JP5236632B2 - 延性複数層シリコーン樹脂フィルム - Google Patents
延性複数層シリコーン樹脂フィルム Download PDFInfo
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- JP5236632B2 JP5236632B2 JP2009514325A JP2009514325A JP5236632B2 JP 5236632 B2 JP5236632 B2 JP 5236632B2 JP 2009514325 A JP2009514325 A JP 2009514325A JP 2009514325 A JP2009514325 A JP 2009514325A JP 5236632 B2 JP5236632 B2 JP 5236632B2
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- Japan
- Prior art keywords
- silicone resin
- silicone
- sio
- layer
- silicon
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 229920002050 silicone resin Polymers 0.000 title claims description 347
- 229920005989 resin Polymers 0.000 claims description 84
- 239000011347 resin Substances 0.000 claims description 84
- 229920002379 silicone rubber Polymers 0.000 claims description 71
- 229920001296 polysiloxane Polymers 0.000 claims description 67
- 239000004945 silicone rubber Substances 0.000 claims description 56
- 238000000034 method Methods 0.000 claims description 49
- 229920000642 polymer Polymers 0.000 claims description 42
- 230000007704 transition Effects 0.000 claims description 33
- 229920001971 elastomer Polymers 0.000 claims description 14
- 239000005060 rubber Substances 0.000 claims description 14
- 239000002245 particle Substances 0.000 claims description 9
- 229920000620 organic polymer Polymers 0.000 claims description 5
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 claims description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 3
- 239000001301 oxygen Substances 0.000 claims description 3
- 229910052760 oxygen Inorganic materials 0.000 claims description 3
- 239000004568 cement Substances 0.000 claims 1
- 239000010410 layer Substances 0.000 description 187
- 239000000203 mixture Substances 0.000 description 88
- 239000003054 catalyst Substances 0.000 description 77
- 125000003342 alkenyl group Chemical group 0.000 description 70
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 60
- 239000010408 film Substances 0.000 description 54
- 238000006459 hydrosilylation reaction Methods 0.000 description 53
- 150000003961 organosilicon compounds Chemical class 0.000 description 40
- -1 siloxane units Chemical group 0.000 description 40
- 125000001183 hydrocarbyl group Chemical class 0.000 description 37
- 239000003960 organic solvent Substances 0.000 description 35
- 229910004283 SiO 4 Inorganic materials 0.000 description 27
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 27
- 239000011342 resin composition Substances 0.000 description 27
- 229910004298 SiO 2 Inorganic materials 0.000 description 26
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 24
- 125000005375 organosiloxane group Chemical group 0.000 description 24
- 229910052751 metal Inorganic materials 0.000 description 23
- 239000002184 metal Substances 0.000 description 23
- 238000009833 condensation Methods 0.000 description 22
- 230000005494 condensation Effects 0.000 description 22
- 125000001931 aliphatic group Chemical group 0.000 description 19
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 19
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 18
- 238000001723 curing Methods 0.000 description 17
- 229920006136 organohydrogenpolysiloxane Polymers 0.000 description 17
