JP5994782B2 - ネガ型感光性樹脂組成物、隔壁、ブラックマトリックスおよび光学素子 - Google Patents

ネガ型感光性樹脂組成物、隔壁、ブラックマトリックスおよび光学素子 Download PDF

Info

Publication number
JP5994782B2
JP5994782B2 JP2013531308A JP2013531308A JP5994782B2 JP 5994782 B2 JP5994782 B2 JP 5994782B2 JP 2013531308 A JP2013531308 A JP 2013531308A JP 2013531308 A JP2013531308 A JP 2013531308A JP 5994782 B2 JP5994782 B2 JP 5994782B2
Authority
JP
Japan
Prior art keywords
group
photosensitive resin
resin composition
carbon atoms
solvent
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2013531308A
Other languages
English (en)
Japanese (ja)
Other versions
JPWO2013031736A1 (ja
Inventor
光太郎 山田
光太郎 山田
高橋　秀幸
秀幸 高橋
川島　正行
正行 川島
正樹 小尾
正樹 小尾
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AGC Inc
Original Assignee
Asahi Glass Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Glass Co Ltd filed Critical Asahi Glass Co Ltd
Publication of JPWO2013031736A1 publication Critical patent/JPWO2013031736A1/ja
Application granted granted Critical
Publication of JP5994782B2 publication Critical patent/JP5994782B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/22—Absorbing filters
    • G02B5/223—Absorbing filters containing organic substances, e.g. dyes, inks or pigments
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0048—Photosensitive materials characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/80—Constructional details
    • H10K59/8791—Arrangements for improving contrast, e.g. preventing reflection of ambient light
    • H10K59/8792—Arrangements for improving contrast, e.g. preventing reflection of ambient light comprising light absorbing layers, e.g. black layers

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
JP2013531308A 2011-08-30 2012-08-27 ネガ型感光性樹脂組成物、隔壁、ブラックマトリックスおよび光学素子 Active JP5994782B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2011187763 2011-08-30
JP2011187763 2011-08-30
PCT/JP2012/071612 WO2013031736A1 (ja) 2011-08-30 2012-08-27 ネガ型感光性樹脂組成物、隔壁、ブラックマトリックスおよび光学素子

Publications (2)

Publication Number Publication Date
JPWO2013031736A1 JPWO2013031736A1 (ja) 2015-03-23
JP5994782B2 true JP5994782B2 (ja) 2016-09-21

Family

ID=47756224

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2013531308A Active JP5994782B2 (ja) 2011-08-30 2012-08-27 ネガ型感光性樹脂組成物、隔壁、ブラックマトリックスおよび光学素子

Country Status (5)

