JP5763612B2 - ロッドレンズの製造方法および製造装置 - Google Patents
ロッドレンズの製造方法および製造装置 Download PDFInfo
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- JP5763612B2 JP5763612B2 JP2012276523A JP2012276523A JP5763612B2 JP 5763612 B2 JP5763612 B2 JP 5763612B2 JP 2012276523 A JP2012276523 A JP 2012276523A JP 2012276523 A JP2012276523 A JP 2012276523A JP 5763612 B2 JP5763612 B2 JP 5763612B2
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- 238000004519 manufacturing process Methods 0.000 title claims description 27
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 29
- 238000000034 method Methods 0.000 claims description 28
- 239000000463 material Substances 0.000 claims description 15
- 230000007062 hydrolysis Effects 0.000 claims description 8
- 238000006460 hydrolysis reaction Methods 0.000 claims description 8
- 230000008021 deposition Effects 0.000 claims description 7
- 239000002245 particle Substances 0.000 claims description 6
- 239000000376 reactant Substances 0.000 claims description 5
- 230000005855 radiation Effects 0.000 claims description 4
- 229910052710 silicon Inorganic materials 0.000 claims description 4
- 239000010703 silicon Substances 0.000 claims description 4
- 239000005350 fused silica glass Substances 0.000 claims description 3
- 229910052814 silicon oxide Inorganic materials 0.000 claims description 3
- 230000000087 stabilizing effect Effects 0.000 claims description 2
- 238000002834 transmittance Methods 0.000 claims description 2
- 230000003287 optical effect Effects 0.000 description 11
- 239000011521 glass Substances 0.000 description 8
- 238000005137 deposition process Methods 0.000 description 4
- 239000011265 semifinished product Substances 0.000 description 4
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 3
- 229910002804 graphite Inorganic materials 0.000 description 3
- 239000010439 graphite Substances 0.000 description 3
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Chemical group [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 3
- 206010040925 Skin striae Diseases 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 2
- 239000011449 brick Substances 0.000 description 2
- 239000011456 concrete brick Substances 0.000 description 2
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 2
- 239000012774 insulation material Substances 0.000 description 2
- 238000012544 monitoring process Methods 0.000 description 2
- UFHFLCQGNIYNRP-VVKOMZTBSA-N Dideuterium Chemical compound [2H][2H] UFHFLCQGNIYNRP-VVKOMZTBSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000003763 carbonization Methods 0.000 description 1
- 229910010293 ceramic material Inorganic materials 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000010924 continuous production Methods 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 238000000265 homogenisation Methods 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 210000003000 inclusion body Anatomy 0.000 description 1
- 238000001499 laser induced fluorescence spectroscopy Methods 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 238000010309 melting process Methods 0.000 description 1
- 238000012634 optical imaging Methods 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 238000007517 polishing process Methods 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 238000002211 ultraviolet spectrum Methods 0.000 description 1
- 235000012431 wafers Nutrition 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B11/00—Pressing molten glass or performed glass reheated to equivalent low viscosity without blowing
- C03B11/06—Construction of plunger or mould
- C03B11/08—Construction of plunger or mould for making solid articles, e.g. lenses
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
- C03B19/1407—Deposition reactors therefor
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
- C03B19/1415—Reactant delivery systems
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B23/00—Re-forming shaped glass
- C03B23/04—Re-forming tubes or rods
- C03B23/045—Tools or apparatus specially adapted for re-forming tubes or rods in general, e.g. glass lathes, chucks