- 125000006657 (C1-C10) hydrocarbyl group Chemical group 0.000 description 16
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 16
- 238000006243 chemical reaction Methods 0.000 description 16
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 13
- 229920005573 silicon-containing polymer Polymers 0.000 description 13
- 150000001875 compounds Chemical class 0.000 description 12
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 12
- 238000000429 assembly Methods 0.000 description 11
- 230000000712 assembly Effects 0.000 description 11
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 10
- 229910052739 hydrogen Inorganic materials 0.000 description 10
- 239000011541 reaction mixture Substances 0.000 description 10
- 238000000151 deposition Methods 0.000 description 9
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 9
- 229920002554 vinyl polymer Polymers 0.000 description 9
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 8
- 230000008901 benefit Effects 0.000 description 8
- 125000004432 carbon atom Chemical group C* 0.000 description 8
- 239000007795 chemical reaction product Substances 0.000 description 8
- 239000002243 precursor Substances 0.000 description 8
- 239000004971 Cross linker Substances 0.000 description 7
- 238000000576 coating method Methods 0.000 description 7
- 239000001257 hydrogen Substances 0.000 description 7
- 239000000463 material Substances 0.000 description 7
- 150000001282 organosilanes Chemical class 0.000 description 7
- 230000035484 reaction time Effects 0.000 description 7
- 229910000077 silane Inorganic materials 0.000 description 7
- 229910052710 silicon Inorganic materials 0.000 description 7
- 239000010703 silicon Substances 0.000 description 7
- 229910001220 stainless steel Inorganic materials 0.000 description 7
- 239000010935 stainless steel Substances 0.000 description 7
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 6
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 6
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 6
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 6
- 239000002253 acid Substances 0.000 description 6
- 230000003197 catalytic effect Effects 0.000 description 6
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical compound [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 description 6
- 229920000548 poly(silane) polymer Polymers 0.000 description 6
- 239000000047 product Substances 0.000 description 6
- 150000004756 silanes Chemical class 0.000 description 6
- 238000004528 spin coating Methods 0.000 description 6
- 239000000758 substrate Substances 0.000 description 6
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 5
- 238000007598 dipping method Methods 0.000 description 5
- 238000005227 gel permeation chromatography Methods 0.000 description 5
- 238000006460 hydrolysis reaction Methods 0.000 description 5
- 239000005046 Chlorosilane Substances 0.000 description 4
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 4
- 238000007259 addition reaction Methods 0.000 description 4
- 230000001680 brushing effect Effects 0.000 description 4
- KOPOQZFJUQMUML-UHFFFAOYSA-N chlorosilane Chemical compound Cl[SiH3] KOPOQZFJUQMUML-UHFFFAOYSA-N 0.000 description 4
