JP5773576B2 - 反射防止構造および光学機器 - Google Patents

反射防止構造および光学機器 Download PDF

Info

Publication number
JP5773576B2
JP5773576B2 JP2010084739A JP2010084739A JP5773576B2 JP 5773576 B2 JP5773576 B2 JP 5773576B2 JP 2010084739 A JP2010084739 A JP 2010084739A JP 2010084739 A JP2010084739 A JP 2010084739A JP 5773576 B2 JP5773576 B2 JP 5773576B2
Authority
JP
Japan
Prior art keywords
refractive index
layer
substrate
interface
structure according
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2010084739A
Other languages
English (en)
Japanese (ja)
Other versions
JP2011215440A5 (enExample
JP2011215440A (ja
Inventor
和彦 桃木
和彦 桃木
浩克 宮田
浩克 宮田
祐彦 ▲高▼橋
祐彦 ▲高▼橋
大介 佐野
大介 佐野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2010084739A priority Critical patent/JP5773576B2/ja
Priority to US13/078,231 priority patent/US9291748B2/en
Publication of JP2011215440A publication Critical patent/JP2011215440A/ja
Publication of JP2011215440A5 publication Critical patent/JP2011215440A5/ja
Application granted granted Critical
Publication of JP5773576B2 publication Critical patent/JP5773576B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/118—Anti-reflection coatings having sub-optical wavelength surface structures designed to provide an enhanced transmittance, e.g. moth-eye structures
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29L—INDEXING SCHEME ASSOCIATED WITH SUBCLASS B29C, RELATING TO PARTICULAR ARTICLES
    • B29L2011/00—Optical elements, e.g. lenses, prisms
    • B29L2011/0016—Lenses

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Laminated Bodies (AREA)
JP2010084739A 2010-04-01 2010-04-01 反射防止構造および光学機器 Expired - Fee Related JP5773576B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2010084739A JP5773576B2 (ja) 2010-04-01 2010-04-01 反射防止構造および光学機器
US13/078,231 US9291748B2 (en) 2010-04-01 2011-04-01 Anti-reflection structure with graded refractive index layer and optical apparatus including same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2010084739A JP5773576B2 (ja) 2010-04-01 2010-04-01 反射防止構造および光学機器

Publications (3)

Publication Number Publication Date
JP2011215440A JP2011215440A (ja) 2011-10-27
JP2011215440A5 JP2011215440A5 (enExample) 2014-03-06
JP5773576B2 true JP5773576B2 (ja) 2015-09-02

Family

ID=44709393

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2010084739A Expired - Fee Related JP5773576B2 (ja) 2010-04-01 2010-04-01 反射防止構造および光学機器

Country Status (2)

Country Link
US (1) US9291748B2 (enExample)
JP (1) JP5773576B2 (enExample)

