JP5520696B2 - パワー半導体モジュールの製造方法、及び接続装置を備えるパワー半導体モジュール - Google Patents
パワー半導体モジュールの製造方法、及び接続装置を備えるパワー半導体モジュール Download PDFInfo
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- 239000004065 semiconductor Substances 0.000 title claims description 61
- 238000004519 manufacturing process Methods 0.000 title claims description 11
- 239000004020 conductor Substances 0.000 claims description 43
- 239000011888 foil Substances 0.000 claims description 43
- 239000000758 substrate Substances 0.000 claims description 33
- 239000002184 metal Substances 0.000 claims description 20
- 238000000034 method Methods 0.000 claims description 17
- 238000005452 bending Methods 0.000 claims description 8
- 230000035515 penetration Effects 0.000 claims description 5
- 238000009413 insulation Methods 0.000 claims 2
- 238000005245 sintering Methods 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 3
- 238000001816 cooling Methods 0.000 description 2
- 230000001419 dependent effect Effects 0.000 description 1
- 238000010292 electrical insulation Methods 0.000 description 1
- 238000001746 injection moulding Methods 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 239000012774 insulation material Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 230000005405 multipole Effects 0.000 description 1
- 229910000679 solder Inorganic materials 0.000 description 1
- 238000005476 soldering Methods 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
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Description
・基板と接続装置とを設けるステップであって、前記縁部まで又はその近くに延在する第2のフォイルの第2の導体パスに関し、電気的安全性のために空気及び沿面距離に適合する程度に十分な距離が存在するように、接続装置の絶縁フォイルが基板からフォイルの縁部に向かう方向にすべての第1の導体パスを越えて突出するように、接続装置が有利に形成されるステップと、
・同時に又は順次に第1の導体パスのそれぞれの第1の接触領域を、パワー半導体コンポーネントの少なくとも1つの第2の接触領域と、負荷端子要素の少なくとも1つの第3の接触領域とに接着接続するステップであって、このステップは、1つの工程ステップで上述のすべての接続を形成する圧力焼結工程によって行うことができることが好ましく、同様に、各々が設けられた所定の曲げ箇所を有する平坦な直線状の金属体として負荷端子要素を形成することが有利であり得るステップと、
・接続装置の少なくとも1つのパワー半導体コンポーネントと負荷端子要素とから構成された結合体を配設して、パワー半導体モジュールのハウジングを形成するステップと、を含むことを特徴とする。この場合、負荷端子要素を有する接触領域が配置される接続装置のそれぞれの部分が、配置してハウジングを形成する間に、基板によって画定された平面に対し直角に位置することになる場合、有利である。このため、接続装置は、この配置の前に曲げ領域内に曲げられる。
12 絶縁材料体
14 パワー半導体コンポーネント
20 パワー半導体コンポーネント
30 ハウジング
32 ハウジング
40 接続装置
42 第1の導体パス
44 電気絶縁フォイル
46 第2の導体パス
48 曲げ領域
50 負荷端子要素
52 凹部
54 所定の曲げ箇所
56 ねじ貫通部
58 ねじ接続部
60 外部のプリント回路基板
62 プラグコネクタ
64 圧力
70 空気及び沿面距離
200 第3の接触領域
420 第1の接触領域
460 補助接触パッド
500 第2の接触領域
Claims (8)
- 基板(10)と、接続装置(40)と、複数の負荷端子要素(50)とを備えるパワー半導体モジュールを製造するための方法であって、少なくとも1つのパワー半導体コンポーネント(20)が、基板(10)の導体パス(14)上に配設され、かつ回路に応じて接続装置(40)を用いて少なくとも1つの負荷端子要素(50)に接続され、接続装置(40)が、外部のプリント回路基板(60)に接続することができる補助接触パッド(460)を有する方法において、次の本質的な製造ステップ、すなわち、
・基板(10)、並びに第1の導電性の構造化された金属フォイル(42)と電気絶縁フォイル(44)と第2の導電性の構造化された金属フォイル(46)とを備える連続層から少なくとも形成された接続装置(40)を設けるステップであって、それぞれの構造化により、前記それぞれの金属フォイルから第1及び第2の導体パスを形成するステップと、
・同時に又は順次に前記第1の導体パス(42)のそれぞれの第1の接触領域(420)を、パワー半導体コンポーネント(20)の少なくとも1つの第2の接触領域(200)と、負荷端子要素(50)の少なくとも1つの第3の接触領域(500)とに接着接続するステップと、
・接続装置(40)の少なくとも1つのパワー半導体コンポーネント(20)と負荷端子要素(50)とから構成された結合体を配設して、前記パワー半導体モジュールのハウジング(30)を形成するステップと、
を有することを特徴とする方法。 - 負荷端子要素(20)を有する接触領域(200、420)が配置される接続装置(40)のそれぞれの部分が、配置してハウジング(30)を形成する間に、基板(10)によって画定された平面に対し直角に位置することになり、このために、接続装置(40)が予め曲げ領域(48)内に曲げられる、請求項1に記載の方法。
