JP2013508969A5 - - Google Patents

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Publication number
JP2013508969A5
JP2013508969A5 JP2012535203A JP2012535203A JP2013508969A5 JP 2013508969 A5 JP2013508969 A5 JP 2013508969A5 JP 2012535203 A JP2012535203 A JP 2012535203A JP 2012535203 A JP2012535203 A JP 2012535203A JP 2013508969 A5 JP2013508969 A5 JP 2013508969A5
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JP
Japan
Prior art keywords
axis
conditioner
brush box
rollers
cylindrical
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2012535203A
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English (en)
Japanese (ja)
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JP5916617B2 (ja
JP2013508969A (ja
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Publication date
Priority claimed from US12/603,771 external-priority patent/US8458843B2/en
Application filed filed Critical
Publication of JP2013508969A publication Critical patent/JP2013508969A/ja
Publication of JP2013508969A5 publication Critical patent/JP2013508969A5/ja
Application granted granted Critical
Publication of JP5916617B2 publication Critical patent/JP5916617B2/ja
Active legal-status Critical Current
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JP2012535203A 2009-10-22 2010-08-25 ブラシコンディショニングおよびパッドコンディショニングのための装置および方法 Active JP5916617B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US12/603,771 2009-10-22
US12/603,771 US8458843B2 (en) 2009-10-22 2009-10-22 Apparatus and methods for brush and pad conditioning
PCT/US2010/046599 WO2011049671A1 (en) 2009-10-22 2010-08-25 Apparatus and methods for brush and pad conditioning

Publications (3)

Publication Number Publication Date
JP2013508969A JP2013508969A (ja) 2013-03-07
JP2013508969A5 true JP2013508969A5 (enExample) 2013-10-03
JP5916617B2 JP5916617B2 (ja) 2016-05-11

Family

ID=43897340

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2012535203A Active JP5916617B2 (ja) 2009-10-22 2010-08-25 ブラシコンディショニングおよびパッドコンディショニングのための装置および方法

Country Status (4)

Country Link
US (3) US8458843B2 (enExample)
JP (1) JP5916617B2 (enExample)
TW (1) TWI535529B (enExample)
WO (1) WO2011049671A1 (enExample)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8458843B2 (en) * 2009-10-22 2013-06-11 Applied Materials, Inc. Apparatus and methods for brush and pad conditioning
US9646859B2 (en) * 2010-04-30 2017-05-09 Applied Materials, Inc. Disk-brush cleaner module with fluid jet
US20130196572A1 (en) * 2012-01-27 2013-08-01 Sen-Hou Ko Conditioning a pad in a cleaning module
CN102601736A (zh) * 2012-03-22 2012-07-25 珠海镇东有限公司 一种背压辊、磨板机整刷系统及方法
CN104289470B (zh) * 2014-09-30 2017-11-14 重庆益新阳工贸有限公司 一种扫刷式纺织锭子超声波清洗机
WO2018125821A1 (en) 2016-12-30 2018-07-05 Applied Materials, Inc. Spray bar design for uniform liquid flow distribution on a substrate
US10410936B2 (en) * 2017-05-19 2019-09-10 Illinois Tool Works Inc. Methods and apparatuses for effluent monitoring for brush conditioning
US11923208B2 (en) * 2017-05-19 2024-03-05 Illinois Tool Works Inc. Methods and apparatuses for chemical delivery for brush conditioning
US10149135B1 (en) * 2017-05-30 2018-12-04 Illinois Tool Works Inc. Methods and apparatuses for wireless communication with a brush
US10170343B1 (en) * 2017-06-30 2019-01-01 Taiwan Semiconductor Manufacturing Co., Ltd. Post-CMP cleaning apparatus and method with brush self-cleaning function
CN107377441B (zh) * 2017-07-31 2021-01-22 京东方科技集团股份有限公司 清洗装置、清洗设备及清洗方法
CN108940939A (zh) * 2018-06-14 2018-12-07 东莞市光纳光电科技有限公司 一种具备自清洁能力的指纹识别屏
US11839907B2 (en) * 2018-08-17 2023-12-12 Taiwan Semiconductor Manufacturing Company, Ltd. Breaking-in and cleaning method and apparatus for wafer-cleaning brush
NL2022059B1 (en) * 2018-11-23 2020-06-09 Gerald Jg Belemans Cleaning device for a pair of spectacles having bar-shaped cleaning elements.
JP7161418B2 (ja) 2019-01-30 2022-10-26 株式会社荏原製作所 基板洗浄装置、基板処理装置、洗浄部材のセルフクリーニング方法
JP7274883B2 (ja) * 2019-02-19 2023-05-17 株式会社荏原製作所 洗浄部材用洗浄装置及び基板処理装置
JP7284514B2 (ja) * 2020-05-11 2023-05-31 アピックヤマダ株式会社 樹脂モールド装置及びクリーニング方法
US12224186B2 (en) * 2023-04-03 2025-02-11 Applied Materials, Inc. Apparatus and method of brush cleaning using periodic chemical treatments
JP7699871B1 (ja) * 2024-09-19 2025-06-30 齊藤精機株式会社 ワーク研削装置における研削ユニットの防液ボックス

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US5639311A (en) 1995-06-07 1997-06-17 International Business Machines Corporation Method of cleaning brushes used in post CMP semiconductor wafer cleaning operations
US5745945A (en) * 1996-06-28 1998-05-05 International Business Machines Corporation Brush conditioner for a semiconductor cleaning brush
JPH10323631A (ja) * 1997-05-23 1998-12-08 Ebara Corp 洗浄部材のセルフクリーニング装置
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US6158448A (en) 1998-03-27 2000-12-12 Rippey Corporation System for cleaning sponge or porous polymeric products
JP2001054765A (ja) * 1999-08-19 2001-02-27 Dainippon Screen Mfg Co Ltd 基板洗浄装置
US20020006767A1 (en) * 1999-12-22 2002-01-17 Applied Materials, Inc. Ion exchange pad or brush and method of regenerating the same
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US20020115283A1 (en) * 2001-02-20 2002-08-22 Chartered Semiconductor Manufacturing Ltd. Planarization by selective electro-dissolution
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JP4934644B2 (ja) * 2007-06-25 2012-05-16 株式会社日立ハイテクノロジーズ ディスク洗浄機構およびディスク洗浄装置
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US8795035B2 (en) * 2008-06-26 2014-08-05 Saint-Gobain Abrasives, Inc. Chemical mechanical planarization pad conditioner and method of forming
US8458843B2 (en) * 2009-10-22 2013-06-11 Applied Materials, Inc. Apparatus and methods for brush and pad conditioning
US20130196572A1 (en) * 2012-01-27 2013-08-01 Sen-Hou Ko Conditioning a pad in a cleaning module

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