JP6023347B2 - 熱アシスト磁気記録ヘッド、半導体レーザ素子及び半導体レーザ素子の製造方法 - Google Patents
熱アシスト磁気記録ヘッド、半導体レーザ素子及び半導体レーザ素子の製造方法 Download PDFInfo
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- G—PHYSICS
- G11—INFORMATION STORAGE
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- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/12—Heads, e.g. forming of the optical beam spot or modulation of the optical beam
- G11B7/125—Optical beam sources therefor, e.g. laser control circuitry specially adapted for optical storage devices; Modulators, e.g. means for controlling the size or intensity of optical spots or optical traces
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- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
- G11B5/3109—Details
- G11B5/313—Disposition of layers
- G11B5/3133—Disposition of layers including layers not usually being a part of the electromagnetic transducer structure and providing additional features, e.g. for improving heat radiation, reduction of power dissipation, adaptations for measurement or indication of gap depth or other properties of the structure
- G11B5/314—Disposition of layers including layers not usually being a part of the electromagnetic transducer structure and providing additional features, e.g. for improving heat radiation, reduction of power dissipation, adaptations for measurement or indication of gap depth or other properties of the structure where the layers are extra layers normally not provided in the transducing structure, e.g. optical layers
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- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/48—Disposition or mounting of heads or head supports relative to record carriers ; arrangements of heads, e.g. for scanning the record carrier to increase the relative speed
- G11B5/58—Disposition or mounting of heads or head supports relative to record carriers ; arrangements of heads, e.g. for scanning the record carrier to increase the relative speed with provision for moving the head for the purpose of maintaining alignment of the head relative to the record carrier during transducing operation, e.g. to compensate for surface irregularities of the latter or for track following
- G11B5/60—Fluid-dynamic spacing of heads from record-carriers
- G11B5/6005—Specially adapted for spacing from a rotating disc using a fluid cushion
- G11B5/6088—Optical waveguide in or on flying head
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- G11—INFORMATION STORAGE
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- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/12—Heads, e.g. forming of the optical beam spot or modulation of the optical beam
- G11B7/22—Apparatus or processes for the manufacture of optical heads, e.g. assembly
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- H—ELECTRICITY
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- H01S5/00—Semiconductor lasers
- H01S5/02—Structural details or components not essential to laser action
- H01S5/022—Mountings; Housings
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- H01S5/22—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
- H01S5/2202—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure by making a groove in the upper laser structure
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- H01S5/00—Semiconductor lasers
- H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
- H01S5/22—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
- H01S5/223—Buried stripe structure
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- H01S5/00—Semiconductor lasers
- H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
- H01S5/22—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
- H01S5/223—Buried stripe structure
- H01S5/2231—Buried stripe structure with inner confining structure only between the active layer and the upper electrode
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- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/30—Structure or shape of the active region; Materials used for the active region
- H01S5/32—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures
