JP6017933B2 - 複合体及びその製造方法 - Google Patents
複合体及びその製造方法 Download PDFInfo
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- JP6017933B2 JP6017933B2 JP2012254367A JP2012254367A JP6017933B2 JP 6017933 B2 JP6017933 B2 JP 6017933B2 JP 2012254367 A JP2012254367 A JP 2012254367A JP 2012254367 A JP2012254367 A JP 2012254367A JP 6017933 B2 JP6017933 B2 JP 6017933B2
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- CIHOLLKRGTVIJN-UHFFFAOYSA-N tert‐butyl hydroperoxide Chemical compound CC(C)(C)OO CIHOLLKRGTVIJN-UHFFFAOYSA-N 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 229920005992 thermoplastic resin Polymers 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 125000000725 trifluoropropyl group Chemical group [H]C([H])(*)C([H])([H])C(F)(F)F 0.000 description 1
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- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
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- PAPBSGBWRJIAAV-UHFFFAOYSA-N ε-Caprolactone Chemical compound O=C1CCCCCO1 PAPBSGBWRJIAAV-UHFFFAOYSA-N 0.000 description 1
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Landscapes
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Description
特許文献1には、シリコーン系プライマーを塗布したポリエステルフィルムと該プライマーを塗布していないポリエステルフィルムの間に未架橋のシリコーンゴム層を形成し、これにγ線を照射してシリコーンゴム層を架橋させてなるシリコーンゴム複合体が提案されている。
また、上記以外の特許文献として、下記特許文献4〜9が挙げられる。
これらの文献には、有機樹脂及びシリコーンの接着性向上について提案されているが、シリコーン変性樹脂の接着性向上については何の提案もない。
前記第1の基材の接合する面、又は前記第1の基材及び前記第2の基材の接合する面は紫外線照射処理、コロナ処理、プラズマ処理のいずれか1以上の処理を施したものであることを特徴とする複合体を提供する。
R1 aR2 bSiO4−a−b/4 (i)
(式中、R1は水素原子、又は一価炭化水素基を示し、R2は前記樹脂骨格に結合する単結合、又は窒素、酸素、硫黄原子を含んでもよい2価の炭化水素連結基を示し、a、bはそれぞれ、0<a≦3、0<b≦1、かつ0<a+b<4を満たす数である。)
前記第1の基材の接合する面、又は前記第1の基材及び前記第2の基材の接合する面に、紫外線照射処理、コロナ処理、プラズマ処理のいずれか1以上の処理を施す接合面処理工程を有し、その後前記第1の基材及び前記第2の基材を接合する接合工程を有することを特徴とする複合体の製造方法を提供する。
R1 aR2 bSiO4−a−b/4 (i)
