JP5499816B2 - ハロゲン系ガスの除去方法 - Google Patents
ハロゲン系ガスの除去方法 Download PDFInfo
- Publication number
- JP5499816B2 JP5499816B2 JP2010068146A JP2010068146A JP5499816B2 JP 5499816 B2 JP5499816 B2 JP 5499816B2 JP 2010068146 A JP2010068146 A JP 2010068146A JP 2010068146 A JP2010068146 A JP 2010068146A JP 5499816 B2 JP5499816 B2 JP 5499816B2
- Authority
- JP
- Japan
- Prior art keywords
- halogen
- gas
- type zeolite
- binderless
- container
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 229910052736 halogen Inorganic materials 0.000 title claims description 54
- 150000002367 halogens Chemical class 0.000 title claims description 54
- 238000000034 method Methods 0.000 title claims description 25
- 239000010457 zeolite Substances 0.000 claims description 52
- 229910021536 Zeolite Inorganic materials 0.000 claims description 51
- HNPSIPDUKPIQMN-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Al]O[Al]=O HNPSIPDUKPIQMN-UHFFFAOYSA-N 0.000 claims description 51
- 150000002506 iron compounds Chemical class 0.000 claims description 35
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 12
- 239000000460 chlorine Substances 0.000 claims description 11
- 229910052801 chlorine Inorganic materials 0.000 claims description 4
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 claims description 3
- FAQYAMRNWDIXMY-UHFFFAOYSA-N trichloroborane Chemical compound ClB(Cl)Cl FAQYAMRNWDIXMY-UHFFFAOYSA-N 0.000 claims description 3
- 229960001716 benzalkonium Drugs 0.000 claims 1
- CYDRXTMLKJDRQH-UHFFFAOYSA-N benzododecinium Chemical compound CCCCCCCCCCCC[N+](C)(C)CC1=CC=CC=C1 CYDRXTMLKJDRQH-UHFFFAOYSA-N 0.000 claims 1
- 238000009877 rendering Methods 0.000 claims 1
- 239000007789 gas Substances 0.000 description 100
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 30
- 239000003795 chemical substances by application Substances 0.000 description 22
- -1 hydrogen halides Chemical class 0.000 description 20
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 12
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 9
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 description 9
- 229910000041 hydrogen chloride Inorganic materials 0.000 description 9
- AMWRITDGCCNYAT-UHFFFAOYSA-L hydroxy(oxo)manganese;manganese Chemical compound [Mn].O[Mn]=O.O[Mn]=O AMWRITDGCCNYAT-UHFFFAOYSA-L 0.000 description 8
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 7
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 7
- 238000001312 dry etching Methods 0.000 description 6
- 230000007935 neutral effect Effects 0.000 description 6
- 150000003839 salts Chemical class 0.000 description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 6
- 230000002378 acidificating effect Effects 0.000 description 5
- 229910052796 boron Inorganic materials 0.000 description 5
- 239000004927 clay Substances 0.000 description 5
- 238000011049 filling Methods 0.000 description 5
- 229910000039 hydrogen halide Inorganic materials 0.000 description 5
- 239000012433 hydrogen halide Substances 0.000 description 5
- 150000002697 manganese compounds Chemical class 0.000 description 5
