JP5379116B2 - 発光素子、発光素子パッケージ及び照明システム - Google Patents
発光素子、発光素子パッケージ及び照明システム Download PDFInfo
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/36—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/44—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the coatings, e.g. passivation layer or anti-reflective coating
- H01L33/46—Reflective coating, e.g. dielectric Bragg reflector
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/02—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
- H01L33/14—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a carrier transport control structure, e.g. highly-doped semiconductor layer or current-blocking structure
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/36—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes
- H01L33/38—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes with a particular shape
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/36—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes
- H01L33/40—Materials therefor
- H01L33/42—Transparent materials
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/4805—Shape
- H01L2224/4809—Loop shape
- H01L2224/48091—Arched
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/11—Device type
- H01L2924/12—Passive devices, e.g. 2 terminal devices
- H01L2924/1203—Rectifying Diode
- H01L2924/12032—Schottky diode
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2933/00—Details relating to devices covered by the group H01L33/00 but not provided for in its subgroups
- H01L2933/0008—Processes
- H01L2933/0016—Processes relating to electrodes
Description
30 活性層
40 第2導電型の半導体層
50 発光構造層
60 透明伝導層
61 第1の透明伝導層
62 第2の透明伝導層
70 反射層
80 導電性支持層
90 電極
Claims (15)
- 導電性支持層と、
前記導電性支持層上に形成され、第1電気伝導性を有する第1の透明伝導層及び前記第1電気伝導性よりも低い第2電気伝導性を有する第2の透明伝導層を含む透明伝導層と、
前記透明伝導層上に形成され、第1導電型の半導体層、第2導電型の半導体層及び前記第1導電型の半導体層と前記第2導電型の半導体層の間の活性層を含む発光構造層と、
前記透明伝導層と導電性支持層との間に介在する反射層と、
前記発光構造層上に形成され、前記第2の透明伝導層と垂直方向にオーバーラップする領域に少なくとも一部分が配置される電極と、を含み、
前記第1の透明伝導層は、前記発光構造層の中央部で前記第1導電型の半導体層が露出するように、前記発光構造層の下面周辺部で面接触し、
前記第2の透明伝導層は、前記発光構造層の中央部に露出した第1導電型の半導体層と前記第1の透明伝導層と接触し、
前記反射層は、前記発光構造層の中央部で前記第2の透明伝導層と接触するとともに、前記発光構造層の周辺部では第1の透明伝導層と接触する発光素子。 - 前記第1の透明伝導層は第1仕事関数を有し、前記第2の透明伝導層は第1仕事関数よりも小さい第2仕事関数を有する請求項1に記載の発光素子。
- 前記第1の透明伝導層は前記発光構造層とオーミック接触領域を形成し、前記第2の透明伝導層は前記発光構造層とショットキー接触領域を形成する請求項1に記載の発光素子。
- 前記透明伝導層は、50%以上の光透過率を有し、10Ω/sq以下の面抵抗を有する物質を含む請求項1に記載の発光素子。
- 前記透明伝導層は、透明伝導酸化物、透明伝導窒化物、透明伝導酸化窒化物のうち少なくとも何れか一つを含む請求項1に記載の発光素子。