(式中、R1は水素原子、又は一価炭化水素基を示し、R2は前記樹脂骨格に結合する単結合、又は窒素、酸素、硫黄原子を含んでもよい2価の炭化水素連結基を示し、a、bはそれぞれ、0<a≦3、0<b≦1、かつ0<a+b<4を満たす数である。)
R1 aR2 bSiO4−a−b/4 (i)
(式中、R1は水素原子、又は一価炭化水素基を示し、R2は前記樹脂骨格に結合する単結合、又は窒素、酸素、硫黄原子を含んでもよい2価の炭化水素連結基を示し、a、bはそれぞれ、0<a≦3、0<b≦1、かつ0<a+b<4を満たす数である。)
ウシオ電機株式会社製SUS05装置を用い、第1の基材表面を、紫外線照度10mW/cm2、照射時間10秒、紫外線の積算光度100mJ/cm 2 で処理を行った。
コロナ処理装置(高周波電源;春日電機社製CT−0212、発信機本体;春日電機社製CT−0212、高圧トランス;春日電機社製CT−T022)を用い、基材表面とコロナ処理装置の電極との距離が3mmとなるように調整し、出力280W、ラインスピード1.0m/min、周囲温度23℃、周囲相対湿度55%RHの条件で、連続して3回行なった。
神港精機株式会社製プラズマ発生装置を用い、4Pa減圧下、メタン2ml/分、酸素1ml/分の処理ガスを流しながら10分間処理を行った。
上記各処理を行った後、5分以内に第2の基材と1kg重/10cm2の加重で圧着させ100℃で1時間エージングした。
接合体を指でつまみ両方向に引っ張った際、接合面で剥がれず第1の基材及び第2の基材いずれかの基材が破れた場合を○、接合面の一部が剥がれた場合を△、接合面で剥がれた場合を×とした。
平均分子量3200のアルコール変性シロキサンオイル(KF−6002;信越化学工業社製)とε−カプロラクトンを共重合して得られる平均分子量5200でシロキサン成分60質量%のエステル変性ポリシロキサンポリオール1000質量部と、平均分子量1700のポリテトラメチレンエーテルグリコール1080質量部に、1,4−ブタンジオール324質量部及び4,4’−ジフェニルメタンジイソシアネート1160質量部を100℃で反応させてシリコーン変性熱可塑性ポリウレタン樹脂(SxTPU)を得た。得られたSxTPU中のシロキサン変性量は17質量%であった。
温度計、撹拌機、還流冷却器付き反応器に亜ニチオン酸ナトリウム7.6質量部を含む6質量%水酸化ナトリウム水溶液29700質量部に、ビスフェノールA3897質量部を溶解させたのち、塩化メチレン11Lを加え、撹拌下22〜30℃でホスゲン1900質量部を60分要して吹き込み、得られたポリカーボネートオリゴマー溶液に7質量%水酸化ナトリウム水溶液7836質量部、p−tert−ブチルフェノール108質量部を加え、攪拌しながらオイゲノールを両末端Si−H基を有するシロキサンにヒドロシリレーション反応することで得られた両末端フェノール基含有シロキサン(重合度40)210重量部を加えて乳化状態とした後、再度撹拌した。かかる攪拌下、反応液が26℃の状態でトリエチルアミン6mlを加えて温度26〜31℃において1時間撹拌を続けて反応を終了した。反応終了後有機相を単離し、塩酸水で洗浄後、純水で洗浄を行い、水相の導電率が純水と同等になったところで塩化メチレン溶液を濃縮・粉砕し減圧下で乾燥し、シロキサン変性量5質量%のシロキサン・ポリカーボネート共重合体(SxPC)を得た。
反応器にトルエン250mlを80℃に加温し、片末端メタクリルシロキサン(信越化学工業(株)製X−22−176DX)50質量%、メチルメタクリレート36質量%、ブチルメタクリレート7質量%、2−エチルヘキシルアクリレート7質量%の混合物(合計300g)とベンゾイルパーオキサイド3gをトルエン50mlに希釈した液を同時に2時間かけて滴下し、更に5時間かけて熟成しシリコーングラフトアクリル共重合体のトルエン溶液を得た。これを100℃減圧下でトルエンを除去し冷却粉砕することによりシロキサン50質量%のシリコーングラフトアクリル共重合体粉末(SxアクリルI)を得た。
