JP5695984B2 - 半導体装置 - Google Patents
半導体装置 Download PDFInfo
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- JP5695984B2 JP5695984B2 JP2011141408A JP2011141408A JP5695984B2 JP 5695984 B2 JP5695984 B2 JP 5695984B2 JP 2011141408 A JP2011141408 A JP 2011141408A JP 2011141408 A JP2011141408 A JP 2011141408A JP 5695984 B2 JP5695984 B2 JP 5695984B2
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- 239000004065 semiconductor Substances 0.000 title claims description 102
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 20
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- 239000001301 oxygen Substances 0.000 claims description 15
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- 229910052802 copper Inorganic materials 0.000 claims description 12
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- 239000011737 fluorine Substances 0.000 description 3
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- 238000002844 melting Methods 0.000 description 3
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- TXEYQDLBPFQVAA-UHFFFAOYSA-N tetrafluoromethane Chemical compound FC(F)(F)F TXEYQDLBPFQVAA-UHFFFAOYSA-N 0.000 description 3
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- 239000004341 Octafluorocyclobutane Substances 0.000 description 2
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 2
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 2
- 230000004913 activation Effects 0.000 description 2
- 239000005407 aluminoborosilicate glass Substances 0.000 description 2
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- 229910052785 arsenic Inorganic materials 0.000 description 2
- RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 description 2
- 229910052788 barium Inorganic materials 0.000 description 2
- DSAJWYNOEDNPEQ-UHFFFAOYSA-N barium atom Chemical compound [Ba] DSAJWYNOEDNPEQ-UHFFFAOYSA-N 0.000 description 2
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- 150000002736 metal compounds Chemical class 0.000 description 2
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- GVGCUCJTUSOZKP-UHFFFAOYSA-N nitrogen trifluoride Chemical compound FN(F)F GVGCUCJTUSOZKP-UHFFFAOYSA-N 0.000 description 2
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- BCCOBQSFUDVTJQ-UHFFFAOYSA-N octafluorocyclobutane Chemical compound FC1(F)C(F)(F)C(F)(F)C1(F)F BCCOBQSFUDVTJQ-UHFFFAOYSA-N 0.000 description 2
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- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 1
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- 229910052779 Neodymium Inorganic materials 0.000 description 1
- NPXOKRUENSOPAO-UHFFFAOYSA-N Raney nickel Chemical class [Al].[Ni] NPXOKRUENSOPAO-UHFFFAOYSA-N 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
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Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/40—Electrodes ; Multistep manufacturing processes therefor
- H01L29/43—Electrodes ; Multistep manufacturing processes therefor characterised by the materials of which they are formed
- H01L29/45—Ohmic electrodes
- H01L29/456—Ohmic electrodes on silicon
- H01L29/458—Ohmic electrodes on silicon for thin film silicon, e.g. source or drain electrode
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
- H01L21/76801—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the dielectrics, e.g. smoothing
- H01L21/76829—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the dielectrics, e.g. smoothing characterised by the formation of thin functional dielectric layers, e.g. dielectric etch-stop, barrier, capping or liner layers
