JP5787306B2 - コロナ処理方法 - Google Patents

コロナ処理方法 Download PDF

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Publication number
JP5787306B2
JP5787306B2 JP2011021461A JP2011021461A JP5787306B2 JP 5787306 B2 JP5787306 B2 JP 5787306B2 JP 2011021461 A JP2011021461 A JP 2011021461A JP 2011021461 A JP2011021461 A JP 2011021461A JP 5787306 B2 JP5787306 B2 JP 5787306B2
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Japan
Prior art keywords
corona treatment
corona
film
treated
discharge
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JP2011021461A
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English (en)
Japanese (ja)
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JP2012161703A (ja
Inventor
武藤　清
清 武藤
修央 出口
修央 出口
賢尚 倉本
賢尚 倉本
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Sumitomo Chemical Co Ltd
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Sumitomo Chemical Co Ltd
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Publication date
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First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=46602717&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=JP5787306(B2) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Sumitomo Chemical Co Ltd filed Critical Sumitomo Chemical Co Ltd
Priority to JP2011021461A priority Critical patent/JP5787306B2/ja
Priority to KR1020197012871A priority patent/KR102137918B1/ko
Priority to CN201280006992.8A priority patent/CN103338856B/zh
Priority to CN201610884117.XA priority patent/CN107041060B/zh
Priority to PCT/JP2012/052005 priority patent/WO2012105503A1/ja
Priority to KR1020137021183A priority patent/KR20140004712A/ko
Priority to TW101103202A priority patent/TWI601618B/zh
Publication of JP2012161703A publication Critical patent/JP2012161703A/ja
Publication of JP5787306B2 publication Critical patent/JP5787306B2/ja
Application granted granted Critical
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J19/087—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy
    • B01J19/088—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy giving rise to electric discharges
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/47—Generating plasma using corona discharges
    • H05H1/473—Cylindrical electrodes, e.g. rotary drums
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/47—Generating plasma using corona discharges
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/47—Generating plasma using corona discharges
    • H05H1/471—Pointed electrodes
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/12—Optical coatings produced by application to, or surface treatment of, optical elements by surface treatment, e.g. by irradiation

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Chemical & Material Sciences (AREA)
  • Toxicology (AREA)
  • General Health & Medical Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
  • Plasma Technology (AREA)
  • Electrostatic Charge, Transfer And Separation In Electrography (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
JP2011021461A 2011-02-03 2011-02-03 コロナ処理方法 Active JP5787306B2 (ja)

Priority Applications (7)

Application Number Priority Date Filing Date Title
JP2011021461A JP5787306B2 (ja) 2011-02-03 2011-02-03 コロナ処理方法
PCT/JP2012/052005 WO2012105503A1 (ja) 2011-02-03 2012-01-30 コロナ処理方法
CN201280006992.8A CN103338856B (zh) 2011-02-03 2012-01-30 电晕处理方法
CN201610884117.XA CN107041060B (zh) 2011-02-03 2012-01-30 电晕处理方法
KR1020197012871A KR102137918B1 (ko) 2011-02-03 2012-01-30 코로나 처리 방법
KR1020137021183A KR20140004712A (ko) 2011-02-03 2012-01-30 코로나 처리 방법
TW101103202A TWI601618B (zh) 2011-02-03 2012-02-01 電暈處理方法及偏光板製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2011021461A JP5787306B2 (ja) 2011-02-03 2011-02-03 コロナ処理方法

Publications (2)

Publication Number Publication Date
JP2012161703A JP2012161703A (ja) 2012-08-30
JP5787306B2 true JP5787306B2 (ja) 2015-09-30

Family

ID=46602717

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2011021461A Active JP5787306B2 (ja) 2011-02-03 2011-02-03 コロナ処理方法

Country Status (5)

Country Link
JP (1) JP5787306B2 (zh)
KR (2) KR20140004712A (zh)
CN (2) CN107041060B (zh)
TW (1) TWI601618B (zh)
WO (1) WO2012105503A1 (zh)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101713864B1 (ko) * 2016-10-13 2017-03-09 주식회사 포스텍 이지-필 필름 제조장치
JP7309843B2 (ja) * 2017-03-03 2023-07-18 住友化学株式会社 光学フィルム原反ロールの製造方法、および光学部材シートの製造方法
JP6421962B1 (ja) * 2017-08-09 2018-11-14 春日電機株式会社 表面改質装置
CN108705788B (zh) * 2018-05-24 2020-05-05 金凌印刷（苏州）有限公司 一种材料表面处理装置

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01246540A (ja) * 1988-03-28 1989-10-02 Konica Corp コロナ放電処理におけるオゾン除去方法
JP3427130B2 (ja) * 1993-12-17 2003-07-14 藤森工業株式会社 偏光板又は位相差板貼付用粘着剤層の積層方法
JP2681625B2 (ja) * 1995-06-27 1997-11-26 春日電機株式会社 放電処理方法及び放電処理装置
US6423924B1 (en) * 1998-03-10 2002-07-23 Tepla Ag Method for treating the surface of a material or an object and implementing device
KR100411455B1 (ko) * 1998-11-13 2003-12-18 미쓰비시덴키 가부시키가이샤 방전표면처리방법 및 방전표면처리용 전극
JP2001290338A (ja) * 2000-04-04 2001-10-19 Canon Inc 電子写真装置
JP4194766B2 (ja) 2001-01-12 2008-12-10 株式会社リコー コロナ放電装置及び画像形成装置
JP3823172B2 (ja) * 2002-09-05 2006-09-20 春日電機株式会社 コロナ処理用電極構造
JP4830258B2 (ja) 2004-01-28 2011-12-07 住友化学株式会社 粘着剤層の貼合方法。
JP4208870B2 (ja) * 2005-10-05 2009-01-14 春日電機株式会社 フィルム等の長尺処理対象物の表面処理装置
KR20070116309A (ko) * 2006-06-05 2007-12-10 동우 화인켐 주식회사 접착제 및 편광판
JP4744483B2 (ja) 2007-06-27 2011-08-10 日東電工株式会社 偏光板の製造方法、偏光板、光学フィルムおよび画像表示装置
JP2009122641A (ja) * 2007-10-25 2009-06-04 Sumitomo Chemical Co Ltd 光学表示パネルの製造方法
JP2009237489A (ja) * 2008-03-28 2009-10-15 Sumitomo Chemical Co Ltd 表面保護フィルム付き偏光板の製造方法
JP2010043215A (ja) * 2008-08-18 2010-02-25 Toray Ind Inc 電気絶縁性シートの表面処理装置、表面処理方法、および、電気絶縁性シートの製造方法
JP5332526B2 (ja) * 2008-11-11 2013-11-06 株式会社ニチレイフーズ 表面処理装置

Also Published As

Publication number Publication date
TW201236843A (en) 2012-09-16
CN103338856B (zh) 2016-11-09
JP2012161703A (ja) 2012-08-30
CN103338856A (zh) 2013-10-02
KR20140004712A (ko) 2014-01-13
CN107041060B (zh) 2019-08-23
KR102137918B1 (ko) 2020-07-24
TWI601618B (zh) 2017-10-11
WO2012105503A1 (ja) 2012-08-09
KR20190053277A (ko) 2019-05-17
CN107041060A (zh) 2017-08-11

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