JP5492509B2 - 基板移載方法及び半導体装置の製造方法及び基板処理装置及び搬送制御プログラム - Google Patents

基板移載方法及び半導体装置の製造方法及び基板処理装置及び搬送制御プログラム Download PDF

Info

Publication number
JP5492509B2
JP5492509B2 JP2009220418A JP2009220418A JP5492509B2 JP 5492509 B2 JP5492509 B2 JP 5492509B2 JP 2009220418 A JP2009220418 A JP 2009220418A JP 2009220418 A JP2009220418 A JP 2009220418A JP 5492509 B2 JP5492509 B2 JP 5492509B2
Authority
JP
Japan
Prior art keywords
substrate
transfer
transfer parameter
information
comparing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2009220418A
Other languages
English (en)
Japanese (ja)
Other versions
JP2011071271A (ja
JP2011071271A5 (enExample
Inventor
仁 関原
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kokusai Denki Electric Inc
Original Assignee
Hitachi Kokusai Electric Inc
Kokusai Denki Electric Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Kokusai Electric Inc, Kokusai Denki Electric Inc filed Critical Hitachi Kokusai Electric Inc
Priority to JP2009220418A priority Critical patent/JP5492509B2/ja
Publication of JP2011071271A publication Critical patent/JP2011071271A/ja
Publication of JP2011071271A5 publication Critical patent/JP2011071271A5/ja
Application granted granted Critical
Publication of JP5492509B2 publication Critical patent/JP5492509B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Landscapes

  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
JP2009220418A 2009-09-25 2009-09-25 基板移載方法及び半導体装置の製造方法及び基板処理装置及び搬送制御プログラム Active JP5492509B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2009220418A JP5492509B2 (ja) 2009-09-25 2009-09-25 基板移載方法及び半導体装置の製造方法及び基板処理装置及び搬送制御プログラム

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2009220418A JP5492509B2 (ja) 2009-09-25 2009-09-25 基板移載方法及び半導体装置の製造方法及び基板処理装置及び搬送制御プログラム

Publications (3)

Publication Number Publication Date
JP2011071271A JP2011071271A (ja) 2011-04-07
JP2011071271A5 JP2011071271A5 (enExample) 2012-10-18
JP5492509B2 true JP5492509B2 (ja) 2014-05-14

Family

ID=44016266

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2009220418A Active JP5492509B2 (ja) 2009-09-25 2009-09-25 基板移載方法及び半導体装置の製造方法及び基板処理装置及び搬送制御プログラム

Country Status (1)

Country Link
JP (1) JP5492509B2 (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6572854B2 (ja) * 2016-09-09 2019-09-11 株式会社ダイフク 容器収納設備
US11121014B2 (en) * 2018-06-05 2021-09-14 Asm Ip Holding B.V. Dummy wafer storage cassette
JP7157786B2 (ja) * 2020-09-23 2022-10-20 株式会社Ｓｃｒｅｅｎホールディングス 基板処理装置および基板処理方法

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2829367B2 (ja) * 1996-03-08 1998-11-25 国際電気株式会社 ウェーハ移載方法

Also Published As

Publication number Publication date
JP2011071271A (ja) 2011-04-07

Similar Documents

Publication Publication Date Title
CN102760673B (zh) 基板处理装置及其异常显示方法、参数设定方法
JP6186000B2 (ja) 基板処理装置のメンテナンス方法、半導体装置の製造方法、基板処理装置、及び基板処理装置のメンテナンスプログラム
TWI448848B (zh) 基板處理裝置、基板處理裝置的異常顯示方法及搬運控制方法
JP5433714B2 (ja) 基板処理装置、基板処理方法、半導体装置の製造方法及びレシピ遷移表示方法
JP6545396B2 (ja) 基板処理装置、振動検出システム及びプログラム
CN104253073A (zh) 衬底处理装置、半导体器件的制造方法及流量监视方法
US20240087929A1 (en) Method of Manufacturing Semiconductor Device and Non-transitory Computer-readable Recording Medium
JPWO2014115643A1 (ja) 基板処理装置の異常判定方法、異常判定装置、及び基板処理システム並びに記録媒体
JP5492509B2 (ja) 基板移載方法及び半導体装置の製造方法及び基板処理装置及び搬送制御プログラム
KR102206194B1 (ko) 기판 처리 장치 및 반도체 장치의 제조 방법
US20220100176A1 (en) Substrate processing apparatus, method of manufacturing semiconductor device, and recording medium
JP2011243677A (ja) 基板処理装置
JPWO2018154829A1 (ja) 基板処理装置、半導体装置の製造方法及びプログラム
JP2017002353A (ja) 基板処理装置及び半導体装置の製造方法
JP5921859B2 (ja) 基板処理システム及び制御装置及びプログラム及び半導体装置の製造方法
JP2013055239A (ja) 基板処理装置
JP5142353B2 (ja) 基板処理装置、基板処理装置の異常検出方法、基板処理システム、基板処理装置の異常検出プログラム及び半導体装置の製造方法
CN110323154A (zh) 基板处理装置、控制系统及半导体器件的制造方法
JP6990297B2 (ja) 部品の診断方法、半導体装置の製造方法、基板処理装置、及びプログラム
JP5474384B2 (ja) 基板処理システム及び基板処理装置及び通信制御プログラム及び基板処理装置のメッセージ処理方法
JP2011171648A (ja) 基板処理システム
JP2012104700A (ja) 基板処理システム
JP2012104699A (ja) 基板処理装置
JP2008078351A (ja) 基板処理システム
JP2011204865A (ja) 基板処理装置

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20120903

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20120903

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20130821

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20130827

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20131025

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20140218

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20140303

R150 Certificate of patent or registration of utility model

Ref document number: 5492509

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

S531 Written request for registration of change of domicile

Free format text: JAPANESE INTERMEDIATE CODE: R313531

R350 Written notification of registration of transfer

Free format text: JAPANESE INTERMEDIATE CODE: R350

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

S111 Request for change of ownership or part of ownership

Free format text: JAPANESE INTERMEDIATE CODE: R313111

R350 Written notification of registration of transfer

Free format text: JAPANESE INTERMEDIATE CODE: R350

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250