JP5926700B2 - 支持体分離装置及び支持体分離方法 - Google Patents

支持体分離装置及び支持体分離方法 Download PDF

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Publication number
JP5926700B2
JP5926700B2 JP2013095969A JP2013095969A JP5926700B2 JP 5926700 B2 JP5926700 B2 JP 5926700B2 JP 2013095969 A JP2013095969 A JP 2013095969A JP 2013095969 A JP2013095969 A JP 2013095969A JP 5926700 B2 JP5926700 B2 JP 5926700B2
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JP
Japan
Prior art keywords
support
holding
laminate
unit
support plate
Prior art date
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Active
Application number
JP2013095969A
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English (en)
Japanese (ja)
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JP2014216632A (ja
JP2014216632A5 (enExample
Inventor
高瀬　真治
真治 高瀬
吉浩 稲尾
吉浩 稲尾
中村　彰彦
彰彦 中村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Ohka Kogyo Co Ltd
Original Assignee
Tokyo Ohka Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Ohka Kogyo Co Ltd filed Critical Tokyo Ohka Kogyo Co Ltd
Priority to JP2013095969A priority Critical patent/JP5926700B2/ja
Priority to TW103108148A priority patent/TWI545685B/zh
Priority to US14/202,445 priority patent/US9238357B2/en
Priority to KR1020140028952A priority patent/KR101625730B1/ko
Publication of JP2014216632A publication Critical patent/JP2014216632A/ja
Publication of JP2014216632A5 publication Critical patent/JP2014216632A5/ja
Application granted granted Critical
Publication of JP5926700B2 publication Critical patent/JP5926700B2/ja
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Classifications

    • H10P72/0442—
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B43/00—Operations specially adapted for layered products and not otherwise provided for, e.g. repairing; Apparatus therefor
    • B32B43/006—Delaminating
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67092—Apparatus for mechanical treatment
    • H10P72/0428—
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2457/00—Electrical equipment
    • B32B2457/14—Semiconductor wafers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
    • H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
    • H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
    • H01L2221/68381—Details of chemical or physical process used for separating the auxiliary support from a device or wafer
    • H01L2221/68386—Separation by peeling
    • H10P72/7442—
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T156/00—Adhesive bonding and miscellaneous chemical manufacture
    • Y10T156/11—Methods of delaminating, per se; i.e., separating at bonding face
    • Y10T156/1126—Using direct fluid current against work during delaminating
    • Y10T156/1132—Using vacuum directly against work during delaminating
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T156/00—Adhesive bonding and miscellaneous chemical manufacture
    • Y10T156/11—Methods of delaminating, per se; i.e., separating at bonding face
    • Y10T156/1168—Gripping and pulling work apart during delaminating
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T156/00—Adhesive bonding and miscellaneous chemical manufacture
    • Y10T156/11—Methods of delaminating, per se; i.e., separating at bonding face
    • Y10T156/1168—Gripping and pulling work apart during delaminating
    • Y10T156/1195—Delaminating from release surface
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T156/00—Adhesive bonding and miscellaneous chemical manufacture
    • Y10T156/19—Delaminating means
    • Y10T156/1928—Differential fluid pressure delaminating means
    • Y10T156/1944—Vacuum delaminating means [e.g., vacuum chamber, etc.]
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T156/00—Adhesive bonding and miscellaneous chemical manufacture
    • Y10T156/19—Delaminating means
    • Y10T156/1978—Delaminating bending means
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T156/00—Adhesive bonding and miscellaneous chemical manufacture
    • Y10T156/19—Delaminating means
    • Y10T156/1994—Means for delaminating from release surface

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Laminated Bodies (AREA)
JP2013095969A 2013-04-30 2013-04-30 支持体分離装置及び支持体分離方法 Active JP5926700B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2013095969A JP5926700B2 (ja) 2013-04-30 2013-04-30 支持体分離装置及び支持体分離方法
TW103108148A TWI545685B (zh) 2013-04-30 2014-03-10 支承體分離裝置及支承體分離方法
US14/202,445 US9238357B2 (en) 2013-04-30 2014-03-10 Supporting member separation apparatus and supporting member separation method
KR1020140028952A KR101625730B1 (ko) 2013-04-30 2014-03-12 지지체 분리 장치 및 지지체 분리 방법

