JP5727073B1 - 可搬型回転装置及び成膜装置 - Google Patents

可搬型回転装置及び成膜装置 Download PDF

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Publication number
JP5727073B1
JP5727073B1 JP2014115098A JP2014115098A JP5727073B1 JP 5727073 B1 JP5727073 B1 JP 5727073B1 JP 2014115098 A JP2014115098 A JP 2014115098A JP 2014115098 A JP2014115098 A JP 2014115098A JP 5727073 B1 JP5727073 B1 JP 5727073B1
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JP
Japan
Prior art keywords
rotating
portable
substrate
substrate holder
planetary gear
Prior art date
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Active
Application number
JP2014115098A
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English (en)
Japanese (ja)
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JP2015229779A (ja
Inventor
石井　孝宣
孝宣 石井
幸喜 千葉
幸喜 千葉
佐藤　康弘
康弘 佐藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shincron Co Ltd
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Shincron Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shincron Co Ltd filed Critical Shincron Co Ltd
Priority to JP2014115098A priority Critical patent/JP5727073B1/ja
Priority to MYPI2015704375A priority patent/MY181764A/en
Priority to CN201580000971.9A priority patent/CN105324513B/zh
Priority to PCT/JP2015/065900 priority patent/WO2015186702A1/ja
Priority to TW104117706A priority patent/TWI586906B/zh
Application granted granted Critical
Publication of JP5727073B1 publication Critical patent/JP5727073B1/ja
Publication of JP2015229779A publication Critical patent/JP2015229779A/ja
Priority to HK16103857.8A priority patent/HK1215877A1/zh
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50—Substrate holders

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
JP2014115098A 2014-06-03 2014-06-03 可搬型回転装置及び成膜装置 Active JP5727073B1 (ja)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP2014115098A JP5727073B1 (ja) 2014-06-03 2014-06-03 可搬型回転装置及び成膜装置
MYPI2015704375A MY181764A (en) 2014-06-03 2015-06-02 Transportable rotation device and film formation device
CN201580000971.9A CN105324513B (zh) 2014-06-03 2015-06-02 可搬型旋转装置及成膜装置
PCT/JP2015/065900 WO2015186702A1 (ja) 2014-06-03 2015-06-02 可搬型回転装置及び成膜装置
TW104117706A TWI586906B (zh) 2014-06-03 2015-06-02 Movable type rotating device and film forming device
HK16103857.8A HK1215877A1 (zh) 2014-06-03 2016-04-05 可搬型旋轉裝置及成膜裝置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2014115098A JP5727073B1 (ja) 2014-06-03 2014-06-03 可搬型回転装置及び成膜装置

Publications (2)

Publication Number Publication Date
JP5727073B1 true JP5727073B1 (ja) 2015-06-03
JP2015229779A JP2015229779A (ja) 2015-12-21

Family

ID=53437866

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2014115098A Active JP5727073B1 (ja) 2014-06-03 2014-06-03 可搬型回転装置及び成膜装置

Country Status (6)

Country Link
JP (1) JP5727073B1 (zh)
CN (1) CN105324513B (zh)
HK (1) HK1215877A1 (zh)
MY (1) MY181764A (zh)
TW (1) TWI586906B (zh)
WO (1) WO2015186702A1 (zh)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11358168B2 (en) * 2019-06-18 2022-06-14 Visera Technologies Company Limited Coating apparatus
DE102020118367A1 (de) * 2020-07-13 2022-01-13 Carl Zeiss Vision International Gmbh Vorrichtung zum Aufnehmen eines Gegenstands in einer Vakuumbeschichtungsanlage
CN114807865A (zh) * 2022-04-18 2022-07-29 兰州交通大学 一种能够双面镀膜的真空蒸镀设备
CN114752911B (zh) * 2022-04-22 2024-04-05 捷捷微电(南通)科技有限公司 行星式穹顶安装架和真空镀膜机

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63307260A (ja) * 1987-06-05 1988-12-14 Shin Meiwa Ind Co Ltd 成膜設備の回転式基板ホルダ
JPH07138756A (ja) * 1993-11-16 1995-05-30 Olympus Optical Co Ltd 薄膜蒸着装置
JPH07228974A (ja) * 1994-02-17 1995-08-29 Asahi Optical Co Ltd 蒸着装置
JP2012227231A (ja) * 2011-04-15 2012-11-15 Japan Pionics Co Ltd Ｉｉｉ族窒化物半導体の気相成長装置

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5124013A (en) * 1988-02-08 1992-06-23 Optical Coating Laboratory, Inc. High ratio planetary drive system and method for vacuum chamber
JP2981682B2 (ja) * 1990-11-30 1999-11-22 新明和工業株式会社 連続成膜方式の真空蒸着装置
TW200712238A (en) * 2005-09-07 2007-04-01 Bohhen Optronics Co Ltd Fixture for large-sized sheet of film-deposition
JP5034578B2 (ja) * 2007-03-15 2012-09-26 パナソニック株式会社 薄膜処理装置
CN102066602B (zh) * 2008-06-17 2012-10-31 株式会社新柯隆 偏压溅射装置
CN101407906B (zh) * 2008-10-20 2011-04-27 舟山市汉邦机械科技有限公司 真空镀膜设备

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63307260A (ja) * 1987-06-05 1988-12-14 Shin Meiwa Ind Co Ltd 成膜設備の回転式基板ホルダ
JPH07138756A (ja) * 1993-11-16 1995-05-30 Olympus Optical Co Ltd 薄膜蒸着装置
JPH07228974A (ja) * 1994-02-17 1995-08-29 Asahi Optical Co Ltd 蒸着装置
JP2012227231A (ja) * 2011-04-15 2012-11-15 Japan Pionics Co Ltd Ｉｉｉ族窒化物半導体の気相成長装置

Also Published As

Publication number Publication date
MY181764A (en) 2021-01-06
CN105324513B (zh) 2017-03-15
TWI586906B (zh) 2017-06-11
WO2015186702A1 (ja) 2015-12-10
TW201546386A (zh) 2015-12-16
CN105324513A (zh) 2016-02-10
JP2015229779A (ja) 2015-12-21
HK1215877A1 (zh) 2016-09-23

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