- 239000011230 binding agent Substances 0.000 description 4
- 238000001179 sorption measurement Methods 0.000 description 4
- 239000004115 Sodium Silicate Substances 0.000 description 3
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 3
- 238000001035 drying Methods 0.000 description 3
- 229910052811 halogen oxide Inorganic materials 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 239000000843 powder Substances 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- 239000000377 silicon dioxide Substances 0.000 description 3
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 3
- 229910052911 sodium silicate Inorganic materials 0.000 description 3
- 229910052721 tungsten Inorganic materials 0.000 description 3
- 239000010937 tungsten Substances 0.000 description 3
- 239000002253 acid Substances 0.000 description 2
- 239000003463 adsorbent Substances 0.000 description 2
- 150000001341 alkaline earth metal compounds Chemical class 0.000 description 2
- OSGAYBCDTDRGGQ-UHFFFAOYSA-L calcium sulfate Chemical compound [Ca+2].[O-]S([O-])(=O)=O OSGAYBCDTDRGGQ-UHFFFAOYSA-L 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 235000014413 iron hydroxide Nutrition 0.000 description 2
- NCNCGGDMXMBVIA-UHFFFAOYSA-L iron(ii) hydroxide Chemical compound [OH-].[OH-].[Fe+2] NCNCGGDMXMBVIA-UHFFFAOYSA-L 0.000 description 2
- 239000004973 liquid crystal related substance Substances 0.000 description 2
- 239000011572 manganese Substances 0.000 description 2
- 150000007522 mineralic acids Chemical class 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- KZBUYRJDOAKODT-UHFFFAOYSA-N Chlorine Chemical compound ClCl KZBUYRJDOAKODT-UHFFFAOYSA-N 0.000 description 1
- PWHULOQIROXLJO-UHFFFAOYSA-N Manganese Chemical compound [Mn] PWHULOQIROXLJO-UHFFFAOYSA-N 0.000 description 1
- 229910021380 Manganese Chloride Inorganic materials 0.000 description 1
- GLFNIEUTAYBVOC-UHFFFAOYSA-L Manganese chloride Chemical compound Cl[Mn]Cl GLFNIEUTAYBVOC-UHFFFAOYSA-L 0.000 description 1
- 229910003691 SiBr Inorganic materials 0.000 description 1
- 229910003902 SiCl 4 Inorganic materials 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 230000032683 aging Effects 0.000 description 1
- ANBBXQWFNXMHLD-UHFFFAOYSA-N aluminum;sodium;oxygen(2-) Chemical compound [O-2].[O-2].[Na+].[Al+3] ANBBXQWFNXMHLD-UHFFFAOYSA-N 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 150000001768 cations Chemical class 0.000 description 1
- 238000010790 dilution Methods 0.000 description 1
- 239000012895 dilution Substances 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000003912 environmental pollution Methods 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 238000010304 firing Methods 0.000 description 1
- 238000005469 granulation Methods 0.000 description 1
- 230000003179 granulation Effects 0.000 description 1
- 230000026030 halogenation Effects 0.000 description 1
- 238000005658 halogenation reaction Methods 0.000 description 1
- 229910000856 hastalloy Inorganic materials 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 1
