JP5908001B2 - 基板処理装置 - Google Patents
基板処理装置 Download PDFInfo
- Publication number
- JP5908001B2 JP5908001B2 JP2014005782A JP2014005782A JP5908001B2 JP 5908001 B2 JP5908001 B2 JP 5908001B2 JP 2014005782 A JP2014005782 A JP 2014005782A JP 2014005782 A JP2014005782 A JP 2014005782A JP 5908001 B2 JP5908001 B2 JP 5908001B2
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- neutral particles
- wafer
- directivity
- separation plate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45587—Mechanical means for changing the gas flow
- C23C16/45591—Fixed means, e.g. wings, baffles
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/04—Coating on selected surface areas, e.g. using masks
- C23C16/045—Coating cavities or hollow spaces, e.g. interior of tubes; Infiltration of porous substrates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
- C23C16/4582—Rigid and flat substrates, e.g. plates or discs
- C23C16/4583—Rigid and flat substrates, e.g. plates or discs the substrate being supported substantially horizontally
- C23C16/4584—Rigid and flat substrates, e.g. plates or discs the substrate being supported substantially horizontally the substrate being rotated
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
- C23C16/511—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using microwave discharges
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32357—Generation remote from the workpiece, e.g. down-stream
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32422—Arrangement for selecting ions or species in the plasma
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physics & Mathematics (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Plasma & Fusion (AREA)
- Analytical Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Chemical Vapour Deposition (AREA)
- Drying Of Semiconductors (AREA)
- Particle Accelerators (AREA)
- Plasma Technology (AREA)
Description
また、別な観点による本発明は、処理容器内の基板をプラズマにより処理する基板処理装置であって、前記処理容器内にプラズマを生成するプラズマ発生源と、前記プラズマ発生源に対向して配置され、前記処理容器内において基板を保持する基板保持機構と、前記プラズマ発生源と前記基板保持機構との間に配置され、前記プラズマ発生源で生成されたプラズマを中性化して中性粒子を生成し、且つ当該中性粒子を前記基板保持機構に保持された基板に照射する開口が複数形成された分離板と、前記基板保持機構で保持される基板上での中性粒子の入射角度分布のピーク値が基板の法線方向よりずれた位置で、且つ前記ピーク値が法線方向を挟んだ位置に複数分布するように、基板に照射される中性粒子の指向性を調整する指向性調整機構と、を有し、前記分離板は複数の領域に区画され、当該領域毎に前記開口が鉛直方向に対して所定の角度傾いて設けられており、前記指向性調整機構は、前記基板保持機構に保持された基板と前記分離板とを相対的に回転させることで、前記中性粒子の指向性を調整することを特徴としている。
10 ウェハチャック
11 処理容器
12 本体部
13 マイクロ波発生源
14 マイクロ波供給部
15 分離板
15a 開口
20 回転軸
21 チャック駆動機構
30 排気口
31 排気機構
50 支持部材
51 マイクロ波透過板
52 スロット板
53 誘電体板
54 プレート
55 同軸導波管
100 制御装置
110 パターン
U プラズマ発生室
P 処理室
W ウェハ
Claims (4)
- 処理容器内の基板をプラズマにより処理する基板処理装置であって、
前記処理容器内にプラズマを生成するプラズマ発生源と、
前記プラズマ発生源に対向して配置され、前記処理容器内において基板を保持する基板保持機構と、
前記プラズマ発生源と前記基板保持機構との間に配置され、前記プラズマ発生源で生成されたプラズマを中性化して中性粒子を生成し、且つ当該中性粒子を前記基板保持機構に保持された基板に照射する開口が複数形成された分離板と、
前記基板保持機構で保持される基板上での中性粒子の入射角度分布のピーク値が基板の法線方向よりずれた位置で、且つ前記ピーク値が法線方向を挟んだ位置に複数分布するように、基板に照射される中性粒子の指向性を調整する指向性調整機構と、を有し、
前記分離板の開口は、前記基板保持機構に保持された基板の表面に垂直な方向に対して所定の角度傾いた第1の開口と、
前記分離板の表面に垂直な軸に対して線対称に形成された第2の開口と、を有し、
前記第1の開口と、前記第2の開口は、互いに隣接して交互に設けられていることを特徴とする、基板処理装置。 - 前記指向性調整機構は、前記基板保持機構に保持された基板と前記分離板とを相対的に回転させることで、前記中性粒子の指向性を調整することを特徴とする、請求項1に記載の基板処理装置。
- 処理容器内の基板をプラズマにより処理する基板処理装置であって、
前記処理容器内にプラズマを生成するプラズマ発生源と、
前記プラズマ発生源に対向して配置され、前記処理容器内において基板を保持する基板保持機構と、
前記プラズマ発生源と前記基板保持機構との間に配置され、前記プラズマ発生源で生成されたプラズマを中性化して中性粒子を生成し、且つ当該中性粒子を前記基板保持機構に保持された基板に照射する開口が複数形成された分離板と、
前記基板保持機構で保持される基板上での中性粒子の入射角度分布のピーク値が基板の法線方向よりずれた位置で、且つ前記ピーク値が法線方向を挟んだ位置に複数分布するように、基板に照射される中性粒子の指向性を調整する指向性調整機構と、を有し、
