MY181764A - Transportable rotation device and film formation device - Google Patents
Transportable rotation device and film formation deviceInfo
- Publication number
- MY181764A MY181764A MYPI2015704375A MYPI2015704375A MY181764A MY 181764 A MY181764 A MY 181764A MY PI2015704375 A MYPI2015704375 A MY PI2015704375A MY PI2015704375 A MYPI2015704375 A MY PI2015704375A MY 181764 A MY181764 A MY 181764A
- Authority
- MY
- Malaysia
- Prior art keywords
- rotation
- film formation
- transportable
- dome
- substrate holders
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/50—Substrate holders
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2014115098A JP5727073B1 (ja) | 2014-06-03 | 2014-06-03 | 可搬型回転装置及び成膜装置 |
PCT/JP2015/065900 WO2015186702A1 (ja) | 2014-06-03 | 2015-06-02 | 可搬型回転装置及び成膜装置 |
Publications (1)
Publication Number | Publication Date |
---|---|
MY181764A true MY181764A (en) | 2021-01-06 |
Family
ID=53437866
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
MYPI2015704375A MY181764A (en) | 2014-06-03 | 2015-06-02 | Transportable rotation device and film formation device |
Country Status (6)
Country | Link |
---|---|
JP (1) | JP5727073B1 (zh) |
CN (1) | CN105324513B (zh) |
HK (1) | HK1215877A1 (zh) |
MY (1) | MY181764A (zh) |
TW (1) | TWI586906B (zh) |
WO (1) | WO2015186702A1 (zh) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US11358168B2 (en) * | 2019-06-18 | 2022-06-14 | Visera Technologies Company Limited | Coating apparatus |
DE102020118367A1 (de) * | 2020-07-13 | 2022-01-13 | Carl Zeiss Vision International Gmbh | Vorrichtung zum Aufnehmen eines Gegenstands in einer Vakuumbeschichtungsanlage |
CN114807865A (zh) * | 2022-04-18 | 2022-07-29 | 兰州交通大学 | 一种能够双面镀膜的真空蒸镀设备 |
CN114752911B (zh) * | 2022-04-22 | 2024-04-05 | 捷捷微电(南通)科技有限公司 | 行星式穹顶安装架和真空镀膜机 |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0689442B2 (ja) * | 1987-06-05 | 1994-11-09 | 新明和工業株式会社 | 真空蒸着装置 |
US5124013A (en) * | 1988-02-08 | 1992-06-23 | Optical Coating Laboratory, Inc. | High ratio planetary drive system and method for vacuum chamber |
JP2981682B2 (ja) * | 1990-11-30 | 1999-11-22 | 新明和工業株式会社 | 連続成膜方式の真空蒸着装置 |
JP3579074B2 (ja) * | 1993-11-16 | 2004-10-20 | オリンパス株式会社 | 薄膜蒸着装置および薄膜蒸着方法 |
JPH07228974A (ja) * | 1994-02-17 | 1995-08-29 | Asahi Optical Co Ltd | 蒸着装置 |
TW200712238A (en) * | 2005-09-07 | 2007-04-01 | Bohhen Optronics Co Ltd | Fixture for large-sized sheet of film-deposition |
JP5034578B2 (ja) * | 2007-03-15 | 2012-09-26 | パナソニック株式会社 | 薄膜処理装置 |
CN102066602B (zh) * | 2008-06-17 | 2012-10-31 | 株式会社新柯隆 | 偏压溅射装置 |
CN101407906B (zh) * | 2008-10-20 | 2011-04-27 | 舟山市汉邦机械科技有限公司 | 真空镀膜设备 |
JP2012227231A (ja) * | 2011-04-15 | 2012-11-15 | Japan Pionics Co Ltd | Iii族窒化物半導体の気相成長装置 |
-
2014
- 2014-06-03 JP JP2014115098A patent/JP5727073B1/ja active Active
-
2015
- 2015-06-02 TW TW104117706A patent/TWI586906B/zh active
- 2015-06-02 MY MYPI2015704375A patent/MY181764A/en unknown
- 2015-06-02 CN CN201580000971.9A patent/CN105324513B/zh active Active
- 2015-06-02 WO PCT/JP2015/065900 patent/WO2015186702A1/ja active Application Filing
-
2016
- 2016-04-05 HK HK16103857.8A patent/HK1215877A1/zh not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
CN105324513B (zh) | 2017-03-15 |
TWI586906B (zh) | 2017-06-11 |
WO2015186702A1 (ja) | 2015-12-10 |
JP5727073B1 (ja) | 2015-06-03 |
TW201546386A (zh) | 2015-12-16 |
CN105324513A (zh) | 2016-02-10 |
JP2015229779A (ja) | 2015-12-21 |
HK1215877A1 (zh) | 2016-09-23 |
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