JP5531614B2 - メルカプト基で修飾したポリシロキサンを含有する反射防止被膜形成用塗布液 - Google Patents

メルカプト基で修飾したポリシロキサンを含有する反射防止被膜形成用塗布液 Download PDF

Info

Publication number
JP5531614B2
JP5531614B2 JP2009509353A JP2009509353A JP5531614B2 JP 5531614 B2 JP5531614 B2 JP 5531614B2 JP 2009509353 A JP2009509353 A JP 2009509353A JP 2009509353 A JP2009509353 A JP 2009509353A JP 5531614 B2 JP5531614 B2 JP 5531614B2
Authority
JP
Japan
Prior art keywords
group
coating
polysiloxane
formula
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2009509353A
Other languages
English (en)
Japanese (ja)
Other versions
JPWO2008126851A1 (ja
Inventor
亮介 嶋野
賢一 元山
隆之 根木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nissan Chemical Corp
Original Assignee
Nissan Chemical Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nissan Chemical Corp filed Critical Nissan Chemical Corp
Priority to JP2009509353A priority Critical patent/JP5531614B2/ja
Publication of JPWO2008126851A1 publication Critical patent/JPWO2008126851A1/ja
Application granted granted Critical
Publication of JP5531614B2 publication Critical patent/JP5531614B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/111—Anti-reflection coatings using layers comprising organic materials
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04—Polysiloxanes
    • C08G77/22—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen
    • C08G77/24—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen halogen-containing groups
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04—Polysiloxanes
    • C08G77/22—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen
    • C08G77/26—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen nitrogen-containing groups
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
    • C09D183/04—Polysiloxanes
    • C09D183/08—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen, and oxygen
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
    • C09D7/40—Additives
    • C09D7/42—Gloss-reducing agents
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04—Polysiloxanes
    • C08G77/22—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen
    • C08G77/28—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen sulfur-containing groups

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Polymers & Plastics (AREA)
  • Medicinal Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Wood Science & Technology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Materials Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • General Physics & Mathematics (AREA)
  • Paints Or Removers (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Silicon Polymers (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
JP2009509353A 2007-04-10 2008-04-09 メルカプト基で修飾したポリシロキサンを含有する反射防止被膜形成用塗布液 Active JP5531614B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2009509353A JP5531614B2 (ja) 2007-04-10 2008-04-09 メルカプト基で修飾したポリシロキサンを含有する反射防止被膜形成用塗布液

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2007103296 2007-04-10
JP2007103296 2007-04-10
JP2009509353A JP5531614B2 (ja) 2007-04-10 2008-04-09 メルカプト基で修飾したポリシロキサンを含有する反射防止被膜形成用塗布液
PCT/JP2008/056987 WO2008126851A1 (ja) 2007-04-10 2008-04-09 メルカプト基で修飾したポリシロキサンを含有する反射防止被膜形成用塗布液

Publications (2)

Publication Number Publication Date
JPWO2008126851A1 JPWO2008126851A1 (ja) 2010-07-22
JP5531614B2 true JP5531614B2 (ja) 2014-06-25

Family

ID=39863948

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2009509353A Active JP5531614B2 (ja) 2007-04-10 2008-04-09 メルカプト基で修飾したポリシロキサンを含有する反射防止被膜形成用塗布液

Country Status (5)

Country Link
JP (1) JP5531614B2 (ko)
KR (2) KR101538177B1 (ko)
CN (1) CN101652442B (ko)
TW (1) TWI433899B (ko)
WO (1) WO2008126851A1 (ko)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6020557B2 (ja) * 2012-04-27 2016-11-02 旭硝子株式会社 ネガ型感光性樹脂組成物、硬化膜、隔壁および光学素子

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04250401A (ja) * 1991-01-28 1992-09-07 Mitsubishi Rayon Co Ltd 反射防止層を有する基板
JP2005249982A (ja) * 2004-03-03 2005-09-15 Hitachi Ltd 反射防止膜及びそれを有する画像表示装置，光記録媒体，太陽発電モジュール並びに反射防止膜形成方法
JP2007009216A (ja) * 2006-07-25 2007-01-18 Shin Etsu Chem Co Ltd 被膜形成用組成物用フロロオルガノポリシロキサン樹脂の製造方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AU2003280750A1 (en) * 2002-11-13 2004-06-03 Asahi Glass Company, Limited Actinic radiation curable coating composition and molded articles having coating films made from the composition through curing
TW200530350A (en) * 2003-12-18 2005-09-16 Nissan Chemical Ind Ltd Water repellent coating film having low refractive index
JP4526126B2 (ja) 2004-12-17 2010-08-18 日東電工株式会社 ハードコートフィルム及びその製造方法