- H01L21/76834—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the dielectrics, e.g. smoothing characterised by the formation of thin functional dielectric layers, e.g. dielectric etch-stop, barrier, capping or liner layers formation of thin insulating films on the sidewalls or on top of conductors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
- H01L21/76838—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the conductors
- H01L21/76877—Filling of holes, grooves or trenches, e.g. vias, with conductive material
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
- H01L21/76838—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the conductors
- H01L21/76877—Filling of holes, grooves or trenches, e.g. vias, with conductive material
- H01L21/76882—Reflowing or applying of pressure to better fill the contact hole
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
- H01L21/76838—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the conductors
- H01L21/76877—Filling of holes, grooves or trenches, e.g. vias, with conductive material
- H01L21/76883—Post-treatment or after-treatment of the conductive material
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
- H01L21/76801—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the dielectrics, e.g. smoothing
- H01L21/76802—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the dielectrics, e.g. smoothing by forming openings in dielectrics
- H01L21/76804—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the dielectrics, e.g. smoothing by forming openings in dielectrics by forming tapered via holes
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Manufacturing & Machinery (AREA)
- Ceramic Engineering (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
- Electrodes Of Semiconductors (AREA)
- Thin Film Transistor (AREA)
Description
本実施の形態では、本発明の一形態である半導体装置の断面形状について、図1を用いて説明する。
本実施の形態では、本発明の一態様である半導体装置に用いることが可能な薄膜トランジスタ151の平面構造及び断面構造について、図3を用いて説明する。図3(A)は平面図であり、図3(B)は図3(A)のA−B断面における断面図である。なお、図3(A)では、煩雑になることを避けるため、薄膜トランジスタ151の構成要素の一部(例えば、ゲート絶縁膜112など)を省略している。
実施の形態2で示した薄膜トランジスタ151の作製方法について、図4及び図5を用いて説明する。
また、上記実施の形態で示す半導体装置の一形態について図6を用いて説明する。
101 基板
102 下地絶縁膜
106 半導体膜
106a チャネル領域
106b 不純物半導体領域
108 導電膜
112 ゲート絶縁膜
114 ゲート電極
118 導電膜
124 絶縁膜
128 導電膜
130 コンタクトホール
138 配線
151 薄膜トランジスタ
9002 機能回路
9004 フィルム
9006 アンテナ
9101 本体
9102 表示部
9201 本体
9202 表示部
9301 本体
9302 表示部
9401 本体
9402 表示部
9701 表示部
9702 表示部
Claims (2)
- 絶縁層と、
前記絶縁層が有するコンタクトホールと、
前記コンタクトホール内の、第1の層と、
前記第1の層と接する領域を有する第2の層と、
前記第2の層と接する領域を有する第3の層と、を有し、
前記第2の層は、酸化された第1の導電層、フッ化された第1の導電層、又は塩化された第1の導電層の一部若しくは全部が流動化して、前記コンタクトホール内に流れ込んで固化されたものであり、
前記第2の層は、前記コンタクトホールの側面と接する領域と、前記コンタクトホールの底面と重なる領域とを有し、
前記第1の層は、チタン、ニッケル、亜鉛、ガリウム、ジルコニウム、ニオブ、モリブデン、インジウム、スズ、タングステン、又は窒化チタンを有し、
前記第2の層は、チタン、ニッケル、亜鉛、ガリウム、ジルコニウム、ニオブ、モリブデン、インジウム、スズ、又はタングステンのいずれか一と、酸素と、を有し、
前記第3の層は、アルミニウム、銅、又は銀を有することを特徴とする半導体装置。 - 絶縁層と、
前記絶縁層が有する溝と、
前記溝内の、第1の層と、
前記第1の層と接する領域を有する第2の層と、
前記第2の層と接する領域を有する第3の層と、を有し、
前記第2の層は、酸化された第1の導電層、フッ化された第1の導電層、又は塩化された第1の導電層の一部若しくは全部が流動化して、前記コンタクトホール内に流れ込んで固化されたものであり、
前記第2の層は、前記コンタクトホールの側面と接する領域と、前記コンタクトホールの底面と重なる領域とを有し、
前記第1の層は、チタン、ニッケル、亜鉛、ガリウム、ジルコニウム、ニオブ、モリブデン、インジウム、スズ、タングステン、又は窒化チタンを有し、
前記第2の層は、チタン、ニッケル、亜鉛、ガリウム、ジルコニウム、ニオブ、モリブデン、インジウム、スズ、又はタングステンのいずれか一と、酸素と、を有し、
前記第3の層は、アルミニウム、銅、又は銀を有することを特徴とする半導体装置。
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JP2012033901A5 JP2012033901A5 (ja) | 2014-05-22 |
JP5695984B2 true JP5695984B2 (ja) | 2015-04-08 |
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JP (1) | JP5695984B2 (ja) |
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KR20120003374A (ko) | 2010-07-02 | 2012-01-10 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 반도체 장치 및 반도체 장치의 제작 방법 |
JP6345023B2 (ja) * | 2013-08-07 | 2018-06-20 | 株式会社半導体エネルギー研究所 | 半導体装置およびその作製方法 |
