JP5800197B2 - 配線接続方法と機能デバイス - Google Patents
配線接続方法と機能デバイス Download PDFInfo
- Publication number
- JP5800197B2 JP5800197B2 JP2011529907A JP2011529907A JP5800197B2 JP 5800197 B2 JP5800197 B2 JP 5800197B2 JP 2011529907 A JP2011529907 A JP 2011529907A JP 2011529907 A JP2011529907 A JP 2011529907A JP 5800197 B2 JP5800197 B2 JP 5800197B2
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- electrode portion
- wiring
- connection electrode
- connection
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/10—Bump connectors ; Manufacturing methods related thereto
- H01L24/15—Structure, shape, material or disposition of the bump connectors after the connecting process
- H01L24/16—Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C3/00—Assembling of devices or systems from individually processed components
- B81C3/001—Bonding of two components
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L24/81—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a bump connector
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01R—ELECTRICALLY-CONDUCTIVE CONNECTIONS; STRUCTURAL ASSOCIATIONS OF A PLURALITY OF MUTUALLY-INSULATED ELECTRICAL CONNECTING ELEMENTS; COUPLING DEVICES; CURRENT COLLECTORS
- H01R43/00—Apparatus or processes specially adapted for manufacturing, assembling, maintaining, or repairing of line connectors or current collectors or for joining electric conductors
- H01R43/02—Apparatus or processes specially adapted for manufacturing, assembling, maintaining, or repairing of line connectors or current collectors or for joining electric conductors for soldered or welded connections
- H01R43/0214—Resistance welding
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
- B81B2203/00—Basic microelectromechanical structures
- B81B2203/04—Electrodes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C2203/00—Forming microstructural systems
- B81C2203/03—Bonding two components
- B81C2203/031—Anodic bondings
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/10—Bump connectors; Manufacturing methods related thereto
- H01L2224/15—Structure, shape, material or disposition of the bump connectors after the connecting process
- H01L2224/16—Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
- H01L2224/161—Disposition
- H01L2224/16151—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/16221—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/16225—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/10—Bump connectors; Manufacturing methods related thereto
- H01L2224/15—Structure, shape, material or disposition of the bump connectors after the connecting process
- H01L2224/16—Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
- H01L2224/161—Disposition
- H01L2224/16151—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/16221—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/16225—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
- H01L2224/16227—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation the bump connector connecting to a bond pad of the item
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/10—Bump connectors; Manufacturing methods related thereto
- H01L2224/15—Structure, shape, material or disposition of the bump connectors after the connecting process
