JP5546504B2 - 記録ヘッドの製造方法 - Google Patents
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- JP5546504B2 JP5546504B2 JP2011155733A JP2011155733A JP5546504B2 JP 5546504 B2 JP5546504 B2 JP 5546504B2 JP 2011155733 A JP2011155733 A JP 2011155733A JP 2011155733 A JP2011155733 A JP 2011155733A JP 5546504 B2 JP5546504 B2 JP 5546504B2
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- 238000004519 manufacturing process Methods 0.000 title claims description 22
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- 239000011347 resin Substances 0.000 claims description 48
- 239000003822 epoxy resin Substances 0.000 claims description 30
- 229920000647 polyepoxide Polymers 0.000 claims description 30
- 239000003999 initiator Substances 0.000 claims description 25
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- 238000000034 method Methods 0.000 claims description 15
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- 239000003505 polymerization initiator Substances 0.000 claims description 13
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 claims description 10
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- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 claims description 6
- 229930003836 cresol Natural products 0.000 claims description 6
- 229920003986 novolac Polymers 0.000 claims description 6
- 150000003839 salts Chemical class 0.000 claims description 6
- 239000012954 diazonium Substances 0.000 claims description 4
- 150000001989 diazonium salts Chemical class 0.000 claims description 4
- 125000003118 aryl group Chemical group 0.000 claims description 2
- 125000006503 p-nitrobenzyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1[N+]([O-])=O)C([H])([H])* 0.000 claims description 2
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- 229920002120 photoresistant polymer Polymers 0.000 description 6
- 206010034972 Photosensitivity reaction Diseases 0.000 description 5
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 5
- 238000012663 cationic photopolymerization Methods 0.000 description 5
- 230000036211 photosensitivity Effects 0.000 description 5
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- 239000010703 silicon Substances 0.000 description 5
- 239000002904 solvent Substances 0.000 description 5
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- 238000006243 chemical reaction Methods 0.000 description 2
- 238000005520 cutting process Methods 0.000 description 2
- 238000007599 discharging Methods 0.000 description 2
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 2
- 230000000977 initiatory effect Effects 0.000 description 2
- 238000004528 spin coating Methods 0.000 description 2
- BMNGOGRNWBJJKB-UHFFFAOYSA-N 1-azidopyrene Chemical compound C1=C2C(N=[N+]=[N-])=CC=C(C=C3)C2=C2C3=CC=CC2=C1 BMNGOGRNWBJJKB-UHFFFAOYSA-N 0.000 description 1
- RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical class S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 description 1
- 229910004200 TaSiN Inorganic materials 0.000 description 1
- 125000002091 cationic group Chemical group 0.000 description 1