US9455349B2 (en) | 2013-10-22 | 2016-09-27 | Semiconductor Energy Laboratory Co., Ltd. | Oxide semiconductor thin film transistor with reduced impurity diffusion |
Family Cites Families (31)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0535979A3 (en) | 1991-10-02 | 1993-07-21 | Sharp Kabushiki Kaisha | A thin film transistor and a method for producing the same |
JPH05129608A (ja) | 1991-10-31 | 1993-05-25 | Sharp Corp | 半導体装置 |
JPH0653332A (ja) * | 1992-07-28 | 1994-02-25 | Sony Corp | メタルプラグの形成方法 |
JPH06296080A (ja) * | 1993-04-08 | 1994-10-21 | Sony Corp | 電子部品実装基板及び電子部品実装方法 |
JPH07130851A (ja) | 1993-10-29 | 1995-05-19 | Sony Corp | 配線形成方法 |
JPH07131030A (ja) | 1993-11-05 | 1995-05-19 | Sony Corp | 表示用薄膜半導体装置及びその製造方法 |
US6090701A (en) | 1994-06-21 | 2000-07-18 | Kabushiki Kaisha Toshiba | Method for production of semiconductor device |
JP3337876B2 (ja) * | 1994-06-21 | 2002-10-28 | 株式会社東芝 | 半導体装置の製造方法 |
US6423585B1 (en) * | 1997-03-11 | 2002-07-23 | Semiconductor Energy Laboratory Co., Ltd. | Heating treatment device, heating treatment method and fabrication method of semiconductor device |
JP3436132B2 (ja) * | 1998-05-13 | 2003-08-11 | セイコーエプソン株式会社 | 半導体装置 |
US6248656B1 (en) * | 1998-08-13 | 2001-06-19 | Tessera, Inc. | Metal-jacketed lead manufacturing process using resist layers |
US6576924B1 (en) * | 1999-02-12 | 2003-06-10 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device having at least a pixel unit and a driver circuit unit over a same substrate |
TW464980B (en) * | 1999-07-09 | 2001-11-21 | Toshiba Corp | Method for selectively forming copper film |
JP2001053283A (ja) | 1999-08-12 | 2001-02-23 | Semiconductor Energy Lab Co Ltd | 半導体装置及びその作製方法 |
US20020072228A1 (en) * | 1999-12-15 | 2002-06-13 | Texas A&M University System | Semiconductor conductive pattern formation method |
US6410383B1 (en) | 2000-03-16 | 2002-06-25 | Sharp Laboratories Of America, Inc. | Method of forming conducting diffusion barriers |
JP3594888B2 (ja) | 2000-08-07 | 2004-12-02 | セイコーエプソン株式会社 | 半導体装置及びその製造方法 |
JP4969001B2 (ja) | 2001-09-20 | 2012-07-04 | 株式会社半導体エネルギー研究所 | 半導体装置及びその作製方法 |
US7384862B2 (en) | 2003-06-30 | 2008-06-10 | Semiconductor Energy Laboratory Co., Ltd. | Method for fabricating semiconductor device and display device |
TWI395996B (zh) | 2003-07-14 | 2013-05-11 | Semiconductor Energy Lab | 半導體裝置及顯示裝置 |
JP4748954B2 (ja) | 2003-07-14 | 2011-08-17 | 株式会社半導体エネルギー研究所 | 液晶表示装置 |
KR101188356B1 (ko) | 2003-12-02 | 2012-10-08 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 레이저 조사장치, 레이저 조사방법 및 반도체장치의제조방법 |
JP5159021B2 (ja) | 2003-12-02 | 2013-03-06 | 株式会社半導体エネルギー研究所 | 半導体装置の作製方法 |
KR100669854B1 (ko) * | 2005-07-05 | 2007-01-16 | 삼성전자주식회사 | 단위 셀 구조물과 그 제조 방법 및 이를 갖는 비휘발성메모리 소자 및 그 제조 방법 |
JP2007287856A (ja) * | 2006-04-14 | 2007-11-01 | Toshiba Corp | 半導体装置の製造方法 |
WO2008105100A1 (ja) * | 2007-02-28 | 2008-09-04 | Fujitsu Limited | 半導体装置及びその製造方法 |
US8354674B2 (en) | 2007-06-29 | 2013-01-15 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device wherein a property of a first semiconductor layer is different from a property of a second semiconductor layer |
JP5357493B2 (ja) | 2007-10-23 | 2013-12-04 | 株式会社半導体エネルギー研究所 | 半導体装置の作製方法 |
JP2009200154A (ja) * | 2008-02-20 | 2009-09-03 | Toshiba Corp | 半導体装置とその製造方法 |
JP5129608B2 (ja) | 2008-02-26 | 2013-01-30 | 共和レザー株式会社 | 自動車用内装材及びその製造方法 |
KR20120003374A (ko) | 2010-07-02 | 2012-01-10 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 반도체 장치 및 반도체 장치의 제작 방법 |
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JP2012033901A (ja) | 2012-02-16 |
KR101830193B1 (ko) | 2018-02-20 |
KR20120003373A (ko) | 2012-01-10 |
US8518762B2 (en) | 2013-08-27 |
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