- H01L2224/16—Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
- H01L2224/165—Material
- H01L2224/16501—Material at the bonding interface
- H01L2224/16503—Material at the bonding interface comprising an intermetallic compound
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L2224/81—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a bump connector
- H01L2224/8119—Arrangement of the bump connectors prior to mounting
- H01L2224/81192—Arrangement of the bump connectors prior to mounting wherein the bump connectors are disposed only on another item or body to be connected to the semiconductor or solid-state body
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L2224/81—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a bump connector
- H01L2224/818—Bonding techniques
- H01L2224/81801—Soldering or alloying
- H01L2224/8181—Soldering or alloying involving forming an intermetallic compound at the bonding interface
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L2224/81—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a bump connector
- H01L2224/818—Bonding techniques
- H01L2224/81893—Anodic bonding, i.e. bonding by applying a voltage across the interface in order to induce ions migration leading to an irreversible chemical bond
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/93—Batch processes
- H01L2224/95—Batch processes at chip-level, i.e. with connecting carried out on a plurality of singulated devices, i.e. on diced chips
- H01L2224/97—Batch processes at chip-level, i.e. with connecting carried out on a plurality of singulated devices, i.e. on diced chips the devices being connected to a common substrate, e.g. interposer, said common substrate being separable into individual assemblies after connecting
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01004—Beryllium [Be]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01005—Boron [B]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01006—Carbon [C]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01011—Sodium [Na]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01013—Aluminum [Al]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01019—Potassium [K]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01023—Vanadium [V]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01024—Chromium [Cr]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01027—Cobalt [Co]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01029—Copper [Cu]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01033—Arsenic [As]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01047—Silver [Ag]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01049—Indium [In]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01078—Platinum [Pt]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01079—Gold [Au]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/013—Alloys
- H01L2924/0132—Binary Alloys
- H01L2924/01327—Intermediate phases, i.e. intermetallics compounds
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/013—Alloys
- H01L2924/014—Solder alloys
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/095—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00 with a principal constituent of the material being a combination of two or more materials provided in the groups H01L2924/013 - H01L2924/0715
