JP5382257B1 - 金属板、金属板の製造方法、および金属板を用いて蒸着マスクを製造する方法 - Google Patents

金属板、金属板の製造方法、および金属板を用いて蒸着マスクを製造する方法 Download PDF

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Publication number
JP5382257B1
JP5382257B1 JP2013153920A JP2013153920A JP5382257B1 JP 5382257 B1 JP5382257 B1 JP 5382257B1 JP 2013153920 A JP2013153920 A JP 2013153920A JP 2013153920 A JP2013153920 A JP 2013153920A JP 5382257 B1 JP5382257 B1 JP 5382257B1
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Prior art keywords
metal plate
vapor deposition
sample
deposition mask
etched
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Japanese (ja)
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JP2014148740A (ja
Inventor
永 知加雄 池
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Dai Nippon Printing Co Ltd
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Dai Nippon Printing Co Ltd
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Priority to JP2013153920A priority Critical patent/JP5382257B1/ja
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Priority to PCT/JP2014/050346 priority patent/WO2014109394A1/ja
Priority to KR1020177020095A priority patent/KR102087056B1/ko
Priority to CN201911326369.0A priority patent/CN110938798A/zh
Priority to KR1020157009821A priority patent/KR101761494B1/ko
Priority to CN201711267436.7A priority patent/CN107858644A/zh
Priority to CN201480003438.3A priority patent/CN104838037B/zh
Priority to CN201711267429.7A priority patent/CN108048793B/zh
Publication of JP2014148740A publication Critical patent/JP2014148740A/ja
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B21—MECHANICAL METAL-WORKING WITHOUT ESSENTIALLY REMOVING MATERIAL; PUNCHING METAL
    • B21B—ROLLING OF METAL
    • B21B1/00—Metal-rolling methods or mills for making semi-finished products of solid or profiled cross-section; Sequence of operations in milling trains; Layout of rolling-mill plant, e.g. grouping of stands; Succession of passes or of sectional pass alternations
    • B21B1/22—Metal-rolling methods or mills for making semi-finished products of solid or profiled cross-section; Sequence of operations in milling trains; Layout of rolling-mill plant, e.g. grouping of stands; Succession of passes or of sectional pass alternations for rolling plates, strips, bands or sheets of indefinite length
    • C—CHEMISTRY; METALLURGY
    • C21—METALLURGY OF IRON
    • C21D—MODIFYING THE PHYSICAL STRUCTURE OF FERROUS METALS; GENERAL DEVICES FOR HEAT TREATMENT OF FERROUS OR NON-FERROUS METALS OR ALLOYS; MAKING METAL MALLEABLE, e.g. BY DECARBURISATION OR TEMPERING
    • C21D1/00—General methods or devices for heat treatment, e.g. annealing, hardening, quenching or tempering
    • C21D1/26—Methods of annealing
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/042—Coating on selected surface areas, e.g. using masks using masks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/58—After-treatment
    • C23C14/5806—Thermal treatment
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C23F1/02—Local etching
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C23F1/02—Local etching
    • C23F1/04—Chemical milling
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C23F1/10—Etching compositions
    • C23F1/14—Aqueous compositions
    • C23F1/16—Acidic compositions
    • C23F1/28—Acidic compositions for etching iron group metals
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10—Deposition of organic active material
    • H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
    • H10K71/166—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using selective deposition, e.g. using a mask
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/40—Thermal treatment, e.g. annealing in the presence of a solvent vapour

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Electroluminescent Light Sources (AREA)
  • Physical Vapour Deposition (AREA)
JP2013153920A 2013-01-10 2013-07-24 金属板、金属板の製造方法、および金属板を用いて蒸着マスクを製造する方法 Active JP5382257B1 (ja)

Priority Applications (8)

Application Number Priority Date Filing Date Title
JP2013153920A JP5382257B1 (ja) 2013-01-10 2013-07-24 金属板、金属板の製造方法、および金属板を用いて蒸着マスクを製造する方法
CN201711267429.7A CN108048793B (zh) 2013-01-10 2014-01-10 金属板、金属板的制造方法、和使用金属板制造蒸镀掩模的方法
CN201480003438.3A CN104838037B (zh) 2013-01-10 2014-01-10 金属板、金属板的制造方法、和使用金属板制造蒸镀掩模的方法
KR1020177020095A KR102087056B1 (ko) 2013-01-10 2014-01-10 금속판, 금속판의 제조 방법, 및 금속판을 사용해서 증착 마스크를 제조하는 방법
PCT/JP2014/050346 WO2014109394A1 (ja) 2013-01-10 2014-01-10 金属板、金属板の製造方法、および金属板を用いて蒸着マスクを製造する方法
CN201911326369.0A CN110938798A (zh) 2013-01-10 2014-01-10 蒸镀掩模的制造方法
KR1020157009821A KR101761494B1 (ko) 2013-01-10 2014-01-10 금속판, 금속판의 제조 방법, 및 금속판을 사용해서 증착 마스크를 제조하는 방법
CN201711267436.7A CN107858644A (zh) 2013-01-10 2014-01-10 金属板、金属板的制造方法、和使用金属板制造蒸镀掩模的方法

