JP5901477B2 - 塗布、現像装置 - Google Patents

塗布、現像装置 Download PDF

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Publication number
JP5901477B2
JP5901477B2 JP2012198403A JP2012198403A JP5901477B2 JP 5901477 B2 JP5901477 B2 JP 5901477B2 JP 2012198403 A JP2012198403 A JP 2012198403A JP 2012198403 A JP2012198403 A JP 2012198403A JP 5901477 B2 JP5901477 B2 JP 5901477B2
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module
unit block
unit
substrate
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JP2014053540A5 (enExample
JP2014053540A (ja
Inventor
郁雄 須中
郁雄 須中
勝洋 森川
勝洋 森川
智伸 古庄
智伸 古庄
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Tokyo Electron Ltd
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Tokyo Electron Ltd
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  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2012198403A 2012-09-10 2012-09-10 塗布、現像装置 Active JP5901477B2 (ja)

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JP2012198403A JP5901477B2 (ja) 2012-09-10 2012-09-10 塗布、現像装置

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JP2012198403A JP5901477B2 (ja) 2012-09-10 2012-09-10 塗布、現像装置

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JP2014053540A JP2014053540A (ja) 2014-03-20
JP2014053540A5 JP2014053540A5 (enExample) 2014-10-23
JP5901477B2 true JP5901477B2 (ja) 2016-04-13

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Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5894623B2 (ja) 2014-03-17 2016-03-30 株式会社フジキカイ 包装機におけるフィルム処理方法及びその装置
JP7300935B2 (ja) * 2019-09-02 2023-06-30 東京エレクトロン株式会社 塗布、現像装置
JP7521391B2 (ja) * 2020-11-25 2024-07-24 東京エレクトロン株式会社 基板処理装置及び基板処理方法
CN113539937B (zh) * 2021-07-09 2023-03-03 江西龙芯微科技有限公司 一种晶圆承载装置

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3320622B2 (ja) * 1996-11-08 2002-09-03 東京エレクトロン株式会社 処理装置および処理方法
JP4291096B2 (ja) * 2003-09-22 2009-07-08 大日本スクリーン製造株式会社 基板処理装置および基板処理装置のための機能ブロック組合せシステム
JP4106017B2 (ja) * 2003-12-19 2008-06-25 東京エレクトロン株式会社 現像装置及び現像方法
JP5348083B2 (ja) * 2010-07-16 2013-11-20 東京エレクトロン株式会社 塗布、現像装置、塗布、現像方法及び記憶媒体
JP5338777B2 (ja) * 2010-09-02 2013-11-13 東京エレクトロン株式会社 塗布、現像装置、塗布、現像方法及び記憶媒体
JP2012080077A (ja) * 2010-09-06 2012-04-19 Tokyo Electron Ltd 基板処理装置及び基板処理方法
JP5212443B2 (ja) * 2010-09-13 2013-06-19 東京エレクトロン株式会社 塗布、現像装置、塗布、現像方法及び記憶媒体
JP5572666B2 (ja) * 2012-05-24 2014-08-13 株式会社Ｓｏｋｕｄｏ 基板処理装置

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