JP5328175B2 - 感光性樹脂組成物、フォトスペーサ及びその製造方法、表示装置用基板並びに表示装置 - Google Patents

感光性樹脂組成物、フォトスペーサ及びその製造方法、表示装置用基板並びに表示装置 Download PDF

Info

Publication number
JP5328175B2
JP5328175B2 JP2008043405A JP2008043405A JP5328175B2 JP 5328175 B2 JP5328175 B2 JP 5328175B2 JP 2008043405 A JP2008043405 A JP 2008043405A JP 2008043405 A JP2008043405 A JP 2008043405A JP 5328175 B2 JP5328175 B2 JP 5328175B2
Authority
JP
Japan
Prior art keywords
group
photosensitive resin
resin composition
display device
meth
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2008043405A
Other languages
English (en)
Japanese (ja)
Other versions
JP2009199019A (ja
Inventor
一仁 宮宅
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Corp
Original Assignee
Fujifilm Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujifilm Corp filed Critical Fujifilm Corp
Priority to JP2008043405A priority Critical patent/JP5328175B2/ja
Priority to CN200910007560A priority patent/CN101520603A/zh
Priority to KR1020090015364A priority patent/KR20090091668A/ko
Priority to TW098105727A priority patent/TW200949436A/zh
Publication of JP2009199019A publication Critical patent/JP2009199019A/ja
Application granted granted Critical
Publication of JP5328175B2 publication Critical patent/JP5328175B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/26—Esters containing oxygen in addition to the carboxy oxygen
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C08F290/08—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated side groups
    • C08F290/12—Polymers provided for in subclasses C08C or C08F
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L63/00—Compositions of epoxy resins; Compositions of derivatives of epoxy resins
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B11/00—Diaryl- or thriarylmethane dyes
    • C09B11/04—Diaryl- or thriarylmethane dyes derived from triarylmethanes, i.e. central C-atom is substituted by amino, cyano, alkyl
    • C09B11/10—Amino derivatives of triarylmethanes
    • C09B11/24—Phthaleins containing amino groups ; Phthalanes; Fluoranes; Phthalides; Rhodamine dyes; Phthaleins having heterocyclic aryl rings; Lactone or lactame forms of triarylmethane dyes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Physics & Mathematics (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Health & Medical Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Materials For Photolithography (AREA)
  • Liquid Crystal (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
JP2008043405A 2008-02-25 2008-02-25 感光性樹脂組成物、フォトスペーサ及びその製造方法、表示装置用基板並びに表示装置 Active JP5328175B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2008043405A JP5328175B2 (ja) 2008-02-25 2008-02-25 感光性樹脂組成物、フォトスペーサ及びその製造方法、表示装置用基板並びに表示装置
CN200910007560A CN101520603A (zh) 2008-02-25 2009-02-23 感光性树脂组合物、转印材料、光间隔物及其制造方法、显示装置及其基板
KR1020090015364A KR20090091668A (ko) 2008-02-25 2009-02-24 감광성 수지 조성물, 전사 재료, 포토 스페이서 및 그 제조방법, 표시 장치용 기판 및 표시 장치
TW098105727A TW200949436A (en) 2008-02-25 2009-02-24 Photosensitive resin composition, transfer material, photospacer, manufacturing method thereof, substrate for display device, and display device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2008043405A JP5328175B2 (ja) 2008-02-25 2008-02-25 感光性樹脂組成物、フォトスペーサ及びその製造方法、表示装置用基板並びに表示装置

Publications (2)

Publication Number Publication Date
JP2009199019A JP2009199019A (ja) 2009-09-03
JP5328175B2 true JP5328175B2 (ja) 2013-10-30

Family

ID=41081258

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2008043405A Active JP5328175B2 (ja) 2008-02-25 2008-02-25 感光性樹脂組成物、フォトスペーサ及びその製造方法、表示装置用基板並びに表示装置

Country Status (4)

Country Link
JP (1) JP5328175B2 (zh)
KR (1) KR20090091668A (zh)
CN (1) CN101520603A (zh)
TW (1) TW200949436A (zh)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011095733A (ja) * 2009-09-29 2011-05-12 Fujifilm Corp フォトスペーサ用感光性樹脂組成物、感光性樹脂転写材料、フォトスペーサ及びその製造方法、並びに液晶表示装置用基板及び液晶表示装置
WO2011145750A1 (ja) * 2010-05-20 2011-11-24 日立化成工業株式会社 感光性樹脂組成物、感光性フィルム、リブパターンの形成方法、中空構造とその形成方法及び電子部品
JP4924776B2 (ja) * 2010-06-07 2012-04-25 日立化成工業株式会社 感光性樹脂組成物、これを用いた感光性エレメント、画像表示装置の隔壁の形成方法、画像表示装置の製造方法及び画像表示装置
CN102981317B (zh) * 2012-11-21 2015-08-05 北京京东方光电科技有限公司 一种彩膜基板、液晶面板及液晶显示器
JP5782162B2 (ja) * 2014-05-29 2015-09-24 三菱製紙株式会社 サンドブラスト用感光性フィルム
KR102202344B1 (ko) * 2019-01-04 2021-01-13 동우 화인켐 주식회사 흑색 감광성 수지 조성물, 이로부터 제조된 화상표시장치용 블랙 매트릭스, 컬럼 스페이서 및 블랙 매트릭스 일체형 컬럼 스페이서