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04250401A (ja) * 1991-01-28 1992-09-07 Mitsubishi Rayon Co Ltd 反射防止層を有する基板
JP2005249982A (ja) * 2004-03-03 2005-09-15 Hitachi Ltd 反射防止膜及びそれを有する画像表示装置，光記録媒体，太陽発電モジュール並びに反射防止膜形成方法
JP2007009216A (ja) * 2006-07-25 2007-01-18 Shin Etsu Chem Co Ltd 被膜形成用組成物用フロロオルガノポリシロキサン樹脂の製造方法

Also Published As

Publication number Publication date
TWI433899B (zh) 2014-04-11
CN101652442A (zh) 2010-02-17
KR20100015446A (ko) 2010-02-12
WO2008126851A1 (ja) 2008-10-23
KR101607446B1 (ko) 2016-03-29
KR101538177B1 (ko) 2015-07-20
KR20150040374A (ko) 2015-04-14
TW200909542A (en) 2009-03-01
JPWO2008126851A1 (ja) 2010-07-22
CN101652442B (zh) 2014-03-26

Similar Documents

Publication Publication Date Title
EP1760126A1 (en) Siloxane coating material, optical articles and process for the production of siloxane coating materials
EP2427521B1 (en) Antistatic sol/gel compositions and optical articles coated therewith
JP5382310B2 (ja) 被膜形成用塗布液、その製造方法、その被膜、及び反射防止材
JPS62148902A (ja) 反射防止性を有する光学物品及びその製造方法
KR101264424B1 (ko) 막 형성용 코팅액, 및 이의 막 및 막 형성 방법
JP4887783B2 (ja) 低屈折率及び撥水性を有する被膜
JP5262722B2 (ja) 低屈折率被膜形成用塗布液、その製造方法及び反射防止材
JP2000117902A (ja) シートまたはフィルム
WO2005059051A1 (ja) 低屈折率及び大きい水接触角を有する被膜
JP5293180B2 (ja) リン酸エステル化合物を含有する被膜形成用塗布液及び反射防止膜
JP5458575B2 (ja) 低屈折率被膜形成用塗布液、その製造方法及び反射防止材
JP4893103B2 (ja) 被膜形成用塗布液及びその被膜並びに被膜形成方法
JP5910494B2 (ja) スプレー塗布用の反射防止被膜形成用塗布液
JP5357502B2 (ja) 低屈折率コーティング材組成物及び塗装品
JP5531614B2 (ja) メルカプト基で修飾したポリシロキサンを含有する反射防止被膜形成用塗布液
JP2009108123A (ja) 表面処理金属酸化物粒子の製造方法、該微粒子を含む透明被膜形成用塗布液および透明被膜付基材
KR20070022311A (ko) 실록산계 도료, 광학물품 및 실록산계 도료의 제조방법
JP5310549B2 (ja) 低屈折率被膜形成用塗布液、その製造方法及び反射防止材
JPS63193971A (ja) 透明導電性被膜
JP2007009127A (ja) コーティング材料およびそれを用いた光学物品
JP2006028322A (ja) シロキサン系コーティング膜および、そのコーティング膜形成用塗料
JP2008174704A (ja) コーティング材料およびそれを用いた光学物品

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20110317

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20130604

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20130805

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20140107

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20140304

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20140325

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20140407

R151 Written notification of patent or utility model registration

Ref document number: 5531614

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R151

S531 Written request for registration of change of domicile

Free format text: JAPANESE INTERMEDIATE CODE: R313531

S533 Written request for registration of change of name

Free format text: JAPANESE INTERMEDIATE CODE: R313533

R350 Written notification of registration of transfer

Free format text: JAPANESE INTERMEDIATE CODE: R350