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- 238000009413 insulation Methods 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 1
- 229920001195 polyisoprene Polymers 0.000 description 1
- 239000007870 radical polymerization initiator Substances 0.000 description 1
- 230000002940 repellent Effects 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 230000006641 stabilisation Effects 0.000 description 1
- 238000011105 stabilization Methods 0.000 description 1
- 125000005409 triarylsulfonium group Chemical group 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/095—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1601—Production of bubble jet print heads
- B41J2/1603—Production of bubble jet print heads of the front shooter type
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1626—Manufacturing processes etching
- B41J2/1628—Manufacturing processes etching dry etching
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1631—Manufacturing processes photolithography
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1632—Manufacturing processes machining
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0035—Multiple processes, e.g. applying a further resist layer on an already in a previously step, processed pattern or textured surface
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/094—Multilayer resist systems, e.g. planarising layers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/38—Treatment before imagewise removal, e.g. prebaking
Description
(1)基板の上に、感光性樹脂を含有する流路側壁形成層を形成する工程と、
(2)前記流路側壁形成層を一部露光することで、該流路側壁形成層に露光された露光部と露光されていない未露光部を形成し、該流路側壁形成層に光学的に流路を決定する工程と、
(3)前記流路側壁形成層の上に、感光性樹脂を含有し、前記未露光部を硬化させる重合開始剤を含有しないドライフィルムで形成された層を形成する工程と、
(4)前記ドライフィルムで形成された層の上に、光重合開始剤及びネガ型感光性樹脂を含有する吐出口形成層を形成する工程と、
(5)前記吐出口形成層を露光し、光学的に吐出口を決定する工程と、
(6)前記吐出口形成層、前記ドライフィルムで形成された層、及び前記流路側壁形成層を現像する工程と、
を前記工程(1)〜(6)の順で含み、
前記ドライフィルムで形成された層が含有する前記感光性樹脂は、前記吐出口形成層の露光によって生じ、前記光重合開始剤に由来する成分により硬化する材料であることを特徴とする。
図1を用いて、本発明の形状安定層を用いた記録ヘッドの製造方法の実施例について説明する。
本実施例は図1(A)で形成する流路側壁形成層6、図1(C)で形成する形状安定層7、及び図1(D)で形成する吐出口形成層14の材料のみが実施例1と異なる。工程は全て実施例1と同様であるため説明を省略する。なお、実施例1で説明した記録ヘッドと同様な構成については同一の符号を付し、詳細な説明を省略する。
2 エネルギー発生素子
4 絶縁保護膜
6 流路側壁形成層
6a 流路側壁形成層硬化部
6b 流路側壁形成層未露光部
7 形状安定層
7a 形状安定層硬化部
7b 形状安定層未露光部
11 インク供給口
12 流路
13 吐出口
14 吐出口形成層
14a 吐出口形成層硬化部
14b 吐出口形成層未露光部
Claims (10)
- (1)基板の上に、感光性樹脂を含有する流路側壁形成層を形成する工程と、
(2)前記流路側壁形成層を一部露光することで、該流路側壁形成層に露光された露光部と露光されていない未露光部を形成し、該流路側壁形成層に光学的に流路を決定する工程と、
(3)前記流路側壁形成層の上に、感光性樹脂を含有し、前記未露光部を硬化させる重合開始剤を含有しないドライフィルムで形成された層を形成する工程と、
(4)前記ドライフィルムで形成された層の上に、光重合開始剤及びネガ型感光性樹脂を含有する吐出口形成層を形成する工程と、
(5)前記吐出口形成層を露光し、光学的に吐出口を決定する工程と、
(6)前記吐出口形成層、前記ドライフィルムで形成された層、及び前記流路側壁形成層を現像する工程と、
を前記工程(1)〜(6)の順で含み、
前記ドライフィルムで形成された層が含有する前記感光性樹脂は、前記吐出口形成層の露光によって生じ、前記光重合開始剤に由来する成分により硬化する材料であることを特徴とする記録ヘッドの製造方法。 - 前記工程(5)の後であって前記工程(6)の前に、前記吐出口形成層、前記ドライフィルムで形成された層、及び前記流路側壁形成層に熱処理を行う請求項1に記載の記録ヘッドの製造方法。
- 前記ドライフィルムで形成された層は、前記吐出口形成層の露光光を吸収する光吸収剤を含む請求項1又は2に記載の記録ヘッドの製造方法。
- 前記流路側壁形成層が含有する感光性樹脂は、前記ドライフィルムで形成された層が含有する感光性樹脂と同じ種類である請求項1乃至3のいずれかに記載の記録ヘッドの製造方法。
- 前記吐出口形成層が含有する感光性樹脂は、前記ドライフィルムで形成された層が含有する感光性樹脂と同じ種類である請求項1乃至4のいずれかに記載の記録ヘッドの製造方法。
