FR2900070B1 - Dispositif d'introduction ou d'injection ou de pulverisation d'un melange de gaz vecteur et de composes liquides et procede de mise en oeuvre dudit dispositif. - Google Patents

Dispositif d'introduction ou d'injection ou de pulverisation d'un melange de gaz vecteur et de composes liquides et procede de mise en oeuvre dudit dispositif.

Info

Publication number
FR2900070B1
FR2900070B1 FR0651378A FR0651378A FR2900070B1 FR 2900070 B1 FR2900070 B1 FR 2900070B1 FR 0651378 A FR0651378 A FR 0651378A FR 0651378 A FR0651378 A FR 0651378A FR 2900070 B1 FR2900070 B1 FR 2900070B1
Authority
FR
France
Prior art keywords
unit
liquid
inlet
flow rate
compound
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
FR0651378A
Other languages
English (en)
Other versions
FR2900070A1 (fr
Inventor
Herve Guillon
Samuel Bonnafous
Jean Emmanuel Decams
Frederic Poignant
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
KEMSTREAM SOC PAR ACTIONS SIMP
Original Assignee
KEMSTREAM SOC PAR ACTIONS SIMP
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to FR0651378A priority Critical patent/FR2900070B1/fr
Application filed by KEMSTREAM SOC PAR ACTIONS SIMP filed Critical KEMSTREAM SOC PAR ACTIONS SIMP
Priority to CN200780021800XA priority patent/CN101466868B/zh
Priority to PCT/EP2007/053805 priority patent/WO2007118898A1/fr
Priority to KR1020087017139A priority patent/KR101439339B1/ko
Priority to EP07728267A priority patent/EP2016206B1/fr
Priority to DE602007004101T priority patent/DE602007004101D1/de
Priority to US12/297,861 priority patent/US8584965B2/en
Priority to AT07728267T priority patent/ATE453736T1/de
Priority to JP2009505885A priority patent/JP5174805B2/ja
Publication of FR2900070A1 publication Critical patent/FR2900070A1/fr
Application granted granted Critical
Publication of FR2900070B1 publication Critical patent/FR2900070B1/fr
Priority to US14/051,806 priority patent/US9387447B2/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F25/00—Flow mixers; Mixers for falling materials, e.g. solid particles
    • B01F25/30—Injector mixers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B7/00—Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas
    • B05B7/24—Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas with means, e.g. a container, for supplying liquid or other fluent material to a discharge device
    • B05B7/26—Apparatus in which liquids or other fluent materials from different sources are brought together before entering the discharge device
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/4486—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by producing an aerosol and subsequent evaporation of the droplets or particles
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45512—Premixing before introduction in the reaction chamber
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45523—Pulsed gas flow or change of composition over time

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Dispersion Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Accessories For Mixers (AREA)
  • Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)
  • Nozzles (AREA)
  • Colloid Chemistry (AREA)
  • Agricultural Chemicals And Associated Chemicals (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Vaporization, Distillation, Condensation, Sublimation, And Cold Traps (AREA)
FR0651378A 2006-04-19 2006-04-19 Dispositif d'introduction ou d'injection ou de pulverisation d'un melange de gaz vecteur et de composes liquides et procede de mise en oeuvre dudit dispositif. Active FR2900070B1 (fr)

Priority Applications (10)

Application Number Priority Date Filing Date Title
FR0651378A FR2900070B1 (fr) 2006-04-19 2006-04-19 Dispositif d'introduction ou d'injection ou de pulverisation d'un melange de gaz vecteur et de composes liquides et procede de mise en oeuvre dudit dispositif.
JP2009505885A JP5174805B2 (ja) 2006-04-19 2007-04-18 キャリアガス及び液体混合物を導入、注入または供給するための装置並びに上記装置を使用するための方法
KR1020087017139A KR101439339B1 (ko) 2006-04-19 2007-04-18 운반 기체와 액체 화합물의 혼합기를 유입시키거나분사하거나 분무하기 위한 장치와, 상기 장치를 구현하는방법
EP07728267A EP2016206B1 (fr) 2006-04-19 2007-04-18 Dispositif d'introduction, d'injection ou de vaporisation d'un mélange d'un gaz vecteur et de composés liquides et méthode d'application dudit dispositif
DE602007004101T DE602007004101D1 (de) 2006-04-19 2007-04-18 Vorrichtun zum eintragen, einspritzen oder einsprühen einer mischung aus einem trägergas und flüssigen verbindungen und verfahren zur verwendung der vorrichtung
US12/297,861 US8584965B2 (en) 2006-04-19 2007-04-18 Device for introducing, injecting or spraying a mixture of a carrier gas and liquid compounds and method for implementing said device
CN200780021800XA CN101466868B (zh) 2006-04-19 2007-04-18 用于引入、喷射或者喷洒载气与液态化合物的混合物的装置以及实现该装置的方法
PCT/EP2007/053805 WO2007118898A1 (fr) 2006-04-19 2007-04-18 Dispositif d'introduction, d'injection ou de vaporisation d'un mélange d'un gaz vecteur et de composés liquides et méthode d'application dudit dispositif
AT07728267T ATE453736T1 (de) 2006-04-19 2007-04-18 Vorrichtun zum eintragen, einspritzen oder einsprühen einer mischung aus einem trägergas und flüssigen verbindungen und verfahren zur verwendung der vorrichtung
US14/051,806 US9387447B2 (en) 2006-04-19 2013-10-11 Device for introducing, injecting or spraying a mixture of a carrier gas and liquid compounds and method for implementing said device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR0651378A FR2900070B1 (fr) 2006-04-19 2006-04-19 Dispositif d'introduction ou d'injection ou de pulverisation d'un melange de gaz vecteur et de composes liquides et procede de mise en oeuvre dudit dispositif.