反応器に、4,4’−ヘキサフルオロプロピリデンビスフタル酸二無水物44.4g(0.1モル)、及びn−メチル−2−ピロリドン400gを仕込んだ。次いで、下記式(ii)で表されるジアミノシロキサン(信越化学工業(株)製X−22−9496)90.9g(0.075モル)及び2,2−ビス[4−(4−アミノフェノキシ)フェニル]プロパン10.3g(0.025モル)をn−メチル−2−ピロリドン100gに溶解した溶液を、反応系の温度が50℃を超えないように調節しながら、上記フラスコ内に滴下した。滴下終了後、さらに室温で10時間攪拌した。次に、該フラスコに水分受容器付き還流冷却器を取り付けた後、キシレン30gを加え、150℃に昇温させてその温度を6時間保持し得られた溶液を室温まで冷却した後、メタノール再沈澱させた。得られた沈降物を乾燥し、下記式(iii)で示される繰り返し単位を有するシリコーン・ポリイミド共重合体(SxPI)を得た。
反応容器中に、オイゲノールを両末端Si−H基を有するシロキサンにヒドロシリレーション反応することで得られた両末端フェノール基含有シロキサン(重合度40)0.982kg(0.3モル)、ビスフェノールAを0.0799kg(0.35モル)、テトラブロモビスフェノールAを0.0381kg(0.07モル)、p−tert−ブチルフェノール7.65g(0.05モル)、水酸化ナトリウム68.4g(1.71モル)、重合触媒としてベンジル−トリ−n−ブチルアンモニウムクロライド1.53g、ハイドロサルファイトナトリウム1.18gを注入し、さらに反応容器中に水5.90Lを注入して溶解し、水相とした。さらに、別の反応容器中で、ジクロロメタン3.47Lに、イソフタル酸クロライドとテレフタル酸クロライドの等量混合物であるフタル酸クロライド(モル比=50:50)152.6g(0.75モル)を溶解し、有機相とした。この有機相を、既に攪拌している水相溶液中に強攪拌下で添加し、温度を15℃に保って2時間重合反応を行った。この後、攪拌を停止し、デカンテーションにより水相と有機相を分離した。水相を除去した有機相に、純水12Lと酢酸1mLを添加して反応を停止し、さらに15℃で30分間攪拌した。この有機相を純水で5回洗浄し、有機相をヘキサンで再沈殿させた。沈殿したポリマーを有機相から分離し、次いで1日間乾燥させ、ポリアリレート樹脂(A−1)を得た。
オープン容器にオクタメチルシクロテトラシロキサン1,500質量部、メタクリロキシプロピルメチルシロキサン3.8質量部、イオン交換水1,500質量部を混合し、これにラウリル硫酸ナトリウム15質量部、ドデシルベンゼンスルホン酸10質量部を添加してからホモミキサーで攪拌して乳化した後、圧力3,000barのホモジナイザーに2回通して安定なエマルジョンを調製した。次いで、これをフラスコに仕込み、70℃で12時間加熱し、25℃まで冷却して24時間熟成した後、炭酸ナトリウムでエマルジョンのpHを7に調節し、4時間窒素ガスを吹き込んでから水蒸気蒸留して揮発性のシロキサンを留去し、次に、イオン交換水を加えて不揮発分を45質量%に調節した。攪拌機、コンデンサー、温度計および窒素ガス導入口を備えた2Lの三ッ口フラスコに、上記で得たエマルジョン333質量部(シロキサン分150質量部)とイオン交換水517質量部を仕込み、窒素ガス気流下に器内を30℃に調節した後、t−ブチルヒドロパーオキサイド1.0質量部、L−アスコルビン酸0.5質量部、硫酸第一鉄7水和物0.002質量部を加え、次いで、器内温を30℃に保ちながら、ブチルアクリレート350質量部を3時間かけて滴下した。滴下終了後、更に、1時間攪拌を続けて反応を完結させた。得られた共重合エマルジョンの固形分濃度は41.3質量%であった。上記のエマルジョン1000質量部を攪拌機付きの容器に仕込み、80℃に加熱し、ここに硫酸ナトリウム92質量部を純水563質量部に溶解した溶液を加えてアクリル変性ポリオルガノシロキサンを析出させ、濾過、水洗、脱水を繰り返してから60℃で乾燥し、シロキサン変性量70質量%のアクリル変性オルガノポリノシロキサン(SxアクリルII)を得た。
反応器にトルエン300ml、アリル基含有エポキシ樹脂187g、両末端ハイドロジェンシロキサン(重合度100)150g、触媒としてジビニルテトラメチルジシロキサン配位白金触媒の1%トルエン溶液2gを添加し100℃にて2時間反応させた後、トルエンを減圧条件下で留去しシロキサン変性量44.5質量%のシリコーン変性エポキシ樹脂液体(Sxエポキシ樹脂)を得た。
表1〜5中、以下の左列の略称は右列のものを示すこととする。
非シリコーンPC;住友ダウ社製カリバーTM200−30
TPU;BASF社製エラストランC95A
アクリル樹脂;三菱レイヨン製アクリペットMD
PI;三井化学社製AURUM−PL450C
PET;帝人デュポンフィルム社製テイジンテトロンフィルムG2
塩化ビニル樹脂;日信化学工業社製ビニブラン240
アクリル板;三菱レイヨン製アクリライトEX
第1の基材の接合面に対して紫外線照射処理、コロナ処理、プラズマ処理のいずれかの処理を施した実施例1−1〜3と処理を施さなかった比較例1の接合度合いを調べた。その結果を表1に示す。
表2に記載の第1の基材と第2の基材を加熱プレス機にて平板の複合体とした。なお、比較例2ではシリコーン変性樹脂を含まない樹脂成形物及び基板を用いて複合体を作製した。これら複合体を用いて第1の基材の違いによる接合度合いの違いを調べた。その結果を表2に示す。
表3に記載のように、第1の基材として二つの材料を質量比1/1の割合でブレンドし、東洋精機株式会社製ラボプラストミルで溶融混練後、加熱プレス機にて平版の複合体とした。これら複合体を用いて第1の基材の2種類の樹脂のブレンドの違いによる接合度合いの違いを調べた。その結果を表3に示す。
表4に記載のように、第1の基材として二つの材料を質量比1/1の割合でブレンドし、東洋精機株式会社製ラボプラストミルで溶融混練後、加熱プレス機にて平板の複合体とした。これら複合体を用いて第2の基材の違いによる接合度合いの違いを調べた。その結果を表4に示す。
表5に記載のように、第1の基材として二つの材料を質量比1/1の割合でブレンドし、東洋精機株式会社製ラボプラストミルで溶融混練後、加熱プレス機にて平板の複合体とした。これら複合体を用いて接合面処理工程から接合工程までの時間の違いによる接合度合いの違いを調べた。その結果を表5に示す。
Claims (7)
- シリコーン変性樹脂を含有する樹脂成形物からなる第1の基材と、第2の基材とを接合した複合体であって、
前記第1の基材のシリコーン変性樹脂は、ポリカーボネート樹脂をシリコーン変性したものであり、
前記第1の基材の接合する面、又は前記第1の基材及び前記第2の基材の接合する面は紫外線照射処理を施したものであることを特徴とする複合体。 - 前記第2の基材は、樹脂成形物、塗料樹脂硬化物、ガラス、又は金属であり、
該第2の基材の樹脂成形物又は塗料樹脂硬化物は、ポリエチレン樹脂、ポリプロピレン樹脂、ポリスチレン樹脂、アクリル樹脂、ポリカーボネート樹脂、熱可塑性ウレタン樹脂、PBT樹脂、PET樹脂、ポリイミド樹脂、ポリアミドイミド樹脂、及びこれら樹脂のシリコーン変性樹脂のいずれか1種類以上からなるものであることを特徴とする請求項1に記載の複合体。 - 前記シリコーン変性樹脂は、変性される樹脂骨格に下記平均組成式(i)で示されるシリコーン骨格がブロック型或いはグラフト型で結合したものであることを特徴とする請求項1又は請求項2に記載の複合体。
R1 aR2 bSiO4−a−b/4 (i)
(式中、R1は水素原子、又は一価炭化水素基を示し、R2は前記樹脂骨格に結合する単結合、又は窒素、酸素、硫黄原子を含んでもよい2価の炭化水素連結基を示し、a、bはそれぞれ、0<a≦3、0<b≦1、かつ0<a+b<4を満たす数である。) - 前記第1の基材に含まれるシリコーン変性量が0.001〜10質量%であることを特徴とする請求項1乃至請求項3のいずれか1項に記載の複合体。
- 前記紫外線照射処理された接合面は、波長172nm又は126nmの紫外線で照射処理を施したものであることを特徴とする請求項1乃至請求項4のいずれか1項に記載の複合体。
- 前記複合体は、表示媒体用、車載用ガラス代替材料用、又は建築用ガラス代替材料用であることを特徴とする請求項1乃至請求項5のいずれか1項に記載の複合体。
- シリコーン変性樹脂を含有する樹脂成形物からなる第1の基材と、第2の基材とを接合して複合体を製造する方法であって、
前記第1の基材のシリコーン変性樹脂を、ポリカーボネート樹脂をシリコーン変性したものとし、
前記第1の基材の接合する面、又は前記第1の基材及び前記第2の基材の接合する面に、紫外線照射処理を施す接合面処理工程を有し、その後前記第1の基材及び前記第2の基材を接合する接合工程を有することを特徴とする複合体の製造方法。
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