JP5727073B1 - 可搬型回転装置及び成膜装置 - Google Patents
可搬型回転装置及び成膜装置 Download PDFInfo
- Publication number
- JP5727073B1 JP5727073B1 JP2014115098A JP2014115098A JP5727073B1 JP 5727073 B1 JP5727073 B1 JP 5727073B1 JP 2014115098 A JP2014115098 A JP 2014115098A JP 2014115098 A JP2014115098 A JP 2014115098A JP 5727073 B1 JP5727073 B1 JP 5727073B1
- Authority
- JP
- Japan
- Prior art keywords
- rotating
- portable
- substrate
- substrate holder
- planetary gear
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 239000000758 substrate Substances 0.000 claims abstract description 116
- 230000007246 mechanism Effects 0.000 claims abstract description 46
- 230000002093 peripheral effect Effects 0.000 claims abstract description 26
- 230000015572 biosynthetic process Effects 0.000 claims abstract description 21
- 238000003860 storage Methods 0.000 claims description 2
- 239000012528 membrane Substances 0.000 claims 1
- 238000007740 vapor deposition Methods 0.000 abstract 1
- 239000010408 film Substances 0.000 description 47
- 238000003780 insertion Methods 0.000 description 11
- 230000037431 insertion Effects 0.000 description 11
- 238000000151 deposition Methods 0.000 description 10
- 230000008021 deposition Effects 0.000 description 10
- 238000001771 vacuum deposition Methods 0.000 description 10
- 238000001704 evaporation Methods 0.000 description 9
- 230000008020 evaporation Effects 0.000 description 8
- 239000000463 material Substances 0.000 description 8
- 230000007723 transport mechanism Effects 0.000 description 7
- 238000010586 diagram Methods 0.000 description 6
- 230000033001 locomotion Effects 0.000 description 6
- 230000005540 biological transmission Effects 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 230000004048 modification Effects 0.000 description 3
- 238000012986 modification Methods 0.000 description 3
- 230000009467 reduction Effects 0.000 description 3
- 239000010409 thin film Substances 0.000 description 3
- 238000007738 vacuum evaporation Methods 0.000 description 3
- 229910000831 Steel Inorganic materials 0.000 description 2
- 238000012423 maintenance Methods 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 238000000926 separation method Methods 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 239000010959 steel Substances 0.000 description 2
- 238000003466 welding Methods 0.000 description 2
- 229910000975 Carbon steel Inorganic materials 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 239000010962 carbon steel Substances 0.000 description 1
- 238000007733 ion plating Methods 0.000 description 1
- 230000007257 malfunction Effects 0.000 description 1
- 230000032258 transport Effects 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 239000013585 weight reducing agent Substances 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/50—Substrate holders
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Priority Applications (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2014115098A JP5727073B1 (ja) | 2014-06-03 | 2014-06-03 | 可搬型回転装置及び成膜装置 |
MYPI2015704375A MY181764A (en) | 2014-06-03 | 2015-06-02 | Transportable rotation device and film formation device |
CN201580000971.9A CN105324513B (zh) | 2014-06-03 | 2015-06-02 | 可搬型旋转装置及成膜装置 |
PCT/JP2015/065900 WO2015186702A1 (ja) | 2014-06-03 | 2015-06-02 | 可搬型回転装置及び成膜装置 |
TW104117706A TWI586906B (zh) | 2014-06-03 | 2015-06-02 | Movable type rotating device and film forming device |
HK16103857.8A HK1215877A1 (zh) | 2014-06-03 | 2016-04-05 | 可搬型旋轉裝置及成膜裝置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2014115098A JP5727073B1 (ja) | 2014-06-03 | 2014-06-03 | 可搬型回転装置及び成膜装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP5727073B1 true JP5727073B1 (ja) | 2015-06-03 |
JP2015229779A JP2015229779A (ja) | 2015-12-21 |
Family
ID=53437866
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2014115098A Active JP5727073B1 (ja) | 2014-06-03 | 2014-06-03 | 可搬型回転装置及び成膜装置 |
Country Status (6)
Country | Link |
---|---|
JP (1) | JP5727073B1 (zh) |
CN (1) | CN105324513B (zh) |
HK (1) | HK1215877A1 (zh) |
MY (1) | MY181764A (zh) |
TW (1) | TWI586906B (zh) |