- H01L2924/097—Glass-ceramics, e.g. devitrified glass
- H01L2924/09701—Low temperature co-fired ceramic [LTCC]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/102—Material of the semiconductor or solid state bodies
- H01L2924/1025—Semiconducting materials
- H01L2924/10251—Elemental semiconductors, i.e. Group IV
- H01L2924/10253—Silicon [Si]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/11—Device type
- H01L2924/14—Integrated circuits
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/146—Mixed devices
- H01L2924/1461—MEMS
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/151—Die mounting substrate
- H01L2924/156—Material
- H01L2924/15786—Material with a principal constituent of the material being a non metallic, non metalloid inorganic material
- H01L2924/15788—Glasses, e.g. amorphous oxides, nitrides or fluorides
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Computer Hardware Design (AREA)
- Power Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Micromachines (AREA)
- Pressure Sensors (AREA)
- Wire Bonding (AREA)
Description
10:第1の基板(LTCC基板)
11,26:絶縁材
12,17,22,27,32,37:接続電極部
13:空間
14,24,34:金属層
15:第2の基板(MEMS基板)
16,21:Si基板
18,28,38:接続配線部
20:第1の基板(MEMS基板)
23:凹陥部
25:第2の基板(ガラス基板)
30:LTCC基板またはガラス基板
31,36:電極部
33:窪み
35:MEMS基板
35a:可動部
35b:固定部
40:MEMS基板
41:MEMS構造体
41a:可動部
41b:固定部
42:第1の電極部
43:第2の電極部
44:凹陥部
45:LTCC基板
46:第1の下側電極部
47:第2の下側電極部
48:第1の上側電極部
49:第2の上側電極部
53,54:金属層
50:収容部
51,52:接続配線部
55,56:空間
60:LTCC基板
61,66:接続電極部
62:空間
63:金属層
65A,65B,65C:チップ
67:接続配線部
70:第1の基板
71:Si基板
72:酸化膜
73:接続電極部
73a:Ti層
73b:Cu層
75:第2の基板
76:LTCC基板
76a:貫通配線
77:接続電極部
77a:Cr層
77b:Cu層
78:金属層
79:接続配線部
以下、具体的な実施例に基づいてさらに説明する。
第1の基板70については、Si基板71に部分的に段差を形成し、CVD法で酸化膜を形成した後に、第2の基板75と接合される面の酸化膜をウエットエッチングし、残った酸化膜72上に電気回路を形成し、接続電極部73としてTi層73aとCu層73bとを順に、それぞれ100nm,600nmとなるよう積層した。接続電極部73としての電極パッドの表面が接合面から300nm低くなるようにした。
第2の基板75については、LTCC基板76の貫通配線76a上に、接続電極部77としてCr層77aとCu層77bとを順に積層し、さらに、金属層78としてのSn層を積層した。Cr層77aの厚みは100nm、Cu層77bの厚みは500nmとした。金属層78としてのSn層は、実施例1では、LTCC基板76の接合面からの高さが600nmとなるようにした。
このことから、電気的な接続を形成するために、接合処理条件として、試料搬送前にステージを加熱しておき、チャンバの温度を350℃に設定した。
比較例では、金属層78としてのSn層は、LTCC基板76の接合面から突出しないようにした。それ以外は、実施例1と同様にした。
MEMSが損傷することはない。
Claims (10)
- 接続電極部を有してLTCC(Low Temperature Co-fired Ceramics)基板又はガラス基板で構成された第1の基板と、接続電極部を有する第2の基板とを準備し、上記第1の基板における接続電極部、上記第2の基板における接続電極部の少なくとも一方に金属層を形成しておき、上記第1の基板における接続電極部と上記第2の基板における接続電極部とが上記金属層を挟んで対向するように上記第1の基板と上記第2の基板とを重ね合わせた後、陽極接合温度まで昇温してその温度を維持しながら上記第1の基板と上記第2の基板に直流電圧を印加することにより、上記第1の基板と上記第2の基板とを陽極接合すると同時に上記金属層を融解して上記第1の基板における接続電極部と上記第2の基板における接続電極部とを電気的に接続する、配線接続方法。
- 前記金属層を設ける前の段階では前記第1の基板と前記第2の基板とを重ね合わせても前記第1の基板における接続電極部と前記第2の基板における接続電極部とは接触しないで空間を形成しており、前記金属層は該金属層を形成する前記第1の基板、前記第2の基板の何れかから突出しかつ上記空間の体積以下の大きさを有する、請求項1に記載の配線接続方法。
- 前記金属層は、陽極接合温度で融解すると前記第1の基板における接続電極部と前記第2の基板における接続電極部との間で金属間化合物又は合金を形成し、かつ該金属間化合物又は合金の融解温度が前記金属層を構成する金属の溶融温度より高い金属で形成される、請求項1又は2に記載の配線接続方法。
- 前記第1の基板における接続電極部、前記第2の基板における接続電極部の少なくとも何れか一方と前記金属層とを形成する素材の組は、Sn、Cuの組、Sn、Agの組、In、Agの組、Sn、Auの組、In、Auの組、Sn、Niの組、Sn、Inの組の何れかである、請求項3に記載の配線接続方法。
- LTCC(Low Temperature Co-fired Ceramics)基板又はガラス基板で構成された第1の基板と第2の基板とが陽極接合されてなり、金属が化合してなる金属間化合物又は金属で構成される合金でなる接続配線部で上記第1の基板と上記第2の基板とが電気的に接続されており、該接続配線部は該接続配線部を構成する上記金属の溶融温度以下では融解しない、機能デバイス。
- 前記接続配線部は、Sn、Cuの組、Sn、Agの組、In、Agの組、Sn、Auの組、In、Auの組、Sn、Niの組、Sn、Inの組の何れかで構成されている、請求項5に記載の機能デバイス。