Publications (2)

Publication Number Publication Date
FR2900070A1 FR2900070A1 (fr) 2007-10-26
FR2900070B1 true FR2900070B1 (fr) 2008-07-11

Family

ID=37685792

Family Applications (1)

Application Number Title Priority Date Filing Date
FR0651378A Active FR2900070B1 (fr) 2006-04-19 2006-04-19 Dispositif d'introduction ou d'injection ou de pulverisation d'un melange de gaz vecteur et de composes liquides et procede de mise en oeuvre dudit dispositif.

Country Status (9)

Country Link
US (2) US8584965B2 (fr)
EP (1) EP2016206B1 (fr)
JP (1) JP5174805B2 (fr)
KR (1) KR101439339B1 (fr)
CN (1) CN101466868B (fr)
AT (1) ATE453736T1 (fr)
DE (1) DE602007004101D1 (fr)
FR (1) FR2900070B1 (fr)
WO (1) WO2007118898A1 (fr)

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DE102009023010A1 (de) * 2009-05-28 2010-12-02 Ruhr Oel Gmbh Vorrichtung zum gleichzeitigen Verdampfen und Dosieren einer verdampfbaren Flüssigkeit und zugehöriges Verfahren
DE102011051261A1 (de) * 2011-06-22 2012-12-27 Aixtron Se Verfahren und Vorrichtung zum Abscheiden von OLEDs insbesondere Verdampfungsvorrichtung dazu
US9238865B2 (en) 2012-02-06 2016-01-19 Asm Ip Holding B.V. Multiple vapor sources for vapor deposition
US9243325B2 (en) * 2012-07-18 2016-01-26 Rohm And Haas Electronic Materials Llc Vapor delivery device, methods of manufacture and methods of use thereof
US9498758B2 (en) * 2012-07-30 2016-11-22 Biosafe Systems Llc Dilution apparatus
WO2015005705A1 (fr) * 2013-07-11 2015-01-15 (주)펨빅스 Appareil et procédé de revêtement par application d'une poudre à l'état solide
KR101447890B1 (ko) * 2013-07-11 2014-10-08 주식회사 펨빅스 고상파우더 코팅장치 및 코팅방법
US10413872B2 (en) * 2013-08-13 2019-09-17 Breville Pty Limited Carbonator
CN103411779B (zh) * 2013-08-28 2016-01-13 天津大学 一种用于空气净化器性能检测的气态污染物发生装置及方法
CN105874095A (zh) * 2013-12-06 2016-08-17 应用材料公司 沉积装置、沉积设备及其操作方法
CN104155132B (zh) * 2014-07-30 2016-09-07 天津大学 一种用于空气过滤器测试系统的气态有机污染物发生器
JP2017010408A (ja) * 2015-06-24 2017-01-12 富士通株式会社 冷却装置及び電子機器システム
CN107431015B (zh) * 2015-11-10 2021-11-12 东京毅力科创株式会社 气化器、成膜装置和温度控制方法
KR101748439B1 (ko) * 2016-02-29 2017-06-16 주식회사 미래와도전 고온 고압에서 작동하는 에어로졸 생성 및 혼합 시스템p
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CN106582453B (zh) * 2017-01-18 2022-09-09 浙江大学 包含可凝结颗粒物气体的发生装置及方法
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KR20190015813A (ko) * 2017-08-07 2019-02-15 박명선 정유를 혼합분무하는 분무장치
US10987475B2 (en) * 2017-10-25 2021-04-27 General Electric Company Systems for feedback control of anesthetic agent concentration
KR20210097744A (ko) * 2018-11-29 2021-08-09 티에스아이 인코포레이티드 액체 탈기의 감소 또는 제거
US11788190B2 (en) 2019-07-05 2023-10-17 Asm Ip Holding B.V. Liquid vaporizer
US11946136B2 (en) 2019-09-20 2024-04-02 Asm Ip Holding B.V. Semiconductor processing device
FR3114588B1 (fr) 2020-09-29 2023-08-11 Safran Ceram Procédé de fabrication d’une barrière environnementale
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Also Published As

Publication number Publication date
FR2900070A1 (fr) 2007-10-26
US20140034751A1 (en) 2014-02-06
US8584965B2 (en) 2013-11-19
KR20080110725A (ko) 2008-12-19
KR101439339B1 (ko) 2014-09-11
CN101466868A (zh) 2009-06-24
US20090078791A1 (en) 2009-03-26
DE602007004101D1 (de) 2010-02-11
JP5174805B2 (ja) 2013-04-03
WO2007118898A1 (fr) 2007-10-25
US9387447B2 (en) 2016-07-12
EP2016206A1 (fr) 2009-01-21
JP2009534528A (ja) 2009-09-24
EP2016206B1 (fr) 2009-12-30
ATE453736T1 (de) 2010-01-15
CN101466868B (zh) 2013-03-27

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