JP5714266B2 - マスクブランク、転写用マスクおよびこれらの製造方法 - Google Patents

マスクブランク、転写用マスクおよびこれらの製造方法 Download PDF

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Publication number
JP5714266B2
JP5714266B2 JP2010186151A JP2010186151A JP5714266B2 JP 5714266 B2 JP5714266 B2 JP 5714266B2 JP 2010186151 A JP2010186151 A JP 2010186151A JP 2010186151 A JP2010186151 A JP 2010186151A JP 5714266 B2 JP5714266 B2 JP 5714266B2
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JP
Japan
Prior art keywords
light shielding
film
mask
mask blank
layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2010186151A
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English (en)
Japanese (ja)
Other versions
JP2011081356A (ja
JP2011081356A5 (enExample
Inventor
野澤　順
順 野澤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hoya Corp
Original Assignee
Hoya Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoya Corp filed Critical Hoya Corp
Priority to JP2010186151A priority Critical patent/JP5714266B2/ja
Publication of JP2011081356A publication Critical patent/JP2011081356A/ja
Publication of JP2011081356A5 publication Critical patent/JP2011081356A5/ja
Application granted granted Critical
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Expired - Fee Related legal-status Critical Current
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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
    • G03F1/46—Antireflective coatings
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0682—Silicides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54—Absorbers, e.g. of opaque materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2008—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the reflectors, diffusers, light or heat filtering means or anti-reflective means used
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography
    • H10P76/20—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials
    • H10P76/204—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials of organic photoresist masks
    • H10P76/2041—Photolithographic processes
    • H10P76/2043—Photolithographic processes using an anti-reflective coating
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography
    • H10P76/40—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising inorganic materials
    • H10P76/408—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising inorganic materials characterised by their sizes, orientations, dispositions, behaviours or shapes
    • H10P76/4085—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising inorganic materials characterised by their sizes, orientations, dispositions, behaviours or shapes characterised by the processes involved to create the masks

Landscapes

  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Structural Engineering (AREA)
  • Architecture (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Physical Vapour Deposition (AREA)
JP2010186151A 2009-08-25 2010-08-23 マスクブランク、転写用マスクおよびこれらの製造方法 Expired - Fee Related JP5714266B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2010186151A JP5714266B2 (ja) 2009-08-25 2010-08-23 マスクブランク、転写用マスクおよびこれらの製造方法

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP2009194701 2009-08-25
JP2009194701 2009-08-25
JP2009207736 2009-09-09
JP2009207736 2009-09-09
JP2010186151A JP5714266B2 (ja) 2009-08-25 2010-08-23 マスクブランク、転写用マスクおよびこれらの製造方法

Publications (3)

Publication Number Publication Date
JP2011081356A JP2011081356A (ja) 2011-04-21
JP2011081356A5 JP2011081356A5 (enExample) 2013-09-12
JP5714266B2 true JP5714266B2 (ja) 2015-05-07

Family

ID=43625428

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2010186151A Expired - Fee Related JP5714266B2 (ja) 2009-08-25 2010-08-23 マスクブランク、転写用マスクおよびこれらの製造方法

Country Status (4)

Country Link
US (1) US8354205B2 (enExample)
JP (1) JP5714266B2 (enExample)
KR (1) KR20110021687A (enExample)
TW (1) TWI484287B (enExample)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8435704B2 (en) 2010-03-30 2013-05-07 Hoya Corporation Mask blank, transfer mask, and methods of manufacturing the same
US8524421B2 (en) 2010-03-30 2013-09-03 Hoya Corporation Mask blank, transfer mask, methods of manufacturing the same and method of manufacturing a semiconductor device
JP5920965B2 (ja) * 2011-05-20 2016-05-24 Hoya株式会社 マスクブランクの製造方法、転写用マスク用の製造方法、および半導体デバイスの製造方法
JP6058318B2 (ja) * 2011-09-14 2017-01-11 Hoya株式会社 マスクブランク、転写用マスク、転写用マスクの製造方法、および半導体デバイスの製造方法
JP6084391B2 (ja) * 2011-09-28 2017-02-22 Hoya株式会社 マスクブランク、転写用マスク、転写用マスクの製造方法および半導体デバイスの製造方法
US20150301444A1 (en) * 2012-06-18 2015-10-22 Indian Institute Of Technology Kanpur Systems and methods for dry processing fabrication of binary masks with arbitrary shapes for ultra-violet laser micromachining
WO2015037392A1 (ja) * 2013-09-10 2015-03-19 Hoya株式会社 マスクブランク、転写用マスクおよび転写用マスクの製造方法
JP6521703B2 (ja) * 2014-04-11 2019-05-29 キヤノン株式会社 振動型アクチュエータの製造方法、振動型アクチュエータを搭載する画像形成装置
KR102447144B1 (ko) * 2015-01-09 2022-09-26 삼성전자주식회사 포토 마스크 제조 방법, 포토레지스트 패턴 형성 방법 및 반도체 장치의 제조 방법
JP6728919B2 (ja) * 2015-04-14 2020-07-22 大日本印刷株式会社 フォトマスクおよびフォトマスクの製造方法
JP6140330B2 (ja) * 2016-04-08 2017-05-31 Hoya株式会社 マスクブランクの製造方法、転写用マスク用の製造方法、および半導体デバイスの製造方法
SG11201811413QA (en) * 2016-07-25 2019-02-27 Hoya Corp Mask blank, transfer mask, method for producing transfer mask, and method for manufacturing semiconductor device
KR102594844B1 (ko) 2018-04-10 2023-10-27 주식회사 엘지화학 장식 부재
JP6938428B2 (ja) * 2018-05-30 2021-09-22 Hoya株式会社 マスクブランク、位相シフトマスクおよび半導体デバイスの製造方法
JP6636581B2 (ja) * 2018-08-01 2020-01-29 Hoya株式会社 反射型マスクブランク、反射型マスクの製造方法、及び半導体装置の製造方法
KR102377406B1 (ko) * 2021-05-21 2022-03-21 에스케이씨솔믹스 주식회사 블랭크 마스크 및 이를 이용한 포토마스크
CN115586705B (zh) * 2021-07-05 2026-03-03 上海芯上微装科技股份有限公司 一种曝光方法及显示面板
JP7482197B2 (ja) * 2021-12-31 2024-05-13 エスケー エンパルス カンパニー リミテッド ブランクマスク及びそれを用いたフォトマスク
KR102554083B1 (ko) * 2022-06-23 2023-07-10 에스케이엔펄스 주식회사 블랭크 마스크 및 이를 이용한 포토마스크

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JP3417427B2 (ja) * 1994-07-08 2003-06-16 ソニー株式会社 光導波路装置、及び光導波路装置又は光導波路の製造方法
JP3713274B2 (ja) * 1994-09-13 2005-11-09 株式会社東芝 サーマルヘッド及びその製造方法
JPH09199911A (ja) * 1996-01-23 1997-07-31 Murata Mfg Co Ltd 薄膜多層電極、高周波共振器及び高周波伝送線路
JP4686006B2 (ja) * 2000-04-27 2011-05-18 大日本印刷株式会社 ハーフトーン位相シフトフォトマスクとハーフトーン位相シフトフォトマスク用ブランクス、及びハーフトーン位相シフトフォトマスクの製造方法
EP2317384B1 (en) * 2002-04-11 2016-11-09 Hoya Corporation Reflective mask blank, reflective mask and methods of producing the mask blank and the mask
JP2006078825A (ja) * 2004-09-10 2006-03-23 Shin Etsu Chem Co Ltd フォトマスクブランクおよびフォトマスクならびにこれらの製造方法
JP4635610B2 (ja) * 2005-01-07 2011-02-23 凸版印刷株式会社 反射型フォトマスクブランク、反射型フォトマスク、及び反射型フォトマスクの製造方法
JP4883278B2 (ja) * 2006-03-10 2012-02-22 信越化学工業株式会社 フォトマスクブランク及びフォトマスクの製造方法
JP4509050B2 (ja) * 2006-03-10 2010-07-21 信越化学工業株式会社 フォトマスクブランク及びフォトマスク
JP4737426B2 (ja) * 2006-04-21 2011-08-03 信越化学工業株式会社 フォトマスクブランク
KR20070114025A (ko) * 2006-05-25 2007-11-29 주식회사 에스앤에스텍 블랭크 마스크 및 블랭크 마스크 제조 방법
WO2008139904A1 (ja) * 2007-04-27 2008-11-20 Hoya Corporation フォトマスクブランク及びフォトマスク
JP4845978B2 (ja) * 2008-02-27 2011-12-28 Ｈｏｙａ株式会社 フォトマスクブランクおよびフォトマスク並びにフォトマスクの製造方法

Also Published As

Publication number Publication date
KR20110021687A (ko) 2011-03-04
JP2011081356A (ja) 2011-04-21
TWI484287B (zh) 2015-05-11
US20110053057A1 (en) 2011-03-03
US8354205B2 (en) 2013-01-15
TW201137514A (en) 2011-11-01

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