JP5620638B2 - 光学結像装置 - Google Patents

光学結像装置 Download PDF

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Publication number
JP5620638B2
JP5620638B2 JP2008521970A JP2008521970A JP5620638B2 JP 5620638 B2 JP5620638 B2 JP 5620638B2 JP 2008521970 A JP2008521970 A JP 2008521970A JP 2008521970 A JP2008521970 A JP 2008521970A JP 5620638 B2 JP5620638 B2 JP 5620638B2
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JP
Japan
Prior art keywords
optical element
contact
optical
module according
lens
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2008521970A
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English (en)
Japanese (ja)
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JP2009502034A5 (enExample
JP2009502034A (ja
Inventor
ビショフ，トーマス
フェデラウ，ハーゲン
ハインテル，ビリ
ビュストフ，ベルント
ビーラント，ヨヒェン
Original Assignee
カール・ツァイス・エスエムティー・ゲーエムベーハー
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
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Publication of JP2009502034A publication Critical patent/JP2009502034A/ja
Publication of JP2009502034A5 publication Critical patent/JP2009502034A5/ja
Application granted granted Critical
Publication of JP5620638B2 publication Critical patent/JP5620638B2/ja
Expired - Fee Related legal-status Critical Current
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system
    • G03F7/70891—Temperature
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/008—Mountings, adjusting means, or light-tight connections, for optical elements with means for compensating for changes in temperature or for controlling the temperature; thermal stabilisation
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/02—Mountings, adjusting means, or light-tight connections, for optical elements for lenses
    • G02B7/028—Mountings, adjusting means, or light-tight connections, for optical elements for lenses with means for compensating for changes in temperature or for controlling the temperature; thermal stabilisation
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/18—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors
    • G02B7/181—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors with means for compensating for changes in temperature or for controlling the temperature; thermal stabilisation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Environmental & Geological Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Lens Barrels (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Optical Couplings Of Light Guides (AREA)
  • Mounting And Adjusting Of Optical Elements (AREA)
JP2008521970A 2005-07-19 2006-07-19 光学結像装置 Expired - Fee Related JP5620638B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US70051705P 2005-07-19 2005-07-19
US60/700,517 2005-07-19
PCT/EP2006/064427 WO2007010011A2 (en) 2005-07-19 2006-07-19 Optical element module

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2014116037A Division JP5993894B2 (ja) 2005-07-19 2014-06-04 光学結像装置

Publications (3)

Publication Number Publication Date
JP2009502034A JP2009502034A (ja) 2009-01-22
JP2009502034A5 JP2009502034A5 (enExample) 2009-09-10
JP5620638B2 true JP5620638B2 (ja) 2014-11-05

Family

ID=37076216

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2008521970A Expired - Fee Related JP5620638B2 (ja) 2005-07-19 2006-07-19 光学結像装置
JP2014116037A Expired - Fee Related JP5993894B2 (ja) 2005-07-19 2014-06-04 光学結像装置

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2014116037A Expired - Fee Related JP5993894B2 (ja) 2005-07-19 2014-06-04 光学結像装置

Country Status (3)

Country Link
US (2) US7859641B2 (enExample)
JP (2) JP5620638B2 (enExample)
WO (1) WO2007010011A2 (enExample)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5055384B2 (ja) * 2007-02-27 2012-10-24 カール・ツァイス・エスエムティー・ゲーエムベーハー 光学結像装置
US8416386B2 (en) * 2007-03-13 2013-04-09 Nikon Corporation Conforming seats for clamps used in mounting an optical element, and optical systems comprising same
DE102009054549A1 (de) 2008-12-11 2010-06-17 Carl Zeiss Smt Ag Gravitationskompensation für optische Elemente in Projektionsbelichtungsanlagen
JP5535108B2 (ja) 2011-02-18 2014-07-02 ギガフォトン株式会社 極端紫外光源装置
DE202013011933U1 (de) * 2013-01-23 2014-10-28 Jenoptik Optical Systems Gmbh Thermisch kompensierte optische Baugruppe mit einem formschlüssig gehaltenen optischen Bauelement
CN103389558B (zh) * 2013-07-29 2015-12-02 中国科学院长春光学精密机械与物理研究所 光刻物镜中透镜轴向调整装置
DE102013110750B3 (de) * 2013-09-27 2014-11-13 Jenoptik Optical Systems Gmbh Optische Baugruppe mit einer Fassung mit thermisch abhängigem Kraftausgleich
CN108345081B (zh) * 2017-01-25 2022-01-04 台湾东电化股份有限公司 支撑机构
US10386595B2 (en) * 2017-01-25 2019-08-20 Tdk Taiwan Corp. Support mechanism
US11256059B2 (en) 2017-01-25 2022-02-22 Tdk Taiwan Corp. Driving module
JP7102860B2 (ja) * 2018-03-30 2022-07-20 住友大阪セメント株式会社 光モジュール
DE102021214140A1 (de) * 2021-12-10 2023-06-15 Carl Zeiss Smt Gmbh Fassung für eine linse, anordnung, lithographieanlage sowie verfahren
DE102022201007A1 (de) 2022-01-31 2022-11-17 Carl Zeiss Smt Gmbh Vorrichtung zur Verbindung wenigstens einer ersten und einer zweiten Modulkomponente, Modul eines Lithografiesystems, optisches Element und Lithografiesystem
DE102022207148A1 (de) * 2022-07-13 2024-01-18 Carl Zeiss Smt Gmbh Projektionsbelichtungsanlage für die Halbleiterlithographie