- H01S5/3211—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures characterised by special cladding layers, e.g. details on band-discontinuities
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- G—PHYSICS
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- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B2005/0002—Special dispositions or recording techniques
- G11B2005/0005—Arrangements, methods or circuits
- G11B2005/0021—Thermally assisted recording using an auxiliary energy source for heating the recording layer locally to assist the magnetization reversal
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- H01S2304/02—MBE
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- H01S2304/04—MOCVD or MOVPE
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- H01S5/00—Semiconductor lasers
- H01S5/02—Structural details or components not essential to laser action
- H01S5/022—Mountings; Housings
- H01S5/0225—Out-coupling of light
- H01S5/02251—Out-coupling of light using optical fibres
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- H01S5/00—Semiconductor lasers
- H01S5/04—Processes or apparatus for excitation, e.g. pumping, e.g. by electron beams
- H01S5/042—Electrical excitation ; Circuits therefor
- H01S5/0425—Electrodes, e.g. characterised by the structure
- H01S5/04256—Electrodes, e.g. characterised by the structure characterised by the configuration
- H01S5/04257—Electrodes, e.g. characterised by the structure characterised by the configuration having positive and negative electrodes on the same side of the substrate
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- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/16—Window-type lasers, i.e. with a region of non-absorbing material between the active region and the reflecting surface
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- H01S5/00—Semiconductor lasers
- H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
- H01S5/2004—Confining in the direction perpendicular to the layer structure
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- H01S5/00—Semiconductor lasers
- H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
- H01S5/2054—Methods of obtaining the confinement
- H01S5/2081—Methods of obtaining the confinement using special etching techniques
- H01S5/209—Methods of obtaining the confinement using special etching techniques special etch stop layers
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- H01S5/00—Semiconductor lasers
- H01S5/30—Structure or shape of the active region; Materials used for the active region
- H01S5/34—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers
- H01S5/343—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser
- H01S5/34313—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser with a well layer having only As as V-compound, e.g. AlGaAs, InGaAs
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- Optics & Photonics (AREA)
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- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Geometry (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Recording Or Reproducing By Magnetic Means (AREA)
- Magnetic Heads (AREA)
- Semiconductor Lasers (AREA)
Description
以下に図面を参照して本発明の実施形態を説明する。説明の便宜上、前述の図12、図13に示す従来例と同様の部分には同一の符号を付している。図1は第1実施形態の熱アシスト磁気記録ヘッドの正面図を示している。熱アシスト磁気記録ヘッド1はHDD装置等に搭載され、サスペンション(不図示)の支持によって磁気ディスクD上に軸方向移動可能に配置される。
次に、図10は第2実施形態の熱アシスト磁気記録ヘッド1の半導体レーザ素子40の斜視図を示している。説明の便宜上、前述の図2に示す第1実施形態と同様の部分には同一の符号を付している。本実施形態は保護壁53の形状が第1実施形態と異なっている。その他の部分は第1実施形態と同様である。
次に、図11は第3実施形態の熱アシスト磁気記録ヘッド1の半導体レーザ素子40の斜視図を示している。説明の便宜上、前述の図2に示す第1実施形態と同様の部分には同一の符号を付している。本実施形態は保護壁53の形状が第1実施形態と異なっている。その他の部分は第1実施形態と同様である。
第1実施形態の半導体レーザ素子40の半導体積層膜42は基板41側から順に積層したn型半導体層43、活性層44及びp型半導体層45により形成される。これに対して、本実施形態の半導体レーザ素子40は基板41側から順にp型半導体層45、活性層44及びn型半導体層43を積層して半導体積層膜42が形成される。これにより、第1実施形態と同様の効果を得ることができる。
第1実施形態の熱アシスト磁気記録ヘッド1の半導体レーザ素子40はストライプ状のリッジ部49を有するリッジ型に形成される。これに対して、本実施形態の半導体レーザ素子40はインナーストライプ型またはBH(Buried Heterostructure:埋め込みへテロ構造)型に形成される。この構造によっても第1実施形態と同様の効果を得ることができる。
10 スライダ
13 磁気記録部
14 磁気再生部
15 光導波路
19 接着剤
21 サブマウント
21a 前面
21b 垂直面
29 ロウ材
30、40 半導体レーザ素子
31、41 基板