- 前記LTCC基板が金系合金でなる貫通配線又は内部配線を有する、請求項5に記載の機能デバイス。
- 前記第1の基板及び前記第2の基板の少なくとも一方に、貫通配線又は内部配線が形成されている、請求項5に記載の機能デバイス。
- 前記第1の基板及び前記第2の基板の少なくとも一方は、電子回路、MEMS(Micro Electronic Mechanical Systems)が形成されたチップである、請求項5に記載の機能デバイス。
- 前記第1の基板と前記第2の基板とで内部空間が画成され気密封止されている、請求項5に記載の機能デバイス。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2011529907A JP5800197B2 (ja) | 2009-09-01 | 2010-09-01 | 配線接続方法と機能デバイス |
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2009202078 | 2009-09-01 | ||
JP2009202078 | 2009-09-01 | ||
JP2011529907A JP5800197B2 (ja) | 2009-09-01 | 2010-09-01 | 配線接続方法と機能デバイス |
PCT/JP2010/064880 WO2011027762A1 (ja) | 2009-09-01 | 2010-09-01 | 配線接続方法と機能デバイス |
Publications (2)
Publication Number | Publication Date |
---|---|
JPWO2011027762A1 JPWO2011027762A1 (ja) | 2013-02-04 |
JP5800197B2 true JP5800197B2 (ja) | 2015-10-28 |
Family
ID=43649297
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2011529907A Active JP5800197B2 (ja) | 2009-09-01 | 2010-09-01 | 配線接続方法と機能デバイス |
Country Status (7)
Country | Link |
---|---|
US (1) | US8796850B2 (ja) |
EP (1) | EP2475053A4 (ja) |
JP (1) | JP5800197B2 (ja) |
KR (1) | KR20120082884A (ja) |
CN (1) | CN102668271B (ja) |
TW (1) | TWI430422B (ja) |
WO (1) | WO2011027762A1 (ja) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5791322B2 (ja) * | 2011-03-28 | 2015-10-07 | セイコーインスツル株式会社 | パッケージの製造方法 |
JP5768975B2 (ja) * | 2011-12-15 | 2015-08-26 | オムロン株式会社 | 接合部の構造及びその接合方法並びに電子部品 |
TWI485930B (zh) * | 2012-10-04 | 2015-05-21 | Jx Nippon Mining & Metals Corp | Metal material for electronic parts and manufacturing method thereof |
JP6365964B2 (ja) * | 2013-05-31 | 2018-08-01 | セイコーNpc株式会社 | 小型化半導体パッケージ |
JP2015115446A (ja) | 2013-12-11 | 2015-06-22 | 株式会社東芝 | 半導体装置の製造方法 |
CN105990166B (zh) * | 2015-02-27 | 2018-12-21 | 中芯国际集成电路制造(上海)有限公司 | 晶圆键合方法 |
ITUA20164673A1 (it) | 2016-06-27 | 2017-12-27 | St Microelectronics Srl | Dispositivo mems formato da almeno due strati strutturali incollati reciprocamente e relativo processo di fabbricazione |
EP3518277A4 (en) * | 2016-09-21 | 2020-04-08 | Shindengen Electric Manufacturing Co., Ltd. | SEMICONDUCTOR DEVICE |
US11037891B2 (en) | 2018-09-21 | 2021-06-15 | Advanced Semiconductor Engineering, Inc. | Device package |
CN111217324B (zh) * | 2018-11-27 | 2023-06-27 | 昆山微电子技术研究院 | 一种阳极键合方法 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2005251898A (ja) * | 2004-03-03 | 2005-09-15 | Mitsubishi Electric Corp | ウエハレベルパッケージ構造体とその製造方法、及びそのウエハレベルパッケージ構造体から分割された素子 |
JP2008060135A (ja) * | 2006-08-29 | 2008-03-13 | Dainippon Printing Co Ltd | センサーユニットおよびその製造方法 |
JP2008130934A (ja) * | 2006-11-22 | 2008-06-05 | Shinko Electric Ind Co Ltd | 電子部品および電子部品の製造方法 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3975430B2 (ja) * | 2001-09-28 | 2007-09-12 | セイコーエプソン株式会社 | 弾性表面波装置の製造方法 |
JP4074862B2 (ja) | 2004-03-24 | 2008-04-16 | ローム株式会社 | 半導体装置の製造方法、半導体装置、および半導体チップ |
JP4505671B2 (ja) * | 2005-03-11 | 2010-07-21 | パナソニック電工株式会社 | 半導体微小電子機械デバイスの信号取り出し構造 |
JP2007305856A (ja) * | 2006-05-12 | 2007-11-22 | Olympus Corp | 封止構造及び該封止構造の製造方法 |
KR100846569B1 (ko) * | 2006-06-14 | 2008-07-15 | 매그나칩 반도체 유한회사 | Mems 소자의 패키지 및 그 제조방법 |
-
2010
- 2010-09-01 WO PCT/JP2010/064880 patent/WO2011027762A1/ja active Application Filing
