JP5989107B2 - 有機出発物質の堆積方法、蒸発装置および堆積装置 - Google Patents
有機出発物質の堆積方法、蒸発装置および堆積装置 Download PDFInfo
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Description
2 エーロゾル発生器
2′ 貯蔵容器
3 キャリヤガス・ライン
4 エーロゾル・ライン
5 蒸気ライン
6 加熱スリーブ
7 CVDリアクタ・ハウジング
8 ガス入口機構(シャワヘッド)
9 サセプタ
10 プロセスチャンバ
11 基板
12 真空ポンプ
13 センサ
14 PID制御器
15 伝熱面
16 外筒
17 絶縁層
18 流入開口/流入ノズル
19 ガス分配器
19′ 衝突面
20 流出開口
21 空洞
22 電極
23 電極
24 温度センサ
25 PID制御器
26 質量流量制御器
a 質量流量(エーロゾル粒子)
b 質量流量(蒸気)
c 加熱エネルギー
Claims (12)
- 有機出発物質がキャリヤガス流れ内の浮遊粒子の形のエーロゾルとして蒸発器(1)内に導入され、浮遊粒子が蒸発器(1)内において温度制御により加熱された伝熱面(15)と接触し且つ伝熱面(15)の温度の関数でもある平均滞留時間後に蒸発し、このようにして発生された蒸気がキャリヤガスにより出口ガス流れとして蒸発器(1)からプロセスチャンバ(10)内に搬送され、プロセスチャンバ(10)内において該蒸気が基板(11)の表面上で凝縮して層を形成する、基板(11)上における有機出発物質からなる層の堆積方法において、滞留時間の間に蒸発器(1)内に含まれている未蒸発有機出発物質の質量が緩衝質量を形成し、伝熱面(15)の温度を、出口ガス流れ内の発生蒸気質量流量(c)の時間的変化に対する応答として、蒸発器(1)内に流入する有機出発物質の質量流量の時間的変動を補償するように変化させ、
伝熱面(15)の温度変化に起因して緩衝質量および有機出発物質の蒸発器(1)内滞留時間が変化し、長期的に、蒸発器内に流入する有機材料の質量流量が蒸発器から流出する質量流量に等しい定常状態が達成される、
ことを特徴とする基板(11)上における有機出発物質からなる層の堆積方法。 - 出口ガス流れ内のセンサ(13)を用いて決定された、キャリヤガス内の蒸気の流量または分圧に対応する値が制御量として制御ループ(14)に供給され、該制御ループ(14)は、操作量として伝熱面(15)に対する加熱エネルギー流量を変化させることを特徴とする請求項1に記載の堆積方法。
- 伝熱面(15)の温度変化速度が少なくとも5℃/sであり且つ温度が加熱エネルギー流量の変化により±10°だけ変化可能であることを特徴とする請求項1または2に記載の堆積方法。
- パルス間の時間が平均滞留時間より小さい脈動入口ガス流れを特徴とする請求項1ないし3のいずれかに記載の堆積方法。
- 伝熱面(15)が、開放細孔固体発泡体の、開放セル壁を形成するウェブにより構成された細孔によって形成され、該固体発泡体は蒸発器(1)を形成する容器の壁を構成することを特徴とする請求項1ないし4のいずれかに記載の堆積方法。
- 固体発泡体または固体発泡体のコーティングが導電性であり且つ固体発泡体ないしはコーティング内を流れる電流により抵抗加熱されることを特徴とする請求項5に記載の堆積方法。
- 内部に、入口ガス流れのための流入開口(18)、出口ガス流れのための流出開口(20)および伝熱面(15)を有する蒸発器(1)の形の、キャリヤガス流れ内の浮遊粒子の形で導入される有機出発物質の蒸発装置であって、伝熱面(15)が、可変加熱エネルギー流量により、流入開口を介して蒸発器(1)内に導入された浮遊粒子が伝熱面(15)と接触して蒸気に蒸発する動的に制御可能な温度に加熱可能であり、該蒸気は流出開口(20)を介して蒸発器(1)から流出する、キャリヤガス流れ内に搬送された浮遊粒子の蒸発装置において、蒸気の流量または蒸気分圧の関数であるセンサ信号を提供する、出口ガス流れ内に配置されたセンサ(13)と、可変熱エネルギー流量により温度を動的に制御するために制御量としてセンサ信号が供給され、および出口ガス流れ内の発生蒸気質量流量(c)の時間的変化に対する応答として蒸発器(1)内に流入する有機出発物質の質量流量の時間的変動を補償するように、操作量として加熱エネルギー流量を変化させる制御ループ(14)と、 を備え、加熱エネルギー流量の変化に起因する伝熱面(15)の温度変化により変更可能な滞留時間の間、蒸発器(1)内に流入した有機出発物質が蒸発器(1)内に滞留するように蒸発器(1)が形成され、これにより、有機出発物質は緩衝質量を形成し、 制御ループ(14)が加熱エネルギー流量を変化させたことに起因して伝熱面(15)の温度が変化し、該温度変化により緩衝質量および有機出発物質の蒸発器(1)内滞留時間が変化し、長期的に、蒸発器内に流入する有機材料の質量流量が蒸発器から流出する質量流量に等しい定常状態が達成される、ことを特徴とするキャリヤガス流れ内に搬送された浮遊粒子の蒸発装置。
- 伝熱面(15)が、蒸発器(1)の壁を形成する開放細孔固体発泡体により形成されることを特徴とする請求項7に記載の蒸発装置。
- 固体発泡体が導電性であり且つ2つの電極(22、23)と協働し、固体発泡体の内部に熱を発生させるために、電極(22、23)により加熱電流が固体発泡体内に通電可能であることを特徴とする請求項8に記載の蒸発装置。
- 固体発泡体の温度が、平均温度に対して±10℃だけ、少なくとも5℃/sの温度変化速度により変化可能なように、固体発泡体がより低温の周辺(16)と結合されていることを特徴とする請求項8または9に記載の蒸発装置。
- 請求項7ないし10のいずれかに記載の蒸発装置と、キャリヤガス流れ内で蒸発器(1)に搬送される浮遊粒子の形の有機出発物質の質量流量を発生させるためのエーロゾル発生器(2)と、蒸発器(1)から発生された蒸気が蒸気ライン(5)を介して供給される、基板(11)を受け入れるためのプロセスチャンバ(10)と、を備えることを特徴とする基板(11)上の層としての有機出発物質の堆積装置。
- 伝熱面(15)の平均温度を測定するための温度センサ(24)と、制御量として温度センサ信号が供給され、および操作量として蒸発器(1)への有機出発物質の質量流量を温度センサ信号の関数として変化させる制御ループ(25)と、を備えることを特徴とする請求項11に記載の堆積装置。
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DE102011051261.6 | 2011-06-22 | ||
