JP5823915B2 - 静電チャックの製造方法 - Google Patents

静電チャックの製造方法 Download PDF

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Publication number
JP5823915B2
JP5823915B2 JP2012122201A JP2012122201A JP5823915B2 JP 5823915 B2 JP5823915 B2 JP 5823915B2 JP 2012122201 A JP2012122201 A JP 2012122201A JP 2012122201 A JP2012122201 A JP 2012122201A JP 5823915 B2 JP5823915 B2 JP 5823915B2
Authority
JP
Japan
Prior art keywords
substrate
electrostatic chuck
resin
heating element
resistance heating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2012122201A
Other languages
English (en)
Japanese (ja)
Other versions
JP2013247342A (ja
JP2013247342A5 (enExample
Inventor
明宏 栗林
明宏 栗林
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shinko Electric Industries Co Ltd
Original Assignee
Shinko Electric Industries Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shinko Electric Industries Co Ltd filed Critical Shinko Electric Industries Co Ltd
Priority to JP2012122201A priority Critical patent/JP5823915B2/ja
Priority to KR1020130058836A priority patent/KR20130133673A/ko
Priority to TW102118320A priority patent/TWI594359B/zh
Priority to US13/903,313 priority patent/US9019684B2/en
Publication of JP2013247342A publication Critical patent/JP2013247342A/ja
Publication of JP2013247342A5 publication Critical patent/JP2013247342A5/ja
Application granted granted Critical
Publication of JP5823915B2 publication Critical patent/JP5823915B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02N—ELECTRIC MACHINES NOT OTHERWISE PROVIDED FOR
    • H02N13/00—Clutches or holding devices using electrostatic attraction, e.g. using Johnson-Rahbek effect
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/6831—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using electrostatic chucks
    • H01L21/6833—Details of electrostatic chucks
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67098—Apparatus for thermal treatment
    • H01L21/67109—Apparatus for thermal treatment mainly by convection
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
JP2012122201A 2012-05-29 2012-05-29 静電チャックの製造方法 Active JP5823915B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2012122201A JP5823915B2 (ja) 2012-05-29 2012-05-29 静電チャックの製造方法
KR1020130058836A KR20130133673A (ko) 2012-05-29 2013-05-24 정전 척 및 정전 척의 제조 방법
TW102118320A TWI594359B (zh) 2012-05-29 2013-05-24 靜電夾頭及其製造方法
US13/903,313 US9019684B2 (en) 2012-05-29 2013-05-28 Electrostatic chuck and method for manufacturing electrostatic chuck

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2012122201A JP5823915B2 (ja) 2012-05-29 2012-05-29 静電チャックの製造方法

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2015172910A Division JP5891332B2 (ja) 2015-09-02 2015-09-02 静電チャック

Publications (3)

Publication Number Publication Date
JP2013247342A JP2013247342A (ja) 2013-12-09
JP2013247342A5 JP2013247342A5 (enExample) 2015-04-23
JP5823915B2 true JP5823915B2 (ja) 2015-11-25

Family

ID=49669973

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2012122201A Active JP5823915B2 (ja) 2012-05-29 2012-05-29 静電チャックの製造方法

Country Status (4)

Country Link
US (1) US9019684B2 (enExample)
JP (1) JP5823915B2 (enExample)
KR (1) KR20130133673A (enExample)
TW (1) TWI594359B (enExample)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108474694A (zh) * 2016-01-22 2018-08-31 应用材料公司 用于多区域静电卡盘的传感器系统
US11784067B2 (en) 2018-05-28 2023-10-10 Niterra Co., Ltd. Holding device and method for manufacturing holding device
US11984333B2 (en) 2020-05-05 2024-05-14 Applied Materials, Inc. Methods and systems for temperature control for a substrate
US12027406B2 (en) 2018-05-28 2024-07-02 Niterra Co., Ltd. Method for manufacturing holding device and holding device

