Filing
- 2006-10-12 TW TW095137602A patent/TW200720394A/zh unknown
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JPWO2007046189A1 (ja) | 2009-04-23 |
JP2013076089A (ja) | 2013-04-25 |
TW200720394A (en) | 2007-06-01 |
KR20080068866A (ko) | 2008-07-24 |
KR101035810B1 (ko) | 2011-05-20 |
TWI338031B (ja) | 2011-03-01 |
WO2007046189A1 (ja) | 2007-04-26 |
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