Country Link
JP (1) JP5994782B2 (ko)
KR (1) KR101940844B1 (ko)
CN (1) CN103782237B (ko)
TW (1) TWI518455B (ko)
WO (1) WO2013031736A1 (ko)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6134236B2 (ja) * 2013-09-02 2017-05-24 株式会社ジャパンディスプレイ 表示装置
JP6309761B2 (ja) * 2013-12-27 2018-04-11 東京応化工業株式会社 ブラックカラムスペーサ用感光性樹脂組成物
JPWO2015118836A1 (ja) * 2014-02-10 2017-03-23 日立化成デュポンマイクロシステムズ株式会社 ポリイミド前駆体を含む樹脂組成物、硬化膜の製造方法及び電子部品
JP6815717B2 (ja) * 2015-03-05 2021-01-20 日鉄ケミカル＆マテリアル株式会社 遮光膜用黒色樹脂組成物、当該組成物を硬化させた遮光膜を有する遮光膜付基板、並びに当該遮光膜付基板を有するカラーフィルター及びタッチパネル
JP6531347B2 (ja) * 2014-03-28 2019-06-19 セイコーエプソン株式会社 機能層形成用インクおよび発光素子の製造方法
JP6405670B2 (ja) * 2014-04-02 2018-10-17 凸版印刷株式会社 カラーフィルタ基板及び液晶表示装置
JP6390143B2 (ja) * 2014-04-08 2018-09-19 東洋インキＳｃホールディングス株式会社 黒色組成物、黒色塗膜、および積層体
KR101804259B1 (ko) * 2015-03-24 2017-12-04 삼성에스디아이 주식회사 감광성 수지 조성물, 이를 이용한 블랙 컬럼 스페이서 및 컬러필터
CN111477766B (zh) * 2015-06-12 2023-04-07 默克专利有限公司 作为用于oled制剂的溶剂的含有非芳族环的酯
KR102025359B1 (ko) * 2016-03-08 2019-09-25 삼성에스디아이 주식회사 감광성 수지 조성물, 이를 이용한 블랙 컬럼 스페이서 및 컬러필터
US10527936B2 (en) 2016-06-17 2020-01-07 Nan Ya Plastics Corporation Low Dk/Df solder resistant composition use for printed circuit board
JP6573850B2 (ja) * 2016-08-01 2019-09-11 南亞塑膠工業股▲分▼有限公司 プリント基板用の低Ｄｋ／Ｄｆのソルダーレジスト組成物
KR102374939B1 (ko) * 2016-09-16 2022-03-16 가부시키가이샤 아데카 경화성 조성물, 경화물 및 경화물의 제조 방법
TWI736718B (zh) * 2016-12-08 2021-08-21 盧森堡商Ａｚ電子材料盧森堡有限公司 黑色矩陣用組成物、黑色矩陣、及黑色矩陣之製造方法
JP6845469B2 (ja) * 2017-02-27 2021-03-17 三菱ケミカル株式会社 画像表示装置用着色硬化膜、画像表示装置用感光性着色組成物及び画像表示装置
KR101933940B1 (ko) * 2018-01-31 2018-12-31 동우 화인켐 주식회사 착색 감광성 수지 조성물, 이를 이용하여 제조된 블랙 매트릭스 및/또는 컬럼 스페이서를 포함하는 컬러필터 및 컬러필터를 포함하는 화상표시장치
JP6699691B2 (ja) * 2018-08-06 2020-05-27 東洋インキＳｃホールディングス株式会社 黒色組成物、黒色塗膜、および積層体
JP7359559B2 (ja) * 2019-03-29 2023-10-11 日鉄ケミカル＆マテリアル株式会社 遮光膜及びそれを得るための感光性樹脂組成物、遮光膜の製造方法
JP7297499B2 (ja) * 2019-04-04 2023-06-26 東京応化工業株式会社 感光性樹脂組成物、パターン化された硬化膜の製造方法、及びパターン化された硬化膜
CN113149650B (zh) * 2021-04-25 2022-09-23 陕西理工大学 一种基于sla的碳材料零件用光敏树脂及零件的制备方法

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100481014B1 (ko) * 2002-10-04 2005-04-07 주식회사 동진쎄미켐 포토폴리머를 이용한 감광성 수지 조성물
JP4904869B2 (ja) * 2006-03-22 2012-03-28 Ｊｓｒ株式会社 着色層形成用感放射線性組成物およびカラーフィルタ
JP2008009121A (ja) * 2006-06-29 2008-01-17 Sumitomo Chemical Co Ltd ポジ型着色感放射線性樹脂組成物
JP4656025B2 (ja) 2006-08-31 2011-03-23 Ｊｓｒ株式会社 着色層形成用感放射線性組成物およびカラーフィルタ
JP4656036B2 (ja) 2006-09-29 2011-03-23 Ｊｓｒ株式会社 着色層形成用感放射線性組成物およびカラーフィルタ
JP4833777B2 (ja) * 2006-09-07 2011-12-07 株式会社Ｄｎｐファインケミカル ブラックマトリクス用硬化性樹脂組成物
JP4656035B2 (ja) 2006-09-29 2011-03-23 Ｊｓｒ株式会社 着色層形成用感放射線性組成物およびカラーフィルタ
JP5126222B2 (ja) 2007-04-25 2013-01-23 旭硝子株式会社 感光性組成物、隔壁、ブラックマトリックス、カラーフィルタの製造方法
WO2010013816A1 (ja) * 2008-08-01 2010-02-04 旭硝子株式会社 ネガ型感光性組成物、それを用いた光学素子用隔壁および該隔壁を有する光学素子
KR101068622B1 (ko) * 2009-12-22 2011-09-28 주식회사 엘지화학 기판접착력이 향상된 고차광성 블랙매트릭스 조성물
JP5641791B2 (ja) * 2010-06-22 2014-12-17 東京応化工業株式会社 樹脂パターンの製造方法

