JP5339342B2 - 表示装置の修正方法およびその装置 - Google Patents

表示装置の修正方法およびその装置 Download PDF

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Publication number
JP5339342B2
JP5339342B2 JP2008247112A JP2008247112A JP5339342B2 JP 5339342 B2 JP5339342 B2 JP 5339342B2 JP 2008247112 A JP2008247112 A JP 2008247112A JP 2008247112 A JP2008247112 A JP 2008247112A JP 5339342 B2 JP5339342 B2 JP 5339342B2
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Japan
Prior art keywords
plasma
gas
defect
display device
substrate
Prior art date
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Active
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JP2008247112A
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English (en)
Japanese (ja)
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JP2010078899A (ja
JP2010078899A5 (cg-RX-API-DMAC7.html
Inventor
武 新井
信昭 中須
理夫 枝村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Liquid Crystal Display Co Ltd
Japan Display Inc
Original Assignee
Panasonic Liquid Crystal Display Co Ltd
Japan Display Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Panasonic Liquid Crystal Display Co Ltd, Japan Display Inc filed Critical Panasonic Liquid Crystal Display Co Ltd
Priority to JP2008247112A priority Critical patent/JP5339342B2/ja
Priority to US12/507,826 priority patent/US9063356B2/en
Priority to CN2009101616448A priority patent/CN101667527B/zh
Publication of JP2010078899A publication Critical patent/JP2010078899A/ja
Publication of JP2010078899A5 publication Critical patent/JP2010078899A5/ja
Application granted granted Critical
Publication of JP5339342B2 publication Critical patent/JP5339342B2/ja
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  • Liquid Crystal (AREA)
  • Chemical Vapour Deposition (AREA)
  • Drying Of Semiconductors (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Thin Film Transistor (AREA)
JP2008247112A 2008-09-05 2008-09-26 表示装置の修正方法およびその装置 Active JP5339342B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2008247112A JP5339342B2 (ja) 2008-09-26 2008-09-26 表示装置の修正方法およびその装置
US12/507,826 US9063356B2 (en) 2008-09-05 2009-07-23 Method for repairing display device and apparatus for same
CN2009101616448A CN101667527B (zh) 2008-09-05 2009-07-24 显示装置的修正方法及其装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2008247112A JP5339342B2 (ja) 2008-09-26 2008-09-26 表示装置の修正方法およびその装置

Publications (3)

Publication Number Publication Date
JP2010078899A JP2010078899A (ja) 2010-04-08
JP2010078899A5 JP2010078899A5 (cg-RX-API-DMAC7.html) 2011-04-14
JP5339342B2 true JP5339342B2 (ja) 2013-11-13

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JP2008247112A Active JP5339342B2 (ja) 2008-09-05 2008-09-26 表示装置の修正方法およびその装置

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JP (1) JP5339342B2 (cg-RX-API-DMAC7.html)

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0866652A (ja) * 1994-06-22 1996-03-12 Hitachi Ltd 液体材料微量供給装置とそれを使用するパターン修正方法
JP2000096248A (ja) * 1998-09-22 2000-04-04 Komatsu Ltd 表面処理装置および表面処理方法
US6660177B2 (en) * 2001-11-07 2003-12-09 Rapt Industries Inc. Apparatus and method for reactive atom plasma processing for material deposition
US7323080B2 (en) * 2004-05-04 2008-01-29 Semes Co., Ltd. Apparatus for treating substrate
JP4688525B2 (ja) * 2004-09-27 2011-05-25 株式会社 日立ディスプレイズ パターン修正装置および表示装置の製造方法
JP2010059509A (ja) * 2008-09-05 2010-03-18 Hitachi Displays Ltd 成膜または表面処理装置および方法

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Publication number Publication date
JP2010078899A (ja) 2010-04-08

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