- 229910001026 inconel Inorganic materials 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 150000002505 iron Chemical class 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- FBAFATDZDUQKNH-UHFFFAOYSA-M iron chloride Chemical compound [Cl-].[Fe] FBAFATDZDUQKNH-UHFFFAOYSA-M 0.000 description 1
- 229910000358 iron sulfate Inorganic materials 0.000 description 1
- BAUYGSIQEAFULO-UHFFFAOYSA-L iron(2+) sulfate (anhydrous) Chemical compound [Fe+2].[O-]S([O-])(=O)=O BAUYGSIQEAFULO-UHFFFAOYSA-L 0.000 description 1
- 238000004898 kneading Methods 0.000 description 1
- 150000002696 manganese Chemical class 0.000 description 1
- 229910052748 manganese Inorganic materials 0.000 description 1
- 235000002867 manganese chloride Nutrition 0.000 description 1
- 239000011565 manganese chloride Substances 0.000 description 1
- 229940099607 manganese chloride Drugs 0.000 description 1
- IPJKJLXEVHOKSE-UHFFFAOYSA-L manganese dihydroxide Chemical compound [OH-].[OH-].[Mn+2] IPJKJLXEVHOKSE-UHFFFAOYSA-L 0.000 description 1
- 229940099596 manganese sulfate Drugs 0.000 description 1
- 235000007079 manganese sulphate Nutrition 0.000 description 1
- 239000011702 manganese sulphate Substances 0.000 description 1
- SQQMAOCOWKFBNP-UHFFFAOYSA-L manganese(II) sulfate Chemical compound [Mn+2].[O-]S([O-])(=O)=O SQQMAOCOWKFBNP-UHFFFAOYSA-L 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 239000008188 pellet Substances 0.000 description 1
- 239000002516 radical scavenger Substances 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 229910001388 sodium aluminate Inorganic materials 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Landscapes
- Treating Waste Gases (AREA)
- Solid-Sorbent Or Filter-Aiding Compositions (AREA)
Description
まず、ステンレス製カラム(内径72.5mm;断面積41cm2)に、後段(下層)の除去剤層としてバインダレスX型ゼオライト(東ソー株式会社製、ゼオラムF−9HA)を500ml充填した。次いで、前段(上層)の除去剤層として酸化鉄の成形体(ズードケミー触媒株式会社製、N−600F)を500ml充填した。この酸化鉄の成形体は、酸化鉄以外に、酸化マンガン、硫酸カルシウム、酸化ケイ素(シリカ)、酸化アルミニウム(アルミナ)等を含むものである。
その結果を表1に示す。
バインダレスX型ゼオライトの代わりに、バインダを含むX型ゼオライト(東ソー株式会社製、ゼオラムF−9)を用いた以外は、実施例1と同様にしてハロゲン系ガス(Cl2、BCl3)の吸着除去を行った。その結果を表1に示す。
Claims (3)
- 三塩化ホウ素および塩素を含むハロゲン系ガスを、前段に鉄化合物を含み、活性炭を含まない層を配置し、後段にバインダレスX型ゼオライトを含む層を配置した容器の中を流通させることで、鉄化合物と接触させ、次いでバインダレスX型ゼオライトと接触させることを特徴とするハロゲン系ガスの除去方法。
- 鉄化合物を含み、活性炭を含まない層が容器の上部に配置され、バインダレスX型ゼオライトを含む層が容器の下部に配置され、ハロゲン系ガスは容器の上部から導入され、容器の下部から導出される請求項1記載のハロゲン系ガスの除去方法。
- 鉄化合物を含み、活性炭を含まない層が容器の下部に配置され、バインダレスX型ゼオライトを含む層が容器の上部に配置され、ハロゲン系ガスは容器の下部から導入され、容器の上部から導出される請求項1記載のハロゲン系ガスの除去方法。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2010068146A JP5499816B2 (ja) | 2010-03-24 | 2010-03-24 | ハロゲン系ガスの除去方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2010068146A JP5499816B2 (ja) | 2010-03-24 | 2010-03-24 | ハロゲン系ガスの除去方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2011200750A JP2011200750A (ja) | 2011-10-13 |
JP5499816B2 true JP5499816B2 (ja) | 2014-05-21 |
Family
ID=44878064
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2010068146A Active JP5499816B2 (ja) | 2010-03-24 | 2010-03-24 | ハロゲン系ガスの除去方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP5499816B2 (ja) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5810950B2 (ja) * | 2012-02-06 | 2015-11-11 | 日産自動車株式会社 | ミクロポーラス炭素系材料の製造方法 |