Families Citing this family (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9101038B2 (en) 2013-12-20 2015-08-04 Lam Research Corporation Electrostatic chuck including declamping electrode and method of declamping
US10002782B2 (en) 2014-10-17 2018-06-19 Lam Research Corporation ESC assembly including an electrically conductive gasket for uniform RF power delivery therethrough
JP6172301B2 (ja) 2014-11-20 2017-08-02 住友大阪セメント株式会社 静電チャック装置
KR101776562B1 (ko) * 2015-08-20 2017-09-07 엔지케이 인슐레이터 엘티디 정전 척 히터
US10153192B2 (en) 2015-09-25 2018-12-11 Sumitomo Osaka Cement Co., Ltd. Electrostatic chuck device
US10690414B2 (en) 2015-12-11 2020-06-23 Lam Research Corporation Multi-plane heater for semiconductor substrate support
JP6580999B2 (ja) * 2016-01-13 2019-09-25 日本特殊陶業株式会社 保持装置
JP6633931B2 (ja) * 2016-02-10 2020-01-22 日本特殊陶業株式会社 保持装置および保持装置の製造方法
US10340171B2 (en) 2016-05-18 2019-07-02 Lam Research Corporation Permanent secondary erosion containment for electrostatic chuck bonds
US11069553B2 (en) * 2016-07-07 2021-07-20 Lam Research Corporation Electrostatic chuck with features for preventing electrical arcing and light-up and improving process uniformity
US10410900B2 (en) * 2016-08-05 2019-09-10 Applied Materials, Inc. Precision screen printing with sub-micron uniformity of metallization materials on green sheet ceramic
US10910195B2 (en) 2017-01-05 2021-02-02 Lam Research Corporation Substrate support with improved process uniformity
JP7050455B2 (ja) * 2017-03-15 2022-04-08 日本特殊陶業株式会社 静電チャックの製造方法
JP7012454B2 (ja) * 2017-04-27 2022-01-28 株式会社岡本工作機械製作所 静電吸着チャックの製造方法並びに半導体装置の製造方法
JP7233160B2 (ja) * 2017-09-26 2023-03-06 日本特殊陶業株式会社 保持装置および保持装置の製造方法
US11353800B2 (en) 2017-12-28 2022-06-07 Onto Innovation Inc. Conformal stage
JP7278035B2 (ja) * 2018-06-20 2023-05-19 新光電気工業株式会社 静電チャック、基板固定装置
JP7278072B2 (ja) * 2018-12-27 2023-05-19 日本特殊陶業株式会社 静電チャックおよび静電チャックの製造方法
KR102787867B1 (ko) * 2020-07-03 2025-04-01 삼성디스플레이 주식회사 표시 장치의 제조 장치 및 표시 장치의 제조 방법
JP7601606B2 (ja) * 2020-10-28 2024-12-17 日本特殊陶業株式会社 保持装置
JP2022175500A (ja) 2021-05-13 2022-11-25 新光電気工業株式会社 静電チャック及び静電チャックの製造方法
JP2023180522A (ja) 2022-06-09 2023-12-21 新光電気工業株式会社 基板固定装置及び基板固定装置の製造方法
CN116759346B (zh) * 2023-08-16 2023-10-24 无锡尚积半导体科技有限公司 快速控温载片台、去胶刻蚀设备及去胶工艺
WO2025062583A1 (ja) * 2023-09-21 2025-03-27 日本碍子株式会社 ウエハ載置台およびウエハ載置台の製造方法
KR102864484B1 (ko) * 2025-01-21 2025-09-25 주식회사 엘케이엔지니어링 정전척의 온도 보정방법

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7436645B2 (en) * 2004-10-07 2008-10-14 Applied Materials, Inc. Method and apparatus for controlling temperature of a substrate
US7723648B2 (en) * 2006-09-25 2010-05-25 Tokyo Electron Limited Temperature controlled substrate holder with non-uniform insulation layer for a substrate processing system
JP2009152475A (ja) 2007-12-21 2009-07-09 Shinko Electric Ind Co Ltd 基板温調固定装置

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108474694A (zh) * 2016-01-22 2018-08-31 应用材料公司 用于多区域静电卡盘的传感器系统
US11784067B2 (en) 2018-05-28 2023-10-10 Niterra Co., Ltd. Holding device and method for manufacturing holding device
US12027406B2 (en) 2018-05-28 2024-07-02 Niterra Co., Ltd. Method for manufacturing holding device and holding device
US11984333B2 (en) 2020-05-05 2024-05-14 Applied Materials, Inc. Methods and systems for temperature control for a substrate
US12283500B2 (en) 2020-05-05 2025-04-22 Applied Materials, Inc. Methods and systems for temperature control for a substrate

Also Published As

Publication number Publication date
US20130321974A1 (en) 2013-12-05
JP2013247342A (ja) 2013-12-09
TWI594359B (zh) 2017-08-01
TW201401429A (zh) 2014-01-01
US9019684B2 (en) 2015-04-28
KR20130133673A (ko) 2013-12-09

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