JP5818340B2 - 撥水膜の形成方法 - Google Patents

撥水膜の形成方法 Download PDF

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Publication number
JP5818340B2
JP5818340B2 JP2010238987A JP2010238987A JP5818340B2 JP 5818340 B2 JP5818340 B2 JP 5818340B2 JP 2010238987 A JP2010238987 A JP 2010238987A JP 2010238987 A JP2010238987 A JP 2010238987A JP 5818340 B2 JP5818340 B2 JP 5818340B2
Authority
JP
Japan
Prior art keywords
film
thin film
water
ink
forming
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2010238987A
Other languages
English (en)
Japanese (ja)
Other versions
JP2012091353A5 (enrdf_load_stackoverflow
JP2012091353A (ja
Inventor
高見 新川
高見 新川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Corp
Original Assignee
Fujifilm Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujifilm Corp filed Critical Fujifilm Corp
Priority to JP2010238987A priority Critical patent/JP5818340B2/ja
Priority to US13/279,612 priority patent/US20120098889A1/en
Priority to CN201110330981.2A priority patent/CN102555326B/zh
Publication of JP2012091353A publication Critical patent/JP2012091353A/ja
Publication of JP2012091353A5 publication Critical patent/JP2012091353A5/ja
Application granted granted Critical
Publication of JP5818340B2 publication Critical patent/JP5818340B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01—Ink jet
    • B41J2/135—Nozzles
    • B41J2/16—Production of nozzles
    • B41J2/162—Manufacturing of the nozzle plates
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01—Ink jet
    • B41J2/135—Nozzles
    • B41J2/16—Production of nozzles
    • B41J2/1621—Manufacturing processes
    • B41J2/164—Manufacturing processes thin film formation
    • B41J2/1642—Manufacturing processes thin film formation thin film formation by CVD [chemical vapor deposition]
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01—Ink jet
    • B41J2/135—Nozzles
    • B41J2/16—Production of nozzles
    • B41J2/1621—Manufacturing processes
    • B41J2/164—Manufacturing processes thin film formation
    • B41J2/1645—Manufacturing processes thin film formation thin film formation by spincoating
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/54—Silicon-containing compounds
    • C08K5/5406—Silicon-containing compounds containing elements other than oxygen or nitrogen

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Particle Formation And Scattering Control In Inkjet Printers (AREA)
JP2010238987A 2010-10-25 2010-10-25 撥水膜の形成方法 Expired - Fee Related JP5818340B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2010238987A JP5818340B2 (ja) 2010-10-25 2010-10-25 撥水膜の形成方法
US13/279,612 US20120098889A1 (en) 2010-10-25 2011-10-24 Method of forming water repelling film, water repelling film, and nozzle plate of inkjet head
CN201110330981.2A CN102555326B (zh) 2010-10-25 2011-10-25 防水膜的形成方法、防水膜、喷墨头的喷嘴板

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2010238987A JP5818340B2 (ja) 2010-10-25 2010-10-25 撥水膜の形成方法

Publications (3)

Publication Number Publication Date
JP2012091353A JP2012091353A (ja) 2012-05-17
JP2012091353A5 JP2012091353A5 (enrdf_load_stackoverflow) 2012-07-19
JP5818340B2 true JP5818340B2 (ja) 2015-11-18

Family

ID=45972665

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2010238987A Expired - Fee Related JP5818340B2 (ja) 2010-10-25 2010-10-25 撥水膜の形成方法

Country Status (3)