Families Citing this family (37)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012242449A (ja) * 2011-05-16 2012-12-10 Sony Chemical & Information Device Corp 位相差素子及びその製造方法
WO2012157706A1 (ja) * 2011-05-17 2012-11-22 キヤノン電子株式会社 光学フィルタ、光学機器、電子機器及び反射防止複合体
JP5840448B2 (ja) * 2011-10-12 2016-01-06 株式会社タムロン 反射防止膜及び反射防止膜の製造方法
JP2013127602A (ja) * 2011-11-18 2013-06-27 Canon Inc 光学部材、撮像装置、光学部材の製造方法及び撮像装置の製造方法
JP5841656B2 (ja) * 2012-02-20 2016-01-13 シャープ株式会社 表示装置
JP2013231779A (ja) * 2012-04-27 2013-11-14 Kuraray Co Ltd 反射防止構造及び光学部材
JP6063645B2 (ja) * 2012-05-30 2017-01-18 イーエイチエス レンズ フィリピン インク 光学物品
JP2014005193A (ja) * 2012-05-30 2014-01-16 Canon Inc 光学部材、撮像装置及び光学部材の製造方法
US9103986B2 (en) * 2012-06-08 2015-08-11 Empire Technology Development Llc Multi frequency filter arrays for low cost spectrometers
JP6386700B2 (ja) 2012-07-04 2018-09-05 キヤノン株式会社 構造体、光学部材、反射防止膜、撥水性膜、質量分析用基板、位相板、構造体の製造方法、及び反射防止膜の製造方法
WO2014103686A1 (ja) * 2012-12-25 2014-07-03 大日本印刷株式会社 光学積層体、これを用いた偏光板及び画像表示装置
KR20170030473A (ko) * 2014-07-10 2017-03-17 에스씨아이브이에이엑스 가부시키가이샤 광학 부재 및 그 제조 방법
KR101586073B1 (ko) * 2014-08-20 2016-01-19 한국과학기술연구원 무반사 나노코팅 구조 및 그 제조방법
JP2017076081A (ja) * 2015-10-16 2017-04-20 キヤノン株式会社 反射防止膜、光学素子、光学系および光学機器
CN109844572A (zh) 2016-09-13 2019-06-04 皇家飞利浦有限公司 包括耐磨层的层压件、包括所述层压件的设备及制造所述层压件的方法
US10591645B2 (en) * 2016-09-19 2020-03-17 Apple Inc. Electronic devices having scratch-resistant antireflection coatings
CN109387889A (zh) * 2017-08-03 2019-02-26 京东方科技集团股份有限公司 抗反射结构、显示装置及抗反射结构制作方法
JP6428905B2 (ja) * 2017-12-20 2018-11-28 王子ホールディングス株式会社 微細構造体および微細構造体の製造方法
CN112740081B (zh) * 2018-09-27 2022-08-26 富士胶片株式会社 防反射膜、光学元件、防反射膜的制造方法及微细凹凸结构的形成方法
US11583388B2 (en) 2019-04-05 2023-02-21 Amo Groningen B.V. Systems and methods for spectacle independence using refractive index writing with an intraocular lens
US11678975B2 (en) 2019-04-05 2023-06-20 Amo Groningen B.V. Systems and methods for treating ocular disease with an intraocular lens and refractive index writing
US12357509B2 (en) 2019-04-05 2025-07-15 Amo Groningen B.V. Systems and methods for improving vision from an intraocular lens in an incorrect position and using refractive index writing
US11564839B2 (en) 2019-04-05 2023-01-31 Amo Groningen B.V. Systems and methods for vergence matching of an intraocular lens with refractive index writing
US11583389B2 (en) 2019-04-05 2023-02-21 Amo Groningen B.V. Systems and methods for correcting photic phenomenon from an intraocular lens and using refractive index writing
US12377622B2 (en) 2019-04-05 2025-08-05 Amo Groningen B.V. Systems and methods for vergence matching with an optical profile and using refractive index writing
US11529230B2 (en) 2019-04-05 2022-12-20 Amo Groningen B.V. Systems and methods for correcting power of an intraocular lens using refractive index writing
US11944574B2 (en) 2019-04-05 2024-04-02 Amo Groningen B.V. Systems and methods for multiple layer intraocular lens and using refractive index writing
CN113311515A (zh) * 2020-02-25 2021-08-27 华为技术有限公司 一种镜头、摄像模组和电子设备
JP2021162728A (ja) * 2020-03-31 2021-10-11 デクセリアルズ株式会社 光学体、光学体の製造方法及び光学デバイス
JP7491163B2 (ja) * 2020-09-23 2024-05-28 株式会社Ｊｖｃケンウッド 反射型液晶表示素子及び液晶表示装置
CN115390168A (zh) 2021-05-21 2022-11-25 大立光电股份有限公司 塑胶光学转折元件、成像镜头模块及电子装置
TWI847209B (zh) * 2021-09-01 2024-07-01 大立光電股份有限公司 成像光學鏡頭、取像裝置及電子裝置
US12379524B2 (en) 2021-09-01 2025-08-05 Largan Precision Co., Ltd. Optical imaging lens assembly comprising a gradient refractive coating having a plurality of holes, imaging apparatus and electronic device
WO2023148839A1 (ja) * 2022-02-02 2023-08-10 株式会社京都セミコンダクター 光半導体素子
US12332408B2 (en) 2022-08-23 2025-06-17 Apple Inc. Anti-reflective optical structures for optical systems
US20240201422A1 (en) * 2022-12-20 2024-06-20 Intevac, Inc. Low index of refraction thin film with high hardness coating and method and apparatus to produce same
FI20235855A1 (en) * 2023-08-01 2025-02-02 Teknologian Tutkimuskeskus Vtt Oy Anti-reflective treated surface and method for manufacturing it