WO (1) | WO2015186702A1 (zh) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US11358168B2 (en) * | 2019-06-18 | 2022-06-14 | Visera Technologies Company Limited | Coating apparatus |
DE102020118367A1 (de) * | 2020-07-13 | 2022-01-13 | Carl Zeiss Vision International Gmbh | Vorrichtung zum Aufnehmen eines Gegenstands in einer Vakuumbeschichtungsanlage |
CN114807865A (zh) * | 2022-04-18 | 2022-07-29 | 兰州交通大学 | 一种能够双面镀膜的真空蒸镀设备 |
CN114752911B (zh) * | 2022-04-22 | 2024-04-05 | 捷捷微电(南通)科技有限公司 | 行星式穹顶安装架和真空镀膜机 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63307260A (ja) * | 1987-06-05 | 1988-12-14 | Shin Meiwa Ind Co Ltd | 成膜設備の回転式基板ホルダ |
JPH07138756A (ja) * | 1993-11-16 | 1995-05-30 | Olympus Optical Co Ltd | 薄膜蒸着装置 |
JPH07228974A (ja) * | 1994-02-17 | 1995-08-29 | Asahi Optical Co Ltd | 蒸着装置 |
JP2012227231A (ja) * | 2011-04-15 | 2012-11-15 | Japan Pionics Co Ltd | Iii族窒化物半導体の気相成長装置 |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5124013A (en) * | 1988-02-08 | 1992-06-23 | Optical Coating Laboratory, Inc. | High ratio planetary drive system and method for vacuum chamber |
JP2981682B2 (ja) * | 1990-11-30 | 1999-11-22 | 新明和工業株式会社 | 連続成膜方式の真空蒸着装置 |
TW200712238A (en) * | 2005-09-07 | 2007-04-01 | Bohhen Optronics Co Ltd | Fixture for large-sized sheet of film-deposition |
JP5034578B2 (ja) * | 2007-03-15 | 2012-09-26 | パナソニック株式会社 | 薄膜処理装置 |
CN102066602B (zh) * | 2008-06-17 | 2012-10-31 | 株式会社新柯隆 | 偏压溅射装置 |
CN101407906B (zh) * | 2008-10-20 | 2011-04-27 | 舟山市汉邦机械科技有限公司 | 真空镀膜设备 |
-
2014
- 2014-06-03 JP JP2014115098A patent/JP5727073B1/ja active Active
-
2015
- 2015-06-02 TW TW104117706A patent/TWI586906B/zh active
- 2015-06-02 MY MYPI2015704375A patent/MY181764A/en unknown
- 2015-06-02 CN CN201580000971.9A patent/CN105324513B/zh active Active
- 2015-06-02 WO PCT/JP2015/065900 patent/WO2015186702A1/ja active Application Filing
-
2016
- 2016-04-05 HK HK16103857.8A patent/HK1215877A1/zh not_active IP Right Cessation
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63307260A (ja) * | 1987-06-05 | 1988-12-14 | Shin Meiwa Ind Co Ltd | 成膜設備の回転式基板ホルダ |
JPH07138756A (ja) * | 1993-11-16 | 1995-05-30 | Olympus Optical Co Ltd | 薄膜蒸着装置 |
JPH07228974A (ja) * | 1994-02-17 | 1995-08-29 | Asahi Optical Co Ltd | 蒸着装置 |
JP2012227231A (ja) * | 2011-04-15 | 2012-11-15 | Japan Pionics Co Ltd | Iii族窒化物半導体の気相成長装置 |
Also Published As
Publication number | Publication date |
---|---|
MY181764A (en) | 2021-01-06 |
CN105324513B (zh) | 2017-03-15 |
TWI586906B (zh) | 2017-06-11 |
WO2015186702A1 (ja) | 2015-12-10 |
TW201546386A (zh) | 2015-12-16 |
CN105324513A (zh) | 2016-02-10 |
JP2015229779A (ja) | 2015-12-21 |
HK1215877A1 (zh) | 2016-09-23 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP5727073B1 (ja) | 可搬型回転装置及び成膜装置 | |
US8070146B2 (en) | Support device for sputtering machine | |
US8535496B2 (en) | Sputter-coating apparatus | |
JP6147168B2 (ja) | 成膜装置 | |
JP5069892B2 (ja) | 差動揺動型減速機 | |
MX2008002382A (es) | Dispositivo portador de piezas de trabajo. | |
US8524054B2 (en) | Loading device and sputtering device using same | |
JP2016516960A (ja) | 外転サイクロイド歯車列 | |
JP2012067359A (ja) | 膜形成対象物品支持装置及び膜形成装置 | |
JP6709124B2 (ja) | 産業用ロボット | |
JP2013147677A (ja) | 成膜装置 | |
CN103080601A (zh) | 多级减速装置 | |
JP2010192720A (ja) | 半導体気相成長装置 | |
US20120097106A1 (en) | Physical vapor deposition device for coating workpiece | |
JP2014047797A (ja) | アクチュエータ | |
US20120090541A1 (en) | Workpiece carrier and deposition device having same | |
CN103806095B (zh) | 行星式旋转托盘装置 | |
US20120097103A1 (en) | Physical vapor deposition device for coating workpiece | |
JP2018135558A (ja) | ワーク回転装置およびそれを備えた成膜装置 | |
JP2012224878A (ja) | 蒸着装置用ワーク移動機構とこれを用いた蒸着方法 | |
JP2009280881A (ja) | 膜形成対象物品支持装置及び膜形成装置 | |
CN115507155A (zh) | 双级型行星齿轮机构和轮驱动装置 | |
JP2014126042A (ja) | ベーンポンプの組立方法 | |
JP2010065542A (ja) | 風車用駆動装置 | |
JP5750470B2 (ja) | 回転伝達装置 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20150303 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20150401 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 5727073 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |