JP5916617B2 - ブラシコンディショニングおよびパッドコンディショニングのための装置および方法 - Google Patents

ブラシコンディショニングおよびパッドコンディショニングのための装置および方法 Download PDF

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Publication number
JP5916617B2
JP5916617B2 JP2012535203A JP2012535203A JP5916617B2 JP 5916617 B2 JP5916617 B2 JP 5916617B2 JP 2012535203 A JP2012535203 A JP 2012535203A JP 2012535203 A JP2012535203 A JP 2012535203A JP 5916617 B2 JP5916617 B2 JP 5916617B2
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JP
Japan
Prior art keywords
axis
conditioner
cylindrical rollers
cylindrical
rollers
Prior art date
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JP2012535203A
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English (en)
Japanese (ja)
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JP2013508969A5 (enExample
JP2013508969A (ja
Inventor
セン−ホー コー，
セン−ホー コー，
ラクシュマナン カルピア，
ラクシュマナン カルピア，
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Applied Materials Inc
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Applied Materials Inc
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Publication of JP2013508969A5 publication Critical patent/JP2013508969A5/ja
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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B15/00—Preventing escape of dirt or fumes from the area where they are produced; Collecting or removing dirt or fumes from that area
    • B08B15/04—Preventing escape of dirt or fumes from the area where they are produced; Collecting or removing dirt or fumes from that area from a small area, e.g. a tool
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B1/00—Cleaning by methods involving the use of tools
    • B08B1/10—Cleaning by methods involving the use of tools characterised by the type of cleaning tool
    • B08B1/12—Brushes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B1/00—Cleaning by methods involving the use of tools
    • B08B1/30—Cleaning by methods involving the use of tools by movement of cleaning members over a surface
    • B08B1/32—Cleaning by methods involving the use of tools by movement of cleaning members over a surface using rotary cleaning members
    • B08B1/34—Cleaning by methods involving the use of tools by movement of cleaning members over a surface using rotary cleaning members rotating about an axis parallel to the surface
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B1/00—Cleaning by methods involving the use of tools
    • B08B1/50—Cleaning by methods involving the use of tools involving cleaning of the cleaning members
    • B08B1/52—Cleaning by methods involving the use of tools involving cleaning of the cleaning members using fluids
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B1/00—Cleaning by methods involving the use of tools
    • B08B1/50—Cleaning by methods involving the use of tools involving cleaning of the cleaning members
    • B08B1/54—Cleaning by methods involving the use of tools involving cleaning of the cleaning members using mechanical tools
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/041—Cleaning travelling work
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B1/00—Processes of grinding or polishing; Use of auxiliary equipment in connection with such processes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/04—Lapping machines or devices; Accessories designed for working plane surfaces
    • B24B37/07—Lapping machines or devices; Accessories designed for working plane surfaces characterised by the movement of the work or lapping tool
    • B24B37/08—Lapping machines or devices; Accessories designed for working plane surfaces characterised by the movement of the work or lapping tool for double side lapping
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/11—Lapping tools
    • B24B37/20—Lapping pads for working plane surfaces
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B53/00—Devices or means for dressing or conditioning abrasive surfaces
    • B24B53/017—Devices or means for dressing, cleaning or otherwise conditioning lapping tools
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D13/00—Wheels having flexibly-acting working parts, e.g. buffing wheels; Mountings therefor
    • B24D13/02—Wheels having flexibly-acting working parts, e.g. buffing wheels; Mountings therefor acting by their periphery
    • B24D13/12—Wheels having flexibly-acting working parts, e.g. buffing wheels; Mountings therefor acting by their periphery comprising assemblies of felted or spongy material, e.g. felt, steel wool, foamed latex
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0402—Apparatus for fluid treatment
    • H10P72/0406—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0402—Apparatus for fluid treatment
    • H10P72/0406—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H10P72/0411—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H10P72/0412—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly scrubbing means, e.g. brushes
    • A—HUMAN NECESSITIES
    • A46—BRUSHWARE
    • A46B—BRUSHES
    • A46B13/00—Brushes with driven brush bodies or carriers
    • A46B13/001—Cylindrical or annular brush bodies
    • A—HUMAN NECESSITIES
    • A46—BRUSHWARE
    • A46B—BRUSHES
    • A46B2200/00—Brushes characterized by their functions, uses or applications
    • A46B2200/30—Brushes for cleaning or polishing
    • A46B2200/3093—Brush with abrasive properties, e.g. wire bristles

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Cleaning In General (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
JP2012535203A 2009-10-22 2010-08-25 ブラシコンディショニングおよびパッドコンディショニングのための装置および方法 Active JP5916617B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US12/603,771 2009-10-22
US12/603,771 US8458843B2 (en) 2009-10-22 2009-10-22 Apparatus and methods for brush and pad conditioning
PCT/US2010/046599 WO2011049671A1 (en) 2009-10-22 2010-08-25 Apparatus and methods for brush and pad conditioning

Publications (3)

Publication Number Publication Date
JP2013508969A JP2013508969A (ja) 2013-03-07
JP2013508969A5 JP2013508969A5 (enExample) 2013-10-03
JP5916617B2 true JP5916617B2 (ja) 2016-05-11

Family

ID=43897340

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2012535203A Active JP5916617B2 (ja) 2009-10-22 2010-08-25 ブラシコンディショニングおよびパッドコンディショニングのための装置および方法

Country Status (4)

Country Link
US (3) US8458843B2 (enExample)
JP (1) JP5916617B2 (enExample)
TW (1) TWI535529B (enExample)
WO (1) WO2011049671A1 (enExample)

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US8458843B2 (en) * 2009-10-22 2013-06-11 Applied Materials, Inc. Apparatus and methods for brush and pad conditioning
US9646859B2 (en) * 2010-04-30 2017-05-09 Applied Materials, Inc. Disk-brush cleaner module with fluid jet
US20130196572A1 (en) * 2012-01-27 2013-08-01 Sen-Hou Ko Conditioning a pad in a cleaning module
CN102601736A (zh) * 2012-03-22 2012-07-25 珠海镇东有限公司 一种背压辊、磨板机整刷系统及方法
CN104289470B (zh) * 2014-09-30 2017-11-14 重庆益新阳工贸有限公司 一种扫刷式纺织锭子超声波清洗机
CN110121767B (zh) 2016-12-30 2023-05-12 应用材料公司 用于基板上的均匀液体流动分布的喷雾棒设计
US11923208B2 (en) * 2017-05-19 2024-03-05 Illinois Tool Works Inc. Methods and apparatuses for chemical delivery for brush conditioning
US10410936B2 (en) * 2017-05-19 2019-09-10 Illinois Tool Works Inc. Methods and apparatuses for effluent monitoring for brush conditioning
US10149135B1 (en) * 2017-05-30 2018-12-04 Illinois Tool Works Inc. Methods and apparatuses for wireless communication with a brush
US10170343B1 (en) * 2017-06-30 2019-01-01 Taiwan Semiconductor Manufacturing Co., Ltd. Post-CMP cleaning apparatus and method with brush self-cleaning function
CN107377441B (zh) * 2017-07-31 2021-01-22 京东方科技集团股份有限公司 清洗装置、清洗设备及清洗方法
CN108940939A (zh) * 2018-06-14 2018-12-07 东莞市光纳光电科技有限公司 一种具备自清洁能力的指纹识别屏
US11839907B2 (en) * 2018-08-17 2023-12-12 Taiwan Semiconductor Manufacturing Company, Ltd. Breaking-in and cleaning method and apparatus for wafer-cleaning brush
NL2022059B1 (en) * 2018-11-23 2020-06-09 Gerald Jg Belemans Cleaning device for a pair of spectacles having bar-shaped cleaning elements.
JP7161418B2 (ja) 2019-01-30 2022-10-26 株式会社荏原製作所 基板洗浄装置、基板処理装置、洗浄部材のセルフクリーニング方法
JP7274883B2 (ja) * 2019-02-19 2023-05-17 株式会社荏原製作所 洗浄部材用洗浄装置及び基板処理装置
JP7284514B2 (ja) * 2020-05-11 2023-05-31 アピックヤマダ株式会社 樹脂モールド装置及びクリーニング方法
CN115995405A (zh) * 2021-10-19 2023-04-21 杭州众硅电子科技有限公司 一种多晶圆刷洗装置
US12224186B2 (en) * 2023-04-03 2025-02-11 Applied Materials, Inc. Apparatus and method of brush cleaning using periodic chemical treatments
KR20250019478A (ko) 2023-08-01 2025-02-10 삼성전자주식회사 웨이퍼 세정 장치
US20260048419A1 (en) * 2024-08-13 2026-02-19 Applied Materials, Inc. Chemical mechanical polishing system cleaning module
JP7699871B1 (ja) * 2024-09-19 2025-06-30 齊藤精機株式会社 ワーク研削装置における研削ユニットの防液ボックス

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Also Published As

Publication number Publication date
US8458843B2 (en) 2013-06-11
TW201114548A (en) 2011-05-01
JP2013508969A (ja) 2013-03-07
TWI535529B (zh) 2016-06-01
US20110094537A1 (en) 2011-04-28
WO2011049671A1 (en) 2011-04-28
US20130247314A1 (en) 2013-09-26
US8813293B2 (en) 2014-08-26
US20140360976A1 (en) 2014-12-11
WO2011049671A4 (en) 2011-07-07

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