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0883581A (ja) * 1994-09-13 1996-03-26 Hitachi Ltd 表示装置の表面基板処理膜とその製造方法
DE69937764T2 (de) * 1998-09-22 2008-11-27 Fujifilm Corp. Verfahren zur Herstellung eines Antireflektionsfilms
EP1039347B1 (en) * 1999-03-25 2003-12-17 Infineon Technologies North America Corp. Antireflective coating for improving cd control
JP2003119052A (ja) * 2001-10-12 2003-04-23 Matsushita Electric Works Ltd 光透過シート、これを用いた発光装置、及び、光透過シートの製造方法
JP2004149782A (ja) * 2002-10-09 2004-05-27 Mitsubishi Chemicals Corp 熱可塑性樹脂組成物及びそれを用いてなる成形体
JP2007052345A (ja) * 2005-08-19 2007-03-01 Oji Paper Co Ltd 屈折率傾斜多層薄膜構造体及びその製造方法
JP5147290B2 (ja) * 2006-05-31 2013-02-20 株式会社半導体エネルギー研究所 表示装置
JP5313750B2 (ja) * 2008-07-31 2013-10-09 学校法人慶應義塾 反射防止膜及びこれを有する光学部品、交換レンズ及び撮像装置

Also Published As

Publication number Publication date
US20110242662A1 (en) 2011-10-06
US9291748B2 (en) 2016-03-22
JP2011215440A (ja) 2011-10-27

Similar Documents

Publication Publication Date Title
JP5773576B2 (ja) 反射防止構造および光学機器
US9405044B2 (en) Antireflection coating film, and optical element, optical system, and optical apparatus having the same
US9715044B2 (en) Antireflection film, and optical element and optical system that include the same
US9423530B2 (en) Optical element, and optical system and optical apparatus using same
JP2015004919A (ja) 反射防止膜及びそれを有する光学素子
JP5885649B2 (ja) 反射防止膜を有する光学素子、光学系および光学機器
JP2010078803A (ja) 光学素子及びそれを有する光学系
KR101058992B1 (ko) 광학 소자 및 광학 기기
TWI432770B (zh) 光學系統
US8437083B2 (en) Optical element, optical system including the optical element, and optical apparatus including the optical system
JP2015094878A (ja) 反射防止膜、光学素子、光学系および光学機器
JP2017040909A (ja) 光学フィルタおよびそれを有する光学系、撮像装置、レンズ装置
JP2019039961A (ja) 反射防止膜を有する光学系および光学装置
JP2010066704A (ja) 光学素子、光学系及び光学機器
JP2015084024A (ja) 反射防止膜、光学素子および光学機器
CN117849924A (zh) 散景滤光膜、成像光学镜头、取像装置及电子装置
JP2017134362A (ja) 光学素子及びそれを有する光学系
JP2018185394A (ja) 反射防止膜およびそれを有する光学素子，光学系，光学装置
JP2009042472A (ja) 光学素子
JP2018091918A (ja) 光学素子およびそれを有する光学系
JP2012159723A (ja) 光学系
JP2015203723A5 (enExample)
JP2012159720A (ja) 光学系
JP2018072624A (ja) 光学素子およびそれを有する光学系、撮像装置
JP2018025651A (ja) 光学素子およびそれを有する光学系、撮像装置

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20130401

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20130401

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20140115

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20140120

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20140121

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20140320

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20141007

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20141208

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20150602

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20150630

R151 Written notification of patent or utility model registration

Ref document number: 5773576

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R151

LAPS Cancellation because of no payment of annual fees