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001350011A (ja) * 2000-06-08 2001-12-21 Fuji Photo Film Co Ltd カラーフィルター用感放射線性着色組成物
CN1997944A (zh) * 2004-05-26 2007-07-11 富士胶片株式会社 图案形成方法
JP4864375B2 (ja) * 2004-08-09 2012-02-01 ドンジン セミケム カンパニー リミテッド スペーサ用感光性樹脂組成物、スペーサ及び液晶表示素子
JP2007003860A (ja) * 2005-06-24 2007-01-11 Asahi Kasei Electronics Co Ltd 感光性樹脂組成物及びその用途
JP5313499B2 (ja) * 2005-08-30 2013-10-09 京セラケミカル株式会社 感光性樹脂組成物、スペーサー、カラーフィルター及び液晶表示装置
JP2007093796A (ja) * 2005-09-27 2007-04-12 Fujifilm Corp パターン形成材料、並びにパターン形成装置及びパターン形成方法
JP4994136B2 (ja) * 2006-07-26 2012-08-08 富士フイルム株式会社 感光性組成物、感光性樹脂転写フイルム及びフォトスペーサーの製造方法並びに液晶表示装置用基板、及び液晶表示装置
WO2008140018A1 (ja) * 2007-05-11 2008-11-20 Sekisui Chemical Co., Ltd. カラムスペーサ用硬化性樹脂組成物、カラムスペーサ、及び、液晶表示素子

Also Published As

Publication number Publication date
CN101520603A (zh) 2009-09-02
JP2009199019A (ja) 2009-09-03
KR20090091668A (ko) 2009-08-28
TW200949436A (en) 2009-12-01

Similar Documents

Publication Publication Date Title
JP5191244B2 (ja) 感光性樹脂組成物、フォトスペーサー及びその形成方法、保護膜、着色パターン、表示装置用基板、並びに表示装置
JP4994136B2 (ja) 感光性組成物、感光性樹脂転写フイルム及びフォトスペーサーの製造方法並びに液晶表示装置用基板、及び液晶表示装置
JP5284833B2 (ja) フォトスペーサーの製造方法
JP5127577B2 (ja) スペーサ及びその製造方法、液晶表示装置用基板、液晶表示装置
JP5207837B2 (ja) 硬化性組成物、硬化膜、フォトスペーサーの製造方法、液晶表示装置用基板及び液晶表示装置
JP5361373B2 (ja) 感光性樹脂組成物、フォトスペーサー及びその形成方法、保護膜、着色パターン、表示装置用基板、並びに表示装置
JP2009162871A (ja) 感光性組成物、フォトスペーサー及びフォトスペーサーの製造方法、保護膜、着色パターン、表示装置用基板、並びに表示装置
EP2023203B1 (en) Photosensitive composition, photosensitive resin transfer film, and method for producing a photospacer, and substrate for a liquid crystal display device and liquid crystal display device
JP5328175B2 (ja) 感光性樹脂組成物、フォトスペーサ及びその製造方法、表示装置用基板並びに表示装置
JP2009229720A (ja) 感光性樹脂組成物、フォトスペーサー及びその形成方法、保護膜、着色パターン、表示装置用基板、並びに表示装置
JP5030599B2 (ja) 液晶ディスプレイ用フォトスペーサー及びその製造方法並びに液晶表示装置
JPWO2009063955A1 (ja) スペーサー形成用感放射線性樹脂組成物、スペーサー、スペーサーの形成方法、及び液晶表示素子
JP2009244323A (ja) 感光性樹脂組成物及びフォトスペーサー
JP2009258353A (ja) 感光性樹脂組成物及びフォトスペーサー
JP2009122533A (ja) 感光性樹脂組成物、スペーサ及びその形成方法、並びに液晶表示素子
KR20090032966A (ko) 감광성 수지 조성물, 포토 스페이서의 제조방법, 액정표시장치용 기판, 액정표시소자 및 액정표시장치
JP2009080194A (ja) 重合性樹脂組成物、転写材料、カラーフィルタ及びその製造方法、液晶表示装置用スペーサ及びその製造方法、並びに液晶表示装置
JP2009186838A (ja) 感光性樹脂組成物、フォトスペーサー及びその形成方法、保護膜、着色パターン、表示装置用基板、並びに表示装置
JP2009122549A (ja) 感光性樹脂組成物、スペーサ及びその形成方法、並びに液晶表示素子
KR20090104670A (ko) 감광성 수지 조성물, 포토 스페이서와 그 제조방법, 보호막, 착색 패턴, 표시장치용 기판, 및 표시장치
JP2009128487A (ja) 感光性樹脂組成物及びフォトスペーサーの製造方法、並びに、液晶表示装置用基板、液晶表示素子及び液晶表示装置
KR20090082859A (ko) 감광성 수지 조성물, 포토 스페이서와 그 형성방법, 보호막, 착색 패턴, 표시장치용 기판, 및 표시장치
JP2009079140A (ja) 硬化性組成物、硬化性樹脂転写フイルム、スペーサーの製造方法、液晶表示装置用基板及び液晶表示装置
JP2009035642A (ja) 硬化性組成物、硬化性樹脂転写材料、硬化膜及びその製造方法、液晶表示装置用基板、並びに液晶表示装置

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20100714

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20120314

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20120327

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20120525

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20121120

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20130702

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20130723

R150 Certificate of patent or registration of utility model

Ref document number: 5328175

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

Free format text: JAPANESE INTERMEDIATE CODE: R150

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250