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2013002924 2013-01-10
JP2013002924 2013-01-10
JP2013153920A JP5382257B1 (ja) 2013-01-10 2013-07-24 金属板、金属板の製造方法、および金属板を用いて蒸着マスクを製造する方法

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JP5382257B1 true JP5382257B1 (ja) 2014-01-08
JP2014148740A JP2014148740A (ja) 2014-08-21

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JP2013153920A Active JP5382257B1 (ja) 2013-01-10 2013-07-24 金属板、金属板の製造方法、および金属板を用いて蒸着マスクを製造する方法

Country Status (4)

Country Link
JP (1) JP5382257B1 (ko)
KR (2) KR102087056B1 (ko)
CN (4) CN104838037B (ko)
WO (1) WO2014109394A1 (ko)

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5641462B1 (ja) * 2014-05-13 2014-12-17 大日本印刷株式会社 金属板、金属板の製造方法、および金属板を用いてマスクを製造する方法
JP2015151579A (ja) * 2014-02-14 2015-08-24 大日本印刷株式会社 蒸着マスク装置の製造方法、基板付蒸着マスクおよび積層体
KR101603200B1 (ko) * 2015-04-24 2016-03-14 엘지이노텍 주식회사 금속기판 및 이를 이용한 증착용마스크
JP2018513918A (ja) * 2015-04-24 2018-05-31 エルジー イノテック カンパニー リミテッド 金属基板およびこれを用いた蒸着用マスク
US10233546B2 (en) 2013-09-13 2019-03-19 Dai Nippon Printing Co., Ltd. Metal plate, method of manufacturing metal plate, and method of manufacturing mask by use of metal plate
JP2019151936A (ja) * 2019-06-11 2019-09-12 大日本印刷株式会社 蒸着マスク装置の製造方法、基板付蒸着マスクおよび積層体
US10570498B2 (en) 2015-02-10 2020-02-25 Dai Nippon Printing Co., Ltd. Manufacturing method for deposition mask, metal plate used for producing deposition mask, and manufacturing method for said metal sheet
CN113005399A (zh) * 2021-02-23 2021-06-22 合肥鑫晟光电科技有限公司 掩膜板的制作方法及掩膜板
US11486031B2 (en) 2013-10-15 2022-11-01 Dai Nippon Printing Co., Ltd. Metal plate

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CN110144547B (zh) * 2016-04-14 2021-06-01 凸版印刷株式会社 蒸镀掩模用基材、蒸镀掩模用基材的制造方法及蒸镀掩模的制造方法
KR102624714B1 (ko) 2016-09-12 2024-01-12 삼성디스플레이 주식회사 마스크 및 이를 포함하는 마스크 조립체의 제조방법
CN109689921A (zh) * 2016-09-14 2019-04-26 夏普株式会社 掩模片、蒸镀掩模、显示面板的制造方法
EP3521482A4 (en) * 2016-09-29 2020-08-12 Dai Nippon Printing Co., Ltd. VAPOR DEPOSIT MASK PACKAGING AND VAPOR DEPOSIT MASK PACKAGING PROCESS
EP3524710B8 (en) * 2016-10-07 2024-01-24 Dai Nippon Printing Co., Ltd. Method of manufacturing deposition mask, intermediate product to which deposition mask is allocated, and deposition mask
US11220736B2 (en) * 2016-11-18 2022-01-11 Dai Nippon Printing Co., Ltd. Deposition mask
JP7121918B2 (ja) * 2016-12-14 2022-08-19 大日本印刷株式会社 蒸着マスク装置及び蒸着マスク装置の製造方法
JP6851820B2 (ja) * 2016-12-28 2021-03-31 マクセルホールディングス株式会社 蒸着用マスク並びにその設置方法及び製造方法
KR102333411B1 (ko) * 2017-01-10 2021-12-02 다이니폰 인사츠 가부시키가이샤 증착 마스크, 증착 마스크 장치의 제조 방법 및 증착 마스크의 제조 방법
CN110578119A (zh) * 2018-06-08 2019-12-17 大日本印刷株式会社 金属板、卷绕体及其梱包方法和保管方法、梱包体、蒸镀掩模的制造方法
JP7137793B2 (ja) * 2018-07-09 2022-09-15 大日本印刷株式会社 蒸着マスクの良否判定方法、蒸着マスクの製造方法、蒸着マスク装置の製造方法、蒸着マスクの選定方法および蒸着マスク
KR20210049888A (ko) * 2018-09-27 2021-05-06 닛테츠 케미컬 앤드 머티리얼 가부시키가이샤 메탈 마스크 재료 및 그의 제조 방법과 메탈 마스크
CN111254386A (zh) * 2020-03-26 2020-06-09 昆山国显光电有限公司 掩膜条及掩膜板
WO2022092848A1 (ko) * 2020-10-30 2022-05-05 에이피에스홀딩스 주식회사 증착 마스크
KR20220069397A (ko) * 2020-11-20 2022-05-27 엘지이노텍 주식회사 Oled 화소 증착을 위한 증착용 마스크

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