- 2010-09-01 TW TW099129423A patent/TWI430422B/zh not_active IP Right Cessation
- 2010-09-01 US US13/393,577 patent/US8796850B2/en not_active Expired - Fee Related
- 2010-09-01 KR KR1020127008295A patent/KR20120082884A/ko not_active Application Discontinuation
- 2010-09-01 CN CN201080048508.9A patent/CN102668271B/zh not_active Expired - Fee Related
- 2010-09-01 EP EP10813711.8A patent/EP2475053A4/en not_active Withdrawn
- 2010-09-01 JP JP2011529907A patent/JP5800197B2/ja active Active
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2005251898A (ja) * | 2004-03-03 | 2005-09-15 | Mitsubishi Electric Corp | ウエハレベルパッケージ構造体とその製造方法、及びそのウエハレベルパッケージ構造体から分割された素子 |
JP2008060135A (ja) * | 2006-08-29 | 2008-03-13 | Dainippon Printing Co Ltd | センサーユニットおよびその製造方法 |
JP2008130934A (ja) * | 2006-11-22 | 2008-06-05 | Shinko Electric Ind Co Ltd | 電子部品および電子部品の製造方法 |
Also Published As
Publication number | Publication date |
---|---|
TW201126685A (en) | 2011-08-01 |
US8796850B2 (en) | 2014-08-05 |
US20120217638A1 (en) | 2012-08-30 |
JPWO2011027762A1 (ja) | 2013-02-04 |
EP2475053A1 (en) | 2012-07-11 |
CN102668271A (zh) | 2012-09-12 |
TWI430422B (zh) | 2014-03-11 |
KR20120082884A (ko) | 2012-07-24 |
EP2475053A4 (en) | 2014-09-17 |
WO2011027762A1 (ja) | 2011-03-10 |
CN102668271B (zh) | 2016-03-02 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP5800197B2 (ja) | 配線接続方法と機能デバイス | |
JP4495711B2 (ja) | 機能素子及びその製造方法 | |
JP5892378B2 (ja) | パッケージ材の製造方法 | |
US11424170B2 (en) | Method for mounting an electrical component in which a hood is used, and a hood that is suitable for use in this method | |
WO2008023465A1 (en) | Microelectronic machine mechanism device, and its manufacturing method | |
WO2017047663A1 (ja) | Memsデバイス、及びその製造方法 | |
TW200839964A (en) | Functional device package | |
JP4969589B2 (ja) | ペルチェ素子精製プロセスとペルチェ素子 | |
JP2002043463A (ja) | 電子及びmems素子の表面実装型チップスケールパッケージング方法 | |
US8021906B2 (en) | Hermetic sealing and electrical contacting of a microelectromechanical structure, and microsystem (MEMS) produced therewith | |
JP2013055632A (ja) | 気密封止パッケージ及びこの気密封止パッケージの製造方法 | |
KR20160065864A (ko) | 금속-세라믹 땜납 연결을 생성하는 방법 | |
JP2012009862A (ja) | 二つの要素を低温熱圧着により封止する方法 | |
JP5828406B2 (ja) | 基板の接合方法 | |
JP4964505B2 (ja) | 半導体装置およびその製造方法、並びに電子部品 | |
JP5227834B2 (ja) | 機能素子パッケージの製造方法 | |
JP2012049298A (ja) | 多孔質金属を電気的接続に用いたデバイス、及び配線接続方法 | |
JP2015122413A (ja) | パッケージおよびその製造方法 | |
JP5774855B2 (ja) | パッケージ及びその製造方法 | |
Tao et al. | Laser-assisted sealing and testing for ceramic packaging of MEMS devices | |
JP2015080108A (ja) | パッケージの製造方法 | |
JP7398565B2 (ja) | 金属-セラミック基板を生産する方法及びそのような方法によって生産された金属-セラミック基板 | |
JP2006100446A (ja) | 複合構造体および電子部品封止用基板 | |
JP2009170389A (ja) | セラミックスヒーターとその製造方法 | |
JP2000286352A (ja) | 電子装置 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20130624 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20140729 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20140929 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20150311 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20150327 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20150714 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20150812 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 5800197 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |