JP5517465B2 - 半導体レーザの製造方法 - Google Patents
半導体レーザの製造方法 Download PDFInfo
- Publication number
- JP5517465B2 JP5517465B2 JP2009031414A JP2009031414A JP5517465B2 JP 5517465 B2 JP5517465 B2 JP 5517465B2 JP 2009031414 A JP2009031414 A JP 2009031414A JP 2009031414 A JP2009031414 A JP 2009031414A JP 5517465 B2 JP5517465 B2 JP 5517465B2
- Authority
- JP
- Japan
- Prior art keywords
- semiconductor laser
- wafer
- semiconductor
- support wafer
- laser chip
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 239000004065 semiconductor Substances 0.000 title claims description 176
- 238000004519 manufacturing process Methods 0.000 title claims description 26
- 239000002131 composite material Substances 0.000 claims description 37
- 238000000034 method Methods 0.000 claims description 31
- 238000001465 metallisation Methods 0.000 claims description 16
- 239000000463 material Substances 0.000 claims description 13
- 239000000758 substrate Substances 0.000 claims description 13
- 230000005855 radiation Effects 0.000 claims description 12
- 229910010293 ceramic material Inorganic materials 0.000 claims description 6
- 235000012431 wafers Nutrition 0.000 description 99
- 238000005086 pumping Methods 0.000 description 12
- 230000005670 electromagnetic radiation Effects 0.000 description 8
- 229910052710 silicon Inorganic materials 0.000 description 6
- 239000010703 silicon Substances 0.000 description 6
- 229910000679 solder Inorganic materials 0.000 description 5
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 238000003698 laser cutting Methods 0.000 description 4
- 239000007769 metal material Substances 0.000 description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- 229910052802 copper Inorganic materials 0.000 description 3
- 239000010949 copper Substances 0.000 description 3
- 230000005693 optoelectronics Effects 0.000 description 3
- 238000000926 separation method Methods 0.000 description 3
- PIGFYZPCRLYGLF-UHFFFAOYSA-N Aluminum nitride Chemical compound [Al]#N PIGFYZPCRLYGLF-UHFFFAOYSA-N 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 230000003595 spectral effect Effects 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- BJQHLKABXJIVAM-UHFFFAOYSA-N bis(2-ethylhexyl) phthalate Chemical compound CCCCC(CC)COC(=O)C1=CC=CC=C1C(=O)OCC(CC)CCCC BJQHLKABXJIVAM-UHFFFAOYSA-N 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 238000001312 dry etching Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000017525 heat dissipation Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000010348 incorporation Methods 0.000 description 1
- 238000001746 injection moulding Methods 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 229910003465 moissanite Inorganic materials 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 230000010287 polarization Effects 0.000 description 1
- 238000002310 reflectometry Methods 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 238000001721 transfer moulding Methods 0.000 description 1
- 238000001039 wet etching Methods 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/02—Structural details or components not essential to laser action
- H01S5/0201—Separation of the wafer into individual elements, e.g. by dicing, cleaving, etching or directly during growth
Landscapes
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Optics & Photonics (AREA)
- Semiconductor Lasers (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102008009108.1 | 2008-02-14 | ||
| DE102008009108A DE102008009108A1 (de) | 2008-02-14 | 2008-02-14 | Verfahren zur Herstellung eines Halbleiterlasers sowie Halbleiterlaser |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2009194388A JP2009194388A (ja) | 2009-08-27 |
| JP2009194388A5 JP2009194388A5 (enExample) | 2012-03-01 |
| JP5517465B2 true JP5517465B2 (ja) | 2014-06-11 |
Family
ID=40428207
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2009031414A Active JP5517465B2 (ja) | 2008-02-14 | 2009-02-13 | 半導体レーザの製造方法 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US7995633B2 (enExample) |
| EP (1) | EP2091116B1 (enExample) |
| JP (1) | JP5517465B2 (enExample) |
| DE (1) | DE102008009108A1 (enExample) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102008009110A1 (de) * | 2008-02-14 | 2009-08-20 | Osram Opto Semiconductors Gmbh | Halbleiterlasermodul |