- 125000004122 cyclic group Chemical group 0.000 description 4
- 238000013461 design Methods 0.000 description 4
- 239000003085 diluting agent Substances 0.000 description 4
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 4
- 150000004795 grignard reagents Chemical class 0.000 description 4
- 230000004048 modification Effects 0.000 description 4
- 238000012986 modification Methods 0.000 description 4
- 229910052697 platinum Inorganic materials 0.000 description 4
- 230000008569 process Effects 0.000 description 4
- 238000007650 screen-printing Methods 0.000 description 4
- 238000001374 small-angle light scattering Methods 0.000 description 4
- 238000005507 spraying Methods 0.000 description 4
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 3
- 238000005481 NMR spectroscopy Methods 0.000 description 3
- 125000002015 acyclic group Chemical group 0.000 description 3
- 125000003118 aryl group Chemical group 0.000 description 3
- 125000001309 chloro group Chemical group Cl* 0.000 description 3
- 238000006482 condensation reaction Methods 0.000 description 3
- 229920001577 copolymer Polymers 0.000 description 3
- 239000003431 cross linking reagent Substances 0.000 description 3
- 150000004759 cyclic silanes Chemical class 0.000 description 3
- PZPGRFITIJYNEJ-UHFFFAOYSA-N disilane Chemical compound [SiH3][SiH3] PZPGRFITIJYNEJ-UHFFFAOYSA-N 0.000 description 3
- 238000001914 filtration Methods 0.000 description 3
- 229910052736 halogen Inorganic materials 0.000 description 3
- 125000005843 halogen group Chemical group 0.000 description 3
- 230000007062 hydrolysis Effects 0.000 description 3
- 238000001540 jet deposition Methods 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- 229920001843 polymethylhydrosiloxane Polymers 0.000 description 3
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 3
- 229910052707 ruthenium Inorganic materials 0.000 description 3
- 239000007787 solid Substances 0.000 description 3
- 239000002904 solvent Substances 0.000 description 3
- 239000007858 starting material Substances 0.000 description 3
- 238000003756 stirring Methods 0.000 description 3
- VEDJZFSRVVQBIL-UHFFFAOYSA-N trisilane Chemical compound [SiH3][SiH2][SiH3] VEDJZFSRVVQBIL-UHFFFAOYSA-N 0.000 description 3
- ZQTYRTSKQFQYPQ-UHFFFAOYSA-N trisiloxane Chemical compound [SiH3]O[SiH2]O[SiH3] ZQTYRTSKQFQYPQ-UHFFFAOYSA-N 0.000 description 3
- KWEKXPWNFQBJAY-UHFFFAOYSA-N (dimethyl-$l^{3}-silanyl)oxy-dimethylsilicon Chemical compound C[Si](C)O[Si](C)C KWEKXPWNFQBJAY-UHFFFAOYSA-N 0.000 description 2
- GVNVAWHJIKLAGL-UHFFFAOYSA-N 2-(cyclohexen-1-yl)cyclohexan-1-one Chemical compound O=C1CCCCC1C1=CCCCC1 GVNVAWHJIKLAGL-UHFFFAOYSA-N 0.000 description 2
- MAYUMUDTQDNZBD-UHFFFAOYSA-N 2-chloroethylsilane Chemical compound [SiH3]CCCl MAYUMUDTQDNZBD-UHFFFAOYSA-N 0.000 description 2
- 125000004493 2-methylbut-1-yl group Chemical group CC(C*)CC 0.000 description 2
- 125000000094 2-phenylethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])* 0.000 description 2
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 2
- 125000003542 3-methylbutan-2-yl group Chemical group [H]C([H])([H])C([H])(*)C([H])(C([H])([H])[H])C([H])([H])[H] 0.000 description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- LHRBHFVFUACXIJ-UHFFFAOYSA-N C[SiH](C)C1=CC([SiH](C)C)=CC([SiH](C)C)=C1 Chemical compound C[SiH](C)C1=CC([SiH](C)C)=CC([SiH](C)C)=C1 LHRBHFVFUACXIJ-UHFFFAOYSA-N 0.000 description 2
