JP5331200B2 - セリウム系研摩材の再生方法 - Google Patents

セリウム系研摩材の再生方法 Download PDF

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Publication number
JP5331200B2
JP5331200B2 JP2011512740A JP2011512740A JP5331200B2 JP 5331200 B2 JP5331200 B2 JP 5331200B2 JP 2011512740 A JP2011512740 A JP 2011512740A JP 2011512740 A JP2011512740 A JP 2011512740A JP 5331200 B2 JP5331200 B2 JP 5331200B2
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JP
Japan
Prior art keywords
abrasive
cerium
acid
slurry
based abrasive
Prior art date
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Active
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JP2011512740A
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English (en)
Japanese (ja)
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JPWO2011099596A1 (ja
Inventor
純和 尾形
佳 大貫
克彦 林
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsui Mining and Smelting Co Ltd
Original Assignee
Mitsui Mining and Smelting Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
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Priority to JP2011512740A priority Critical patent/JP5331200B2/ja
Publication of JPWO2011099596A1 publication Critical patent/JPWO2011099596A1/ja
Application granted granted Critical
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Classifications

    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09KMATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00Materials not provided for elsewhere
    • C09K3/14Anti-slip materials; Abrasives
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09KMATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00Materials not provided for elsewhere
    • C09K3/14Anti-slip materials; Abrasives
    • C09K3/1454Abrasive powders, suspensions and pastes for polishing
    • C09K3/1463Aqueous liquid suspensions
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B57/00Devices for feeding, applying, grading or recovering grinding, polishing or lapping agents
    • B24B57/02Devices for feeding, applying, grading or recovering grinding, polishing or lapping agents for feeding of fluid, sprayed, pulverised, or liquefied grinding, polishing or lapping agents

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Grinding-Machine Dressing And Accessory Apparatuses (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
JP2011512740A 2010-02-15 2011-02-14 セリウム系研摩材の再生方法 Active JP5331200B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2011512740A JP5331200B2 (ja) 2010-02-15 2011-02-14 セリウム系研摩材の再生方法

Applications Claiming Priority (12)

Application Number Priority Date Filing Date Title
JP2010029858 2010-02-15
JP2010029859 2010-02-15
JP2010029859 2010-02-15
JP2010029858 2010-02-15
JP2010103399 2010-04-28
JP2010103399 2010-04-28
JP2010103398 2010-04-28
JP2010103398 2010-04-28
JPPCT/JP2010/068443 2010-10-20
PCT/JP2010/068443 WO2011099197A1 (ja) 2010-02-15 2010-10-20 セリウム系研摩材の再生方法
PCT/JP2011/052982 WO2011099596A1 (ja) 2010-02-15 2011-02-14 セリウム系研摩材の再生方法
JP2011512740A JP5331200B2 (ja) 2010-02-15 2011-02-14 セリウム系研摩材の再生方法

Publications (2)

Publication Number Publication Date
JPWO2011099596A1 JPWO2011099596A1 (ja) 2013-06-17
JP5331200B2 true JP5331200B2 (ja) 2013-10-30

Family

ID=44367490

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2011512740A Active JP5331200B2 (ja) 2010-02-15 2011-02-14 セリウム系研摩材の再生方法

Country Status (5)

Country Link
JP (1) JP5331200B2 (zh)
KR (1) KR101398904B1 (zh)
MY (1) MY155812A (zh)
TW (2) TW201129685A (zh)
WO (2) WO2011099197A1 (zh)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101225746B1 (ko) * 2010-08-03 2013-02-15 주식회사 랜코 세리아계 연마재의 재생방법
JP2013126928A (ja) * 2011-12-19 2013-06-27 Shin-Etsu Chemical Co Ltd 酸化セリウムの回収方法
JP6044550B2 (ja) * 2011-12-28 2016-12-14 コニカミノルタ株式会社 研磨剤の製造方法
CN103571336B (zh) * 2012-07-30 2015-04-29 张艺兵 一种废弃抛光粉回收利用方法
CN104619433B (zh) * 2012-09-13 2016-08-24 株式会社Lg化学 含氧化铈废磨料的再生方法
JP5967246B2 (ja) * 2015-04-03 2016-08-10 信越化学工業株式会社 酸化セリウムの回収方法
TWI645045B (zh) * 2017-09-25 2018-12-21 國立臺北科技大學 氧化鈰拋光粉與玻璃粉的分離方法
KR102282872B1 (ko) * 2019-11-11 2021-07-28 주식회사 켐톤 세륨 산화물 입자의 제조방법, 연마입자 및 이를 포함하는 연마용 슬러리 조성물
TWI759787B (zh) * 2020-07-07 2022-04-01 環創源科技股份有限公司 研磨廢液與含氫氟酸廢液的處理方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003205460A (ja) * 2002-01-15 2003-07-22 Speedfam Co Ltd 酸化セリウム系研磨剤再生方法
JP2004306210A (ja) * 2003-04-08 2004-11-04 Speedfam Co Ltd ガラス研磨における排出水中の酸化セリウム系研磨剤と水を再利用するための処理方法とその処理装置

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4729428B2 (ja) * 2006-04-07 2011-07-20 Agcセイミケミカル株式会社 セリウム系研磨剤の再生方法
JP4969313B2 (ja) * 2007-05-11 2012-07-04 Agcセイミケミカル株式会社 希土類元素の回収方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003205460A (ja) * 2002-01-15 2003-07-22 Speedfam Co Ltd 酸化セリウム系研磨剤再生方法
JP2004306210A (ja) * 2003-04-08 2004-11-04 Speedfam Co Ltd ガラス研磨における排出水中の酸化セリウム系研磨剤と水を再利用するための処理方法とその処理装置

Also Published As

Publication number Publication date
TW201129685A (en) 2011-09-01
WO2011099197A1 (ja) 2011-08-18
TWI499481B (zh) 2015-09-11
WO2011099596A1 (ja) 2011-08-18
MY155812A (en) 2015-11-30
KR20120123084A (ko) 2012-11-07
KR101398904B1 (ko) 2014-05-27
TW201136709A (en) 2011-11-01
JPWO2011099596A1 (ja) 2013-06-17

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