| KR101715761B1 (ko) | 2010-12-31 | 2017-03-14 | 삼성전자주식회사 | 반도체 패키지 및 그 제조방법 |
| DE102012107409B4 (de) * | 2012-08-13 | 2022-06-15 | OSRAM Opto Semiconductors Gesellschaft mit beschränkter Haftung | Verfahren zur Herstellung eines Halbleiter-Laserelements |
| DE102013224420A1 (de) * | 2013-05-13 | 2014-11-13 | Osram Gmbh | Laserbauelement und Verfahren zur seiner Herstellung |
| DE102016101942B4 (de) * | 2016-02-04 | 2022-07-21 | OSRAM Opto Semiconductors Gesellschaft mit beschränkter Haftung | Verfahren zum Herstellen einer optoelektronischen Leuchtvorrichtung |
Family Cites Families (25)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH03286547A (ja) * | 1990-04-02 | 1991-12-17 | Mitsubishi Electric Corp | 半導体レーザ装置の製造方法 |
| JPH10335383A (ja) * | 1997-05-28 | 1998-12-18 | Matsushita Electric Ind Co Ltd | 半導体装置の製造方法 |
| JP3810529B2 (ja) * | 1997-09-05 | 2006-08-16 | 株式会社フジクラ | 光部品の組立方法 |
| JP4897133B2 (ja) * | 1999-12-09 | 2012-03-14 | ソニー株式会社 | 半導体発光素子、その製造方法および配設基板 |
| JP2001230492A (ja) * | 2000-02-21 | 2001-08-24 | Fuji Photo Film Co Ltd | 半導体発光装置 |
| CN1292494C (zh) * | 2000-04-26 | 2006-12-27 | 奥斯兰姆奥普托半导体有限责任公司 | 发光半导体元件及其制造方法 |
| US6680959B2 (en) * | 2000-07-18 | 2004-01-20 | Rohm Co., Ltd. | Semiconductor light emitting device and semiconductor laser |
| US20030099273A1 (en) * | 2001-01-09 | 2003-05-29 | Murry Stefan J. | Method and apparatus for coupling a surface-emitting laser to an external device |
| CN1224148C (zh) | 2001-02-20 | 2005-10-19 | 奥斯兰姆奥普托半导体有限责任公司 | 光抽运的表面发射半导体激光器件及其制造方法 |
| JP4242599B2 (ja) * | 2002-04-08 | 2009-03-25 | パナソニック株式会社 | 窒化物半導体装置の製造方法及び窒化物半導体基板の製造方法 |
| US6936929B1 (en) * | 2003-03-17 | 2005-08-30 | National Semiconductor Corporation | Multichip packages with exposed dice |
| JP3794489B2 (ja) * | 2003-06-18 | 2006-07-05 | セイコーエプソン株式会社 | 光通信モジュール及びその製造方法、光通信装置、電子機器 |
| TWI240434B (en) * | 2003-06-24 | 2005-09-21 | Osram Opto Semiconductors Gmbh | Method to produce semiconductor-chips |
| US7164702B1 (en) * | 2003-08-29 | 2007-01-16 | The United States Of America As Represented By The Secretary Of The Army | Optical transmitters and interconnects using surface-emitting lasers and micro-optical elements |
| JP4439313B2 (ja) * | 2004-03-31 | 2010-03-24 | 三洋電機株式会社 | 光学モジュールの製造方法 |
| US7408199B2 (en) * | 2004-04-02 | 2008-08-05 | Nichia Corporation | Nitride semiconductor laser device and nitride semiconductor device |
| JP4614715B2 (ja) * | 2004-08-31 | 2011-01-19 | 三洋電機株式会社 | 半導体レーザ装置およびその製造方法 |
| US7817695B2 (en) * | 2004-09-22 | 2010-10-19 | Osram Opto Semiconductors Gmbh | Lateral optically pumped surface-emitting semiconductor laser on a heat sink |
| US7932111B2 (en) * | 2005-02-23 | 2011-04-26 | Cree, Inc. | Substrate removal process for high light extraction LEDs |
| DE102005053274A1 (de) * | 2005-09-30 | 2007-04-12 | Osram Opto Semiconductors Gmbh | Verfahren zum Herstellen einer Mehrzahl von Halbleiterchips und Halbleiterbauelement |
| DE102006017293A1 (de) * | 2005-12-30 | 2007-07-05 | Osram Opto Semiconductors Gmbh | Verfahren zur Herstellung einer optisch pumpbaren Halbleitervorrichtung |
| DE102006017294A1 (de) * | 2005-12-30 | 2007-07-05 | Osram Opto Semiconductors Gmbh | Optisch pumpbare Halbleitervorrichtung |
| DE102006033502A1 (de) | 2006-05-03 | 2007-11-15 | Osram Opto Semiconductors Gmbh | Strahlungsemittierender Halbleiterkörper mit Trägersubstrat und Verfahren zur Herstellung eines solchen |
| DE102006042196A1 (de) * | 2006-06-30 | 2008-01-03 | Osram Opto Semiconductors Gmbh | Oberflächenemittierender Halbleiterkörper mit vertikaler Emissionsrichtung und stabilisierter Emissionswellenlänge |
| JP4948307B2 (ja) * | 2006-07-31 | 2012-06-06 | 三洋電機株式会社 | 半導体レーザ素子およびその製造方法 |
-
2008
- 2008-02-14 DE DE102008009108A patent/DE102008009108A1/de not_active Withdrawn
-
2009
- 2009-01-22 EP EP09151143.6A patent/EP2091116B1/de active Active
- 2009-02-13 JP JP2009031414A patent/JP5517465B2/ja active Active
- 2009-02-13 US US12/371,292 patent/US7995633B2/en active Active
Also Published As
| Publication number | Publication date |
|---|---|
| US7995633B2 (en) | 2011-08-09 |
| EP2091116B1 (de) | 2020-04-08 |
| US20090232177A1 (en) | 2009-09-17 |
| EP2091116A2 (de) | 2009-08-19 |
| JP2009194388A (ja) | 2009-08-27 |
| DE102008009108A1 (de) | 2009-08-20 |
| EP2091116A3 (de) | 2013-10-02 |
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