32、42 半導体積層膜
36、46 光導波路
36a、46a 出射部
43 n型半導体層
44 活性層
45 p型半導体層
47 第1電極
48 第2電極
49 リッジ部
50 埋め込み層
51 凹部
52 発光部
53 保護壁
54 分離溝
61 第1金属膜
62 第2金属膜
D 磁気ディスク
Claims (3)
- 半導体から成る基板と、前記基板を下地としてエピタキシャル成長により第1導電型半導体層と活性層と第2導電型半導体層とを順に積層した半導体積層膜を有するとともにストライプ状の光導波路を前記活性層により形成する発光部と、前記発光部に隣接して前記半導体積層膜により形成されるとともに前記基板または第1導電型半導体層を底面とする凹部を囲む環状の保護壁と、前記凹部の底面上に配される第1電極と、前記発光部の上面に配される第2電極とを備え、前記保護壁が前記発光部に面した一方を開放されることを特徴とする半導体レーザ素子。
- 前記発光部と前記保護壁とが前記基板または第1導電型半導体層を底面とする分離溝により分離されることを特徴とする請求項1に記載の半導体レーザ素子。
- 請求項1または請求項2に記載の半導体レーザ素子と、磁気記録を行うスライダとを備え、前記基板の前記光導波路に直交した端面を前記スライダに接着したことを特徴とする熱アシスト磁気記録ヘッド。
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JP2013216593 | 2013-10-17 | ||
JP2013216593 | 2013-10-17 | ||
PCT/JP2014/073048 WO2015056489A1 (ja) | 2013-10-17 | 2014-09-02 | 熱アシスト磁気記録ヘッド、半導体レーザ素子及び半導体レーザ素子の製造方法 |
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JP6023347B2 true JP6023347B2 (ja) | 2016-11-09 |
JPWO2015056489A1 JPWO2015056489A1 (ja) | 2017-03-09 |
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US (1) | US20160300592A1 (ja) |
JP (1) | JP6023347B2 (ja) |
CN (1) | CN104854765B (ja) |
WO (1) | WO2015056489A1 (ja) |
Cited By (1)
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JPWO2015075988A1 (ja) * | 2013-11-21 | 2017-03-16 | シャープ株式会社 | 半導体レーザ素子を用いた近接場光出射装置 |
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US9754617B2 (en) * | 2015-02-23 | 2017-09-05 | Seagate Technology Llc | Laser diode unit with enhanced thermal conduction to slider |
DE102015116970A1 (de) | 2015-10-06 | 2017-04-06 | Osram Opto Semiconductors Gmbh | Halbleiterlaser und Verfahren zur Herstellung eines Halbleiterlasers |
DE102017118477A1 (de) | 2017-08-14 | 2019-02-14 | Osram Opto Semiconductors Gmbh | Halbleiterlaserdiode |
US10332553B1 (en) * | 2017-12-29 | 2019-06-25 | Headway Technologies, Inc. | Double ridge near-field transducers |
CN114336268B (zh) * | 2022-03-04 | 2022-05-31 | 苏州长光华芯光电技术股份有限公司 | 一种高可靠性低缺陷半导体发光器件及其制备方法 |
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JP2003243773A (ja) * | 2003-03-04 | 2003-08-29 | Sony Corp | 半導体発光素子の製造方法および半導体発光素子 |
JP2005142546A (ja) * | 2003-10-14 | 2005-06-02 | Nichia Chem Ind Ltd | 半導体レーザ素子 |
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DE3605925C2 (de) * | 1986-02-25 | 1997-09-18 | Sel Alcatel Ag | Halbleiterlaser und Verfahren zu seiner Herstellung |
JPH0632345B2 (ja) * | 1987-06-30 | 1994-04-27 | 株式会社フジクラ | 分布反射型半導体レ−ザ |
JPH08264875A (ja) * | 1995-03-20 | 1996-10-11 | Hitachi Ltd | 半導体レーザ素子 |
JP2001102678A (ja) * | 1999-09-29 | 2001-04-13 | Toshiba Corp | 窒化ガリウム系化合物半導体素子 |
JP2003045004A (ja) * | 2001-07-27 | 2003-02-14 | Fuji Xerox Co Ltd | 光アシスト磁気ヘッド及び光アシスト磁気ディスク装置 |
JP3804485B2 (ja) * | 2001-08-02 | 2006-08-02 | ソニー株式会社 | 半導体レーザー素子の製造方法 |
JP3878868B2 (ja) * | 2002-03-01 | 2007-02-07 | シャープ株式会社 | GaN系レーザ素子 |
JP2004118918A (ja) * | 2002-09-25 | 2004-04-15 | Fuji Xerox Co Ltd | 光ヘッドおよびその製造方法 |
JP4635607B2 (ja) * | 2004-12-28 | 2011-02-23 | Tdk株式会社 | 熱アシスト磁気記録ヘッド及び熱アシスト磁気記録装置 |
US8406091B2 (en) * | 2010-07-08 | 2013-03-26 | Tdk Corporation | Thermal assisted magnetic recording head having integral mounted of photo-detector and laser diode |
WO2012014594A1 (ja) * | 2010-07-30 | 2012-02-02 | コニカミノルタオプト株式会社 | 光学素子、製造方法、光アシスト磁気記録ヘッド、及び磁気記録装置 |
JP2014192475A (ja) * | 2013-03-28 | 2014-10-06 | Japan Oclaro Inc | 窒化物光半導体素子及び光半導体装置 |
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2014
- 2014-09-02 US US14/778,538 patent/US20160300592A1/en not_active Abandoned
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Patent Citations (2)
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JP2003243773A (ja) * | 2003-03-04 | 2003-08-29 | Sony Corp | 半導体発光素子の製造方法および半導体発光素子 |
JP2005142546A (ja) * | 2003-10-14 | 2005-06-02 | Nichia Chem Ind Ltd | 半導体レーザ素子 |
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JPWO2015075988A1 (ja) * | 2013-11-21 | 2017-03-16 | シャープ株式会社 | 半導体レーザ素子を用いた近接場光出射装置 |
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CN104854765A (zh) | 2015-08-19 |
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US20160300592A1 (en) | 2016-10-13 |
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