- 前記透明伝導酸化物は、ITO、ZnO、AZO、IZO、ATO、ZITO、Sn‐O、In‐O、Ga‐Oのうち何れか一つであり、前記透明伝導窒化物は、TiN、CrN、TaN、In‐Nのうち少なくとも何れか一つであり、前記透明伝導酸化窒化物は、ITON、ZnON、O‐In‐N、IZONのうち何れか一つである請求項5に記載の発光素子。
- 前記第1の透明伝導層と前記第2の透明伝導層は互いに異なる物質で形成される請求項1に記載の発光素子。
- 本体と、
前記本体上の第1の電極層及び第2の電極層と、
前記本体上に設けられ、前記第1の電極層及び第2の電極層と電気的に接続される発光素子と、
前記本体上の前記発光素子を取り囲むモールディング部材と、
を含む発光素子パッケージであって、
前記発光素子は、
導電性支持層と、
前記導電性支持層上に形成され、第1電気伝導性を有する第1の透明伝導層及び前記第1電気伝導性よりも低い第2電気伝導性を有する第2の透明伝導層を含む透明伝導層と、
前記透明伝導層上に形成され、第1導電型の半導体層、第2導電型の半導体層及び前記第1導電型の半導体層と前記第2導電型の半導体層の間の活性層を含む発光構造層と、
前記透明伝導層と導電性支持層との間に介在する反射層と、
前記発光構造層上に形成され、前記第2の透明伝導層と垂直方向にオーバーラップする領域に少なくとも一部が配置される電極と、を含み、
前記第1の透明伝導層は、前記発光構造層の中央部で前記第1導電型の半導体層が露出するように、前記発光構造層の下面周辺部で面接触し、
前記第2の透明伝導層は、前記発光構造層の中央部に露出した第1導電型の半導体層と前記第1の透明伝導層と接触し、
前記反射層は、前記発光構造層の中央部で前記第2の透明伝導層と接触するとともに、前記発光構造層の周辺部では第1の透明伝導層と接触する発光素子パッケージ。 - 前記第1の透明伝導層は第1仕事関数を有し、前記第2の透明伝導層は第1仕事関数よりも小さい第2仕事関数を有する請求項8に記載の発光素子パッケージ。
- 前記第1の透明伝導層は前記発光構造層とオーミック接触領域を形成し、前記第2の透明伝導層は前記発光構造層とショットキー接触領域を形成する請求項8に記載の発光素子パッケージ。
- 前記透明伝導層は、50%以上の光透過率を有し、10Ω/sq以下の面抵抗を有する物質を含む請求項8に記載の発光素子パッケージ。
- 前記透明伝導層は、透明伝導酸化物、透明伝導窒化物、透明伝導酸化窒化物のうち少なくとも何れか一つを含む請求項8に記載の発光素子パッケージ。
- 前記透明伝導酸化物は、ITO、ZnO、AZO、IZO、ATO、ZITO、Sn‐O、In‐O、Ga‐Oのうち何れか一つであり、前記透明伝導窒化物は、TiN、CrN、TaN、In‐Nのうち少なくとも何れか一つであり、前記透明伝導酸化窒化物は、ITON、ZnON、O‐In‐N、IZONのうち何れか一つである請求項8に記載の発光素子パッケージ。
- 前記第1の透明伝導層と前記第2の透明伝導層は互いに異なる物質で形成される請求項8に記載の発光素子パッケージ。
- 発光素子を光源として使用する照明システムであり、
基板と、
前記基板上に設けられた少なくとも一つの発光素子と、
を含み、
前記発光素子は、
導電性支持層と、
前記導電性支持層上に形成され、第1電気伝導性を有する第1の透明伝導層及び前記第1電気伝導性よりも低い第2電気伝導性を有する第2の透明伝導層を含む透明伝導層と、
前記透明伝導層上に形成され、第1導電型の半導体層、第2導電型の半導体層及び第1導電型の半導体層と第2導電型の半導体層の間の活性層を含む発光構造層と、
前記透明伝導層と導電性支持層との間に介在する反射層と、
前記発光構造層上に形成され、第2の透明伝導層と垂直方向にオーバーラップする領域に少なくとも一部が配置される電極と、を含み、
前記第1の透明伝導層は、前記発光構造層の中央部で前記第1導電型の半導体層が露出するように、前記発光構造層の下面周辺部で面接触し、
前記第2の透明伝導層は、前記発光構造層の中央部に露出した第1導電型の半導体層と前記第1の透明伝導層と接触し、
前記反射層は、前記発光構造層の中央部で前記第2の透明伝導層と接触するとともに、前記発光構造層の周辺部では第1の透明伝導層と接触する照明システム。
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US20140110734A1 (en) | 2014-04-24 |
JP2011129921A (ja) | 2011-06-30 |
CN102130104B (zh) | 2013-10-23 |
KR101020945B1 (ko) | 2011-03-09 |
US9166113B2 (en) | 2015-10-20 |
EP2337098B1 (en) | 2019-06-19 |
JP5882276B2 (ja) | 2016-03-09 |
JP2016129235A (ja) | 2016-07-14 |
US8564738B2 (en) | 2013-10-22 |
US8102484B2 (en) | 2012-01-24 |
EP2337098A2 (en) | 2011-06-22 |
EP2337098A3 (en) | 2014-06-18 |
CN102130104A (zh) | 2011-07-20 |
JP2013254991A (ja) | 2013-12-19 |
JP6267245B2 (ja) | 2018-01-24 |
US20110147780A1 (en) | 2011-06-23 |
US20120091492A1 (en) | 2012-04-19 |
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