JP5774772B2 - 反応性堆積プロセスのためのガスシステム - Google Patents
反応性堆積プロセスのためのガスシステム Download PDFInfo
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- JP5774772B2 JP5774772B2 JP2014506774A JP2014506774A JP5774772B2 JP 5774772 B2 JP5774772 B2 JP 5774772B2 JP 2014506774 A JP2014506774 A JP 2014506774A JP 2014506774 A JP2014506774 A JP 2014506774A JP 5774772 B2 JP5774772 B2 JP 5774772B2
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/243—Crucibles for source material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0021—Reactive sputtering or evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Description
Claims (12)
- 複数の離間したるつぼ(120)による反応性堆積プロセスのために構成されたガスランスユニットであって、空間が前記るつぼ間に設けられ、ガスランスユニットは、前記複数の離間したるつぼ(120)の配列における第1の方向に延在し、
ガスランスユニットは、
前記反応性堆積プロセス用のガス(4)を供給するための1つまたは複数の出口(30)を有するガス案内管(130)と、
凝縮液を前記空間の上方の1つまたは複数の位置に案内するための凝縮液案内要素(140)と、
を含み、
前記凝縮液案内要素(140)は、少なくとも一部が前記ガス案内管(130)より下方に設けられている、
ガスランスユニット。 - 前記凝縮液案内要素が、前記1つまたは複数の位置に突起(141、341)を含む、請求項1に記載のユニット。
- 前記凝縮液案内要素が1つまたは複数の突起を有する排出シートを含み、前記排出シートは、前記突起を形成する三角形区間を持つ排出シート、前記突起を形成する波状区間を持つ排出シート、前記突起を形成するピーク区間を持つ排出シート、および区間がそれらの組合せである排出シートからなる群から選択される、請求項1または2に記載のユニット。
- 前記凝縮液案内要素(140)は、
前記ガス案内管が前記凝縮液案内要素上に支持されるためのガス案内管支持体(142)
をさらに含む、請求項1ないし3のいずれか一項に記載のユニット。 - 前記ガス案内管支持体が、前記ガス案内管を凹部に少なくとも部分的に埋め込ませるための凹部を有する、請求項4に記載のユニット。
- 反応性堆積プロセスのための蒸発装置(100)であって、
複数の離間したるつぼ(120)のための複数の支持体であり、空間が前記るつぼ間に設けられる、複数の支持体と、
堆積表面上に設けられた基板上に材料を堆積させるための前記堆積表面と、
請求項1ないし5のいずれか一項に記載のガスランスユニットであり、前記堆積表面の下方に設けられ、前記第1の方向に延びる長さを有する、ガスランスユニットと
を含む、装置。 - 前記堆積表面が、本質的に前記第1の方向に延びる回転軸を有する被覆ドラム(28)の表面であり、前記1つまたは複数の位置が、本質的に前記第1の方向に沿って設けられる、請求項6に記載の装置。
- 前記ガスランスユニットが取付け支持体(144)で支持され、前記取付け支持体(144)が、前記第1の方向に関して前記ガスランスユニットの中央区域に設けられ、かつ本質的に前記第1の方向に関して前記ガスランスユニットの中心に設けられる、請求項6または7に記載の装置。
- 前記1つまたは複数の位置のうちの1つまたは複数が、前記対応する空間に関して室温でオフセットされ、動作温度で前記空間の上方にある、請求項6ないし8のいずれか一項に記載の装置。
- 前記複数の離間したるつぼのための前記複数の支持体の下方に設けられ、滴る凝縮液を動作中に収集するように構成された凝縮液ボックス(150)
をさらに含む、請求項6ないし9のいずれか一項に記載の装置。 - 蒸発装置を動作させる方法であって、
複数の離間したるつぼ(120)中の材料を堆積表面の方に蒸発させることであり、空間が前記るつぼ間に設けられる、蒸発させることと、
前記るつぼと堆積領域との間でガス案内管(130)によりガス(4)を少なくとも一部の蒸気(2)に案内することと、
前記少なくとも一部の蒸気の凝縮液を前記空間の上方の位置に案内することと
を含み、
ガスから蒸気への案内は、ガス案内管によって実施され、凝縮液案内要素(140)は、少なくとも一部が前記ガス案内管(130)より下方に設けられている、
方法。 - 前記空間内または前記空間の下方の位置で、下向きに滴る凝縮液を収集すること
をさらに含む、請求項11に記載の方法。
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
PCT/EP2011/056879 WO2012146312A1 (en) | 2011-04-29 | 2011-04-29 | Gas system for reactive deposition process |
Publications (2)
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JP2014517146A JP2014517146A (ja) | 2014-07-17 |
JP5774772B2 true JP5774772B2 (ja) | 2015-09-09 |
Family
ID=44626082
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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JP2014506774A Expired - Fee Related JP5774772B2 (ja) | 2011-04-29 | 2011-04-29 | 反応性堆積プロセスのためのガスシステム |
Country Status (6)
Country | Link |
---|---|
US (1) | US9732412B2 (ja) |
EP (1) | EP2702184B1 (ja) |
JP (1) | JP5774772B2 (ja) |
KR (1) | KR101638765B1 (ja) |
CN (1) | CN103502502B (ja) |
WO (1) | WO2012146312A1 (ja) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
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US20140272346A1 (en) * | 2013-03-15 | 2014-09-18 | Rubicon Technology, Inc. | Method of growing aluminum oxide onto substrates by use of an aluminum source in an oxygen environment to create transparent, scratch resistant windows |