- 接続装置(40)の絶縁フォイル(44)が、前記絶縁フォイルの縁部まで又はその近くに延在する前記第2のフォイルの第2の導体パス(46)に関し、電気的安全性のために空気及び沿面距離に適合するのに十分な距離(70)が存在するように、前記基板から絶縁フォイル(44)の縁部に向かう方向に、すべての前記第1の導体パスを越えて突出し、配置してハウジング(30)を形成した後に、少なくとも1つの第2の導体パス(46)を有する絶縁フォイル(44)が前記ハウジングを越えて突出する、請求項1又は2に記載の方法。
- 少なくとも1つの負荷端子要素(50)が角状の金属成形部品として形成され、接続装置(40)に接続するための負荷端子要素(50)の接触領域(500)が第1の脚部の外面に配置され、負荷端子要素(50)の第2の脚部がねじ貫通部(56)用の凹部(52)を有し、前記第2の脚部が基板(10)に対し平行に配置され、前記角状の形状が基板に配置する前に形成される、請求項1に記載の方法。
- 基板(10)と、接続装置(40)と、複数の負荷端子要素(50)とを備えるパワー半導体モジュールであって、少なくとも1つのパワー半導体コンポーネント(20)が、基板(10)の導体パス(14)上に配設され、かつ回路に応じて接続装置(40)を用いて少なくとも1つの負荷端子要素(50)に接続され、前記接続装置(40)が、第1の導電性の構造化された金属フォイル(42)を備える連続層と、電気絶縁フォイル(44)と、第2の導電性の構造化された金属フォイル(46)とから構成され、それぞれの構造化により、前記それぞれの金属フォイルから第1及び第2の導体パスを形成し、少なくとも1つの第1の導体パス(42)が、負荷端子要素(50)に接着接続される接触領域(420)を有し、接続装置(40)が、外部のプリント回路基板(60)に接続することができる補助接触パッド(460)を有する、パワー半導体モジュール。
- 負荷端子要素(50)への接触領域(420)が配置される接続装置(40)の部分が、基板(10)によって画定された平面に対し直角に位置する、請求項5に記載のパワー半導体モジュール。
- 前記接続装置の絶縁フォイル(44)が、前記絶縁フォイルの縁部まで延在する前記第2のフォイルの第2の導体パス(46)に関し、電気的安全性のために空気及び沿面距離に適合するのに十分な距離(70)が存在するように、基板(10)からフォイル(44)の縁部に向かう方向に、すべての第1の導体パス(42)を越えて突出し、少なくとも1つの第2の導体パス(46)を有する絶縁フォイル(44)の前記部分がハウジング(30)を越えて突出する、請求項6に記載のパワー半導体モジュール。
- 少なくとも1つの負荷端子要素(50)が角状の金属成形部品として形成され、接続装置(40)に接続するための負荷端子要素(50)の接触領域(500)が第1の脚部の外面に配置され、負荷端子要素(50)の第2の脚部がねじ貫通部(56)用の凹部(52)を有し、前記第2の脚部が基板(10)に対し平行に配置される、請求項5に記載のパワー半導体モジュール。
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Application Number | Priority Date | Filing Date | Title |
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DE102009024385A DE102009024385B4 (de) | 2009-06-09 | 2009-06-09 | Verfahren zur Herstellung eines Leistungshalbleitermoduls und Leistungshalbleitermodul mit einer Verbindungseinrichtung |
DE102009024385.2 | 2009-06-09 |
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JP2010287887A JP2010287887A (ja) | 2010-12-24 |
JP5520696B2 true JP5520696B2 (ja) | 2014-06-11 |
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JP2010125775A Active JP5520696B2 (ja) | 2009-06-09 | 2010-06-01 | パワー半導体モジュールの製造方法、及び接続装置を備えるパワー半導体モジュール |
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US (1) | US8283784B2 (ja) |
EP (1) | EP2264761A3 (ja) |
JP (1) | JP5520696B2 (ja) |
KR (1) | KR101672548B1 (ja) |
CN (1) | CN101924044B (ja) |
DE (1) | DE102009024385B4 (ja) |
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JP5434857B2 (ja) * | 2010-09-15 | 2014-03-05 | 株式会社デンソー | 半導体モジュール |
DE102010063387A1 (de) | 2010-12-17 | 2012-06-21 | Semikron Elektronik Gmbh & Co. Kg | Schaltungsanordnung mit mindestens zwei Teilmoduln |
JP5842489B2 (ja) * | 2011-09-14 | 2016-01-13 | 三菱電機株式会社 | 半導体装置 |
DE102013200526B4 (de) * | 2013-01-16 | 2019-11-21 | Semikron Elektronik Gmbh & Co. Kg | Leistungshalbleitermodul und Verfahren zur Herstellung eines Leistungshalbleitermoduls |
JP6138181B2 (ja) | 2014-04-15 | 2017-05-31 | キヤノン株式会社 | 画像形成装置に用いられる樹脂成形品及びカートリッジ、並びに画像形成装置に用いられる可動部材の製造方法及びカートリッジの製造方法 |
DE102016113152B4 (de) * | 2016-07-18 | 2019-12-19 | Semikron Elektronik Gmbh & Co. Kg | Leistungselektronische Schalteinrichtung und Leistungshalbleitermodul hiermit |
Family Cites Families (19)
Publication number | Priority date | Publication date | Assignee | Title |
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JP2002093995A (ja) * | 2000-09-20 | 2002-03-29 | Unisia Jecs Corp | 半導体装置 |
DE10237561C1 (de) * | 2002-08-16 | 2003-10-16 | Semikron Elektronik Gmbh | Induktivitätsarme Schaltungsanordnung bzw. Schaltungsaufbau für Leistungshalbleitermodule |
DE10309302B4 (de) * | 2003-03-04 | 2007-09-27 | Semikron Elektronik Gmbh & Co. Kg | Leistungshalbleitermodul mit Sensorbauteil |
JP3898156B2 (ja) * | 2003-06-02 | 2007-03-28 | 三菱電機株式会社 | 半導体パワーモジュール |
JP4282417B2 (ja) | 2003-09-12 | 2009-06-24 | ソニーケミカル&インフォメーションデバイス株式会社 | 接続構造体 |
DE10355925B4 (de) * | 2003-11-29 | 2006-07-06 | Semikron Elektronik Gmbh & Co. Kg | Leistungshalbleitermodul und Verfahren seiner Herstellung |
JP4265394B2 (ja) * | 2003-12-17 | 2009-05-20 | 株式会社日立製作所 | 電力変換装置 |
DE102005024900B4 (de) * | 2004-06-08 | 2012-08-16 | Fuji Electric Co., Ltd. | Leistungsmodul |
DE102005039278A1 (de) * | 2005-08-19 | 2007-02-22 | Semikron Elektronik Gmbh & Co. Kg | Leistungshalbleitermodul mit Leitungselement |
US7995356B2 (en) * | 2005-08-26 | 2011-08-09 | Siemens Aktiengesellschaft | Power semiconductor module comprising load connection elements applied to circuit carriers |
DE102005047567B3 (de) * | 2005-10-05 | 2007-03-29 | Semikron Elektronik Gmbh & Co. Kg | Leistungshalbleitermodul mit Isolationszwischenlage und Verfahren zu seiner Herstellung |
DE102005049687B4 (de) * | 2005-10-14 | 2008-09-25 | Infineon Technologies Ag | Leistungshalbleiterbauteil in Flachleitertechnik mit vertikalem Strompfad und Verfahren zur Herstellung |
DE102006013078B4 (de) * | 2006-03-22 | 2008-01-03 | Semikron Elektronik Gmbh & Co. Kg | Kompaktes Leistungshalbleitermodul mit Verbindungseinrichtung |
DE102006027482B3 (de) * | 2006-06-14 | 2007-08-16 | Semikron Elektronik Gmbh & Co. Kg | Gehauste Halbleiterschaltungsanordnung mit Kontakteinrichtung |
US9373563B2 (en) * | 2007-07-20 | 2016-06-21 | Infineon Technologies Ag | Semiconductor assembly having a housing |
JP5192194B2 (ja) | 2007-07-26 | 2013-05-08 | デクセリアルズ株式会社 | 接着フィルム |
DE102007054710B3 (de) * | 2007-11-16 | 2009-07-09 | Semikron Elektronik Gmbh & Co. Kg | Verfahren zur Herstellung einer Halbleiterbaugruppe |
DE102008017454B4 (de) * | 2008-04-05 | 2010-02-04 | Semikron Elektronik Gmbh & Co. Kg | Leistungshalbleitermodul mit hermetisch dichter Schaltungsanordnung und Herstellungsverfahren hierzu |
DE102009017733B4 (de) * | 2009-04-11 | 2011-12-08 | Semikron Elektronik Gmbh & Co. Kg | Leistungshalbleitermodul mit einer Verbindungseinrichtung und mit als Kontaktfeder ausgebildeten internen Anschlusselementen |
-
2009
- 2009-06-09 DE DE102009024385A patent/DE102009024385B4/de active Active
-
2010
- 2010-04-24 EP EP10004376.9A patent/EP2264761A3/de not_active Withdrawn
- 2010-06-01 JP JP2010125775A patent/JP5520696B2/ja active Active
- 2010-06-09 CN CN201010202629.6A patent/CN101924044B/zh active Active
- 2010-06-09 US US12/797,331 patent/US8283784B2/en not_active Expired - Fee Related
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Also Published As
Publication number | Publication date |
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JP2010287887A (ja) | 2010-12-24 |
DE102009024385A1 (de) | 2010-12-16 |
CN101924044A (zh) | 2010-12-22 |
US20110001244A1 (en) | 2011-01-06 |
EP2264761A2 (de) | 2010-12-22 |
CN101924044B (zh) | 2014-07-30 |
KR101672548B1 (ko) | 2016-11-16 |
EP2264761A3 (de) | 2016-07-13 |
KR20100132467A (ko) | 2010-12-17 |
DE102009024385B4 (de) | 2011-03-17 |
US8283784B2 (en) | 2012-10-09 |
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