Family Cites Families (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4147413A (en) * 1977-03-07 1979-04-03 Hewlett-Packard Company Temperature compensated lens mount
JPS5926706A (ja) * 1982-08-05 1984-02-13 Olympus Optical Co Ltd レンズ保持装置
JPS6117110A (ja) * 1984-07-03 1986-01-25 Konishiroku Photo Ind Co Ltd レンズ保持装置
DE3525813A1 (de) * 1984-07-23 1986-02-27 Olympus Optical Co., Ltd., Tokio/Tokyo Vorrichtung zur halterung von linsen
US4733945A (en) * 1986-01-15 1988-03-29 The Perkin-Elmer Corporation Precision lens mounting
JPH07191248A (ja) * 1993-12-27 1995-07-28 Chinon Ind Inc レンズ構体
US5523893A (en) * 1994-08-24 1996-06-04 Northrop Grumman Corporation Strain free temperature-compensated optical mounts
JPH0886948A (ja) * 1994-09-20 1996-04-02 Canon Inc 光学機器
JPH09113781A (ja) * 1995-10-19 1997-05-02 Canon Inc シリアルスキャナの光学系固定装置
JPH1096843A (ja) * 1996-09-19 1998-04-14 Minolta Co Ltd 光学素子保持構造
JPH10253872A (ja) * 1997-03-13 1998-09-25 Nikon Corp 反射光学部材の保持装置及び露光装置
JPH10186196A (ja) * 1996-12-20 1998-07-14 Canon Inc 光学素子支持装置およびこれを備えた光学機器、露光装置
JPH11271586A (ja) * 1998-03-25 1999-10-08 Fuji Photo Optical Co Ltd レンズの支持構造
DE19904152A1 (de) * 1999-02-03 2000-08-10 Zeiss Carl Fa Baugruppe aus einem optischen Element und einer Fassung
JP4809987B2 (ja) * 2000-03-30 2011-11-09 キヤノン株式会社 光学要素の支持構造、それを用いた露光装置及び半導体デバイスの製造方法
JP2002175964A (ja) * 2000-12-06 2002-06-21 Nikon Corp 観察装置およびその製造方法、露光装置、並びにマイクロデバイスの製造方法
JP2002236242A (ja) * 2001-02-09 2002-08-23 Nikon Corp 光学素子保持装置、鏡筒及び露光装置並びにマイクロデバイスの製造方法
US6747730B2 (en) * 2001-12-04 2004-06-08 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method, and method of manufacturing an optical element
JP2003241051A (ja) * 2002-02-15 2003-08-27 Canon Inc 光学素子の支持手段、該光学素子の支持手段による光学系、露光装置、デバイス製造方法
TW200402606A (en) * 2002-06-11 2004-02-16 Nippon Kogaku Kk Exposure system and exposure method
JP2004062091A (ja) * 2002-07-31 2004-02-26 Canon Inc 保持装置、露光装置及びデバイス製造方法
JP2004264782A (ja) * 2003-03-04 2004-09-24 Canon Inc レンズ鏡筒
JP4590205B2 (ja) * 2003-05-14 2010-12-01 キヤノン株式会社 ミラー保持方法、光学装置、露光装置、およびデバイス製造方法
JP2005017020A (ja) * 2003-06-24 2005-01-20 Canon Inc ３次元形状計測装置
US8854602B2 (en) * 2003-11-24 2014-10-07 Asml Netherlands B.V. Holding device for an optical element in an objective
DE102006038634A1 (de) * 2006-08-17 2008-02-21 Carl Zeiss Smt Ag Halteeinrichtung für ein optisches Element mit Stützkraftausgleich

Also Published As

Publication number Publication date
US20080239270A1 (en) 2008-10-02
US20110063590A1 (en) 2011-03-17
US7859641B2 (en) 2010-12-28
WO2007010011A3 (en) 2007-04-19
JP5993894B2 (ja) 2016-09-14
JP2009502034A (ja) 2009-01-22
JP2014209248A (ja) 2014-11-06
WO2007010011A2 (en) 2007-01-25

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