JP5458486B2 - アレイ基板、表示装置、及びその製造方法 - Google Patents

アレイ基板、表示装置、及びその製造方法 Download PDF

Info

Publication number
JP5458486B2
JP5458486B2 JP2007270090A JP2007270090A JP5458486B2 JP 5458486 B2 JP5458486 B2 JP 5458486B2 JP 2007270090 A JP2007270090 A JP 2007270090A JP 2007270090 A JP2007270090 A JP 2007270090A JP 5458486 B2 JP5458486 B2 JP 5458486B2
Authority
JP
Japan
Prior art keywords
film
thin film
resist
conductive film
forming
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2007270090A
Other languages
English (en)
Japanese (ja)
Other versions
JP2008152236A (ja
Inventor
雄一 升谷
茂昭 野海
武志 島村
理 青木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP2007270090A priority Critical patent/JP5458486B2/ja
Priority to TW096143429A priority patent/TW200832719A/zh
Priority to US11/943,976 priority patent/US9645457B2/en
Priority to KR1020070119535A priority patent/KR20080046604A/ko
Publication of JP2008152236A publication Critical patent/JP2008152236A/ja
Application granted granted Critical
Publication of JP5458486B2 publication Critical patent/JP5458486B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1343Electrodes
    • G02F1/13439Electrodes characterised by their electrical, optical, physical properties; materials therefor; method of making
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1345Conductors connecting electrodes to cell terminals
    • G02F1/13454Drivers integrated on the active matrix substrate
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362Active matrix addressed cells
    • G02F1/136286Wiring, e.g. gate line, drain line
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F2201/00Constructional arrangements not provided for in groups G02F1/00 - G02F7/00
    • G02F2201/48Flattening arrangements

Landscapes

  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Optics & Photonics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Mathematical Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Liquid Crystal (AREA)
  • Thin Film Transistor (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
JP2007270090A 2006-11-22 2007-10-17 アレイ基板、表示装置、及びその製造方法 Active JP5458486B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2007270090A JP5458486B2 (ja) 2006-11-22 2007-10-17 アレイ基板、表示装置、及びその製造方法
TW096143429A TW200832719A (en) 2006-11-22 2007-11-16 Array substrae, display device, and method for manufacturing the array substrate
US11/943,976 US9645457B2 (en) 2006-11-22 2007-11-21 Array substrate, display device, and method for manufacturing the array substrate
KR1020070119535A KR20080046604A (ko) 2006-11-22 2007-11-22 어레이 기판, 표시장치 및 그 제조 방법

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2006315579 2006-11-22
JP2006315579 2006-11-22
JP2007270090A JP5458486B2 (ja) 2006-11-22 2007-10-17 アレイ基板、表示装置、及びその製造方法

Publications (2)

Publication Number Publication Date
JP2008152236A JP2008152236A (ja) 2008-07-03
JP5458486B2 true JP5458486B2 (ja) 2014-04-02

Family

ID=39517343

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007270090A Active JP5458486B2 (ja) 2006-11-22 2007-10-17 アレイ基板、表示装置、及びその製造方法

Country Status (4)

Country Link
JP (1) JP5458486B2 (zh)
KR (1) KR20080046604A (zh)
CN (1) CN101202286A (zh)
TW (1) TW200832719A (zh)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2010047288A1 (en) * 2008-10-24 2010-04-29 Semiconductor Energy Laboratory Co., Ltd. Method for manufacturing semiconductordevice
JP5339356B2 (ja) * 2009-04-03 2013-11-13 パナソニック液晶ディスプレイ株式会社 表示装置
JP5594084B2 (ja) * 2010-11-19 2014-09-24 セイコーエプソン株式会社 電気光学装置及び電子機器
TWI419097B (zh) * 2011-01-11 2013-12-11 E Ink Holdings Inc 顯示器
JP5950638B2 (ja) 2012-03-12 2016-07-13 三菱電機株式会社 配線構造及びそれを備える薄膜トランジスタアレイ基板並びに表示装置

