JP5510152B2 - 着色感光性樹脂組成物 - Google Patents

着色感光性樹脂組成物 Download PDF

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Publication number
JP5510152B2
JP5510152B2 JP2010167943A JP2010167943A JP5510152B2 JP 5510152 B2 JP5510152 B2 JP 5510152B2 JP 2010167943 A JP2010167943 A JP 2010167943A JP 2010167943 A JP2010167943 A JP 2010167943A JP 5510152 B2 JP5510152 B2 JP 5510152B2
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Japan
Prior art keywords
group
carbon atoms
compound
parts
formula
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JP2010167943A
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English (en)
Japanese (ja)
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JP2011215572A (ja
Inventor
裕次 秋山
泰基 辰巳
昭妍 朴
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Chemical Co Ltd
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Sumitomo Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Chemical Co Ltd filed Critical Sumitomo Chemical Co Ltd
Priority to JP2010167943A priority Critical patent/JP5510152B2/ja
Priority to TW100104963A priority patent/TWI476517B/zh
Priority to CN201110063965.1A priority patent/CN102193315B/zh
Priority to KR1020110020745A priority patent/KR101734978B1/ko
Publication of JP2011215572A publication Critical patent/JP2011215572A/ja
Application granted granted Critical
Publication of JP5510152B2 publication Critical patent/JP5510152B2/ja
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B45/00—Complex metal compounds of azo dyes
    • C09B45/02—Preparation from dyes containing in o-position a hydroxy group and in o'-position hydroxy, alkoxy, carboxyl, amino or keto groups
    • C09B45/04—Azo compounds in general
    • C09B45/10—Cobalt compounds
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/201—Filters in the form of arrays
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0042—Photosensitive materials with inorganic or organometallic light-sensitive compounds not otherwise provided for, e.g. inorganic resists

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
JP2010167943A 2010-03-15 2010-07-27 着色感光性樹脂組成物 Active JP5510152B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2010167943A JP5510152B2 (ja) 2010-03-15 2010-07-27 着色感光性樹脂組成物
TW100104963A TWI476517B (zh) 2010-03-15 2011-02-15 Coloring the photosensitive resin composition
CN201110063965.1A CN102193315B (zh) 2010-03-15 2011-03-08 着色感光性树脂组合物
KR1020110020745A KR101734978B1 (ko) 2010-03-15 2011-03-09 착색 감광성 수지 조성물

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2010057491 2010-03-15
JP2010057491 2010-03-15
JP2010167943A JP5510152B2 (ja) 2010-03-15 2010-07-27 着色感光性樹脂組成物

Publications (2)

Publication Number Publication Date
JP2011215572A JP2011215572A (ja) 2011-10-27
JP5510152B2 true JP5510152B2 (ja) 2014-06-04

Family

ID=44945307

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2010167943A Active JP5510152B2 (ja) 2010-03-15 2010-07-27 着色感光性樹脂組成物

Country Status (3)

Country Link
JP (1) JP5510152B2 (ko)
KR (1) KR101734978B1 (ko)
TW (1) TWI476517B (ko)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8178360B2 (en) 2006-05-18 2012-05-15 Illumina Cambridge Limited Dye compounds and the use of their labelled conjugates
JP5521800B2 (ja) * 2010-06-08 2014-06-18 Ｊｓｒ株式会社 感放射線性樹脂組成物、硬化膜、硬化膜の形成方法、及び表示素子
JP5978583B2 (ja) * 2011-10-04 2016-08-24 住友化学株式会社 着色感光性樹脂組成物
CN103034056A (zh) * 2011-10-07 2013-04-10 住友化学株式会社 着色感光性树脂组合物
KR101574089B1 (ko) 2011-12-23 2015-12-03 제일모직 주식회사 감광성 수지 조성물 및 이를 이용한 컬러필터
JP6174881B2 (ja) * 2012-04-04 2017-08-02 住友化学株式会社 着色硬化性樹脂組成物
JP6454273B2 (ja) * 2013-06-07 2019-01-16 東友ファインケム株式会社Ｄｏｎｇｗｏｏ Ｆｉｎｅ−Ｃｈｅｍ Ｃｏ．， Ｌｔｄ． 着色硬化性樹脂組成物
JP2017053942A (ja) * 2015-09-08 2017-03-16 三菱化学株式会社 感光性着色組成物、硬化物、着色スペーサー、及び画像表示装置
TWI741223B (zh) * 2017-10-20 2021-10-01 南韓商東友精細化工有限公司 著色分散液、含該著色分散液之著色感光性樹脂組合物、使用該組合物製造之圖案層、含該圖案層之彩色濾光片、及含該彩色濾光片之顯示裝置
JP2022081147A (ja) * 2020-11-19 2022-05-31 セイコーエプソン株式会社 分散液、インクジェット記録用インク組成物、及び分散樹脂

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5250708A (en) * 1991-08-13 1993-10-05 Milliken Research Corporation Poly(oxyalkylene) substituted aminophenol intermediate and xanthene colorant
JP2000183435A (ja) * 1998-12-14 2000-06-30 Mitsubishi Electric Corp 色素レーザ
JP5481844B2 (ja) * 2007-12-14 2014-04-23 住友化学株式会社 着色感光性樹脂組成物
JP5504627B2 (ja) * 2008-07-01 2014-05-28 住友化学株式会社 着色感光性樹脂組成物

Also Published As

Publication number Publication date
KR101734978B1 (ko) 2017-05-12
JP2011215572A (ja) 2011-10-27
KR20110103861A (ko) 2011-09-21
TW201142495A (en) 2011-12-01
TWI476517B (zh) 2015-03-11

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