前記分離板は複数の領域に区画され、当該領域毎に前記開口が鉛直方向に対して所定の角度傾いて設けられており、
前記指向性調整機構は、前記基板保持機構に保持された基板と前記分離板とを相対的に回転させることで、前記中性粒子の指向性を調整することを特徴とする、基板処理装置。 - 前記指向性調整機構は、前記中性粒子の入射角分布のピーク値が2n(nは1以上の整数)回対称の分布となるように、前記中性粒子の指向性を調整することを特徴とする、請求項1〜3のいずれか一項に記載の基板処理装置。
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2014005782A JP5908001B2 (ja) | 2014-01-16 | 2014-01-16 | 基板処理装置 |
KR1020150006723A KR101658304B1 (ko) | 2014-01-16 | 2015-01-14 | 기판 처리 장치 |
US14/597,929 US20150197853A1 (en) | 2014-01-16 | 2015-01-15 | Substrate processing apparatus |
US15/600,467 US20170253972A1 (en) | 2014-01-16 | 2017-05-19 | Substrate processing apparatus |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2014005782A JP5908001B2 (ja) | 2014-01-16 | 2014-01-16 | 基板処理装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2015134943A JP2015134943A (ja) | 2015-07-27 |
JP5908001B2 true JP5908001B2 (ja) | 2016-04-26 |
Family
ID=53520832
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2014005782A Expired - Fee Related JP5908001B2 (ja) | 2014-01-16 | 2014-01-16 | 基板処理装置 |
Country Status (3)
Country | Link |
---|---|
US (2) | US20150197853A1 (ja) |
JP (1) | JP5908001B2 (ja) |
KR (1) | KR101658304B1 (ja) |
Families Citing this family (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2017059579A (ja) * | 2015-09-14 | 2017-03-23 | 東京エレクトロン株式会社 | プラズマ処理装置 |
US9812349B2 (en) * | 2015-12-01 | 2017-11-07 | Lam Research Corporation | Control of the incidence angle of an ion beam on a substrate |
JP2018011032A (ja) * | 2016-07-15 | 2018-01-18 | 株式会社東芝 | 流路構造及び処理装置 |
US10141161B2 (en) * | 2016-09-12 | 2018-11-27 | Varian Semiconductor Equipment Associates, Inc. | Angle control for radicals and reactive neutral ion beams |
CN106455282A (zh) * | 2016-11-04 | 2017-02-22 | 中国工程物理研究院流体物理研究所 | 离子过滤方法、具有离子过滤功能的栅网及中子发生器 |
US11694911B2 (en) * | 2016-12-20 | 2023-07-04 | Lam Research Corporation | Systems and methods for metastable activated radical selective strip and etch using dual plenum showerhead |
JP6855884B2 (ja) * | 2017-04-04 | 2021-04-07 | 富士通株式会社 | 排気浄化装置、内燃装置、発電装置及び自動車 |
US10790119B2 (en) * | 2017-06-09 | 2020-09-29 | Mattson Technology, Inc | Plasma processing apparatus with post plasma gas injection |
US11201036B2 (en) | 2017-06-09 | 2021-12-14 | Beijing E-Town Semiconductor Technology Co., Ltd | Plasma strip tool with uniformity control |
CN110391120B (zh) * | 2018-04-17 | 2022-02-22 | 北京北方华创微电子装备有限公司 | 一种喷头和等离子体处理腔室 |
GB201904587D0 (en) * | 2019-04-02 | 2019-05-15 | Oxford Instruments Nanotechnology Tools Ltd | Surface processing apparatus |
US11553518B2 (en) * | 2019-11-07 | 2023-01-10 | Qualcomm Incorporated | Prioritization of uplink transmissions on NR-U |
US11881378B2 (en) * | 2022-05-13 | 2024-01-23 | Applied Materials, Inc. | Angle control for neutral reactive species generated in a plasma |
Family Cites Families (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0639707B2 (ja) * | 1987-05-15 | 1994-05-25 | 日新電機株式会社 | 薄膜形成装置 |
JP3162223B2 (ja) * | 1993-01-27 | 2001-04-25 | 株式会社リコー | 薄膜形成装置 |
JP3364830B2 (ja) * | 1998-06-09 | 2003-01-08 | 株式会社日立製作所 | イオンビーム加工装置 |
JP2000200885A (ja) * | 1999-01-06 | 2000-07-18 | Seiko Epson Corp | キャパシタ―の製造方法 |
JP4039834B2 (ja) * | 2001-09-28 | 2008-01-30 | 株式会社荏原製作所 | エッチング方法及びエッチング装置 |
KR100412953B1 (ko) * | 2001-11-26 | 2003-12-31 | 학교법인 성균관대학 | 중성빔을 이용한 식각장치 |
JP3748230B2 (ja) * | 2002-02-20 | 2006-02-22 | 株式会社日立ハイテクノロジーズ | プラズマエッチング装置及びシャワープレート |
JP2005089823A (ja) * | 2003-09-17 | 2005-04-07 | Seiji Sagawa | 成膜装置および成膜方法 |
KR100559245B1 (ko) * | 2004-02-27 | 2006-03-15 | 학교법인 성균관대학 | 삼중그리드를 이용한 반도체 식각용 중성빔 소오스 |
JP4350576B2 (ja) * | 2004-03-31 | 2009-10-21 | 俊夫 後藤 | プラズマ処理装置 |
KR100714898B1 (ko) * | 2005-01-21 | 2007-05-04 | 삼성전자주식회사 | 중성빔을 이용한 기판 처리장치 및 처리방법 |
KR100702010B1 (ko) * | 2005-03-07 | 2007-03-30 | 삼성전자주식회사 | 반사체, 이를 채택하는 기판 처리 장치 및 이를 사용하는기판 처리 방법 |
KR100722821B1 (ko) * | 2005-03-22 | 2007-05-30 | 성균관대학교산학협력단 | 개선된 반사체를 구비한 중성빔 식각장치 |
JP4700441B2 (ja) * | 2005-08-29 | 2011-06-15 | 東ソー・クォーツ株式会社 | 斜め貫通孔を有する開口体の製造方法 |
JP4971930B2 (ja) * | 2007-09-28 | 2012-07-11 | 東京エレクトロン株式会社 | プラズマ処理装置 |
KR100969520B1 (ko) * | 2008-08-06 | 2010-07-09 | 한국과학기술원 | 기판 처리 장치 및 기판 처리 방법 |
JP5264938B2 (ja) * | 2011-01-13 | 2013-08-14 | 株式会社半導体理工学研究センター | 中性粒子照射型cvd装置 |
US9288889B2 (en) * | 2013-03-13 | 2016-03-15 | Varian Semiconductor Equipment Associates, Inc. | Apparatus and techniques for energetic neutral beam processing |
-
2014
- 2014-01-16 JP JP2014005782A patent/JP5908001B2/ja not_active Expired - Fee Related
-
2015
- 2015-01-14 KR KR1020150006723A patent/KR101658304B1/ko active IP Right Grant
- 2015-01-15 US US14/597,929 patent/US20150197853A1/en not_active Abandoned
-
2017
- 2017-05-19 US US15/600,467 patent/US20170253972A1/en not_active Abandoned
Also Published As
Publication number | Publication date |
---|---|
US20150197853A1 (en) | 2015-07-16 |
US20170253972A1 (en) | 2017-09-07 |
JP2015134943A (ja) | 2015-07-27 |
KR20150085793A (ko) | 2015-07-24 |
KR101658304B1 (ko) | 2016-09-22 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP5908001B2 (ja) | 基板処理装置 | |
KR102699441B1 (ko) | 기판을 처리하기 위한 장치 및 시스템, 및 기판을 에칭하는 방법 | |
US9997422B2 (en) | Systems and methods for frequency modulation of radiofrequency power supply for controlling plasma instability | |
US9543126B2 (en) | Collimator for use in substrate processing chambers | |
KR100663351B1 (ko) | 플라즈마 처리장치 | |
US8038836B2 (en) | Plasma processing apparatus | |
TWI411034B (zh) | A plasma processing apparatus and a method and a focusing ring | |
KR100349064B1 (ko) | 플라즈마처리장치 | |
KR101046335B1 (ko) | 할로우 캐소드 플라즈마 발생방법 및 할로우 캐소드플라즈마를 이용한 대면적 기판 처리방법 | |
KR102614244B1 (ko) | 플라즈마 처리 장치 및 플라즈마 처리 방법 | |
KR20130141455A (ko) | 반도체 기판의 가변 밀도 플라즈마 프로세싱 | |
TWI751423B (zh) | 電漿處理裝置及電漿處理方法 | |
US20130323916A1 (en) | Plasma doping method and apparatus | |
KR102582667B1 (ko) | 플라즈마 식각 장치를 이용한 반도체 소자의 제조 방법 | |
JP7204350B2 (ja) | 載置台、基板処理装置及びエッジリング | |
TW201717264A (zh) | 用以在混合模式處理操作中分別施加帶電的電漿成分與紫外光的系統及方法 | |
US9034772B2 (en) | Etching method | |
KR102568804B1 (ko) | 지지 유닛 및 이를 포함하는 기판 처리 장치 | |
WO2016047493A1 (ja) | 基板処理方法、コンピュータ記憶媒体及び基板処理システム | |
TWI795794B (zh) | 處理系統、包括高角度提取光學元件之提取總成 | |
JP3192352B2 (ja) | プラズマ処理装置 | |
JP6450932B2 (ja) | プラズマ処理装置及び方法 | |
JPH0620794A (ja) | プラズマ発生装置およびプラズマ発生方法 | |
US20220336194A1 (en) | Plasma processing apparatus | |
KR20150117227A (ko) | 플라즈마 처리 장치 및 플라즈마 처리 방법 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20151112 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20151124 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20160120 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20160301 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20160322 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 5908001 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
LAPS | Cancellation because of no payment of annual fees |