Also Published As

Publication number Publication date
KR20140061426A (ko) 2014-05-21
CN103782237B (zh) 2017-02-15
KR101940844B1 (ko) 2019-01-21
TWI518455B (zh) 2016-01-21
JPWO2013031736A1 (ja) 2015-03-23
TW201314366A (zh) 2013-04-01
CN103782237A (zh) 2014-05-07
WO2013031736A1 (ja) 2013-03-07

Similar Documents

Publication Publication Date Title
JP5994782B2 (ja) ネガ型感光性樹脂組成物、隔壁、ブラックマトリックスおよび光学素子
JP6136928B2 (ja) ネガ型感光性樹脂組成物、隔壁の製造方法および光学素子の製造方法
WO2012147626A1 (ja) ネガ型感光性樹脂組成物、硬化膜、隔壁およびブラックマトリックスとその製造方法、カラーフィルタならびに有機ｅｌ素子
JP5371950B2 (ja) カラーフィルタの製造方法およびこれによって製造されたカラーフィルタ
JP2013050549A (ja) ネガ型感光性樹脂組成物、隔壁、光学素子
JP6036699B2 (ja) 撥インク剤の製造方法、ネガ型感光性樹脂組成物、隔壁および光学素子
JP2017102431A (ja) 着色感光性樹脂組成物、これを利用して製造されたカラーフィルターおよび画像表示装置
JP5357570B2 (ja) 感光性樹脂組成物、カラーフィルター、及び液晶表示ディスプレイ
CN105388705B (zh) 着色感光性树脂组合物
JP2011039404A (ja) 光学素子隔壁形成用感光性組成物、これを用いたブラックマトリックスおよびその製造方法、並びにカラーフィルタの製造方法
JPWO2010001976A1 (ja) 感光性組成物、隔壁、カラーフィルタ及び有機ｅｌ素子
JP5682573B2 (ja) 感光性組成物、隔壁、カラーフィルタおよび有機ｅｌ素子
JP6625511B2 (ja) 着色感光性樹脂組成物、これを含むカラーフィルタおよび表示装置
WO2012132755A1 (ja) ネガ型感光性樹脂組成物および塗膜
JP2014098140A (ja) 硬化性組成物、硬化膜及び表示素子
JP2016126324A (ja) 着色感光性樹脂組成物
JP2014167492A (ja) ネガ型用感光性組成物、隔壁、ブラックマトリックス、カラーフィルタおよび液晶表示素子
JP5590046B2 (ja) 感光性組成物、隔壁、カラーフィルタおよび有機ｅｌ素子
JP2016051176A (ja) 着色感光性樹脂組成物
KR101406298B1 (ko) 고내열성 네거티브 레지스트 조성물
KR102039670B1 (ko) 청색 감광성 수지 조성물, 이를 포함하는 청색 컬러필터 및 표시장치
KR102524653B1 (ko) 감광성 수지 조성물, 이를 이용하여 제조된 감광성 수지막 및 컬러필터
KR102039673B1 (ko) 적색 감광성 수지 조성물, 이를 포함하는 적색 컬러필터 및 표시장치
KR102397093B1 (ko) 착색 감광성 수지 조성물, 이를 포함하는 컬러필터 및 표시장치
JP2016147977A (ja) 着色組成物、着色硬化膜、並びに固体撮像素子及び表示素子

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20150303

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20160202

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20160229

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20160726

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20160808

R150 Certificate of patent or registration of utility model

Ref document number: 5994782

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

S533 Written request for registration of change of name

Free format text: JAPANESE INTERMEDIATE CODE: R313533

R350 Written notification of registration of transfer

Free format text: JAPANESE INTERMEDIATE CODE: R350

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250