JP5841431B2 - 基板処理装置及び基板処理方法 - Google Patents

基板処理装置及び基板処理方法 Download PDF

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Publication number
JP5841431B2
JP5841431B2 JP2011550960A JP2011550960A JP5841431B2 JP 5841431 B2 JP5841431 B2 JP 5841431B2 JP 2011550960 A JP2011550960 A JP 2011550960A JP 2011550960 A JP2011550960 A JP 2011550960A JP 5841431 B2 JP5841431 B2 JP 5841431B2
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Japan
Prior art keywords
processing liquid
substrate
plate
holding plate
processing
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JP2011550960A
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English (en)
Japanese (ja)
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JPWO2011090141A1 (ja
Inventor
黒川　禎明
禎明 黒川
晃一 濱田
晃一 濱田
小林　信雄
信雄 小林
裕次 長嶋
裕次 長嶋
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shibaura Mechatronics Corp
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Shibaura Mechatronics Corp
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Priority to JP2011550960A priority Critical patent/JP5841431B2/ja
Publication of JPWO2011090141A1 publication Critical patent/JPWO2011090141A1/ja
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
    • H01L21/0274—Photolithographic processes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor
    • G03F7/422—Stripping or agents therefor using liquids only
    • G03F7/423—Stripping or agents therefor using liquids only containing mineral acids or salts thereof, containing mineral oxidizing substances, e.g. peroxy compounds
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02041—Cleaning
    • H01L21/02043—Cleaning before device manufacture, i.e. Begin-Of-Line process
    • H01L21/02052—Wet cleaning only
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
    • H01L21/30604—Chemical etching
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H01L21/67051—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67098—Apparatus for thermal treatment
    • H01L21/67109—Apparatus for thermal treatment mainly by convection

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Power Engineering (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP2011550960A 2010-01-22 2011-01-20 基板処理装置及び基板処理方法 Active JP5841431B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2011550960A JP5841431B2 (ja) 2010-01-22 2011-01-20 基板処理装置及び基板処理方法

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2010012634 2010-01-22
JP2010012634 2010-01-22
JP2011550960A JP5841431B2 (ja) 2010-01-22 2011-01-20 基板処理装置及び基板処理方法
PCT/JP2011/051019 WO2011090141A1 (ja) 2010-01-22 2011-01-20 基板処理装置及び基板処理方法

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2015096769A Division JP6000404B2 (ja) 2010-01-22 2015-05-11 基板処理装置及び基板処理方法

Publications (2)

Publication Number Publication Date
JPWO2011090141A1 JPWO2011090141A1 (ja) 2013-05-23
JP5841431B2 true JP5841431B2 (ja) 2016-01-13

Family

ID=44306941

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JP2011550960A Active JP5841431B2 (ja) 2010-01-22 2011-01-20 基板処理装置及び基板処理方法
JP2015096769A Active JP6000404B2 (ja) 2010-01-22 2015-05-11 基板処理装置及び基板処理方法

Family Applications After (1)

Application Number Title Priority Date Filing Date
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Country Status (6)

Country Link
US (1) US9240314B2 (ko)
JP (2) JP5841431B2 (ko)
KR (2) KR101690402B1 (ko)
CN (1) CN102782807B (ko)
TW (1) TWI451524B (ko)
WO (1) WO2011090141A1 (ko)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2383771B1 (de) * 2010-04-29 2020-04-22 EV Group GmbH Vorrichtung und Verfahren zum Lösen einer Polymerschicht von einer Oberfläche eines Substrats
JP6271304B2 (ja) 2013-03-29 2018-01-31 芝浦メカトロニクス株式会社 基板処理装置及び基板処理方法
JP6222817B2 (ja) * 2013-09-10 2017-11-01 株式会社Ｓｃｒｅｅｎホールディングス 基板処理方法および基板処理装置
US20150128993A1 (en) * 2013-11-13 2015-05-14 TEF FSI, Inc. Chamber cleaning when using acid chemistries to fabricate microelectronic devices and precursors thereof
WO2015137077A1 (ja) * 2014-03-11 2015-09-17 芝浦メカトロニクス株式会社 反射型マスクの洗浄装置および反射型マスクの洗浄方法
EP3657601B1 (en) * 2014-06-27 2022-08-03 ViaSat Inc. Method of rotationally coupling antennas
JP6748524B2 (ja) * 2015-09-30 2020-09-02 芝浦メカトロニクス株式会社 基板処理装置及び基板処理方法
JP6903441B2 (ja) * 2016-03-31 2021-07-14 芝浦メカトロニクス株式会社 基板処理装置
CN110491805A (zh) * 2019-08-07 2019-11-22 长江存储科技有限责任公司 半导体处理设备及半导体处理方法
JP7403320B2 (ja) * 2020-01-07 2023-12-22 東京エレクトロン株式会社 基板処理装置
CN113448186B (zh) 2020-03-27 2024-05-14 长鑫存储技术有限公司 晶圆处理装置及晶圆处理方法
US20220396896A1 (en) * 2020-12-21 2022-12-15 Ebara Corporation Plating apparatus and plating solution agitating method
JP2023152532A (ja) 2022-04-04 2023-10-17 芝浦メカトロニクス株式会社 基板処理装置
KR20240102872A (ko) 2022-12-26 2024-07-03 시바우라 메카트로닉스 가부시끼가이샤 기판 처리 장치 및 기판 처리 방법

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61104621A (ja) * 1984-10-29 1986-05-22 Nec Corp ポジレジスト現像装置
JPH10135127A (ja) * 1996-10-31 1998-05-22 Canon Sales Co Inc 基板現像装置
JPH11260718A (ja) * 1998-01-09 1999-09-24 Tokyo Electron Ltd 現像処理方法および現像処理装置
JP2002110525A (ja) * 2000-10-02 2002-04-12 Semiconductor Energy Lab Co Ltd 現像処理方法
JP2010010348A (ja) * 2008-06-26 2010-01-14 Dainippon Screen Mfg Co Ltd 基板処理装置

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6190063B1 (en) 1998-01-09 2001-02-20 Tokyo Electron Ltd. Developing method and apparatus
JP2008066400A (ja) 2006-09-05 2008-03-21 Dainippon Screen Mfg Co Ltd 基板処理装置および基板処理方法

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61104621A (ja) * 1984-10-29 1986-05-22 Nec Corp ポジレジスト現像装置
JPH10135127A (ja) * 1996-10-31 1998-05-22 Canon Sales Co Inc 基板現像装置
JPH11260718A (ja) * 1998-01-09 1999-09-24 Tokyo Electron Ltd 現像処理方法および現像処理装置
JP2002110525A (ja) * 2000-10-02 2002-04-12 Semiconductor Energy Lab Co Ltd 現像処理方法
JP2010010348A (ja) * 2008-06-26 2010-01-14 Dainippon Screen Mfg Co Ltd 基板処理装置

Also Published As

Publication number Publication date
KR20120106899A (ko) 2012-09-26
JP2015159331A (ja) 2015-09-03
JP6000404B2 (ja) 2016-09-28
TWI451524B (zh) 2014-09-01
KR20150013342A (ko) 2015-02-04
JPWO2011090141A1 (ja) 2013-05-23
US20130025636A1 (en) 2013-01-31
TW201140744A (en) 2011-11-16
KR101555088B1 (ko) 2015-09-22
WO2011090141A1 (ja) 2011-07-28
CN102782807B (zh) 2015-07-08
KR101690402B1 (ko) 2017-01-09
CN102782807A (zh) 2012-11-14
US9240314B2 (en) 2016-01-19

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