JP5610487B2 - 機械加工装置及び機械加工方法 - Google Patents

機械加工装置及び機械加工方法 Download PDF

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Publication number
JP5610487B2
JP5610487B2 JP2011267444A JP2011267444A JP5610487B2 JP 5610487 B2 JP5610487 B2 JP 5610487B2 JP 2011267444 A JP2011267444 A JP 2011267444A JP 2011267444 A JP2011267444 A JP 2011267444A JP 5610487 B2 JP5610487 B2 JP 5610487B2
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Japan
Prior art keywords
cutting fluid
fine
bubble
fine bubbles
processing tool
Prior art date
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Expired - Fee Related
Application number
JP2011267444A
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English (en)
Japanese (ja)
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JP2012135869A (ja
JP2012135869A5 (enrdf_load_stackoverflow
Inventor
廣瀬　治道
治道 廣瀬
牧野　勉
勉 牧野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shibaura Mechatronics Corp
Original Assignee
Shibaura Mechatronics Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shibaura Mechatronics Corp filed Critical Shibaura Mechatronics Corp
Priority to JP2011267444A priority Critical patent/JP5610487B2/ja
Publication of JP2012135869A publication Critical patent/JP2012135869A/ja
Publication of JP2012135869A5 publication Critical patent/JP2012135869A5/ja
Application granted granted Critical
Publication of JP5610487B2 publication Critical patent/JP5610487B2/ja
Expired - Fee Related legal-status Critical Current
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67092—Apparatus for mechanical treatment
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H01L21/67051—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Dicing (AREA)
  • Grinding-Machine Dressing And Accessory Apparatuses (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
JP2011267444A 2010-12-10 2011-12-07 機械加工装置及び機械加工方法 Expired - Fee Related JP5610487B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2011267444A JP5610487B2 (ja) 2010-12-10 2011-12-07 機械加工装置及び機械加工方法

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2010276195 2010-12-10
JP2010276195 2010-12-10
JP2011267444A JP5610487B2 (ja) 2010-12-10 2011-12-07 機械加工装置及び機械加工方法

Publications (3)

Publication Number Publication Date
JP2012135869A JP2012135869A (ja) 2012-07-19
JP2012135869A5 JP2012135869A5 (enrdf_load_stackoverflow) 2013-12-12
JP5610487B2 true JP5610487B2 (ja) 2014-10-22

Family

ID=46337314

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2011267444A Expired - Fee Related JP5610487B2 (ja) 2010-12-10 2011-12-07 機械加工装置及び機械加工方法

Country Status (4)

Country Link
JP (1) JP5610487B2 (enrdf_load_stackoverflow)
KR (1) KR101325295B1 (enrdf_load_stackoverflow)
CN (1) CN102528624B (enrdf_load_stackoverflow)
TW (1) TWI492290B (enrdf_load_stackoverflow)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013111713A (ja) * 2011-11-29 2013-06-10 Tokyo Seimitsu Co Ltd 切削水の供給装置及び供給方法
JP6200685B2 (ja) * 2013-05-09 2017-09-20 株式会社ディスコ 加工装置
WO2018168912A1 (ja) * 2017-03-16 2018-09-20 Idec株式会社 研削液生成装置、研削液生成方法、研削装置および研削液
CN109382922A (zh) * 2018-11-28 2019-02-26 江苏晶成光学有限公司 一种单晶硅片用线切割机切削液供给装置
JP2020104230A (ja) * 2018-12-28 2020-07-09 株式会社ナガセインテグレックス ワーク切削方法
JP7165079B2 (ja) * 2019-03-12 2022-11-02 日本タングステン株式会社 加工用クーラント供給機構、および、加工用クーラントの供給方法
JP7712132B2 (ja) * 2021-07-29 2025-07-23 株式会社ディスコ 加工装置
JP2024050022A (ja) * 2022-09-29 2024-04-10 株式会社ディスコ 切削装置及び切削方法

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3105057B2 (ja) * 1992-02-20 2000-10-30 株式会社東京精密 ダイシング装置及びダイシング装置の目立て方法
US5632886A (en) * 1993-04-02 1997-05-27 Harvey Universal, Inc. Cutting oil treatment apparatus
DE69733160T8 (de) * 1996-02-15 2006-06-08 Zeta Heiwa Ltd., Ashiya Vorrichtung zum Abscheiden von Verunreinigungen aus einer Kühlflüssigkeit in einer Werkzeugmaschine
JP2003068677A (ja) * 2001-08-21 2003-03-07 Sony Corp ダイシング装置およびダイシング方法
US7048863B2 (en) * 2003-07-08 2006-05-23 Ashland Licensing And Intellectual Property Llc Device and process for treating cutting fluids using ultrasound
JP2006012966A (ja) 2004-06-23 2006-01-12 Seiko Epson Corp 切削方法
JP2007160175A (ja) * 2005-12-12 2007-06-28 Sharp Corp 洗浄装置
JP2007331088A (ja) * 2006-06-15 2007-12-27 Kazumasa Onishi マイクロバブルを用いた機械加工装置
WO2010122985A1 (ja) * 2009-04-20 2010-10-28 日立化成工業株式会社 半導体基板用研磨液及び半導体基板の研磨方法

Also Published As

Publication number Publication date
JP2012135869A (ja) 2012-07-19
KR20120065239A (ko) 2012-06-20
TW201234468A (en) 2012-08-16
TWI492290B (zh) 2015-07-11
CN102528624B (zh) 2014-08-27
CN102528624A (zh) 2012-07-04
KR101325295B1 (ko) 2013-11-08

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