KR101333220B1 (ko) * | 2012-03-05 | 2013-11-26 | (주) 리드제넥스 | 금속수산화물을 이용한 반도체 및 평판디스플레이 제조공정에서 발생하는 독성유해가스 제거용 흡착제 및 이의 제조방법 |
JP2015112545A (ja) * | 2013-12-12 | 2015-06-22 | 宇部興産株式会社 | ガスの処理装置及びガスの処理カートリッジ |
JP2016221428A (ja) * | 2015-05-28 | 2016-12-28 | 宇部興産株式会社 | ガスの処理装置及びガスの処理カートリッジ |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2581642B2 (ja) * | 1993-05-10 | 1997-02-12 | 宇部興産株式会社 | エッチング排ガス除害剤及び排ガス処理方法 |
JP3004204B2 (ja) * | 1996-02-22 | 2000-01-31 | 勇藏 森 | プラズマcvm排ガスの精製回収方法 |
JP3981206B2 (ja) * | 1997-06-20 | 2007-09-26 | 株式会社荏原製作所 | 無機ハロゲン化ガスを含有する排ガスの処理方法及び処理装置 |
JP3840877B2 (ja) * | 2000-05-26 | 2006-11-01 | 昭和電工株式会社 | ハロゲン系ガスの除害剤、除害方法及びその用途 |
JP5145904B2 (ja) * | 2007-02-21 | 2013-02-20 | 東ソー株式会社 | ハロゲン系ガスの除害剤及びそれを使用するハロゲン系ガスの除害方法 |
-
2010
- 2010-03-24 JP JP2010068146A patent/JP5499816B2/ja active Active
Also Published As
Publication number | Publication date |
---|---|
JP2011200750A (ja) | 2011-10-13 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
TWI406702B (zh) | 鹵素系氣體除害劑及使用其之鹵素系氣體之除害方法 | |
JP4648977B2 (ja) | 高温用途のハロゲン化物捕捉剤 | |
JP5499816B2 (ja) | ハロゲン系ガスの除去方法 | |
Dash et al. | Fluoride removal from aqueous solutions using cerium loaded mesoporous zirconium phosphate | |
TW201829049A (zh) | 鹵素氣體的去除劑、其製造方法、使用其的鹵素氣體去除方法以及去除鹵素氣體的系統 | |
JP2581642B2 (ja) | エッチング排ガス除害剤及び排ガス処理方法 | |
JP5309945B2 (ja) | ハロゲン系ガスの除害剤及びそれを使用するハロゲン系ガスの除害方法 | |
JP2010005542A (ja) | Pfc吸着剤及びそれを用いたpfc除害方法 | |
EP1967254B1 (en) | Use of a faujasite and method for the adsorption of halogen-containing gases | |
KR20140110145A (ko) | 복합흡착제 및 복합흡착제 제조방법 | |
JP2004351364A (ja) | 三フッ化塩素を含む無機ハロゲン化ガス含有排ガスの処理方法、処理剤及び処理装置 | |
JP2008505750A (ja) | アルカリ土類金属でイオン交換されたゼオライトを用いた三フッ化窒素ガスの精製方法 | |
US20230302431A1 (en) | Adsorbent | |
JP4873108B2 (ja) | 二酸化炭素の吸着分離方法 | |
KR101333220B1 (ko) | 금속수산화물을 이용한 반도체 및 평판디스플레이 제조공정에서 발생하는 독성유해가스 제거용 흡착제 및 이의 제조방법 | |
JP6006492B2 (ja) | 揮発性無機水素化物含有排ガス除害剤及び揮発性無機水素化物含有排ガス除害方法 | |
JP2010158620A (ja) | フッ素化合物を含有する排ガスの処理方法及び処理用反応槽 | |
JP4498183B2 (ja) | 塩化水素ガス吸収材および塩化水素ガスの除去方法 | |
JP2002018226A (ja) | 二酸化炭素の吸着分離方法 | |
KR20130102978A (ko) | 금속수산화물을 이용한 염소제거용 흡착제 및 이의 제조방법 | |
JP2019072686A (ja) | 水蒸気吸着材及びその製造方法 | |
JP2011194337A (ja) | ハイドロフルオロカーボン除去剤、およびハイドロフルオロカーボンの除去方法 | |
JPH0999216A (ja) | 有害ガスの浄化剤 | |
JP2015107450A (ja) | 二酸化炭素吸着剤 | |
JP3244728B2 (ja) | 気体分離濃縮用ゼオライトの製造方法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20121226 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20130606 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20130611 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20130809 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20140212 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20140225 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 5499816 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
S533 | Written request for registration of change of name |
Free format text: JAPANESE INTERMEDIATE CODE: R313533 |
|
R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |