JP5854512B2 - 熱分解窒化ホウ素被覆炭素質基材の製造方法 - Google Patents

熱分解窒化ホウ素被覆炭素質基材の製造方法 Download PDF

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Publication number
JP5854512B2
JP5854512B2 JP2012274300A JP2012274300A JP5854512B2 JP 5854512 B2 JP5854512 B2 JP 5854512B2 JP 2012274300 A JP2012274300 A JP 2012274300A JP 2012274300 A JP2012274300 A JP 2012274300A JP 5854512 B2 JP5854512 B2 JP 5854512B2
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Japan
Prior art keywords
boron nitride
carbonaceous substrate
pyrolytic boron
thermal expansion
expansion coefficient
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JP2012274300A
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English (en)
Japanese (ja)
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JP2014118600A (ja
Inventor
加藤　公二
公二 加藤
山村　和市
和市 山村
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Shin Etsu Chemical Co Ltd
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Shin Etsu Chemical Co Ltd
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Priority to JP2012274300A priority Critical patent/JP5854512B2/ja
Priority to KR1020130118327A priority patent/KR20140078533A/ko
Priority to TW102146452A priority patent/TWI510666B/zh
Publication of JP2014118600A publication Critical patent/JP2014118600A/ja
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/02—Pretreatment of the material to be coated
    • C23C16/0254—Physical treatment to alter the texture of the surface, e.g. scratching or polishing
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/34—Nitrides
    • C23C16/342—Boron nitride

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  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Carbon And Carbon Compounds (AREA)
  • Drying Of Semiconductors (AREA)
JP2012274300A 2012-12-17 2012-12-17 熱分解窒化ホウ素被覆炭素質基材の製造方法 Active JP5854512B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2012274300A JP5854512B2 (ja) 2012-12-17 2012-12-17 熱分解窒化ホウ素被覆炭素質基材の製造方法
KR1020130118327A KR20140078533A (ko) 2012-12-17 2013-10-04 열분해 질화붕소 피복 탄소질 기재의 제조방법
TW102146452A TWI510666B (zh) 2012-12-17 2013-12-16 熱解氮化硼被覆碳基材的製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2012274300A JP5854512B2 (ja) 2012-12-17 2012-12-17 熱分解窒化ホウ素被覆炭素質基材の製造方法

Publications (2)

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JP2014118600A JP2014118600A (ja) 2014-06-30
JP5854512B2 true JP5854512B2 (ja) 2016-02-09

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JP2012274300A Active JP5854512B2 (ja) 2012-12-17 2012-12-17 熱分解窒化ホウ素被覆炭素質基材の製造方法

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JP (1) JP5854512B2 (zh)
KR (1) KR20140078533A (zh)
TW (1) TWI510666B (zh)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2016102232A (ja) * 2014-11-27 2016-06-02 信越化学工業株式会社 熱分解窒化ホウ素被覆基材およびその製造方法
JP7294021B2 (ja) * 2019-09-18 2023-06-20 住友金属鉱山株式会社 黒鉛製支持基板の表面処理方法、炭化珪素多結晶膜の成膜方法および炭化珪素多結晶基板の製造方法

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0784357B2 (ja) * 1985-12-24 1995-09-13 京セラ株式会社 窒化ホウ素被覆ルツボ
JPS62207786A (ja) * 1986-03-06 1987-09-12 信越化学工業株式会社 グラフアイト材のコ−テイング方法
JPH0310076A (ja) * 1989-06-05 1991-01-17 Toshiba Ceramics Co Ltd 熱分解窒化ホウ素膜の被覆方法
EP0495095B1 (en) * 1990-08-08 1996-01-31 Advanced Ceramics Corporation Process for forming crack-free pyrolytic boron nitride on a carbon structure and article
JP2934120B2 (ja) * 1992-07-02 1999-08-16 信越化学工業株式会社 熱分解窒化ほう素容器
JP2763239B2 (ja) * 1992-10-28 1998-06-11 信越化学工業株式会社 複層セラミックスるつぼ
JP3057670B2 (ja) * 1992-10-28 2000-07-04 信越化学工業株式会社 複層セラミックスヒーター
TW200420431A (en) * 2002-11-20 2004-10-16 Shinetsu Chemical Co Heat resistant coated member, making method, and treatment using the same
JP2007317820A (ja) * 2006-05-25 2007-12-06 Shin Etsu Chem Co Ltd 静電吸着装置

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Publication number Publication date
TWI510666B (zh) 2015-12-01
TW201430162A (zh) 2014-08-01
KR20140078533A (ko) 2014-06-25
JP2014118600A (ja) 2014-06-30

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