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2013095969A JP5926700B2 (ja) 2013-04-30 2013-04-30 支持体分離装置及び支持体分離方法

Publications (3)

Publication Number Publication Date
JP2014216632A JP2014216632A (ja) 2014-11-17
JP2014216632A5 JP2014216632A5 (enExample) 2016-01-21
JP5926700B2 true JP5926700B2 (ja) 2016-05-25

Family

ID=51788240

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2013095969A Active JP5926700B2 (ja) 2013-04-30 2013-04-30 支持体分離装置及び支持体分離方法

Country Status (4)

Country Link
US (1) US9238357B2 (enExample)
JP (1) JP5926700B2 (enExample)
KR (1) KR101625730B1 (enExample)
TW (1) TWI545685B (enExample)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6216727B2 (ja) * 2014-05-08 2017-10-18 東京応化工業株式会社 支持体分離方法
CN204792711U (zh) * 2015-01-27 2015-11-18 精材科技股份有限公司 剥离装置
JP6612648B2 (ja) * 2016-02-17 2019-11-27 東京応化工業株式会社 支持体分離装置及び支持体分離方法
JP6622661B2 (ja) 2016-06-29 2019-12-18 東京応化工業株式会社 支持体分離装置、及び支持体分離方法
JP6695227B2 (ja) * 2016-07-19 2020-05-20 東京応化工業株式会社 支持体分離装置および支持体分離方法
CN113299576B (zh) * 2020-02-21 2022-11-22 济南晶正电子科技有限公司 一种薄膜机械分离装置
CN115803851B (zh) * 2021-01-21 2023-06-30 信越工程株式会社 工件分离装置及工件分离方法

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7187162B2 (en) * 2002-12-16 2007-03-06 S.O.I.Tec Silicon On Insulator Technologies S.A. Tools and methods for disuniting semiconductor wafers
JP2004266052A (ja) * 2003-02-28 2004-09-24 Canon Inc 重ね合わせ装置
JP2005057046A (ja) 2003-08-04 2005-03-03 Sekisui Chem Co Ltd Ｉｃチップの製造方法及びｉｃチップの製造装置
JP2005191535A (ja) * 2003-12-01 2005-07-14 Tokyo Ohka Kogyo Co Ltd 貼り付け装置および貼り付け方法
JP4985513B2 (ja) * 2008-03-26 2012-07-25 富士通セミコンダクター株式会社 電子部品の剥離方法及び剥離装置
JP5487560B2 (ja) * 2008-05-28 2014-05-07 富士通株式会社 基板処理装置及び基板処理方法
JP5210060B2 (ja) 2008-07-02 2013-06-12 東京応化工業株式会社 剥離装置および剥離方法
EP2357208B1 (en) * 2008-12-11 2014-05-07 DIC Corporation Curable resin compositions, coatings, and laminated plastics including the same
JP5155454B2 (ja) * 2009-08-31 2013-03-06 旭硝子株式会社 剥離装置
JP5795199B2 (ja) 2011-06-16 2015-10-14 株式会社ダイヘン 電力変換装置及び電力変換装置の制御方法
JP2014179355A (ja) * 2011-07-04 2014-09-25 Asahi Glass Co Ltd ガラス基板の剥離方法及びその装置
US8858756B2 (en) * 2011-10-31 2014-10-14 Masahiro Lee Ultrathin wafer debonding systems
JP5977710B2 (ja) * 2013-05-10 2016-08-24 東京エレクトロン株式会社 剥離装置、剥離システム、剥離方法、プログラム及びコンピュータ記憶媒体

Also Published As

Publication number Publication date
TWI545685B (zh) 2016-08-11
JP2014216632A (ja) 2014-11-17
US20140318714A1 (en) 2014-10-30
KR101625730B1 (ko) 2016-06-13
US9238357B2 (en) 2016-01-19
TW201448107A (zh) 2014-12-16
KR20140130018A (ko) 2014-11-07

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