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
- C03B37/01—Manufacture of glass fibres or filaments
- C03B37/012—Manufacture of preforms for drawing fibres or filaments
- C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
- C03B37/018—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD] by glass deposition on a glass substrate, e.g. by inside-, modified-, plasma-, or plasma modified- chemical vapour deposition [ICVD, MCVD, PCVD, PMCVD], i.e. by thin layer coating on the inside or outside of a glass tube or on a glass rod
- C03B37/01884—Means for supporting, rotating and translating tubes or rods being formed, e.g. lathes
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B3/00—Simple or compound lenses
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B3/00—Simple or compound lenses
- G02B3/02—Simple or compound lenses with non-spherical faces
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/06—Doped silica-based glasses
- C03B2201/20—Doped silica-based glasses doped with non-metals other than boron or fluorine
- C03B2201/21—Doped silica-based glasses doped with non-metals other than boron or fluorine doped with molecular hydrogen
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/06—Doped silica-based glasses
- C03B2201/20—Doped silica-based glasses doped with non-metals other than boron or fluorine
- C03B2201/23—Doped silica-based glasses doped with non-metals other than boron or fluorine doped with hydroxyl groups
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2207/00—Glass deposition burners
- C03B2207/60—Relationship between burner and deposit, e.g. position
- C03B2207/66—Relative motion
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- General Physics & Mathematics (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- General Life Sciences & Earth Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Glass Compositions (AREA)
- Glass Melting And Manufacturing (AREA)
Description
1a 断熱材料
1b コンクリートレンガ壁または耐火レンガ壁
1c 内側フェアリング
2 バーナ
3 反応剤用の供給ライン
4 ダイ
5 FSインゴット
6 溶融表面
7 炉空洞の延長部
a FSインゴットの包絡面からマッフル内壁までの間隔
b 溶融表面からマッフル内壁までの間隔
L キルン空洞延長部の長さ
Claims (6)
- 200mmまでのロッドレンズ面の包絡直径および800mm以上のエッジ長さを有するロッドレンズの製造方法において、前記製造が、SiOx粒子を火炎流れから火炎流れに関して直線状にマッフル内で可動な回転ダイ上に直接単段堆積させる工程を含む火炎加水分解法に基づいて溶融シリカのインゴットとして構成される合成石英ガラス材料製の円柱状の素子からの製作によって行われ、
前記マッフルが、形成中のベース素子(5)の包絡面および前記マッフルの内壁の間の40〜75mmの範囲の間隔(a)と、前記マッフルおよび前記ベース素子(5)の溶融表面(6)の間の10〜25mmの間隔(b)とを有するマッフル形状を具え、これにより最終的なロッドレンズの合成石英ガラスがその全長にわたって均質であることを特徴とするロッドレンズの製造方法。 - 請求項1に記載の方法において、前記堆積工程において堆積される合成石英ガラス材料の総量が、1000ppmより多いOH含有量、および/または、0.8×1018分子/cm3より多い、通常1.2×1018分子/cm3のH2含有量を有する、ことを特徴とする方法。
- 請求項1または2に記載の方法において、前記堆積工程において堆積される合成石英ガラス材料の総量が、193〜400nmの波長範囲の紫外線放射に対して最高の透過率を有する、ことを特徴とする方法。
- ロッドレンズの製造用として構成される円柱体素子を製造するための、SiOx粒子を火炎流れからマッフル内の回転および可動ダイの上に直接単段堆積させる工程を含む火炎加水分解法の使用であって、
前記マッフルが、形成中のベース素子(5)の包絡面および前記マッフルの内壁の間の40〜75mmの範囲の間隔(a)と、前記マッフルおよび前記ベース素子(5)の溶融表面(6)の間の10〜25mmの間隔(b)とを有するマッフル形状を具え、これにより最終的なロッドレンズの合成石英ガラスがその全長にわたって均質であることを特徴とする使用。 - 円柱体形状のロッドレンズベース素子を製造するためのマッフル炉を含む装置であって、前記マッフル炉が、多重シェルの管状またはトンネル形状のマッフル(1)と、第1の側において前記マッフル内に差し込まれるバーナ(2)であり、ケイ素を含む反応剤用の供給ライン(3)を備えたバーナ(2)と、前記マッフルの第2の側における可動なダイ(4)であり、前記バーナの反対側に配置されるダイ(4)とを含む装置において、前記マッフルが、形成中のベース素子(5)の包絡面および前記マッフルの内壁の間の40〜75mmの範囲の間隔(a)と、前記マッフルおよび前記ベース素子(5)の溶融表面(6)の間の10〜25mmの間隔(b)とを有するマッフル形状を含み、かつ、1100〜1300℃の排気空気制御されたキルン温度が前記マッフル内に形成され、これにより最終的なロッドレンズの合成石英ガラスがその全長にわたって均質であることを特徴とする装置。
- 請求項5に記載の装置において、前記マッフルが、少なくとも50mmの長さの温度安定用の炉空洞部の延長部(7)を含む、ことを特徴とする装置。
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102011122184.4 | 2011-12-23 | ||
DE102011122184 | 2011-12-23 | ||
DE102012000418A DE102012000418A1 (de) | 2011-12-23 | 2012-01-12 | Verfahren zum Herstellen von Stablinsen und Vorrichtung hierfür |
DE102012000418.4 | 2012-01-12 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2013133277A JP2013133277A (ja) | 2013-07-08 |
JP5763612B2 true JP5763612B2 (ja) | 2015-08-12 |
Family
ID=47290796
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2012276523A Active JP5763612B2 (ja) | 2011-12-23 | 2012-12-19 | ロッドレンズの製造方法および製造装置 |
Country Status (6)
Country | Link |
---|---|
US (2) | US20130160496A1 (ja) |
EP (1) | EP2607325B1 (ja) |
JP (1) | JP5763612B2 (ja) |
KR (1) | KR20130073846A (ja) |
DE (1) | DE102012000418A1 (ja) |
IL (1) | IL223764A (ja) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5848320B2 (ja) * | 2013-12-20 | 2016-01-27 | デクセリアルズ株式会社 | 円筒基材、原盤、及び原盤の製造方法 |
CN111320360A (zh) * | 2020-03-04 | 2020-06-23 | 广州精点科技有限公司 | 一种用于光学镜片热压成型的自动化上下料的装置 |
Family Cites Families (24)
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GB2083806B (en) * | 1980-09-11 | 1984-08-08 | Nippon Telegraph & Telephone | Fabrication methods of doped silica glass and optical fibre preform by using the doped silica glass |
JPS57100934A (en) * | 1980-12-12 | 1982-06-23 | Nippon Telegr & Teleph Corp <Ntt> | Manufacturing of optical fiber preform |
JPS5978947A (ja) * | 1982-10-22 | 1984-05-08 | Furukawa Electric Co Ltd:The | 光学系ガラスの堆積方法 |
JPS62216935A (ja) * | 1986-03-19 | 1987-09-24 | Furukawa Electric Co Ltd:The | 石英系ガラス母材の製造方法 |
ATE116448T1 (de) * | 1989-06-09 | 1995-01-15 | Heraeus Quarzglas | Optische teile und rohlinge aus synthetischem siliziumdioxidglas und verfahren zu ihrer herstellung. |
US6518210B1 (en) * | 1995-01-06 | 2003-02-11 | Nikon Corporation | Exposure apparatus including silica glass and method for producing silica glass |
US5707908A (en) * | 1995-01-06 | 1998-01-13 | Nikon Corporation | Silica glass |
US5616159A (en) | 1995-04-14 | 1997-04-01 | Corning Incorporated | Method of forming high purity fused silica having high resistance to optical damage |
JPH09278453A (ja) * | 1996-04-16 | 1997-10-28 | Sumitomo Electric Ind Ltd | ロッドレンズ用素材の製造方法 |
DE59800763D1 (de) * | 1997-03-07 | 2001-06-28 | Schott Ml Gmbh | Vorform aus synthetischem kieselglas und vorrichtung zu ihrer herstellung |
JPH1129331A (ja) * | 1997-05-14 | 1999-02-02 | Nikon Corp | 合成石英ガラス光学部材の製造方法および光学部材 |
TW440548B (en) * | 1997-05-14 | 2001-06-16 | Nippon Kogaku Kk | Synthetic silica glass optical member and method of manufacturing the same |
JP2001010833A (ja) * | 1999-06-21 | 2001-01-16 | Nikon Corp | 石英ガラス部材 |
DE19960211B4 (de) * | 1999-12-14 | 2005-08-04 | Schott Ag | Vorrichtung zum Herstellen eines Glasstranges |
JP3715163B2 (ja) * | 1999-12-24 | 2005-11-09 | 東芝セラミックス株式会社 | 高出力ArFエキシマレーザー用合成石英ガラス部材およびその製造方法 |
JP2004151682A (ja) * | 2002-09-04 | 2004-05-27 | Nippon Sheet Glass Co Ltd | 屈折率分布型ロッドレンズ被覆用ガラス、屈折率分布型ロッドレンズおよびその製造方法 |
US20070049482A1 (en) * | 2005-08-11 | 2007-03-01 | Shin-Etsu Chemical Co., Ltd. | Synthetic quartz glass substrate for excimer lasers and making method |
DE102005043289B3 (de) | 2005-09-09 | 2006-09-14 | Heraeus Tenevo Gmbh | Verfahren zur Herstellung eines Halbzeugs für ein optisches Bauteil hoher Homogenität, zur Durchführung des Verfahrens geeigneter Rohling sowie Verwendung des Rohlings und des Halbzeugs |
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DE102006061931B3 (de) * | 2006-12-21 | 2008-04-17 | Institut für Physikalische Hochtechnologie e.V. | Verfahren zur Herstellung von Quarzglas mit geringem OH-Gehalt |
JP5270862B2 (ja) * | 2007-05-15 | 2013-08-21 | 信越石英株式会社 | 銅含有シリカガラス及びその製造方法、並びにそれを用いたキセノンフラッシュランプ |
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-
2012
- 2012-01-12 DE DE102012000418A patent/DE102012000418A1/de not_active Ceased
- 2012-12-07 EP EP12195986.0A patent/EP2607325B1/de active Active
- 2012-12-19 JP JP2012276523A patent/JP5763612B2/ja active Active
- 2012-12-20 IL IL223764A patent/IL223764A/en not_active IP Right Cessation
- 2012-12-20 US US13/721,609 patent/US20130160496A1/en not_active Abandoned
- 2012-12-21 KR KR1020120150758A patent/KR20130073846A/ko active Search and Examination
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2015
- 2015-11-11 US US14/938,069 patent/US9738556B2/en active Active
Also Published As
Publication number | Publication date |
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JP2013133277A (ja) | 2013-07-08 |
IL223764A (en) | 2017-05-29 |
EP2607325B1 (de) | 2019-08-21 |
US9738556B2 (en) | 2017-08-22 |
KR20130073846A (ko) | 2013-07-03 |
US20160060155A1 (en) | 2016-03-03 |
EP2607325A1 (de) | 2013-06-26 |
DE102012000418A1 (de) | 2013-06-27 |
US20130160496A1 (en) | 2013-06-27 |
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