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4264675B2 (ja) * 1998-08-17 2009-05-20 栄 田中 液晶表示装置とその製造方法
JP2002141512A (ja) * 2000-11-06 2002-05-17 Advanced Display Inc 薄膜のパターニング方法およびそれを用いたtftアレイ基板およびその製造方法
JP4675504B2 (ja) * 2001-06-20 2011-04-27 ルネサスエレクトロニクス株式会社 マスクパターンの設計方法
JP3783707B2 (ja) * 2003-03-19 2006-06-07 セイコーエプソン株式会社 検査素子付基板並びに電気光学装置用基板及び電気光学装置及び電子機器
US8064003B2 (en) * 2003-11-28 2011-11-22 Tadahiro Ohmi Thin film transistor integrated circuit device, active matrix display device, and manufacturing methods of the same
JP4802462B2 (ja) * 2004-07-27 2011-10-26 三菱電機株式会社 薄膜トランジスタアレイ基板の製造方法
JP4096933B2 (ja) * 2004-09-30 2008-06-04 セイコーエプソン株式会社 パターンの形成方法
JP3922280B2 (ja) * 2004-09-30 2007-05-30 セイコーエプソン株式会社 配線パターンの形成方法及びデバイスの製造方法
JP4805587B2 (ja) * 2005-02-24 2011-11-02 エーユー オプトロニクス コーポレイション 液晶表示装置とその製造方法
KR101190045B1 (ko) * 2005-12-21 2012-10-12 엘지디스플레이 주식회사 포토 마스크 및 이를 이용한 액정표시장치용 어레이 기판의제조 방법

Also Published As

Publication number Publication date
KR20080046604A (ko) 2008-05-27
TW200832719A (en) 2008-08-01
JP2008152236A (ja) 2008-07-03
CN101202286A (zh) 2008-06-18

Similar Documents

Publication Publication Date Title
JP4469004B2 (ja) 液晶ディスプレイ装置用アレー基板及びその製造方法
KR101258903B1 (ko) 액정표시장치 및 액정표시장치 제조방법
US8426229B2 (en) Method of fabricating liquid crystal display device
US8405788B2 (en) TFT-LCD array substrate and manufacturing method thereof
JP2004341550A (ja) 液晶表示装置および液晶表示装置の製造方法
KR20060044861A (ko) 액정표시장치와 그 제조방법
KR20080010522A (ko) 표시 기판의 제조 방법, 표시 기판 및 마스크
KR100660531B1 (ko) 반사투과 복합형 박막트랜지스터 액정표시장치
JP4578402B2 (ja) 薄膜トランジスタ基板及びその製造方法
KR100886241B1 (ko) 액정표시소자의 제조방법
JP2009128397A (ja) 液晶表示装置及びその製造方法
JP5458486B2 (ja) アレイ基板、表示装置、及びその製造方法
KR20120099009A (ko) Mofet을 위한 마스크 레벨 감소
US7799621B2 (en) Method of manufacturing thin film transistor array substrate and display device
CN100485470C (zh) 液晶显示器及其制造方法
KR20020072228A (ko) 액티브 매트릭스 기판 및 그의 제조방법
KR100558714B1 (ko) 액정표시패널 및 그 제조 방법
JP2006078643A (ja) 半透過型液晶表示装置およびその製造方法
KR20170037074A (ko) 표시 장치 및 이의 제조 방법
KR20030056531A (ko) 액정표시장치의 제조방법
CN114551349A (zh) 阵列基板的制备方法、阵列基板以及显示装置
JP2004157151A (ja) 表示装置用マトリクス基板およびその製造方法
US9645457B2 (en) Array substrate, display device, and method for manufacturing the array substrate
KR100583313B1 (ko) 액정표시장치 및 그 제조 방법
KR100330097B1 (ko) 액정표시장치용박막트랜지스터기판및그제조방법

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20100913

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20130318

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20130326

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20130509

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20131217

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20131230

R151 Written notification of patent or utility model registration

Ref document number: 5458486

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R151

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250