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
- 101150065749 Churc1 gene Proteins 0.000 description 2
- RGSFGYAAUTVSQA-UHFFFAOYSA-N Cyclopentane Chemical compound C1CCCC1 RGSFGYAAUTVSQA-UHFFFAOYSA-N 0.000 description 2
- 238000005033 Fourier transform infrared spectroscopy Methods 0.000 description 2
- 239000007818 Grignard reagent Substances 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- OFBQJSOFQDEBGM-UHFFFAOYSA-N Pentane Chemical compound CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 2
- 102100038239 Protein Churchill Human genes 0.000 description 2
- YKSADNUOSVJOAS-UHFFFAOYSA-N [bis[(dimethyl-$l^{3}-silanyl)oxy]-phenylsilyl]oxy-dimethylsilicon Chemical compound C[Si](C)O[Si](O[Si](C)C)(O[Si](C)C)C1=CC=CC=C1 YKSADNUOSVJOAS-UHFFFAOYSA-N 0.000 description 2
- 239000002318 adhesion promoter Substances 0.000 description 2
- 125000002877 alkyl aryl group Chemical group 0.000 description 2
- 125000000217 alkyl group Chemical group 0.000 description 2
- 150000001350 alkyl halides Chemical class 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- 125000003710 aryl alkyl group Chemical group 0.000 description 2
- 150000001502 aryl halides Chemical class 0.000 description 2
- 125000004429 atom Chemical group 0.000 description 2
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 2
- QARVLSVVCXYDNA-UHFFFAOYSA-N bromobenzene Chemical compound BrC1=CC=CC=C1 QARVLSVVCXYDNA-UHFFFAOYSA-N 0.000 description 2
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 2
- 125000000068 chlorophenyl group Chemical group 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
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- 238000011161 development Methods 0.000 description 2
- 125000004188 dichlorophenyl group Chemical group 0.000 description 2
- VDCSGNNYCFPWFK-UHFFFAOYSA-N diphenylsilane Chemical compound C=1C=CC=CC=1[SiH2]C1=CC=CC=C1 VDCSGNNYCFPWFK-UHFFFAOYSA-N 0.000 description 2
- SCTQCPWFWDWNTC-UHFFFAOYSA-N diphenylsilyloxy(diphenyl)silane Chemical compound C=1C=CC=CC=1[SiH](C=1C=CC=CC=1)O[SiH](C=1C=CC=CC=1)C1=CC=CC=C1 SCTQCPWFWDWNTC-UHFFFAOYSA-N 0.000 description 2
- 239000006185 dispersion Substances 0.000 description 2
- SNRUBQQJIBEYMU-UHFFFAOYSA-N dodecane Chemical compound CCCCCCCCCCCC SNRUBQQJIBEYMU-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- BITPLIXHRASDQB-UHFFFAOYSA-N ethenyl-[ethenyl(dimethyl)silyl]oxy-dimethylsilane Chemical compound C=C[Si](C)(C)O[Si](C)(C)C=C BITPLIXHRASDQB-UHFFFAOYSA-N 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 239000011888 foil Substances 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 125000003187 heptyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- 150000002431 hydrogen Chemical class 0.000 description 2
- 239000004615 ingredient Substances 0.000 description 2
- 229910052741 iridium Inorganic materials 0.000 description 2
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 description 2
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 2
- 238000002955 isolation Methods 0.000 description 2
- 125000001972 isopentyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])C([H])([H])* 0.000 description 2