Country Link
US (1) US20120098889A1 (enrdf_load_stackoverflow)
JP (1) JP5818340B2 (enrdf_load_stackoverflow)
CN (1) CN102555326B (enrdf_load_stackoverflow)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103553359B (zh) * 2013-10-23 2015-11-18 傅逸承 以烟灰为模板廉价构建透明超疏水自清洁纳米涂层的方法
JP6522322B2 (ja) * 2013-12-12 2019-05-29 株式会社トクヤマ ナノインプリント用レプリカ金型の製造方法
CN104434131A (zh) * 2014-10-16 2015-03-25 苏州康磁医疗科技有限公司 一种基于石英晶振片具有优异生物相容性的葡萄糖敏感薄膜的制备方法及其应用
JP6547278B2 (ja) * 2014-11-04 2019-07-24 日本ゼオン株式会社 撥水性フィルムの製造方法
JP6995540B2 (ja) 2017-09-14 2022-02-04 東芝テック株式会社 インクジェットヘッド及びインクジェットプリンタ
JP7242933B2 (ja) * 2017-09-14 2023-03-20 東芝テック株式会社 インクジェットヘッド及びインクジェットプリンタ
JP2019051636A (ja) * 2017-09-14 2019-04-04 東芝テック株式会社 インクジェットヘッド及びインクジェットプリンタ
JP6991806B2 (ja) * 2017-09-14 2022-01-13 東芝テック株式会社 インクジェットヘッド及びインクジェットプリンタ
JP2019077103A (ja) 2017-10-25 2019-05-23 東芝テック株式会社 インクジェットヘッド及びインクジェットプリンタ
CN108944051B (zh) * 2017-11-20 2019-08-09 广东聚华印刷显示技术有限公司 喷嘴的表面处理方法
JP6956850B2 (ja) * 2018-03-16 2021-11-02 日鉄ステンレス株式会社 クリヤ塗装ステンレス鋼板
CN117655009B (zh) * 2022-08-26 2025-03-25 上海飞机制造有限公司 一种飞机机翼管路的自动清洗方法、装置、设备及介质

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH089631B2 (ja) * 1987-07-16 1996-01-31 日本カ−ボン株式会社 ジメチルジアルコキシシランの製造方法
JPH09180268A (ja) * 1995-12-28 1997-07-11 Shin Etsu Chem Co Ltd 光ディスクの製造方法及びその製造装置
EP0855614A4 (en) * 1996-05-15 2001-12-19 Seiko Epson Corp THIN FILM COMPONENT WITH COATING FILM, LIQUID CRYSTAL FIELD, ELECTRONIC DEVICE AND MANUFACTURING METHOD OF THE THIN FILM COMPONENT
TW478033B (en) * 1999-02-26 2002-03-01 Applied Materials Inc Improved dry photolithography process for deep ultraviolet exposure
US6689479B2 (en) * 2001-08-28 2004-02-10 Dai Nippon Printing Co., Ltd. Anti-reflection film, and silica layer
JP3631236B2 (ja) * 2002-07-12 2005-03-23 東京応化工業株式会社 シリカ系有機被膜の製造方法
JP4447846B2 (ja) * 2003-02-28 2010-04-07 宇部日東化成株式会社 多孔質シリカ系薄膜の製造方法
JP4293035B2 (ja) * 2003-05-07 2009-07-08 セイコーエプソン株式会社 撥液膜被覆部材、液体噴出装置の構成部材、液体噴出ヘッドのノズルプレート、液体噴出ヘッドおよび液体噴出装置
JP4496805B2 (ja) * 2004-03-02 2010-07-07 セイコーエプソン株式会社 成膜方法および膜
JP2006289838A (ja) * 2005-04-12 2006-10-26 Seiko Epson Corp 撥液性部材、ノズルプレート及びそれを用いた液体噴射ヘッドならびに液体噴射装置
WO2007105801A1 (ja) * 2006-03-10 2007-09-20 Canon Kabushiki Kaisha 液体吐出ヘッド基体、その基体を用いた液体吐出ヘッドおよびそれらの製造方法
JP2009029068A (ja) * 2007-07-30 2009-02-12 Konica Minolta Holdings Inc 液体吐出ヘッド用ノズルプレートの製造方法及び液体吐出ヘッド用ノズルプレート
JP2009190299A (ja) * 2008-02-15 2009-08-27 Seiko Epson Corp 接合基材、接合基材の製造方法、接合体の製造方法及び液滴吐出装置
JP2009292917A (ja) * 2008-06-04 2009-12-17 Seiko Epson Corp 接合方法および接合体
JP4608629B2 (ja) * 2008-07-18 2011-01-12 セイコーエプソン株式会社 ノズルプレート、ノズルプレートの製造方法、液滴吐出ヘッド、液滴吐出ヘッドの製造方法および液滴吐出装置
JP2010030048A (ja) * 2008-07-24 2010-02-12 Seiko Epson Corp 液滴吐出ヘッドの製造方法
JP4674619B2 (ja) * 2008-07-29 2011-04-20 セイコーエプソン株式会社 ノズルプレート、ノズルプレートの製造方法、液滴吐出ヘッドおよび液滴吐出装置

Also Published As

Publication number Publication date
CN102555326B (zh) 2016-01-20
US20120098889A1 (en) 2012-04-26
CN102555326A (zh) 2012-07-11
JP2012091353A (ja) 2012-05-17

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