EP2818572B1 (en) * | 2013-06-28 | 2019-11-13 | Applied Materials, Inc. | Evaporation apparatus with gas supply |
CN103993268B (zh) * | 2014-04-30 | 2017-02-15 | 京东方科技集团股份有限公司 | 一种坩埚 |
US9508976B2 (en) | 2015-01-09 | 2016-11-29 | Applied Materials, Inc. | Battery separator with dielectric coating |
CN107406969B (zh) * | 2015-06-09 | 2020-06-19 | 株式会社爱发科 | 卷取式成膜装置、蒸发源单元和卷取式成膜方法 |
CN106978589B (zh) * | 2017-04-20 | 2019-03-08 | 京东方科技集团股份有限公司 | 用于蒸镀设备的挡板装置及蒸镀设备 |
CN111201634B (zh) | 2017-08-17 | 2023-04-04 | 应用材料公司 | 无烯烃隔板的锂离子电池 |
WO2020037494A1 (en) | 2018-08-21 | 2020-02-27 | Applied Materials, Inc. | Ultra-thin ceramic coating on separator for batteries |
CN113330137B (zh) | 2018-11-06 | 2023-05-09 | 康宁股份有限公司 | 包括第一导管并且第一导管被第二导管包围的方法和设备 |
US11631840B2 (en) | 2019-04-26 | 2023-04-18 | Applied Materials, Inc. | Surface protection of lithium metal anode |
Family Cites Families (12)
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US3356529A (en) * | 1964-07-31 | 1967-12-05 | Gen Electric | Method for the deposition of an electro-conductive transparent indium oxide coating |
GB2165614A (en) * | 1984-10-16 | 1986-04-16 | David Adrian Dalton | Watering hose |
IT1279238B1 (it) * | 1995-06-19 | 1997-12-09 | Galileo Vacuum Tec Spa | Sistema continuo di evaporazione con ossidazione assistita da plasma, per depositare sotto vuoto ossidi di metalli su pellicole plastiche |
JPH11335819A (ja) | 1998-05-22 | 1999-12-07 | Dainippon Printing Co Ltd | 真空蒸着装置 |
ITMI20050962A1 (it) * | 2005-05-25 | 2006-11-26 | Lpe Spa | Dispositivo per introurre gas di reazione in una camera di reazione e reattore epitassiale che lo utilizza |
JP2007270251A (ja) * | 2006-03-31 | 2007-10-18 | Toray Ind Inc | 多層薄膜付き積層体の製造方法および製造装置 |
DE102006023463A1 (de) * | 2006-05-18 | 2007-11-22 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Vorrichtung zum Elektronenstrahlverdampfen |
US7951271B2 (en) * | 2006-06-12 | 2011-05-31 | David Brent Thompson | System for recovering oil from used automobile tires |
CN101542008B (zh) * | 2007-03-09 | 2011-08-24 | 松下电器产业株式会社 | 蒸镀装置及使用蒸镀装置的膜的制造方法 |
JP5226773B2 (ja) * | 2008-04-11 | 2013-07-03 | 東芝三菱電機産業システム株式会社 | 均熱装置 |
JP5239483B2 (ja) * | 2008-04-28 | 2013-07-17 | 東レ株式会社 | 金属酸化物薄膜付きシートの製造方法および製造装置 |
DE102008026974A1 (de) * | 2008-06-03 | 2009-12-10 | Aixtron Ag | Verfahren und Vorrichtung zum Abscheiden dünner Schichten aus polymeren Para-Xylylene oder substituiertem Para-Xylylene |
-
2011
- 2011-04-29 US US14/114,648 patent/US9732412B2/en active Active
- 2011-04-29 JP JP2014506774A patent/JP5774772B2/ja not_active Expired - Fee Related
- 2011-04-29 KR KR1020137031668A patent/KR101638765B1/ko active IP Right Grant
- 2011-04-29 EP EP11716931.8A patent/EP2702184B1/en not_active Not-in-force
- 2011-04-29 WO PCT/EP2011/056879 patent/WO2012146312A1/en active Application Filing
- 2011-04-29 CN CN201180070470.XA patent/CN103502502B/zh not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
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CN103502502A (zh) | 2014-01-08 |
KR20140041506A (ko) | 2014-04-04 |
JP2014517146A (ja) | 2014-07-17 |
WO2012146312A1 (en) | 2012-11-01 |
EP2702184B1 (en) | 2018-12-05 |
US20140227443A1 (en) | 2014-08-14 |
EP2702184A1 (en) | 2014-03-05 |
CN103502502B (zh) | 2017-09-01 |
US9732412B2 (en) | 2017-08-15 |
KR101638765B1 (ko) | 2016-07-13 |
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