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
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- 125000001971 neopentyl group Chemical group [H]C([*])([H])C(C([H])([H])[H])(C([H])([H])[H])C([H])([H])[H] 0.000 description 2
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 229910052762 osmium Inorganic materials 0.000 description 2
- SYQBFIAQOQZEGI-UHFFFAOYSA-N osmium atom Chemical compound [Os] SYQBFIAQOQZEGI-UHFFFAOYSA-N 0.000 description 2
- 229910052763 palladium Inorganic materials 0.000 description 2
- 125000003538 pentan-3-yl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])C([H])([H])[H] 0.000 description 2
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 2
- 239000002244 precipitate Substances 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 238000000746 purification Methods 0.000 description 2
- 239000000376 reactant Substances 0.000 description 2
- 229910052703 rhodium Inorganic materials 0.000 description 2
- 239000010948 rhodium Substances 0.000 description 2
- 125000003548 sec-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 239000000725 suspension Substances 0.000 description 2
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 2
- 229920001169 thermoplastic Polymers 0.000 description 2
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- 239000004416 thermosoftening plastic Substances 0.000 description 2
- 125000003944 tolyl group Chemical group 0.000 description 2
- 238000011282 treatment Methods 0.000 description 2
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 2
- 125000005023 xylyl group Chemical group 0.000 description 2
- UOCLXMDMGBRAIB-UHFFFAOYSA-N 1,1,1-trichloroethane Chemical compound CC(Cl)(Cl)Cl UOCLXMDMGBRAIB-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- 125000001140 1,4-phenylene group Chemical group [H]C1=C([H])C([*:2])=C([H])C([H])=C1[*:1] 0.000 description 1
- QYLFHLNFIHBCPR-UHFFFAOYSA-N 1-ethynylcyclohexan-1-ol Chemical compound C#CC1(O)CCCCC1 QYLFHLNFIHBCPR-UHFFFAOYSA-N 0.000 description 1
- 125000004206 2,2,2-trifluoroethyl group Chemical group [H]C([H])(*)C(F)(F)F 0.000 description 1
- VLQZJOLYNOGECD-UHFFFAOYSA-N 2,4,6-trimethyl-1,3,5,2,4,6-trioxatrisilinane Chemical compound C[SiH]1O[SiH](C)O[SiH](C)O1 VLQZJOLYNOGECD-UHFFFAOYSA-N 0.000 description 1
- KSLSOBUAIFEGLT-UHFFFAOYSA-N 2-phenylbut-3-yn-2-ol Chemical compound C#CC(O)(C)C1=CC=CC=C1 KSLSOBUAIFEGLT-UHFFFAOYSA-N 0.000 description 1
- 238000005133 29Si NMR spectroscopy Methods 0.000 description 1
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- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- YGHFDTDSFZTYBW-UHFFFAOYSA-N O-silylhydroxylamine Chemical class NO[SiH3] YGHFDTDSFZTYBW-UHFFFAOYSA-N 0.000 description 1
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- 229910008051 Si-OH Inorganic materials 0.000 description 1
- 229910003902 SiCl 4 Inorganic materials 0.000 description 1
- 229910002808 Si–O–Si Inorganic materials 0.000 description 1
- 229910006358 Si—OH Inorganic materials 0.000 description 1
- 239000004809 Teflon Substances 0.000 description 1
- 229920006362 Teflon® Polymers 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- 239000012963 UV stabilizer Substances 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- JOPQCTQPHGGFQZ-UHFFFAOYSA-N [SiH4].C(C)(=O)N Chemical class [SiH4].C(C)(=O)N JOPQCTQPHGGFQZ-UHFFFAOYSA-N 0.000 description 1
- TVJPBVNWVPUZBM-UHFFFAOYSA-N [diacetyloxy(methyl)silyl] acetate Chemical compound CC(=O)O[Si](C)(OC(C)=O)OC(C)=O TVJPBVNWVPUZBM-UHFFFAOYSA-N 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 150000001335 aliphatic alkanes Chemical class 0.000 description 1
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- 125000000304 alkynyl group Chemical group 0.000 description 1
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- 125000005018 aryl alkenyl group Chemical group 0.000 description 1
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29K—INDEXING SCHEME ASSOCIATED WITH SUBCLASSES B29B, B29C OR B29D, RELATING TO MOULDING MATERIALS OR TO MATERIALS FOR MOULDS, REINFORCEMENTS, FILLERS OR PREFORMED PARTS, e.g. INSERTS
- B29K2083/00—Use of polymers having silicon, with or without sulfur, nitrogen, oxygen, or carbon only, in the main chain, as moulding material
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
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- B29K2105/00—Condition, form or state of moulded material or of the material to be shaped
- B29K2105/06—Condition, form or state of moulded material or of the material to be shaped containing reinforcements, fillers or inserts
- B29K2105/16—Fillers
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- B32B2310/00—Treatment by energy or chemical effects
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- B32B2310/00—Treatment by energy or chemical effects
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- B32B37/00—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding
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- B32B37/153—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding characterised by the properties of the layers with at least one layer being manufactured and immediately laminated before reaching its stable state, e.g. in which a layer is extruded and laminated while in semi-molten state at least one layer is extruded and immediately laminated while in semi-molten state
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- B32B38/0008—Electrical discharge treatment, e.g. corona, plasma treatment; wave energy or particle radiation
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Description
シリコーン樹脂を硬化するのに十分な量の、分子当たり平均少なくとも2つのケイ素−結合水素原子を有する有機ケイ素化合物;及び(C)触媒量のヒドロシリル化触媒を含む。
(Vi2MeSiO1/2)0.25(PhSiO3/2)0.75、(ViMe2SiO1/2)0.25(PhSiO3/2)0.75、(ViMe2SiO1/2)0.25(MeSiO3/2)0.25(PhSiO3/2)0.50、(ViMe2SiO1/2)0.15(PhSiO3/2)0.75(SiO4/2)0.1、及び(Vi2MeSiO1/2)0.15(ViMe2SiO1/2)0.1(PhSiO3/2)0.75(ここで、Meはメチルであり、Viはビニルであり、Phはフェニルであり、括弧の外の数字の添字はモル分率を表す)を有する樹脂が挙げられるがこれらに限定されない。又、先の式で、単位の順序は特に指定されない。
(ここで、gは1〜6である)から選択される式を有する脂肪族不飽和のないヒドロカルビレン基である)を有することもできる。R1で表示されるヒドロカルビル及びハロゲン置換ヒドロカルビル基は、成分(A)のシリコーン樹脂に対して上で定義され且つ例示された通りである。
−CH2CH2SiMe2H、
−CH2CH2SiMe2CnH2nSiMe2H、
−CH2CH2SiMe2CnH2nSiMePhH、
−CH2CH2SiMePhH、
−CH2CH2SiPh2H、
−CH2CH2SiMePhCnH2nSiPh2H、
−CH2CH2SiMePhCnH2nSiMe2H、
−CH2CH2SiMePhOSiMePhH、及び
−CH2CH2SiMePhOSiPh(OSiMePhH)2(ここで、Meはメチルであり、Phはフェニルであり、添字nは、2〜10の値を有する)
を有する基が挙げられるがこれらに限定されない。
((HMe2SiC6H4SiMe2CH2CH2)2MeSiO1/2)0.12(PhSiO3/2)0.88、
((HMe2SiC6H4SiMe2CH2CH2)2MeSiO1/2)0.17(PhSiO3/2)0.83、
((HMe2SiC6H4SiMe2CH2CH2)2MeSiO1/2)0.17(MeSiO3/2)0.17(PhSiO3/2)0.66、
((HMe2SiC6H4SiMe2CH2CH2)2MeSiO1/2)0.15(PhSiO3/2)0.75(SiO4/2)0.10、及び
((HMe2SiC6H4SiMe2CH2CH2)2MeSiO1/2)0.08((HMe2SiC6H4SiMe2CH2CH2)Me2SiO1/2)0.06(PhSiO3/2)0.86(ここで、Meはメチルであり、Phはフェニルであり、C6H4はパラ−フェニレン基を表し、括弧の外の数字の添字はモル分率を表す)を有する樹脂が挙げられるがこれらに限定されない。又、先の式で、単位の順序は特に指定されない。
(HMe2SiO1/2)0.25(PhSiO3/2)0.75、(HMeSiO2/2)0.3(PhSiO3/2)0.6(MeSiO3/2)0.1、及び(Me3SiO1/2)0.1(H2SiO2/2)0.1(MeSiO3/2)0.4(PhSiO3/2)0.4(ここで、Meはメチルであり、Phはフェニルであり、括弧の外の数字の添字はモル分率を表す)を有する樹脂が挙げられるがこれらに限定されない。又、先の式で、単位の順序は特に指定されない。
Vi4Si、PhSiVi3、MeSiVi3、PhMeSiVi2、Ph2SiVi2、及びPhSi(CH2CH=CH2)3(ここで、Meはメチルであり、Phはフェニルであり、Viはビニルである)を有するシランが挙げられるがこれらに限定されない。
PhSi(OSiMe2Vi)3、Si(OSiMe2Vi)4、MeSi(OSiMe2Vi)3、及びPh2Si(OSiMe2Vi)2(ここで、Meはメチルであり、Phはフェニルである)を有するシロキサンが挙げられるがこれらに限定されない。
ViMe2SiO(Me2SiO)aSiMe2Vi、ViMe2SiO(Ph2SiO)aSiMe2Vi、及びViMe2SiO(PhMeSiO)aSiMe2Vi(ここで、Meはメチルであり、Phはフェニルであり、Viはビニルであり、添字aは1〜4の値を有する)を有するシリコーンゴムが挙げられるがこれらに限定されない。
HMe2SiO(Me2SiO)bSiMe2H、HMe2SiO(Ph2SiO)bSiMe2H、HMe2SiO(PhMeSiO)bSiMe2H、及びHMe2SiO(Ph2SiO)2(Me2SiO)2SiMe2H(ここで、Meはメチルであり、Phはフェニルであり、添字bは1〜4の値を有する)を有するシリコーンゴムが挙げられるがこれらに限定されない。
HMe2SiO(Me2SiO)50SiMe2H、HMe2SiO(Me2SiO)10SiMe2H、HMe2SiO(PhMeSiO)25SiMe2H、及びMe3SiO(MeHSiO)10SiMe3(ここで、Meはメチルであり、Phはフェニルであり、数字の添字は、シロキサン単位の各タイプの数を示す)を有するシリコーンゴムが挙げられるがこれらに限定されない。
ViMe2SiO(Me2SiO)50SiMe2Vi、ViMe2SiO(Me2SiO)10SiMe2Vi、ViMe2SiO(PhMeSiO)25SiMe2Vi、及びVi2MeSiO(PhMeSiO)25SiMe2Vi(ここで、Meはメチルであり、Phはフェニルであり、Viはビニルであり、数字の添字は、シロキサン単位の数又は各タイプを示す)を有するシリコーンゴムが挙げられるがこれらに限定されない。
(ViMeSiO)3、(ViMeSiO)4、(ViMeSiO)5、(ViMeSiO)6、(ViPhSiO)3、(ViPhSiO)4、(ViPhSiO)5、(ViPhSiO)6、ViMe2SiO(ViMeSiO)nSiMe2Vi、Me3SiO(ViMSiO)nSiMe3、及び(ViMe2SiO)4Si(ここで、Meはメチルであり、Phはフェニルであり、Viはビニルであり、添字nは、有機シロキサンが、25℃で0.001〜2Pa・sの粘度を有するような値を有する)を有する有機シロキサンが挙げられるがこれらに限定されない。
PhSi(OSiMe2H)3、Si(OSiMe2H)4、MeSi(OSiMe2H)3、(HMe2SiO)3SiOSi(OSiMe2H)3、及び(HMe2SiO)3SiOSi(Ph)(OSiMe2H)2(ここで、Meはメチルであり、Phはフェニルである)を有する有機水素シロキサンが挙げられるがこれらに限定されない。
(R1R6 2SiO1/2)w’(R6 2SiO2/2)x’(R6SiO3/2)y’(SiO4/2)z’ (VIII)
(ここで、R1は上で記載され且つ例示された通りであり、R6は、R1、−H、−OH、又は加水分解性基であり、w’は0〜0.8、好ましくは、0.02〜0.75、更に好ましくは、0.05〜0.3であり、x’は0〜0.95、好ましくは、0.05〜0.8、更に好ましくは、0.1〜0.3であり、y’は0〜1、好ましくは、0.25〜0.8、更に好ましくは、0.5〜0.8であり、z’は0〜0.99、好ましくは、0.2〜0.8、更に好ましくは、0.4〜0.6であり、シリコーン樹脂(A’’’’)は、分子当たり平均少なくとも2つのケイ素−結合水素原子、ヒドロキシ基、又は加水分解性基を有する)を有する。本明細書で使用される「加水分解性基」という用語は、ケイ素−結合基が、数分以内、例えば、30分以内で、室温(〜23±2℃)〜100℃の任意の温度で触媒の不存在下で水と反応してシラノール(Si−OH)基を形成することを意味する。R6で表示される加水分解性基の例としては、−Cl、−Br、−OR7、−OCH2CH2OR7、CH3C(=O)O−、Et(Me)C=N−O−、CH3C(=O)N(CH3)−、及び−ONH2(ここで、R7は、C1〜C8ヒドロカルビル又はC1〜C8ハロゲン置換ヒドロカルビルである)を有する。
(MeSiO3/2)n、(PhSiO3/2)n、(Me3SiO1/2)0.8(SiO4/2)0.2、(MeSiO3/2)0.67(PhSiO3/2)0.33、(MeSiO3/2)0.45(PhSiO3/2)0.40(Ph2SiO2/2)0.1(PhMeSiO2/2)0.05、(PhSiO3/2)0.4(MeSiO3/2)0.45(PhSiO3/2)0.1(PhMeSiO2/2)0.05、及び(PhSiO3/2)0.4(MeSiO3/2)0.1(PhMeSiO2/2)0.5(ここで、Meはメチルであり、Phはフェニルであり、括弧の外の数字の添字はモル分率を表し、添字nは、シリコーン樹脂が、500〜50,000の数平均分子量を有するような値を有する)を有するシリコーン樹脂が挙げられるがこれらに限定されない。先の式における単位の順序は、本発明の範囲に対して限定するものとして決して見なされるべきではない。これらの式は樹脂の完全に縮合した形態を表示する。硬化する前は、これらは、上で特定された量で、−H、−OH、及び/又はその他の加水分解性基を有する。
(MeSiO3/2)n、(PhSiO3/2)n、(PhSiO3/2)0.4(MeSiO3/2)0.45(PhSiO3/2)0.1(PhMeSiO2/2)0.55、及び(PhSiO3/2)0.3(SiO4/2)0.1(Me2SiO2/2)0.2(Ph2SiO2/2)0.4(ここで、Meはメチルであり、Phはフェニルであり、括弧の外の数字の添字はモル分率を表し、添字nは、シリコーン樹脂が、500〜50,000の数平均分子量を有するような値を有する)を有する樹脂が挙げられるがこれらに限定されない。先の式における単位の順序は、本発明の範囲に対して限定するものとして決して見なされるべきではない。シリコーン樹脂(i)は、それぞれが特定の式を有する、単一シリコーン樹脂又は2つ以上の異なるシリコーン樹脂を含む混合物であることができる。
Me2ViSiCl、Me3SiCl、MeSi(OEt)3、PhSiCl3、MeSiCl3、Me2SiCl2、PhMeSiCl2、SiCl4、Ph2SiCl2、PhSi(OMe)3、MeSi(OMe)3、PhMeSi(OMe)2、及びSi(OEt)4(ここで、Meはメチルであり、Etはエチルであり、Phはフェニルである)を有するシランが挙げられるがこれらに限定されない。
(EtO)3SiO(Me2SiO)55Si(OEt)3、(EtO)3SiO(Me2SiO)16Si(OEt)3、(EtO)3SiO(Me2SiO)386Si(OEt)3、及び(EtO)2MeSiO(PhMeSiO)10SiMe(OEt)2(ここで、Meはメチルであり、Etはエチルである)を有するシリコーンゴムが挙げられるがこれらに限定されない。
Claims (15)
- 少なくとも2つのポリマー層を含むシリコーン樹脂フィルムを形成する工程を含む方法であって、前記ポリマー層の少なくとも1つが、相当する延性遷移厚さ未満の厚さを有する第1シリコーン樹脂層であり、ポリマー層のうち第1シリコーン樹脂層とは異なる層の少なくとも1つは、相当する延性遷移厚さ未満の厚さを有する第2シリコーン樹脂層であり、前記延性遷移厚さは、脆性状態から更に延性状態への遷移が生じる時の厚さであり、前記シリコーン樹脂フィルムを形成する工程が前記少なくとも2つのシリコーン樹脂層が隣接するようにシリコーン樹脂フィルムを形成する工程を含み、前記形成されたシリコーン樹脂は延性である、上記方法。
- シリコーン樹脂フィルムを形成する工程が、第2シリコーン樹脂層への接着を増加させるために前記第1シリコーン樹脂層の少なくとも1つの表面を処理する工程を含む、請求項1に記載の方法。
- 第1シリコーン樹脂層の前記少なくとも1つの表面を処理する工程が、前記少なくとも1つの表面を酸素プラズマへ暴露する工程、前記少なくとも1つの表面を紫外線オゾンへ暴露する工程、及び前記少なくとも1つの表面の化学量論を変更する工程の少なくとも1つを含む、請求項2に記載の方法。
- シリコーン樹脂フィルムを形成する工程が、前記2つのシリコーン樹脂層の少なくとも1つに隣接する少なくとも1つの第3層を形成する工程を含む、請求項1に記載の方法。
- 前記少なくとも1つの第3層を形成する工程が、前記少なくとも1つの第3層が、ゴム粒子、共重合したゴムセグメント、及びシリコーンゴムの少なくとも1つを含むように前記少なくとも1つの第3層を形成する工程を含む、請求項4に記載の方法。
- 前記少なくとも2つのポリマー層の少なくとも1つの層がシリコーンゴムである、請求項1に記載の方法。
- 前記少なくとも2つのポリマー層の少なくとも1つの層が有機ポリマーである、請求項1に記載の方法。
- 少なくとも2つのポリマー層を含むシリコーン樹脂フィルムであって、前記ポリマー層の少なくとも1つが相当する延性遷移厚さ未満の厚さを有する第1シリコーン樹脂層であり、前記ポリマー層のうち第1シリコーン樹脂層とは異なる層の少なくとも1つは、相当する延性遷移厚さ未満の厚さを有する第2シリコーン樹脂層であり、前記延性遷移厚さは、脆性状態から更に延性状態への遷移が生じる時の厚さであり、前記少なくとも2つのシリコーン樹脂層は互いに隣接しており、前記形成されたシリコーン樹脂は延性である、前記シリコーン樹脂フィルム。
- 前記第2シリコーン樹脂層への接着を増加させるために、前記第1シリコーン樹脂層の少なくとも1つの表面が処理されている、請求項8に記載のシリコーン樹脂フィルム。
- 前記少なくとも1つの表面を酸素プラズマへ暴露すること、前記少なくとも1つの表面を紫外線オゾンへ暴露すること、及び前記少なくとも1つの表面の化学量論を変更することの少なくとも1つにより、前記第1シリコーン樹脂層の少なくとも1つの表面が処理されている、請求項9に記載のシリコーン樹脂フィルム。
- 前記少なくとも2つのシリコーン樹脂層の少なくとも1つに隣接する少なくとも1つの第3層を含む、請求項8に記載のシリコーン樹脂フィルム。
- 前記少なくとも1つの第3層が、ゴム粒子、共重合したゴムセメント、及びシリコーンゴムの少なくとも1つを含む、請求項11に記載のシリコーン樹脂フィルム。
- 前記少なくとも2つのポリマー層の少なくとも1つの層がシリコーンゴムである、請求項8に記載のシリコーン樹脂フィルム。
- 前記少なくとも2つのポリマー層の少なくとも1つの層が有機ポリマーである、請求項8に記載のシリコーン樹脂フィルム。
- 請求項1〜7のいずれか一項に記載の方法により得られうる、延性シリコーン樹脂フィルム。
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-
2007
- 2007-06-04 EP EP07777383A patent/EP2076387A2/en not_active Withdrawn
- 2007-06-04 EP EP20110151549 patent/EP2325003A1/en not_active Withdrawn
- 2007-06-04 US US12/303,330 patent/US20110014482A1/en not_active Abandoned
- 2007-06-04 WO PCT/US2007/013135 patent/WO2007145885A2/en active Application Filing
- 2007-06-04 KR KR1020147015031A patent/KR20140079871A/ko not_active Application Discontinuation
- 2007-06-04 KR KR1020087031867A patent/KR20090014404A/ko active Application Filing
- 2007-06-04 CN CN200780022756.4A patent/CN101932442B/zh not_active Expired - Fee Related
- 2007-06-04 JP JP2009514325A patent/JP5236632B2/ja not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
CN101932442B (zh) | 2015-01-21 |
WO2007145885A2 (en) | 2007-12-21 |
CN101932442A (zh) | 2010-12-29 |
US20110014482A1 (en) | 2011-01-20 |
JP2009543711A (ja) | 2009-12-10 |
EP2076387A2 (en) | 2009-07-08 |
EP2325003A1 (en) | 2011-05-25 |
WO2007145885A3 (en) | 2009-10-29 |
KR20090014404A (ko) | 2009-02-10 |
KR20140079871A (ko) | 2014-06-27 |
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