- 前記工程(6)において、前記ドライフィルムで形成された層は、前記流路側壁形成層及び前記吐出口形成層と一括で現像される請求項1乃至5のいずれかに記載の記録ヘッドの製造方法。
- 前記未露光部を硬化させる重合開始剤は、オニウム塩、ジアゾニウム塩、チタノセン化合物、p−ニトロベンジル芳香族スルホネートの少なくとも1つである請求項1乃至6のいずれかに記載の記録ヘッドの製造方法。
- 前記工程(5)の前に、前記吐出口形成層の上面に撥水膜を形成する請求項1乃至7のいずれかに記載の記録ヘッドの製造方法。
- 前記ドライフィルムで形成された層が含有するネガ型感光性樹脂は、ビスフェノールA型エポキシ樹脂またはクレゾールノボラック型エポキシ樹脂である請求項1乃至8のいずれかに記載の記録ヘッドの製造方法。
- 前記ドライフィルムで形成された層の厚みは、0.5μm〜3μmである請求項1乃至9のいずれかに記載の記録ヘッドの製造方法。
Priority Applications (2)
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JP2011155733A JP5546504B2 (ja) | 2011-07-14 | 2011-07-14 | 記録ヘッドの製造方法 |
US13/540,960 US8481249B2 (en) | 2011-07-14 | 2012-07-03 | Method for manufacturing recording head |
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JP2011155733A JP5546504B2 (ja) | 2011-07-14 | 2011-07-14 | 記録ヘッドの製造方法 |
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JP2013018272A JP2013018272A (ja) | 2013-01-31 |
JP5546504B2 true JP5546504B2 (ja) | 2014-07-09 |
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US (1) | US8481249B2 (ja) |
JP (1) | JP5546504B2 (ja) |
Families Citing this family (6)
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JP6327836B2 (ja) * | 2013-11-13 | 2018-05-23 | キヤノン株式会社 | 液体吐出ヘッドの製造方法 |
US9599893B2 (en) * | 2014-09-25 | 2017-03-21 | Canon Kabushiki Kaisha | Production process for optically shaped product and production process for liquid discharge head |
JP2016221866A (ja) * | 2015-06-01 | 2016-12-28 | キヤノン株式会社 | 液体吐出ヘッドの製造方法 |
US10336050B2 (en) * | 2016-03-07 | 2019-07-02 | Thermwood Corporation | Apparatus and methods for fabricating components |
JP7419011B2 (ja) * | 2019-10-08 | 2024-01-22 | キヤノン株式会社 | 接合体の製造方法および液体吐出ヘッドの製造方法 |
JP2021109385A (ja) | 2020-01-10 | 2021-08-02 | キヤノン株式会社 | 液体吐出ヘッド及び液体吐出ヘッドの製造方法 |
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JP2781466B2 (ja) | 1990-12-19 | 1998-07-30 | キヤノン株式会社 | 液体噴射記録ヘッド、その製造方法、及び液体噴射記録ヘッドを備えた記録装置 |
EP0491560B1 (en) | 1990-12-19 | 1997-10-01 | Canon Kabushiki Kaisha | Method for producing liquid discharging recording head |
US6162589A (en) * | 1998-03-02 | 2000-12-19 | Hewlett-Packard Company | Direct imaging polymer fluid jet orifice |
KR100396559B1 (ko) * | 2001-11-05 | 2003-09-02 | 삼성전자주식회사 | 일체형 잉크젯 프린트헤드의 제조 방법 |
JP2003311975A (ja) * | 2002-02-20 | 2003-11-06 | Canon Inc | インクジェットヘッドおよびその製造方法および記録方法 |
KR100445004B1 (ko) * | 2002-08-26 | 2004-08-21 | 삼성전자주식회사 | 모노리틱 잉크 젯 프린트 헤드 및 이의 제조 방법 |
JP2005125619A (ja) * | 2003-10-24 | 2005-05-19 | Canon Inc | 液体噴射記録ヘッド及びその製造方法 |
JP2006347072A (ja) * | 2005-06-17 | 2006-12-28 | Canon Inc | 液体吐出ヘッドの製造方法、液体吐出ヘッド、および液体吐出記録装置 |
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2011
- 2011-07-14 JP JP2011155733A patent/JP5546504B2/ja not_active Expired - Fee Related
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2012
- 2012-07-03 US US13/540,960 patent/US8481249B2/en not_active Expired - Fee Related
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US8481249B2 (en) | 2013-07-09 |
US20130017496A1 (en) | 2013-01-17 |
JP2013018272A (ja) | 2013-01-31 |
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