DE102011051261A DE102011051261A1 (de) | 2011-06-22 | 2011-06-22 | Verfahren und Vorrichtung zum Abscheiden von OLEDs insbesondere Verdampfungsvorrichtung dazu |
PCT/EP2012/060645 WO2012175334A2 (de) | 2011-06-22 | 2012-06-06 | Verfahren und vorrichtung zum abscheiden von oleds insbesondere verdampfungsvorrichtung dazu |
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CN (1) | CN103620086B (ja) |
DE (1) | DE102011051261A1 (ja) |
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DE102014102484A1 (de) | 2014-02-26 | 2015-08-27 | Aixtron Se | Verwendung eines QCM-Sensors zur Bestimmung der Dampfkonzentration beim OVPD-Verfahren beziehungsweise in einem OVPD-Beschichtungssystem |
DE102014109195A1 (de) | 2014-07-01 | 2016-01-07 | Aixtron Se | Vorrichtung und Verfahren zum Erzeugen eines Dampfes aus mehreren flüssigen oder festen Ausgangsstoffen für eine CVD- oder PVD-Einrichtung |
DE102014109194A1 (de) | 2014-07-01 | 2016-01-07 | Aixtron Se | Vorrichtung und Verfahren zum Erzeugen eines Dampfes für eine CVD- oder PVD-Einrichtung |
DE102014109196A1 (de) | 2014-07-01 | 2016-01-07 | Aixtron Se | Vorrichtung zum Erzeugen eines Dampfes aus einem festen oder flüssigen Ausgangsstoff für eine CVD- oder PVD-Einrichtung |
DE102014115497A1 (de) * | 2014-10-24 | 2016-05-12 | Aixtron Se | Temperierte Gaszuleitung mit an mehreren Stellen eingespeisten Verdünnungsgasströmen |
DE102016100625A1 (de) | 2016-01-15 | 2017-07-20 | Aixtron Se | Vorrichtung zum Bereitstellen eines Prozessgases in einer Beschichtungseinrichtung |
DE102017103047A1 (de) | 2016-11-29 | 2018-05-30 | Aixtron Se | Aerosolverdampfer |
DE102017106431A1 (de) * | 2017-03-24 | 2018-09-27 | Aixtron Se | Vorrichtung und Verfahren zum Herabsetzen des Wasserpartialdrucks in einer OVPD-Beschichtungseinrichtung |
DE102017112668A1 (de) * | 2017-06-08 | 2018-12-13 | Aixtron Se | Verfahren zum Abscheiden von OLEDs |
DE102017123233A1 (de) * | 2017-10-06 | 2019-04-11 | Aixtron Se | Vorrichtung und Verfahren zur Erzeugung eines in einem Trägergas transportierten Dampfes |
DE102017126126A1 (de) * | 2017-11-08 | 2019-05-09 | Aixtron Se | Verfahren und Vorrichtung zum Erzeugen eines Dampfes durch die Verwendung von in einem Regelmodus gewonnenen Steuerdaten |
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JP2010159448A (ja) * | 2009-01-07 | 2010-07-22 | Canon Inc | 成膜装置及び成膜方法 |
US20120094014A1 (en) * | 2009-04-24 | 2012-04-19 | Tokyo Electron Limited | Vapor deposition apparatus and vapor deposition method |
KR20110004081A (ko) * | 2009-07-07 | 2011-01-13 | 삼성모바일디스플레이주식회사 | 증착 장치용 캐니스터, 이를 이용한 증착 장치 및 증착 방법 |
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CN103620086A (zh) | 2014-03-05 |
WO2012175334A2 (de) | 2012-12-27 |
KR20180090391A (ko) | 2018-08-10 |
KR20140043791A (ko) | 2014-04-10 |
DE102011051261A1 (de) | 2012-12-27 |
KR101956829B1 (ko) | 2019-03-11 |
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